<p> In four experiments I addressed factors that affect human performance monitoring as indicated by neural correlates observed in response-locked event related potentials. Specifically, I examined modulations of the error related negativity (ERN), the correct response negativity (CRN), and the error positivity (Pe) components across a variety of conditions. These components, all thought to be generated in the anterior cingulate cortex, represent activation of the performance monitoring system. Experiments 1 and 2 used stimulus congruency and visual noise to manipulate response and stimulus uncertainty in an extension of previous research. These manipulations, together with a between experiment task manipulation, examined the role of cognitive/attentional load in performance monitoring. Replication of previous findings and a task specific modulation of ERN amplitudes provided support for a role of cognitive load in performance monitoring. Further, these two experiments used a novel task and novel stimuli to replicate previous research and extend our knowledge of how uncertainty affects performance monitoring. In stark comparison to all previous research in this area, Experiments 3 and 4 both employed complex and somewhat ecologically valid tasks. Standard ERN/Pe results in Experiment 3 (touch typing task) revealed that it is possible to examine the ERN in more complex, real world-like tasks. Further, an expectancy manipulation elicited marginal differences in the response-locked Pe but resulted in large N1 and P3 differences suggesting a possible role of attention in early expectation driven performance monitoring adjustments. Experiment 4 examined the role of task difficulty, anxiety level and exposure (i.e., time on task) for effects on ERN and Pe amplitudes. By comparing how math anxious people perform in a math environment, this study represents the first to pit a specific anxiety against a specific anxiety provoking situation. This complex paradigm again replicated general ERN findings providing further support for the validity of complex task usage. Findings surrounding the difficulty manipulation and anxiety measures provide new insight into the role of difficulty in performance monitoring and support the importance of considering personality characteristics in self-regulation. </p> / Thesis / Doctor of Philosophy (PhD)

O PVD (Physical Vapor Deposition- Deposição física na fase de vapor) é um meio utilizado para a produção de recobrimentos e empregado em grande escala industrial. É um processo de deposição atômica no qual o material é vaporizado de alvo sólido por sputtering e posteriormente condensado sobre a peça a ser revestida na forma de filme. O processo ocorre em uma câmara de vácuo, na presença de plasma, e por diferença de potencial os íons, na forma pura ou combinados com átomos de hidrogênio ou carbono, são movidos para a superfície do substrato. Uma técnica relativamente nova de sputtering é o HiPIMS (High Power Impulse Magnetron Sputtering) que utiliza impulsos de energia extremamente altas com densidade de potência possibilitando filmes com melhores performances e mais densos. No presente trabalho filmes de nitreto de cromo (CrN) foram depositados por duas técnicas de magnetron sputtering, HiPIMS e DCMS (Direct Current Magnetron Sputtering), variando frequência de pulso em 400 Hz, 450 Hz e 500 Hz para o HiPIMS e a tensão de polarização em 0 V, -20 V, -40V, -60V, - 100 V e -140 V para os dois processos. Foram obtidos filmes com maior dureza, menor rugosidade para HiPIMS, no entanto DCMS apresentou maior taxa de deposição. O aumento da frequência nos filmes HiPIMS, assim como o aumento da tensão de polarização negativa possibilitaram filmes com morfologia mais densa e homogênea. Este fato também foi observado com o aumento do valor de bias nos filmes depositados por DCMS. Os valores de dureza obtidos (17 ± 2 para DCMS e 26 ± 1 para HiPIMS) são superiores aos reportados na literatura e podem estar relacionados ao efeito de \"multicamadas\" obtido pela oscilação do substrato. / PVD (Physical Vapor Deposition) is a process used for coatings deposition and it is used on a large industrial scale. It is an atomic deposition process in which the material is vaporized from solid target by sputtering and then condensed onto the part to be coated in film form. The process occurs in a vacuum chamber in the presence of plasma, and by potential difference the ions in pure form or combined with hydrogen or carbon atoms are moved to the surface of the substrate. A relatively new sputtering technique is the HiPIMS (High Power Impulse Magnetron Sputtering) which uses extremely high energy pulses with power density to enable higher performance and denser films. In the present work, chromium nitride (CrN) films were deposited by two magnetron sputtering techniques, HiPIMS and DCMS (Direct Current Magnetron Sputtering), varying the pulse frequency at 400 Hz, 450 Hz and 500 Hz for the HiPIMS and the bias at 0 V, -20 V, -40 V, -60 V, -100 V and -140 V for both processes. It was obtained films with high hardness, less roughness for HiPIMS, however DCMS presented a higher rate of deposition. The increase of the frequency in the HiPIMS films, as well as the increase of the negative polarization voltage, allowed films with denser and homogeneous morphology. This fact was also observed with the increase of the value in the films deposited by DCMS. The hardness values obtained (17 ± 2 for DCMS and 26 ± 1 for HiPIMS) were higher than those reported in the literature and may be related to the \"multilayer\" effect obtained by substrate oscillation.

