Στην παρούσα διπλωματική εργασία αναλύονται λεπτά υμένια (thin films) διαφόρων πολυμερικών ή ολιγομερών οργανικών ενώσεων, με την επεξεργασία μετρήσεων που είχαν ληφθεί με την επιφανειακά ευαίσθητη τεχνική της φασματοσκοπίας φωτοηλεκτρονίων από ακτίνες Χ (XPS). Από την ανάλυση των φασμάτων XPS προκύπτουν συμπεράσματα τόσο για την παρουσία συγκεκριμένων χημικών στοιχείων στα δείγματα (ποιοτική ανάλυση) όσο και για την συγκέντρωση των στοιχείων αυτών στην περιοχή ανάλυσης (ποσοτική ανάλυση). / This thesis analyzed thin films (thin films) various polymeric or oligomeric organic compounds, the processing of measurements taken with the surface sensitive technique of spectroscopy X-ray photoelectron (XPS). From the analysis of XPS spectra resulting conclusions as to the presence of certain chemical elements in samples (qualitative analysis) and for the concentration of these elements in the analysis (quantitative analysis).

Advances in the interconnection technology have played a key role in the continued improvement of the integrated circuit (IC) density, performance and cost. Copper (Cu) metallization, dual damascenes processing and integration of copper with low dielectric constant material are key issues in the IC industries. Chemical mechanical planarization of copper (CuCMP) has emerged as an important process for the manufacturing of ICs. Usually, Cu-CMP process consists of several steps such as the removal of surface layer by mechanical action of the pad and the abrasive particles, the dissolution of the abraded particles in the CMP solution, and the protection of the recess areas. The CMP process occurs at the atomic level at the pad/slurry/wafer interface, and hence, slurries and polishing pads play critical role in its successful implementation. The slurry for the Cu-CMP contains chemical components to facilitate the oxidation and removal of excess Cu as well as passivation of the polished surface. During the process, these slurry chemicals also react with the pad. In the present study, investigations were carried out to understand the effect of hydrogen peroxide (H2O2) as an oxidant and benzotriazole (BTA) as an inhibitor on the CMP of Cu. Interaction of these slurry components on copper has been investigated using electrochemical studies, x-ray photoelectron spectroscopy (XPS) and secondary ion mass spectroscopy (SIMS). In the presence of 0.1M glycine, Cu removal rate was found to be high in the solution containing 5% H2O2 at pH 2 because of the Cu-glycine complexation reaction. The dissolution rate of the Cu was found to increase due to the formation of highly soluble Cu-glycine complex in the presence of H2O2. Addition of 0.01M BTA in the solution containing 0.1M glycine and 5% H2O2 at pH 2 exhibited a reduction in the Cu removal rate due to the formation of Cu-BTA complex on the surface of the Cu further inhibiting the dissolution. XPS and SIMS investigations revealed the formation of such Cu-glycine complex, which help understand the mechanism of the Cu-oxidant-inhibitor interaction during polishing. Along with the slurry, pads used in the Cu-CMP process have direct influence an overall process. To overcome problems associated with the current pads, new application specific pad (ASP) have been developed in collaboration with PsiloQuest Inc. Using plasma enhanced chemical vapor deposition (PECVD) process; surface of such ASP pads were modified. Plasma treatment of a polymer surface results in the formation of various functional groups and radicals. Post plasma treatment such as chemical reduction or oxidation imparts a more uniform distribution of such functional groups on the surface of the polymer resulting in unique surface properties. The mechanical properties of such coated pad have been investigated using nanoindentation technique in collaboration with Dr. Vaidyanathan’s research group. The surface morphology and the chemistry of the ASP are studied using scanning electron microcopy (SEM), x-ray photoelectron spectroscopy (XPS), and fourier transform infrared spectroscopy (FTIR) to understand the formation of different chemical species on the surface. It is observed that the mechanical and the chemical properties of the pad top surface are a function of the PECVD coating time. Such PECVD treated pads are found to be hydrophilic and do not require being stored in aqueous medium during the not-in-use period. The metal removal rate using such surface modified polishing pad is found to increase linearly with the PECVD coating time. Overall, this thesis is an attempt to optimize the two most important parameters of the Cu-CMP process viz. slurry and pads for enhanced performance and ultimately reduce the cost of ownership (CoO).

