Pour les technologies CMOS sub-10 nm, l’industrie du semi-conducteur est confrontée aux limites de résolution de la lithographie conventionnelle. Différentes techniques alternatives ont été proposées afin de permettre l’obtention de motifs avec des dimensions de l’ordre de 20 nm. Dans cette thèse, nous nous sommes intéressés au « spacer patterning » et à l’autoassemblage dirigé des copolymères à blocs. Nous avons développé une intégration de « spacer patterning » permettant l’obtention de lignes de 20 nm de largeur. Une étude a été menée à partir des matériaux disponibles au CEA-LETI. Ainsi, nous avons étudié les différents enjeux de cette intégration pour les prochains nœuds technologiques. Pour l’auto-assemblage dirigé des copolymères à blocs (DSA), un des enjeux concerne la création d’un masque avec le retrait d’un polymère sélectivement à l’autre. Dans le cadre de notre étude sur le PS-b-PMMA, nous nous sommes intéressés au retrait du PMMA sélectivement au PS par gravure plasma. Des chimies par plasma permettant le retrait du PMMA sélectivement au PS pour des motifs cylindriques et lamellaires ont été développées. / For sub-10 nm CMOS technologies, the semiconductor industry is facing the limits of conventionnal lithography. Several alternative techniques have been proposed to allow 20 nm patterns. In this thesis, we have proposed to focus on spacer patterning technique and Directed Self-Assembly of block copolymers (DSA). We have developped a spacer patterning integration which allows to pattern 20 nm-wide lines. A study has been carried out with materials available at CEA-LETI. Thus, we have studied the different challenges induced by this integration for the following technologic nodes. Concerning Directed Self-Assembly of block copolymers (DSA) technique, one of the main challenge concerns the mask creation by removing a polymer selectively to another. For our study on PS-b-PMMA, we have studied PMMA removal selectively to PS by plasma etching. Plasma chemistries have been developed for removing PMMA selectively to PS on cylidrical and lamellar patterns.

No description available.

In this thesis, we successfully fabricated GOLD ( gate-overlapped LDD ) polycrystalline silicon thin-film transistors ( poly-Si TFTs ) with selectively deposited W spacers. Under appropriate deposition conditions, tungsten ( W ) films can be selectively deposited on poly-Si gate electrodes to form spacers without any additional etching process. Compared with the conventional poly-TFTs without LDD structures, our devices effectively lower the leakage current and sustain a comparable on current. The transconductance of our devices is compatible to that of conventional devices, because W-spacer acts as a part of gate electrode to induce channel when the device is operated under ON state. To further study the characteristics of W-spacer TFTs, devices with different channel thickness, spacer thickness and LDD dopant density are fabricated. It is found that thinner channel, thicker spacer and lightly doped LDD implant can effectively suppress the floating body effect and also the kink effect. By comparing device performances after plasma passivation, it is also found that small-dimensional devices have better passivation effect. Finally, the hot-carrier reliability of W-spacer TFTs is also studied. Due to the reduced electric filed on the drain side, W-spacer TFTs have better reliability than the conventional counterparts.

No description available.

The amber spacers from Bronze Age Britain and Europe are one of the most well known artefact groups from this time period. Yet despite the frequency with which these artefacts are cited, the details of these finds both individually and within their original excavation contexts appear to be poorly understood. Recent new finds of ‘sets’ of spacers prompted this review and updating of the amber spacer corpus, which now extends to 375 individual spacers from 141 findspots. Once thought to constitute an artefact horizon which could provide a chronological bridge between the regions of Northwest Europe and Britain / the Central European Únĕtice/Tumulus Cultures and Late Helladic I and II Mycenaean Greece, new radiocarbon dating programs have extended their date range from (potentially) c. 2000 cal B.C. to c.1360 cal. B.C., although the regional chronologies remain essentially unresolved. To give a clear survey of how the spacers have been viewed historically, the catalogue entry for each findspot/spacer includes, as well as information about the findspots themselves, x-rays, photographs and drawings produced for this research, alongside all the previously published quotes and illustrations. Microscopic analyses provide evidence for some spacer-sets having been fragmented and deposited separately. Maps showing illustrations of the spacers where they were recovered allow comparison of regional similarities and differences. Loose colour plates show the x-rays of groups of spacers which have been correlated in past interpretations at 1:1 scale for easy comparison. Some earlier interpretations, including the Crescentic/Pendant regional division, the jet spacer/amber spacer/lunulae discrete distribution pattern and the close relationship of the Basic Pattern spacers, are challenged and found to no longer be sustainable. The craft and production aspects of spacer manufacture, particularly the procurement of suitable raw material, are addressed and a new narrative is presented, which is partly informed by the experimental replica research.

