Double-exposure lithography has shown promise as potential resolu- tion enhancement technique that is attractive because it is much cheaper than double-patterning lithography and it can be deployed on existing imaging tools. However, this technology is not possible without the development of new materials with nonlinear response to exposure dose. Several materials have been proposed to implement a nonlinear response to exposure including re- versible contrast enhancement layers (rCELs), two-photon materials, interme- diate state two-photon (ISTP) materials, and optical threshold layers (OTLs). The performance of these materials in double-exposure applications was inves- tigated through computer simulation using a custom simulator. The results from the feasibility studies revealed that the ISTP and OTL types of materials showed much more promise than the rCEL and two-photon types of materi- als. Calculations show that two-photon materials will not be feasible unless achievable laser peak power in exposure tools can be signi¯cantly increased. Although rCEL materials demonstrated nonlinear behavior in double-exposure mode, only marginal image quality and process window improvements were ob- served. Using the results from the simulation work described herein, materials development work is currently ongoing to enable potential ISTP and OTL materials for manufacturing. A new biochip platform named \Mesoscale Unaddressed Functional- ized Features INdexed by Shape" (MUFFINS) was developed in the Willson Research Group at the University of Texas at Austin as a potential method to achieve a new low-cost biosensor system. The platform uses poly(ethylene glycol) hydrogels with bioprobes covalently cross-linked into the matrix for detection. Each sensor is shape-encoded with a unique pattern such that the information of the sensor is associated with the pattern and not its position. Large quantities of individual sensors can be produced separately and then self- assembled to form random arrays. Detection occurs through hybridization of the probes with °uorescently labeled targets. The key designs of the system include parallel batch fabrication using photolithography and self-assembly, in- creased information density using multiplexing, and enhanced shape-encoding with automated pattern recognition. The development of two aspects of the platform { self-assembly mechanics and pattern recognition algorithm, and a demonstration of all the key design elements using a single array are described herein. / text

Aim: The aim of the study was to analyse the psychosocial factors in work- and private life and its correlation with various stress-related symptoms and ill health among employees at a faculty at the Linnaeus University. The goal was also to analyze whether there was a gender difference in these health parameters associated with a difference in psychosocial work and home conditions between women and men. Method: Data were collected through a questionnaire were the responders answered questions about demand, control and social support which emanated from Karasek's demand control model. Their professional position was determined by their pay-and educational level in accordance with the theory of the social gradient of health. Stress was measured using "SCGP scale" and mental illness with the help of the ”General Health Qestionnarie.” Two regression analyses were conducted, the first to analyze the correlation between psychosocial factors and stress-related symptoms and the other to analyze the correlation between psychosocial factors and mental ilness. Results: High demand, low control, low social support and lower professional position had a strong relationship (p<0,000)  with both stress-related symptoms ( R = 0,49) and mental illness ( R = 0,56) even after controlling for confounders.The strongest own relationship (when the overlap effects between different variables was taken into account) were found between high demands and stress-related symptoms (standardized beta 0.35) and high demands and mental illness (standardized beta 0.38). Conclusion: Due to the cross-sectional nature of the study causal inferences cannot be made. However the results showed that high demand, low control and low social support together had a strong correlation with stress-related ill-health. Furthermore, the study showed no gender differences in the psychosocial factors which is a likely explanation for the fact that there was no difference between men and women in neither stress related