A new sensor technology based on optical diffraction of visible light shows promise for sensing metal ions and other species that employ chemically-responsive metal oxide and conducting polymer grating elements. These materials undergo reversible redox processes upon interaction with a chemical analyte that subsequently induces changes in the materials refractive index. The two key design parameters of this sensing technique involve preparation of micropatterned sensor elements and the evaluation of appropriate wavelengths for detection of diffracted light. Much of the ability to “tune” a desired sensing response is dictated by the understanding of how factors of size, dimension, crystallinity, morphology, porosity, and heterogeneity influence analyte/sensor interactions (i.e., adsorption, binding, and transport). The effect of composition, structure, and morphology of MoO₃, WO₃, Moₓ W₁₋ₓO₃, IrOₓ and polyaniline grating materials on chemical, electrochemical and optical properties of these systems will be examined by a range of spectroscopic and electrochemical techniques. Comprehensive evaluation and correlation of materials’ optical properties to diffraction-based detection will advance understanding of the capabilities and limitations for the diffraction-based sensing methodology. This information can then used to determine optimal sensing parameters to improve detection limits, enhance sensitivity and increase the dynamic range for detection of model analytes. / text

Optical waveguides, quantum dot emitters, and flat top beam shapers were designed and fabricated by two soft lithographic techniques; micro transfer molding (microTM) and vacuum assisted microfluidics (VAM). Optical waveguides were fabricated through a microTM technique that utilizes a poly dimethylsiloxane (PDMS) stamp. Generation of the flexible stamp required development of a channel waveguide pattern mask, defined by maskless lithography, and followed by construction of a three dimensional channel waveguide master, acquired through contact lithography on a glass substrate coated with SU-8 photoresist. Creation of a positive imprint replicating mold was accomplished through prepolymer PDMS solution settling and curing around the master. Waveguide fabrication was achieved through PDMS conformal contact on, and subsequent curing of, ultraviolet (UV) polymer resins on a silicon substrate. A slight modification of the microTM PDMS stamp, whereby inlet and outlet tunnels were incorporated, resulted in a novel VAM structure and correspondingly waveguides. Waveguide propagation losses were determined to be 1.14 dB/cm and 0.68 dB/cm for the microTM and VAM fabricated waveguides, respectively. A lithographic approach employing quantum dots doped in SU-8 photoresist has led to the realization of a new quantum dot emitter. Uniform coating of a doped material on a silver coated substrate was followed by contact mask lithography. Evaporation of a thin silver layer, upon development of the resultant quantum dot doped channel waveguide structure, facilitates confined emission. Successful edge emitting was demonstrated with blue laser pumping. The lithographic fabrication of such quantum dot emitter is successfully replaced by soft lithographic VAM technique. A flat top beam shaper, whose profile was developed on cured UV polymer resins, was fabricated by microTM technique. The master used for the development of the PDMS stamp was produced through an iterative wet etching process capable of achieving etching depths as small as a few nanometers. Comparisons between the reference wet etched beam shaper and the microTM based beam shaper produced near identical output flat top beams from incident Gaussian beams. Through this research work, successful soft lithographic fabrication of optical waveguides, quantum dot emitters, and flat top beam shapers were demonstrated. The vast potential exhibited by these and other related technologies show great promise for cost-effective mass production of various micro optics and integrated photonic components.

L'objectif des travaux est de démontrer que la lithographie douce, quelquefois baptisée " Micro-Contcat Printing (µCP)", constitue une méthode de dépôt de biomolécules présentant de nombreux avantages pour des applications de type Biopuces. Pour la fabrication de puces à ADN, nous démontrons que le µCP est une technique compétitive par rapport au dépôt robotisé de gouttes traditionnellement utilisé. Le coût est inférieur, la densité des puces est augmentée et la qualité et la définition des motifs biomoléculaires sont supérieures. Une étude complète des mécanismes d'encrage des timbres élastomères d'impression ainsi que des mécanismes de transfert par contact des molécules vers le substrat est présentée. Le rôle prépondérant des fragments de polymère non réticulés présents à la surface des timbres est mis en évidence. Dans un second volet nous étudions la possibilité de générer par la même méthode des puces à biomolécules uniques. Nous montrons comment le µCP peut être poussé jusqu'à une résolution sub-micrométrique proche de 50 nm. Deux voies technologiques originales impliquant la lithographie douce sont proposées : l'une pour peigner individuellement en des sites organisés précisément sur la surface des longs brins d'ADN pour des études de génétique, l'autre pour fixer des molécules individuelles d'ADN par une extrémité rendant possible l'étude dynamique de molécules uniques (ADN) sur de larges populations.