Veeco Applied EPI 930 molecular beam epitaxy system equipped with a radio frequency plasma assisted nitrogen source has been introduced and the growth procedure and some specialized measurements are also described. The GaN thin films grown by RF-MBE have been talked about nitridation, low temperature GaN buffer layer, and GaN epilayer. The nitridation is a necessary for grown GaN on c-sapphire. From the result of the HRXRD symmetric (002) rocking curve, the magnitude of the FWHM of the GaN films without nitridation was larger than the films with nitridation. The growth temperature of the LT GaN buffer layer was the major factor on the quality of GaN epilayer which grown on the almost without nitridated sapphire substrate. The growth condition of high growth temperature, thin, low growth rate, and low N/Ga ratio of the LT GaN buffer layer can improve the sequent GaN epilayer quality. On the other hand, in the N/Ga flux ratio of GaN epitaxy layer experiment, we have found three interesting results. First, the narrowest peak width of PL spectrum appeared in a slight Ga-rich condition. Second, the smallest of HRXRD FWHM appeared in the nearly stoichiometry condition. Third, the highest electron mobility and less overall dislocations appeared in a slight N-rich condition. Finally, we report the results about AlGaN/GaN heterostructure grown by metalorganic chemical vapor deposition. The piezoelectric effect on the Alx-£_In£_Ga1-xN/GaN heterostructures was investigated and we found that a little In atom in the spacer (£_< 0.01 %) will substantially reduce the strain at interface due to the much larger size of the In atom in comparison to Al and Ga atoms. The electric field at the interface is reduced one order of magnitude smaller than that of the heterostructure without In atom. Two SdH oscillations beat each other due to the population of the lowest two subbands was been seen. Another two SdH oscillations beating have been observed in modulation-doped AlxGa1-xN/GaN heterostructures caused by the finite zero-filed spin splitting due to the inversion-asymmetry-induced bulk k3 term.