Low pressure chemical vapor deposition (LPCVD) is one of the important technics in the semiconductor process recently. The computer simulation is the best efficient method on the process research. This research use numerical method to study the performance of showerhead parameters, and to confer the flow field distribution and deposition rate under different design parameters in LPCVD of silicon (Si). In this simulation, the CVD reactor modelings are constructed and discredited by using implicit finite volume method. The grids are arranged in a staggered manner for the discretization of the governing equations. Then the SIMPLE-type algorithm is used to solve all of the discretized algebra equations. The variable parameters are: (1) the inlet velocity, (2) the holes diameter of showerhead, (3) the showerhead size. The results show that using the showerhead can adjust the flow filed distribution and it is better for film thickness uniformity. The holes diameter and distribution density have relations with film uniformity. We also proved that the growth rate increase with the inlet velocity under the some conditions.

Two sets of experiments were performed on a simulated turbine nozzle guide vane. First, adiabatic and overall effectiveness measurements were taken in the showerhead region of the vane using adiabatic and matched Biot vane models, respectively. Measurements of overall effectiveness in the showerhead region are not found in the literature, and are a useful baseline for validating the results of computational fluid dynamics (CFD) simulations. Overall effectiveness is useful because it shows the results of combining film cooling, internal convection, and surface conduction to provide a more complete picture of vane cooling than adiabatic effectiveness. An impingement plate was utilized to generate internal jet cooling. Momentum flux ratios were matched between the models and ranged from I*SH = 0.76 to 6.70, based on showerhead upstream approach velocity. The second set of experiments used a different model to examine the effects of surface curvature on adiabatic effectiveness. Results in open literature are found by varying the radius of curvature of a fixed setup, so the current approach was novel in that it looked at adiabatic effectiveness at locations of various curvature around the same vane. Blowing ratios from M = 0.4 to M = 1.6 were tested at a density ratio of DR = 1.20 for two locations on the suction side of the vane. Results were presented in terms of laterally averaged adiabatic effectiveness and contour plots of adiabatic effectiveness, and were compared to literature. / text