Allyl methacrylate, AMA was polymerized by chemical initiator and by &amp / #947 / -radiation under different conditions. The polymer obtained is mostly gel type with some soluble fractions at lower conversions. Arrhenius activation energy is 82.3 kJ/mol for chemical initiated polymerization. The polymer was characterized by FT-IR, NMR, DSC, TGA, XPS, XRD, DLS, and MS methods. It was found that about 98-99% of allyl side groups retained as pendant even after completion of the polymerization, while 1-2% may give crosslinking and/or cyclization that yields lactones and anhydrides. The spectroscopic and thermal results of the work showed that the reaction is not cyclopolymerization, but may have end group cyclization. Molecular weight of 1.1x106 was measured by DLS. Therefore, insolubility is due to the high molecular weight of polymer, even in the early stage of polymerization rather than crosslinking. The Tg of PAMA was observed as 94&ordm / C before curing, upon curing at 150-200&ordm / C, Tg increased to 211&ordm / C as measured by DSC. The thermal treatment of polymer at about 350&ordm / C gave anhydride by linkage type degradation, following side group cyclization. The XPS analysis showed the presence of radical fragments of AIBN and CCl4 associated with oligomers. The MS and TGA thermograms showed two or three stage degradations depending on solubility. The first stage was mostly linkage type degradation for the fragmentation of pendant allyl groups at 225-350&ordm / C. In the second stage, at 395-515&ordm / C, the degradation is random scission and depolymerization.

The interactions which occur between both polar and non-polar fluid phases and surfaces of various carbon materials: Activated Carbon (AC), non-porous Carbon Black (CB) and Multiwall Carbon Nanotubes (MWCNTs)with different surface chemistry have been studied. These are currently of great interest as they govern the interfacial behaviour of carbons in a wide range of applications; separation adn composite technologies being two prime examples. Consequently, techniques for chemical modification of carbon surfaces ar also of interest. Surface oxygen functional groups have been introduced, or modified, using the following oxidation techniques: liquid-phase oxidation (both AC and CB), Fenton and Birch reduction treatment (MWCNTs) and in a more controlled manner using gas-phase ozone treatment (CB). The chemistry of all the resulting carbon surfaces were characterised using X-ray Photoelectron Spectroscopy (XPS), which gives a quick and direct quantitative measure of the external surface composition. This technique, which has not yet been extensively employed in detailed adsorption studies, is a promising alternative to Temperature Programmed Desorption (TPD) and Boehm titration method in the determination of oxygen and other surface groups. Physical effects of the various surface modifications have been studied using a variety of techniques appropriate for the material in question. Scanning Electron Microscopy (SEM) images show some deteriorating effects of the liquid-phase oxidations on the structure of both activated carbon and carbon black materials. Conversely, surface areas from nitrogen adsorption at 77oK, coupled witj immersion calorimetry data for toluene, show thet the physical structure of the carbon blacks is not modified by ozone treatment. This has allowed a detailed study of the effects of surface oxygen level (i.e. polarity) on vapour adsorption. Regarding the MWCNT materials, detailed High-Resolution Electron Microscopy (HRTEM) photographs show that the multi-wall structure of the nanotubes in not significantly disrupted during the introduction of active functional groups by the Fenton or Birch treatment and therefore keeping intact their mechanical properties which augurs well for their use as reinforcement in composite structures whilst also improving their dispersion properties in polar fluids. A systematic shift to higher adsorption values, due to the increasing specific interactions between the alcohol -OH groups and the surface oxygen groups, is observed in all the isotherms of alcohols from the CB series as the total surface oxygen concentration ([O]T) increases. Moreover, this effect was observed to be most significant for methanol confirming that the mechanism of adsorption is dominated by hydrogen bonding and therefore dependant on the surface concentration of oxygen sites; whereas it becomes less marked in the case of ethanol and isopropanol respectively due to the increasing non-specific, dispersion, interactions of the alkyl chain with the non-polar carbon surface. Overall correlations were observed between the surface oxygen concentration [O]T, the resulting enthalpy of immersion -^Hi values and the characteristic energy E of the Dubinin-Radushkevich-Kaganer (DRK) equation obtained for toluene and these alcohols and the influence of the carbon surface chemistry on the character of the adsorption isotherms is also discussed. This behaviour is also observed and much more pronounced in the case of water adsorption on other oxidised carbon materials (AC, CB and MWCNT) due to the higher polarity of water molecules. The water adsorption data were analysed using in particular the Dubinin-Serpinsky (DS) equation and also some of its recent variations such as Barton and D'Arcy & Watt equations. The DS2 and various Barton equations were found to fit best the AC and CB materials modified by liquid-phase oxidations and also for the CB 03 series with increasing level of oxidation while both D'Arcy & Watt equations gave the best fittings for the MWCNTs materials. It was also shown that the resulting parameters ao (for the DS equation) describing the surface concentration of primary polar adsorption sites and as the limiting water adsorption value were both linked to the surface oxygen level [O]T. Regarding interfacial bonding, the oxidised CB and MWCNT materials are expected to show an improved physicochemical wetting of their surfaces by various resin compunds

