The goal of this thesis is on improving the understanding of mechanical and tribological mechanisms in microelectronic wire bonding. In particular, it focusses on the development and application of quantitative models of ultrasonic (US) friction and interfacial wear in wire bonding. Another objective of the thesis is to develop a low-stress Cu ball bonding process that minimizes damage to the microchip. These are accomplished through experimental measurements of in situ US tangential force by piezoresistive microsensors integrated next to the bonding zone using standard complementary metal oxide semiconductor (CMOS) technology. The processes investigated are thermosonic (TS) Au ball bonding on Al pads (Au-Al process), TS Cu ball bonding on Al pads (Cu-Al process), and US Al wedge-wedge bonding on Al pads (Al-Al process). TS ball bonding processes are optimized with one Au and two Cu wire types, obtaining average shear strength (SS) of more than 120 MPa. Ball bonds made with Cu wire show at least 15% higher SS than those made with Au wire. However, 30% higher US force induced to the bonding pad is measured for the Cu process using the microsensor, which increases the risk of underpad damage. The US force can be reduced by: (i) using a Cu wire type that produces softer deformed ball results in a measured US force reduction of 5%; and (ii) reducing the US level to 0.9 times the conventionally optimized level, the US force can be reduced by 9%. It is shown that using a softer Cu deformed ball and a reduced US level reduces the extra stress observed with Cu wire compared to Au wire by 42%. To study the combined effect of bond force (BF) and US in Cu ball bonding, the US parameter is optimized for eight levels of BF. For ball bonds made with conventionally optimized BF and US settings, the SS is ≈ 140 MPa. The amount of Al pad splash extruding out of bonded ball interface (for conventionally optimized BF and US settings) is between 10–12 µm. It can be reduced to 3–7 µm if accepting a SS reduction to 50–70 MPa. For excessive US settings, elliptical shaped Cu bonded balls are observed, with the major axis perpendicular to the US direction. By using a lower value of BF combined with a reduced US level, the US force can be reduced by 30% while achieving an average SS of at least 120 MPa. These process settings also aid in reducing the amount of splash by 4.3 µm. The US force measurement is like a signature of the bond as it allows for detailed insight into the tribological mechanisms during the bonding process. The relative amount of the third harmonic of US force in the Cu-Al process is found to be five times smaller than in the Au-Al process. In contrast, in the Al-Al process, a large second harmonic content is observed, describing a non-symmetric deviation of the force signal waveform from the sinusoidal shape. This deviation might be due to the reduced geometrical symmetry of the wedge tool. The analysis of harmonics of the US force indicates that although slightly different from each other, stick-slip friction is an important mechanism in all these wire bonding variants. A friction power theory is used to derive the US friction power during Au-Al, Cu-Al, and Al-Al processes. Auxiliary measurements include the current delivered to the US transducer, the vibration amplitude of the bonding tool tip in free-air, and the US tangential force acting on the bonding pad. For bonds made with typical process parameters, several characteristic values used in the friction power model such as the ultrasonic compliance of the bonding system and the profile of the relative interfacial sliding amplitude are determined. The maximum interfacial friction power during Al-Al process is at least 11.5 mW (3.9 W/mm²), which is only about 4.8% of the total electrical power delivered to the US transducer. The total sliding friction energy delivered to the Al-Al wedge bond is 60.4 mJ (20.4 J/mm²). For the Au-Al and Cu-Al processes, the US friction power is derived with an improved, more accurate method to derive the US compliance. The method uses a multi-step bonding process. In the first two steps, the US current is set to levels that are low enough to prevent sliding. Sliding and bonding take place during the third step, when the current is ramped up to the optimum value. The US compliance values are derived from the first two steps. The average maximum interfacial friction power is 10.3 mW (10.8 W/mm²) and 16.9 mW (18.7 W/mm²) for the Au-Al and Cu-Al processes, respectively. The total sliding friction energy delivered to the bond is 48.5 mJ (50.3 J/mm²) and 49.4 mJ (54.8 J/mm²) for the Au-Al and Cu-Al processes, respectively. Finally, the sliding wear theory is used to derive the amount of interfacial wear during Au-Al and Cu-Al processes. The method uses the US force and the derived interfacial sliding amplitude as the main inputs. The estimated total average depth of interfacial wear in Au-Al and Cu-Al processes is 416 nm and 895 nm, respectively. However, the error of estimation of wear in both the Au-Al and the Cu-Al processes is ≈ 50%, making this method less accurate than the friction power and energy results. Given the error in the determination of compliance in the Al-Al process, the error in the estimation of wear in the Al-Al process might have been even larger; hence the wear results pertaining to the Al-Al process are not discussed in this study.