symptoms or mental illness. This is an important and positive finding because of the fact that the result indicates that differences in health between men and women is reduced when they have equal opportunities in work and private life. / Mål: Målet med studien var att analysera psykosociala faktorer i arbets- och privatliv och dess samband med stressrelaterad ohälsa bland de anställda på en fakultet vid Linnéuniversitetet. Målet var även att analysera huruvida det fanns en könskillnad i dessa hälsoparametrar kopplad till en skillnad i psykosociala förutsättningar mellan kvinnor och män. Metod: Data samlades in via en enkätstudie där de anställda fick svara på frågor kring krav, kontroll och socialt stöd vilka utgick från Karasek´s krav kontroll modell. Individernas plats i yrkeshierarkin avgjordes av deras lön samt utbildningsnivå i enlighet med teorin kring hälsans sociala gradient. De frågor som berörde hemarbete utgick ifrån tidigare forskning på området. Stress mättes med hjälp av ”SCGP scale”, en skala som mäter olika stressrelaterade symtom och psykisk ohälsa mättes med hjälp av ”General Health Qestionnarie”. Två regressionsanalyser genomfördes, den första regressionen analyserade samband mellan psykosociala faktorer och stressrelaterade symtom och den andra regressionen analyserade samband mellan psykosociala faktorer och psykisk ohälsa. Resultat: Höga krav, låg kontroll, lågt socialt stöd samt lägre yrkesposition hade tillsammans ett starkt samband, (p <0,001) med både stressrelaterade symtom (R = 0,49) och psykisk ohälsa (R = 0,56), även efter kontroll för confounders. Det starkaste egna sambandet (när överlappningseffekter mellan olika variabler tagits hänsyn till) återfanns mellan höga krav och stressrelaterade symtom (standardiserad beta 0,35) respektive höga krav och psykisk ohälsa (standardiserad beta 0,38). Konklusion: Resultatet visade att höga krav, låg kontroll, lågt socialt stöd samt lägre plats i yrkeshierarkin tillsammans hade ett starkt samband med stressrelaterade symtom samt psykisk ohälsa. På grund av studiens tvärsnittsdesign kan dock inte orsak och verkan säkerställas. Vidare visade studien inga könsskillnader i ovannämnda psykosociala faktorer vilket är en trolig förklaring till att det inte heller fanns någon skillnad mellan kvinnor och män i stressrelaterade symtom samt psykisk ohälsa. Detta är ett viktigt och positivt fynd då resultatet indikerar på att skillnader i ohälsa mellan kvinnor och män går att utjämna genom att skapa lika förutsättningar i arbets- och privatliv.

The field of organic chemistry is divided into many subfields, which include polymer design and synthesis, transition metal catalysis and organocatalysis among a variety of others. Challenges in polymer design and synthesis can be highlighted pointedly in the use of photoresists for lithographic processing. Recent challenges in development of shorter wavelength sources has led to the need to develop new photoresist materials that can be exposed twice without any development steps in between. Two methods for addressing double exposure materials will be presented. Additionally, the areas of catalysis, whether transition metal or organic in nature, are important methods in organic synthesis. The mechanism of the addition of Gilman reagents to enones has been the subject of debate, and efforts to elucidate this mechanism will be presented. Finally, organocatalysis has expanded its scope into a variety of reactions previously only conducted with transition metal catalysts. Work towards an enantioselective allylic amination reaction using organocatalysis as well as absolute stereochemistry of the product will be explored. / text

交換重曝是一種兩人交換已拍攝底片的活動。透過交換，底片經由重複曝光使同一張底片出現兩個人所攝之重疊影像。交換重曝這種新近的網路及人際互動現象，說明了傳統的攝影方式與底片使用在攝影數位化的浪潮中並未消逝。 近來底片攝影與玩具相機的興起，使研究者觀察到現今的交換重曝攝影蘊含著情感與趣味的分享。從文獻探討過程發現，參與交換重曝的動機與目的來自於遊戲的樂趣，且交換重曝是一種特殊的人際互動過程，交換過程中因缺乏交換雙方的溝通與交流，竟產生人際傳播間類同「噪音」現象所致的「影像醬」。 本研究經由問卷調查與深度訪談，從參與交換重曝活動者所發佈分享影像的情形，了解交換重曝一般行為。其次，分析沖洗完成的底片所帶來的出乎意料的影像驚喜元素，以探察交換重曝活動在攝影數位化時代中新的影像敘事方法。 本研究結果歸納如下：交換重曝結合了遊戲與生活，開創新的人際交流與互動。交換重曝的影像由出乎意料的內涵與驚喜元素，描繪影像的故事場景，帶來的窺視感內含多種可能，建立陌生文化的交集並型塑影像自我敘事。 / “Filmswap” is an activity that two people take photos and exchange their own films and then take photos again. By exchanging films, two different images will overlap and simultaneously be developed at one film through double exposure. The arising of “Filmswap” as a new way of communication reflects that analog photography has not disappeared in digital trends. Recently, analog photography and toy cameras have become popular. One important fact needs to be discovered that analog photography is related to emotion and fun sharing. As revealed in literature review, the motivation and purpose of Filmswap come from the playfulness of playing games. The process of Filmswap is actually a kind of particular interpersonal interaction: Filmswap brings “photo jam” instead of “noise” due to the lack of adequate communication between people. In this study, I use in‐depth interviews and questionnaire surveys to collect the on-line information of displaying photos from the people doing Filmswap and to generalize the elements of surprise in Filmswap. Through the research and the understanding of the context from Filmswap players, this study tries to construct a new method of photo narrative in digital era. There are three conclusions of this research can be addressed as follow: First of all, Filmswap combines play and daily life. Secondly, Filmswap brings a new way of interpersonal interaction. Moreover, those unexpected and surprising image elements depict stories of those Filmswap images and create new ways of photo narratives.

The relentless commercial drive for smaller, faster, and cheaper semi-conductor devices has pushed the existing patterning technologies to their limits. Photolithography, one of the crucial processes that determine the feature size in a microchip, is currently facing this challenge. The immaturity of next generation lithography (NGL) technology, particularly EUV, forces the semiconductor industry to explore new processing technologies that can extend the use of the existing lithographic method (i.e. ArF lithography) to enable production beyond the 32 nm node. Two new resolution enhancement techniques, double exposure lithography (DEL) and pitch division lithography (PDL), were proposed that could extend the resolution capability of the current lithography tools. This thesis describes the material and process development for these two techniques. DEL technique requires two exposure passes in a single lithographic cycle. The first exposure is performed with a mask that has a relaxed pitch, and the mask is then shifted by half pitch and re-used for the second exposure. The resolution of the resulting pattern on the wafer is doubled with respect to the features on the mask. This technique can be enabled with a type of material that functions as optical threshold layer (OTL). The key requirements for materials to be useful for OTL are a photoinduced isothermal phase transition and permeance modulation with reverse capabilities. A number of materials were designed and tested based on long alkyl side chain crystalline polymers that bear azobenzene pendant groups on the main chain. The target copolymers were synthesized and fully characterized. A proof-of-concept for the OTL design was successfully demonstrated with a series of customized analytical techniques. PDL technique doubles the line density of a grating mask with only a single exposure and is fully compatible with current lithography tools. Thus, this technique is capable of extending the resolution limit of the current ArF lithography without increasing the cost-of-ownership. Pitch division with a single exposure is accomplished by a dual-tone photoresist. This thesis presents a novel method to enable a dual-tone behavior by addition of a photobase generator (PBG) into a conventional resist formulation. The PBG was optimized to function as an exposure-dependent base quencher, which mainly neutralizes the acid generated in high dose regions but has only a minor influence in low dose regions. The resulting acid concentration profile is a parabola-like function of exposure dose, and only the medium exposure dose produces a sufficient amount of acid to switch the resist solubility. This acid response is exploited to produce pitch division patterns by creating a set of negative-tone lines in the overexposed regions in addition to the conventional positive-tone lines. A number of PBGs were synthesized and characterized, and their decomposition rate constants were studied using various techniques. Simulations were carried out to assess the feasibility of pitch division lithography. It was concluded that pitch division lithography is advantageous when the process aggressiveness factor k₁ is below 0.27. Finally, lithography evaluations of these dual-tone resists demonstrated a proof-of-concept for pitch division lithography with 45 nm pitch divided line and space patterns for a k₁ of 0.13. / text