Catalytic combustion is an environmentally benign technologywhich has recently reached the stage of commercialization.Palladium is the catalyst of choice when considering gasturbines fuelled with natural gas because of its superioractivity for methane oxidation. Several fundamental issues arestill open and their understanding would result in animprovement of the technology. Hence, the work presented inthis thesis aims at the identification of some of theparameters which govern the combustion activity ofpalladium-based catalysts. The first part of this work gives a background to catalyticcombustion and a brief comparison with other existingtechnologies. Paper I reviews some of the issues related tomaterial development and combustor design. The second part of this thesis consists of an experimentalinvestigation on palladium-based catalysts. The influence ofthe preparation method onthe properties of these catalystmaterials is investigated in Paper II. Paper III examines theactivity of the following catalysts: Pd/Al2O3, Pd/Ba-Al2O3 andPd/La-Al2O3. Specific attention is given to the metal-supportinteraction which strongly affects the combustion activity ofpalladium. The effect of doping of the support by addition ofcerium is reported in Paper IV. Finally, the deactivation of combustion catalysts isconsidered. The various deactivation processes which may affecthigh temperature combustion catalysts are reviewed in Paper V.Paper VI focuses on the poisoning of supported palladiumcatalysts by sulphur species. Palladium exhibits a higherresistance to sulphur poisoning than transition metals.Nevertheless, the nature of the support material plays animportant role and may entail a severe loss of activity whensulphur is present in the fuel-air mixture entering thecombustion chamber. <b>Keywords</b>: catalytic combustion, gas turbine, methane,palladium, alumina, barium, lanthanum, oxidation, preparation,temperature-programmed oxidation (TPO), decomposition,reoxidation, X-ray photoelectron spectroscopy (XPS),metal-support interaction, deactivation, sulphur, poisoning.The cover illustration is a TEM picture of a 100 nm palladiumparticle supported on alumina

<p>Catalytic combustion is an environmentally benign technologywhich has recently reached the stage of commercialization.Palladium is the catalyst of choice when considering gasturbines fuelled with natural gas because of its superioractivity for methane oxidation. Several fundamental issues arestill open and their understanding would result in animprovement of the technology. Hence, the work presented inthis thesis aims at the identification of some of theparameters which govern the combustion activity ofpalladium-based catalysts.</p><p>The first part of this work gives a background to catalyticcombustion and a brief comparison with other existingtechnologies. Paper I reviews some of the issues related tomaterial development and combustor design.</p><p>The second part of this thesis consists of an experimentalinvestigation on palladium-based catalysts. The influence ofthe preparation method onthe properties of these catalystmaterials is investigated in Paper II. Paper III examines theactivity of the following catalysts: Pd/Al2O3, Pd/Ba-Al2O3 andPd/La-Al2O3. Specific attention is given to the metal-supportinteraction which strongly affects the combustion activity ofpalladium. The effect of doping of the support by addition ofcerium is reported in Paper IV.</p><p>Finally, the deactivation of combustion catalysts isconsidered. The various deactivation processes which may affecthigh temperature combustion catalysts are reviewed in Paper V.Paper VI focuses on the poisoning of supported palladiumcatalysts by sulphur species. Palladium exhibits a higherresistance to sulphur poisoning than transition metals.Nevertheless, the nature of the support material plays animportant role and may entail a severe loss of activity whensulphur is present in the fuel-air mixture entering thecombustion chamber.</p><p><b>Keywords</b>: catalytic combustion, gas turbine, methane,palladium, alumina, barium, lanthanum, oxidation, preparation,temperature-programmed oxidation (TPO), decomposition,reoxidation, X-ray photoelectron spectroscopy (XPS),metal-support interaction, deactivation, sulphur, poisoning.The cover illustration is a TEM picture of a 100 nm palladiumparticle supported on alumina</p>