The goal of this thesis is on improving the understanding of mechanical and tribological mechanisms in microelectronic wire bonding. In particular, it focusses on the development and application of quantitative models of ultrasonic (US) friction and interfacial wear in wire bonding. Another objective of the thesis is to develop a low-stress Cu ball bonding process that minimizes damage to the microchip. These are accomplished through experimental measurements of in situ US tangential force by piezoresistive microsensors integrated next to the bonding zone using standard complementary metal oxide semiconductor (CMOS) technology. The processes investigated are thermosonic (TS) Au ball bonding on Al pads (Au-Al process), TS Cu ball bonding on Al pads (Cu-Al process), and US Al wedge-wedge bonding on Al pads (Al-Al process). TS ball bonding processes are optimized with one Au and two Cu wire types, obtaining average shear strength (SS) of more than 120 MPa. Ball bonds made with Cu wire show at least 15% higher SS than those made with Au wire. However, 30% higher US force induced to the bonding pad is measured for the Cu process using the microsensor, which increases the risk of underpad damage. The US force can be reduced by: (i) using a Cu wire type that produces softer deformed ball results in a measured US force reduction of 5%; and (ii) reducing the US level to 0.9 times the conventionally optimized level, the US force can be reduced by 9%. It is shown that using a softer Cu deformed ball and a reduced US level reduces the extra stress observed with Cu wire compared to Au wire by 42%. To study the combined effect of bond force (BF) and US in Cu ball bonding, the US parameter is optimized for eight levels of BF. For ball bonds made with conventionally optimized BF and US settings, the SS is ≈ 140 MPa. The amount of Al pad splash extruding out of bonded ball interface (for conventionally optimized BF and US settings) is between 10–12 µm. It can be reduced to 3–7 µm if accepting a SS reduction to 50–70 MPa. For excessive US settings, elliptical shaped Cu bonded balls are observed, with the major axis perpendicular to the US direction. By using a lower value of BF combined with a reduced US level, the US force can be reduced by 30% while achieving an average SS of at least 120 MPa. These process settings also aid in reducing the amount of splash by 4.3 µm. The US force measurement is like a signature of the bond as it allows for detailed insight into the tribological mechanisms during the bonding process. The relative amount of the third harmonic of US force in the Cu-Al process is found to be five times smaller than in the Au-Al process. In contrast, in the Al-Al process, a large second harmonic content is observed, describing a non-symmetric deviation of the force signal waveform from the sinusoidal shape. This deviation might be due to the reduced geometrical symmetry of the wedge tool. The analysis of harmonics of the US force indicates that although slightly different from each other, stick-slip friction is an important mechanism in all these wire bonding variants. A friction power theory is used to derive the US friction power during Au-Al, Cu-Al, and Al-Al processes. Auxiliary measurements include the current delivered to the US transducer, the vibration amplitude of the bonding tool tip in free-air, and the US tangential force acting on the bonding pad. For bonds made with typical process parameters, several characteristic values used in the friction power model such as the ultrasonic compliance of the bonding system and the profile of the relative interfacial sliding amplitude are determined. The maximum interfacial friction power during Al-Al process is at least 11.5 mW (3.9 W/mm²), which is only about 4.8% of the total electrical power delivered to the US transducer. The total sliding friction energy delivered to the Al-Al wedge bond is 60.4 mJ (20.4 