O PVD (Physical Vapor Deposition- Deposição física na fase de vapor) é um meio utilizado para a produção de recobrimentos e empregado em grande escala industrial. É um processo de deposição atômica no qual o material é vaporizado de alvo sólido por sputtering e posteriormente condensado sobre a peça a ser revestida na forma de filme. O processo ocorre em uma câmara de vácuo, na presença de plasma, e por diferença de potencial os íons, na forma pura ou combinados com átomos de hidrogênio ou carbono, são movidos para a superfície do substrato. Uma técnica relativamente nova de sputtering é o HiPIMS (High Power Impulse Magnetron Sputtering) que utiliza impulsos de energia extremamente altas com densidade de potência possibilitando filmes com melhores performances e mais densos. No presente trabalho filmes de nitreto de cromo (CrN) foram depositados por duas técnicas de magnetron sputtering, HiPIMS e DCMS (Direct Current Magnetron Sputtering), variando frequência de pulso em 400 Hz, 450 Hz e 500 Hz para o HiPIMS e a tensão de polarização em 0 V, -20 V, -40V, -60V, - 100 V e -140 V para os dois processos. Foram obtidos filmes com maior dureza, menor rugosidade para HiPIMS, no entanto DCMS apresentou maior taxa de deposição. O aumento da frequência nos filmes HiPIMS, assim como o aumento da tensão de polarização negativa possibilitaram filmes com morfologia mais densa e homogênea. Este fato também foi observado com o aumento do valor de bias nos filmes depositados por DCMS. Os valores de dureza obtidos (17 ± 2 para DCMS e 26 ± 1 para HiPIMS) são superiores aos reportados na literatura e podem estar relacionados ao efeito de \"multicamadas\" obtido pela oscilação do substrato. / PVD (Physical Vapor Deposition) is a process used for coatings deposition and it is used on a large industrial scale. It is an atomic deposition process in which the material is vaporized from solid target by sputtering and then condensed onto the part to be coated in film form. The process occurs in a vacuum chamber in the presence of plasma, and by potential difference the ions in pure form or combined with hydrogen or carbon atoms are moved to the surface of the substrate. A relatively new sputtering technique is the HiPIMS (High Power Impulse Magnetron Sputtering) which uses extremely high energy pulses with power density to enable higher performance and denser films. In the present work, chromium nitride (CrN) films were deposited by two magnetron sputtering techniques, HiPIMS and DCMS (Direct Current Magnetron Sputtering), varying the pulse frequency at 400 Hz, 450 Hz and 500 Hz for the HiPIMS and the bias at 0 V, -20 V, -40 V, -60 V, -100 V and -140 V for both processes. It was obtained films with high hardness, less roughness for HiPIMS, however DCMS presented a higher rate of deposition. The increase of the frequency in the HiPIMS films, as well as the increase of the negative polarization voltage, allowed films with denser and homogeneous morphology. This fact was also observed with the increase of the value in the films deposited by DCMS. The hardness values obtained (17 ± 2 for DCMS and 26 ± 1 for HiPIMS) were higher than those reported in the literature and may be related to the \"multilayer\" effect obtained by substrate oscillation.