This talk was presented in the 14th International Conference on Atomic Layer Deposition (ALD 2014) in Kyoto, Japan on 18th June 2014. Abstract Atomic Layer Deposition (ALD) is emerging as a ubiquitous method for the deposition of conformal and homogeneous ultra-thin films on complex topographies and large substrates in microelectronics. Electrochemical deposition (ECD) is the first choice for the deposition of copper (Cu) into the trenches and vias of the interconnect system for ULSI circuits. The ECD of Cu necessitates an electrically conductive seed layer for filling the interconnect structures. ALD is now considered as a solution for conformal deposition of Cu seed layers on very high aspect ratio (AR) structures also for technology nodes below 20 nm, since physical vapor deposition is not applicable for structures with high AR. Cu seed layer deposition by the reduction of Cu2O, which has been deposited from the Cu(I) β-diketonate [(nBu3P)2Cu(acac)] (1) used as Cu precursor, has been successfully carried out on different substrates like Ta, TaN, SiO2, and Ru [1, 2]. It was found that the subsequent gas-phase reduction of the Cu2O films can be aided by introducing catalytic amounts of a Ru precursor into the Cu precursor, so that metallic copper films could potentially obtained also on non-catalytic substrates [3, 4]. In this work, in situ X-ray photoelectron spectroscopy (XPS) investigation of the surface chemistry during Cu2O ALD from the mixture of 99 mol % of 1 and 1 mol % of [Ru(η5 C5H4SiMe3)(η5-C7H11)] (2) as ruthenium precursor, and the reduction of Cu2O to metallic Cu by formic acid carried out on SiO2 substrate are demonstrated. Oxidation states of the Cu in the film are identified by comparing the Cu Auger parameter (α) [5] with literature data. α calculated after ALD equals 362.2 eV and after reduction equals 363.8 eV, comparable to the Cu2O and metallic Cu in thin-films [6] respectively. In addition, <10 % of Cu(I), Cu(II), and Cu(OH)2 species are identified from the Cu 2p3/2 and Cu L3VV Auger spectrum after reduction. Consequently, the ALD Cu2O is successfully reduced to metallic copper by in-situ thermal reduction using formic acid. [1] T. Waechtler et al., J. Electrochem. Soc., 156 (6), H453 (2009). [2] T. Waechtler et al., Microelectron. Eng., 88, 684 (2011). [3] S. Mueller et al., Conference Proceedings SCD 2011, Semiconductor Conference Dresden, pp. 1-4. [4] T. Waechtler et al., US Patent Application Publication, US 2013/0062768. [5] C. D. Wagner, Faraday Discuss. Chem. Soc., 60, 291 (1975). [6] J. P. Espinós et al., J. Phys. Chem. B, 106, 6921 (2002).