J/mm²). For the Au-Al and Cu-Al processes, the US friction power is derived with an improved, more accurate method to derive the US compliance. The method uses a multi-step bonding process. In the first two steps, the US current is set to levels that are low enough to prevent sliding. Sliding and bonding take place during the third step, when the current is ramped up to the optimum value. The US compliance values are derived from the first two steps. The average maximum interfacial friction power is 10.3 mW (10.8 W/mm²) and 16.9 mW (18.7 W/mm²) for the Au-Al and Cu-Al processes, respectively. The total sliding friction energy delivered to the bond is 48.5 mJ (50.3 J/mm²) and 49.4 mJ (54.8 J/mm²) for the Au-Al and Cu-Al processes, respectively. Finally, the sliding wear theory is used to derive the amount of interfacial wear during Au-Al and Cu-Al processes. The method uses the US force and the derived interfacial sliding amplitude as the main inputs. The estimated total average depth of interfacial wear in Au-Al and Cu-Al processes is 416 nm and 895 nm, respectively. However, the error of estimation of wear in both the Au-Al and the Cu-Al processes is ≈ 50%, making this method less accurate than the friction power and energy results. Given the error in the determination of compliance in the Al-Al process, the error in the estimation of wear in the Al-Al process might have been even larger; hence the wear results pertaining to the Al-Al process are not discussed in this study.

The main topic of this thesis is the development of a chemical microsystem based on integration of a silicon-based resonant microsensor and a CMOS ASIC for portable sensing applications. Cantilever and disk-shape microresonators have been used as mass-sensitive sensors. Based on the characteristics of the microresonators, CMOS integrated interface and control electronics have been implemented. The CMOS ASIC utilizes the self-oscillation method, which incorporates the microresonator in an amplifying feedback loop as the frequency determining element. In this manner, the ASIC includes a main feedback loop to sustain oscillation at or close to the fundamental resonance frequency of the microresonator. For stable oscillation, an automatic gain control loop regulates the oscillation amplitude by controlling the gain of the main feedback loop. In addition, an automatic phase control loop has been included to adjust the phase of the main feedback loop to ensure an operating point as close as possible to the resonance frequency, resulting in improved frequency stability. The CMOS chip has been interfaced to cantilever and disk-shape microresonators and short-term frequency stabilities as low as 3.4×10-8 in air have been obtained with a 1 sec gate time. The performance of the implemented microsystem as a chemical sensor has been evaluated experimentally with microresonators coated with chemically sensitive polymer films. With a gas-phase chemical measurement setup constructed in this work, chemical measurements have been performed and different concentrations of VOCs, such as benzene, toluene and m-xylene have been detected with limits of detection of 5.3 ppm, 1.2 ppm and 0.35 ppm, respectively. To improve the long-term stability in monitoring applications with slowly changing analyte signatures, a method to compensate for frequency drift caused by environmental disturbances has been implemented on the CMOS chip. This method uses a controlled stiffness modulation generated by a frequency drift compensation circuit to track the changes in the resonator's Q-factor in response to variations in the environmental conditions. The measured Q-factor is then used to compensate for the frequency drift using an initial calibration step. The feasibility of the proposed method has been verified experimentally by compensating for temperature-induced frequency drift during gas-phase chemical measurements.