Currently , the STN-LCD with twist angle of 240 degree is the most popular operation mode . In this thesis , we utilize Photo-Sensitive spacer of TFT-LCD to substitute for the traditional spacer , and apply them in the above mentioned STN-LCD . The traditional spacer were used N2 air to spray on glass substrate by SUS tube . It make light leakage , decrease the transmittance , contrast ratio and aggregate spacer easily . When we pressure on glass and the phenomenon of migration has been found accordingly . It will influence quality of LCD . So we utilize Photo-Sensitive spacer to substitute for the traditional spacer in order to improve the defect . In this thesis , we fabricate different kind Photo-Sensitive spacer of size , shape and area ratio (Photo-Resist (NPS) from Everlight Chemical Industrial Corp) . We utilize Photo Lithography process to form the spacer thickness on insulation layer , and find the best type . In this experiment , the different characteristic of material between traditional spacer and Photo-Spacer were compared . And we utilize different process condition (pressure) and material(LC £Gnd) to discuss the relation . Finally , we proof the advantage of Photo-Spacer apply in STN-LCD .

The wild origin, early breeding history, and diversity of the China Rose group, including R. chinensis and its varieties, cultivars, and hybrids, are largely unknown. The aims of this study were to investigate the genetic diversity and relationships of the China Roses with related species and hybrids, including information in support of, or refuting, the hypothesis that these roses are the hybrid result of the wild R. chinensis var. spontanea and R. odorata var. gigantea. Ninety Rosa accessions, including China Roses, a Miscellaneous Old Garden Rose, Noisettes, early Polyanthas, Bourbons, Teas, and species from Sections Indicae and Synstylae were surveyed using 23 microsatellite primer pairs. The trnH-psbA chloroplast intergenic spacer was also sequenced for the China Roses, Misc. Old Garden Rose, and the species to look specifically at maternal relationships. A total of 291 alleles were scored for the 23 microsatellites, with alleles per locus ranging from 6-22 and averaging 12.65. A dendrogram based on Dice similarity and a three-dimensional Principle Coordinate Analysis (PCoorA) graph were plotted with the data. In the cluster analysis, the similarity coefficients ranged from ~0.15-0.99, with the cultivated roses forming well-defined groups at about 0.45 similarity. These groups generally reflected the American Rose Society horticultural classifications. A large number of sports and synonyms in the China Rose group were identified through this analysis as well. The PCoorA gave a better graphical representation of the relationships of the species and cultivars, and with the inclusion of the chloroplast sequence haplotypes, some maternal relationships could also be identified. This study shows that the cultivated China Roses are a closely related group and identified which accessions were likely Hybrid China Roses. The results also suggest that the China Roses were maternally derived from R. chinensis var. spontanea. Based on the microsatellites and chloroplast sequence haplotypes, the identity of the R. odorata var. gigantea accessions in this study are suspect, but the China Roses may also have this species in their background as the result of natural or artificial hybridization.

Structural determinations and electrochemical properties in the series of multinuclear ferrocenyl-ethynyl complexes with formula [(£b5-C5(CH3)5)(P2)MII-C¡ÝC-(fc)n-C¡ÝC-MII(P2)(£b5-C5(CH3)5)] (fc = ferrocenyl; M = Fe(II), Ru(II), Os(II); R = H, CH3; P2 = Ph2PCH2CH2PPh2 (dppe)) are reported. Complexes with more electron-rich ligand environment, were prepared with regard to the understanding of electronic coupling mechanism. These complexes undergo sequential reversible oxidation events from -0.2 V to 1.0 V referred to the Ag/AgCl electrode in anhydrous CH2Cl2 solution and the low-pontential waves have been assigned to the end-capped metallic centers. The magnitude of the electronic coupling between two terminal metallic centers in the series of complexes was estimated by electrochemical technique. Based on the correlation between the £GE1/2 values and the second redox potentials of the end-capping metallic centers in the series of complexes, a qualitative explanation for the different magnitude of the electronic coupling is given.