The development of new storage materials will facilitate the use of hydrogen as a major energy carrier in near future. In hydrogen economy, chemical hydrides such as NaBH4, KBH4, LiH, NaH have been tested as hydrogen storage materials for supplying hydrogen at ambient temperature. Among these chemical hydrides, sodium borohydride seems to be an ideal hydrogen storage material because it is stable under ordinary conditions and liberates hydrogen gas in a safe and controllable way in aqueous solutions. However, self hydrolysis of sodium borohydride is so slow that it requires a suitable catalyst. All of the prior catalysts tested for the hydrolysis of sodium borohydride are heterogeneous and, therefore, have limited activity because of the small surface area. Here, we report for the first time the employment of water dispersible metal(0) nanoclusters having a large portion of atoms on the surface as a catalyst for the hydrolysis of sodium borohydride. In-situ formation of nickel(0) nanoclusters and catalytic hydrolysis of sodium borohydride were performed in the same medium. Nickel(0) nanoclusters are prepared from the reduction of nickel(II) acetylacetonate by sodium borohydride in aqueous solution and stabilized with hydrogenphosphate anions. The nickel(0) nanoclusters were characterized by using XPS, Powder XRD, FT-IR, UV-Vis and NMR spectroscopic methods. The kinetics of the nickel(0) nanoclusters catalyzed hydrolysis of sodium borohydride was studied depending on the catalyst concentration, substrate concentration, stabilizing agent concentration and temperature. Tha kinetic study shows that the nickel(0) nanocluster-catalyzed hydrolysis of sodium borohydride is first order with respect to catalyst concentration and zero order with respect to substrate concentration The activation parameters of this reaction were also determined from the evaluation of the kinetic data. The hydrogenphosphate-stabilized nickel(0) nanoclusters provide a lower activation energy (Ea= 55 kJ/mol) than bulk nickel (Ea=73 kJ/mol) for the hydrolysis of sodium borohydride.

The oxidative dissolution of chalcopyrite in ferric media often produces incomplete copper recoveries. The incomplete recoveries have been attributed to inhibition caused by the formation of a metal deficient sulphide and the deposition of elemental sulphur and jarosite. Although these phases have been qualitatively identified on the surface of chalcopyrite, none have been quantitatively identified. The aim of the project was to quantitatively analyse the surface before and after oxidative dissolution, with X-ray photoelectron spectroscopy (XPS), and to use the phases identified as the basis for mechanisms of dissolution and inhibition. / XPS analysis was performed on chalcopyrite massive fractured under anaerobic atmosphere and chalcopyrite massive and concentrate oxidised in 0.1 M ferric sulphate (pH 1.9) and 0.2 M ferric chloride (pH 1.6) at 50, 65 and 80ºC. Quantitative XPS analysis of the chalcopyrite surfaces required the development of programs that accounted for the observed XPS spectra. The output of these programs was used to construct profiles of the chalcopyrite surfaces and the deposited phases. These surface profiles were correlated with copper recoveries determined for chalcopyrite concentrate dissolution under the same conditions. / The surface of chalcopyrite before oxidative dissolution reconstructs to form a `pyritic' disulphide phase. This phase is oxidised in ferric media to form thiosulphate via the incorporation of oxygen atoms from the hydration sphere. The thiosulphate reacts in the oxidising conditions of low pH to form elemental sulphur, sulphite and sulphate. The sulphate complexes with ferric to produce hydronium jarosite. This reaction occurs at the surface during the initial stages of dissolution and in the bulk solution during the latter stages. This precipitation of hydronium jarosite during the latter stages of dissolution corresponds to inhibition of the dissolution reaction. It is therefore concluded hydronium jarosite is responsible for inhibiting the oxidative dissolution of chalcopyrite in ferric media. / The identification of hydronium jarosite as the inhibiting phase is consistent with the industrial practice of removing `excess' iron from the ferric solution before oxidative dissolution. However, additional iron and sulphate are generated at the chalcopyrite surface during oxidative dissolution. These high iron and sulphate concentrations combine with the low pH and high temperatures favoured for the oxidative dissolution of chalcopyrite to produce ideal conditions for jarosite precipitation. Therefore, pH must be lowered further to prevent jarosite precipitation and enhance copper recoveries from chalcopyrite in ferric media.

Comprehensive investigations of the electron field emission (FE) properties of annealed single crystal and polycrystalline molybdenum plugs, which are used as substrates for actual alkali-based photocathodes were performed with a FE scanning microscope. Well-polished and dry-ice cleaned Mo samples with native oxide did not show parasitic FE up to a field level of 50 MV/m required for photoinjector cavities. In situ heat treatments (HT) above 400°C, which are usual before photocathode deposition, activated field emission at lower field strength. Oxygen loading into the Mo surface, however, partially weakened these emitters. X-ray photoelectron spectroscopy of comparable Mo samples showed the dissolution of the native oxide during such heat treatments. These results reveal the suppression of field emission by native Mo oxides. Possible improvements for the photocathode preparation will be discussed.