Le travail de la thèse présente une série de (bio)capteurs conductimétriques, à base de la clinoptilolite, pour la détermination de l’ammonium, de l’urée et de la L-arginine. La clinoptilolite, le matériau nanométrique, possédant des propriétés de la sorption intrinsèque et une capacité d’échange cationique vis-à-vis des espèces ammonium, a été d’abord utilisée pour la réalisation d’un microcapteur conductimétrique sélectif à NH4+. Ci-après, une application de ce nanomatériau dans les biocapteurs est favorable pour le fonctionnement dans les solutions tampons multicomposants. Parmi plusieurs variantes de biocapteurs à l’urée à base de la zéolite, la plus intéressante est le biocapteur, dans lequel la couche de la clinoptilolite, déposée sur le transducteur, a été recouverte par le dépôt de la couche de l’uréase et de la zéolite. Pour l’élaboration d’un biocapteur conductimétrique hautement sensible pour la détermination de la L-arginine, l’arginase et l’uréase ont été co-réticulées sur le transducteur. Une détermination quantitative de la L-arginine dans une solution buvable « Arginine Veyron » a montré un fort accord avec les données fournies par le producteur. Une procédure détaillée de l’optimisation du biocapteur conductimétrique pour la détection de la L-arginine dans le sérum bovin a été proposée. La clinoptilolite a été également appliquée comme un modificateur dans la co-immobilisation de l’arginase et l’uréase pour améliorer les caractéristiques analytiques de biocapteur conductimétriques pour la détermination de la L-arginine / Currentwork presents a serie of conductometric (bio)sensors based on clinoptilolite, for ammonium, urea and L-arginine determination. Clinoptilolite, a nanoscale material possessing exceptional sorption and cation-exchange properties toward ammonium species, was initially used for the development of NH4+-selective conductometric microsensor. The clinoptilolite-based microsensor was selective toward ammonium in the presence of interferences that are commonly found along with ammonium in natural waters. Hereafter, an application of this nanomaterial in biosensors is favorable for operation in multicomponent buffer solutions. Among the several variants of the urea biosensors based on zeolite, considerably better characteristics were obtained for the biosensor comprising a clinoptilolite adlayer and an upper layer of immobilized urease and zeolite. In the work, for first time was developed a highly sensitive conductometric biosensor for L-arginine determination based on arginase and urease co-immobilized in a single membrane. The results of a quantitative determination of L-arginine in a drinkable solution “Arginine Veyron”, obtained by the biosensor, were in high correlation with the data provided by the producer. The L-arginine conductometric biosensor was optimized for the serum analysis. Clinoptilolite was also applied as a modifier in co-immobilization of arginase and urease for the improvement of analytical characteristics of the conductometric biosensor for L-arginine determination

La protection de nombreux capteurs de pression en milieux hostiles se résume souvent en un boitier métallique hermétique rempli d’huile enveloppant la puce. La pression agit alors sur une membrane métallique qui agit sur la puce par l’intermédiaire de l’huile jugée incompressible. Cette encapsulation présente des difficultés de réalisation non négligeables et surtout une limitation des capteurs en température. Les travaux réalisés au cours de cette thèse concernent une encapsulation au niveau wafer du capteur de pression. L’idée principale est d’intégrer la protection de la puce dans le processus de fabrication sur wafer. L’intérêt est alors d’obtenir une protection réalisée de manière collective, réduisant ainsi drastiquement les coûts de production. De plus, une encapsulation au niveau wafer offre la possibilité de réduire considérablement les dimensions du capteur tout en le gardant résistant. La suppression d’éléments intermédiaires telle que l’huile entre la pression et la puce en elle même permet enfin d’espérer des applications possibles à température plus élevée. Une fois l’encapsulation réalisée au niveau wafer, il est nécessaire de réaliser le packaging de premier niveau. Le packaging de premier niveau offre un support à la puce, ce qui la rend manipulable et testable, tant par ses dimensions que par la présence de connexions électriques. L’assemblage au niveau wafer et de premier niveau constituent donc les deux niveaux de packaging qui peuvent avoir une influence directe sur le comportement de la puce.Au niveau de l’encapsulation de niveau wafer, trois techniques d’assemblage (wafer bonding) ont été analysées : le scellement anodique, le scellement eutectique et le scellement direct. Le scellement anodique est la technique la plus éprouvée pour assembler un wafer de verre sur un wafer de silicium. Le scellement eutectique représente une technique moins commune mais offrant l’intérêt d’utiliser deux wafers silicium, limitant la différence de dilatation thermique entre les deux wafers et permettant d’usiner plus facilement le wafer d’encapsulation. Enfin la technique du direct bonding donne l’opportunité d’éviter d’utiliser une couche intermédiaire métallique entre les deux wafers, à condition d’avoir deux surfaces à assembler très propres et de très bonne qualité. La technique de soudure anodique a permis de livrer les capteurs qui ont pu confirmer l’intérêt des capteurs WLP pour des applications hautes températures. Les techniques silicium-silicium ont été évaluées mais n’ont pas donné lieu à des capteurs WLP testables.Au niveau de l’encapsulation de niveau un, la technique de Flip-Chip à été utilisée pour reporter la puce sur son support. Cette technique consiste à retourner la puce et l’assembler par thermocompression. Les plots de connexions de la puce pour cet assemblage ont pu être réalisés par ball bumping. Des cycles en température (-55°C à +125°C ou 150°C) ont pu être réalisés sur les puces scellées par scellement anodique. L’erreur totale en précision de ces capteurs WLP est du même ordre que les capteurs Auxitrol actuels avec une compensation numérique. Le principal atout des capteurs WLP est une non-linéarité de l’offset en température divisée par deux. Cette caractéristique est importante dans le cas où l’on utilise une compensation analogique qui peut résister à des températures plus élevées que la compensation numérique. Les capteurs WLP offre donc l’opportunité d’avoir des applications au-delà de 200°C, chose alors jusqu’alors prohibée par l’utilisation de l’huile / Protection of most of the pressure sensors working in harsh environment consist in oil filled metallic unit including the sensor die. In that case, pressure is applied on a metallic membrane moving the silicon membrane of the die across an incompressible fluid. The main drawbacks of the standard encapsulation are a complex fabrication process and most of all a sensor limitation in high temperatures. The topic of this PhD thesis is about wafer-level packaging (WLP) of the pressure sensor. The main idea is to integrate the die protection in the fabrication process at wafer level. Advantage is to obtain a collective protection fabrication reducing production costs. Moreover, a wafer-level encapsulation allows a possible reduction of sensor dimensions keeping it reliable. Removing intermediary elements allows also high temperature applications. Once encapsulation realised on the wafer, it is necessary to build the first-level packaging. First-level packaging makes the die usable in terms of electrical connection and dimensions. Wafer and first-levels are both packaging levels with important impact on the die behaviour.At wafer-level packaging, three wafer bonding technologies have been investigated: anodic bonding, Au-Si eutectic bonding and direct bonding. Anodic bonding is the most known technology to assemble a glass wafer with a silicon wafer. Eutectic bonding represents a promising technique to bond two silicon wafers allowing less CTE mismatch between wafers material and an easier micromachining of silicon instead of glass material. Direct bonding is also interesting to bond two silicon wafers, without using intermediary metallic layer but needing really clean surfaces to assemble. Anodic bonding process gave us the opportunity to deliver WLP sensors showing interest for high temperature applications. Silicon-Silicon technologies have been evaluated but did not give representative WLP sensors.At first-level packaging, the Flip-chip technology have been used for die attach. This technique consists in flipping the die and making the die attach by thermocompression with stud bumps on the die connection pads.Temperature cycling (-55°C to +125°C or more) have been realised on anodic WLP sensors. Accuracy total error of these WLP sensors is in the same order than standard Auxitrol sensors with digital compensation. the main advantage of the WLP sensors is a offset non-linearity in temperature divided by two. This characteristic is important in the case of analogical compensation that can resist to higher temperatures than digital compensation elements. In definitive, WLP sensors offer a good opportunity to have application over 200°C, prohibited at present with the presence of oil for standard Auxitrol sensor