Universiẗat, Diss., 2003--Tübingen.

The need for innovative lightweight materials are rapidly increased in the recent years, owing to their cost-effective, high-strength, environmentally-sound use of materials and process technologies, in addition to that they reduce the weight of a product. The characteristics of 3D-spacer fabrics as one of the most important lightweight materials in future are multifaceted not only owing to its extremely light materials, but also because of exceptionally high stiffness to weight ratio compared to other constructions. It is also one possible method for improving the properties of fabric-reinforced composites. It can enhance the through-the-thickness properties, such as shear strength, dimensional stability, damage, tolerance, and fracture toughness that are critical for many structural applications. Spacer fabric has been employed in high-technology applications because of its critical mechanical properties related to high tensile strength, tear strength and stiffness. Furthermore, its multidirectional structures allow with more reinforcement along the thickness direction leading to an increase in stiffness and strength properties. The fundamental aim of this thesis exists in the development of a new kind of woven spacer fabrics for the light weight composites materials, in an effort to weave spacer fabrics that can not be realized with the old technology which are mentioned above. Therefore, the work in brief focuses on two main goals: 1. Development of a new kind of spacer fabrics for composites in the lightweight constructions. 2. Development of special devices of a narrow weaving machine for standing the process of the new kind of spacer fabrics production. The slippage strength test had to be carried out for the floated warp yarns through the ground fabrics by using different elements of woven fabric structures variables represented in different fabric constructions, different weft densities and different repeats of constructions by using different materials. The importance of this test related to the backward-movement of the floated warp yarns which is the crucial stage in the weaving process of spacer fabrics during the backward-movement. The results of this test determine the required forces for the backward-movement, on the other side it is the best method to observe the behavior of structure elements during the backward movement. The results of the slippage strength had been statistically analyzed, and the weaving process for the spacer fabrics had been achieved. It was concluded that the best properties for the woven spacer fabrics and the optimum case for the weaving process on the test weaving machine had been achieved when the following items are realized: Development of the narrow weaving machine is closed in assisting operations, let-off and take-up and enhancement for take-up processes. Extra let-off and take-up devices must be constructed at the weaving machine. Extra let-off device has to be used for controlling the floated warp yarns of ground fabrics. On the other side, extra take-up and the developed take-up devices have to be used for controlling the woven spacer fabrics. The experimental results give fundamental knowledges for the next steps in research and development of woven spacer fabrics made of high-performance yarns on the wide weaving machine. / Die Ziele der Arbeit bestanden in der Entwicklung der Geometrie der Spacer Fabrics und der notwendigen Falteneinrichtung an der Bandwebmaschine. Spacer Fabrics werden ausschließlich aus zwei Deckflächen, die durch eingewebte Stege verbunden sind, gefertigt. Zur Entwicklung der Spacer Fabrics muss eine Doppelnadel-Bandwebmaschine mit zwei Webfächern eingesetzt werden. Für die Faltenwebeinrichtung werden der entwickelte Extra-Kettablass und der Extra-Abzug benötigt. Der Antrieb und die Steuerung des Extra-Abzuges erfolgen durch einen Synchronantrieb und der Antrieb und die Steuerung des Extra-Ablasses durch Pneumatik.Eine frei programmierbare Steuerung der Faltenwebeinrichtung ermöglicht eine sichere und optimierte Synchronisation zwischen Webprozess und Faltenbildung. Im Ergebnis einer systematischen Strukturentwicklung von Spacer Fabrics und der Simulation ihrer günstigen Herstellung mittles eines speziell entwickelten Slippage Strength Tests werden die optimalen Strukturen ermittelt. Die experimentellen Untersuchungen bringen grundlegende Erkenntnisse für die folgenden Forschungsschritte zur Entwicklung von gewebten Spacer Fabrics mit Hochleistungsgarnen auf Doppelgreiferwebmaschinen.