Élaborer et optimiser des nouveaux matériaux restent toujours parmi les enjeux liés à l'amélioration de la performance de la durabilité des matériaux.Le domaine des traitements de surface et plus particulièrement les nanotechnologies utilisées pour produire des revêtements en couches minces plus précisément les dépôts physiques en phase vapeur (PVD), permet de synthétiser des nouveaux matériaux qui peuvent résister dans des conditions sévères de diverses applications.L'industrie des outils de coupe et plus précisément le bois dans notre cas, nécessitent de plus en plus la synthèse des nouveaux matériaux et nanomatériaux pour améliorer la tenue en service des outils de coupe.L'objectif de ce présent travail est de développer et caractériser des revêtements dont le matériau de base est le chrome et/ou le silicium en vue de les optimiser. L'élaboration a été réalisée par différentes méthodes à savoir la pulvérisation cathodique magnétron radio fréquence ou encore en mode courant direct. En outre, la RGPP (reactive gas pulsing process) a été exploité pour la première fois dans ce travail dont le but est de surmonter les difficultés rencontrées avec la pulvérisation réactive.Les différentes caractéristiques mécaniques et tribologiques des couches ont été étudiées et corrélées avec les caractéristiques physicochimiques et microstructurales.Il s'avère que la pulvérisation cathodique en mode courant direct prouve son importance par l'obtention des couches de meilleure qualité que celles obtenues en mode radio fréquence. Pour des contenus d'azote similaires on obtient des propriétés mécaniques et tribologiques plus importantes. On note que les propriétés mécaniques réalisent un gain de 60 % par rapport à celles obtenues en mode RF. En outre l'ajustement des paramètres de la méthode RGPP (le rapport cyclique et la période des pulses) influe considérablement les caractéristiques des couches obtenues et on montre une amélioration de la performance des couches. A l'issue de l'injection pulsée du gaz réactif, on montre que l'alternance entre l'ouverture et la coupure de la vanne du gaz réactif est indispensable pour la déposition dans un milieu réactif afin d'éliminer les composés métalliques sur les cibles obtenus lors de dépôt.Enfin, l'ajout de silicium au CrN mène à obtenir des solutions solides ou une structure nanocomposite selon la teneur de silicium dans la couche ce qui implique une amélioration des caractéristiques mécaniques et par la suite celles tribologiques.L'apport de ce travail de thèse est de présenter une étude globale sur la performance des couches CrN et CrSiN en corrélant ses caractéristiques mécaniques et tribologiques avec les paramètres physiques de dépôt et en adoptant plusieurs méthodes d'élaboration. / Develop and optimize new materials are still among the issues to improve the performance of the durability of materials.The field of surface treatments and nanotechnology used to produce thin film coatings specifically physical vapor deposition (PVD) allow the synthesis of new materials that can withstand harsh conditions in various applications.The cutting tool industry and more specifically the wood in our case require more synthesis of new materials and nanomaterials to improve the serviceability of cutting tools.The aim of the present work is to develop and characterize coatings with the base material is chromium and / or silicon and optimize them. The preparation was carried out by different methods : the magnetron sputtering radio frequency RF or direct current mode DC. In addition, RGPP (reactive gas pulsing process) was used for the first time in this work which aims to overcome the difficulties of sputtering in reactive environment.Different characteristics of the layers were studied and correlated with the physicochemical and microstructural characteristics.It turns out that the direct current sputtering method proves its importance in obtaining layers of better quality than those obtained by radio-frequency mode. For similar nitrogen content, greater mechanical and tribological properties were obtained. We note that the mechanical properties realize a gain of 60% compared to those obtained in RF mode. Further adjustment of parameters RGPP method (duty cycle and pulse period) significantly influences the characteristics of the layers obtained and shown to improve the performance of layers. Following the pulsed injection of the reactive gas, it is shown that the alternation between the opening and the cutting of the valve of the reactive gas is essential for deposition in a reactive environment to remove the metal compounds on targets obtained during deposition.Finally, the addition of silicon in CrN films leads to obtain solid solutions or nanocomposite structure according to the content of silicon in the layer which implies an improvement of the mechanical and tribological properties.The contribution of this thesis is to present a comprehensive study on the performance of CrN layers and CrSiN correlating mechanical and tribological characteristics with physical deposition parameters by adopting various methods of preparation.

<p>In this study, six dc Magnetron Sputtered (dcMS) CrN hard coatings were deposited on pretreated High Speed Steel (HSS) to achieve different interface architectures. The aim was to correlate the interfacial microstructure to the adhesion of the coatings. The substrates were pretreatment using the Ionized Physical Vapor Deposition (IPVD) method High Power Impulse Magnetron Sputtering (HIPIMS) using a Cr target in an inert atmosphere varying the substrate bias ($U_b$) between 0 V and 1100 V at ambient temperature as well as at a substrate temperature of 400$^\circ$C. The deposition parameters were chosen to show how kinetically induced diffusion, etching and implantation changes the interface chemistry and structure and to investigate their effect on the adhesion on the film. At elevated temperatures, the diffusion will be thermally driven. Annealing of the deposited samples were, therefore, performed at 900 K in an Ar atmosphere. The films were characterized employing XRD, HR-TEM, A-STEM and by scratch test measurements to see how the the interface microstructure can be correlated to the adhesion of the coating. The study shows that a sputter cleaned substrate surface with well preserved crystal structure of the substrate enhances the adhesion of the coating by promotion of local epitaxial growth. However, annealing was also shown to have a large effect on the adhesion enhancement by allowing for interdiffusion in the interface region and due to promotion of interface strain relaxation. Implantation of target material on the other hand had limited influence on the adhesion compared to the clean oxide free surfaces. The low adhesion improvement when gradually changing the chemical composition at the interface is assumed to stem from that the radiation induced defects and strain diminished the positive effect of this gradient.</p>

In this study, six dc Magnetron Sputtered (dcMS) CrN hard coatings were deposited on pretreated High Speed Steel (HSS) to achieve different interface architectures. The aim was to correlate the interfacial microstructure to the adhesion of the coatings. The substrates were pretreatment using the Ionized Physical Vapor Deposition (IPVD) method High Power Impulse Magnetron Sputtering (HIPIMS) using a Cr target in an inert atmosphere varying the substrate bias ($U_b$) between 0 V and 1100 V at ambient temperature as well as at a substrate temperature of 400$^\circ$C. The deposition parameters were chosen to show how kinetically induced diffusion, etching and implantation changes the interface chemistry and structure and to investigate their effect on the adhesion on the film. At elevated temperatures, the diffusion will be thermally driven. Annealing of the deposited samples were, therefore, performed at 900 K in an Ar atmosphere. The films were characterized employing XRD, HR-TEM, A-STEM and by scratch test measurements to see how the the interface microstructure can be correlated to the adhesion of the coating. The study shows that a sputter cleaned substrate surface with well preserved crystal structure of the substrate enhances the adhesion of the coating by promotion of local epitaxial growth. However, annealing was also shown to have a large effect on the adhesion enhancement by allowing for interdiffusion in the interface region and due to promotion of interface strain relaxation. Implantation of target material on the other hand had limited influence on the adhesion compared to the clean oxide free surfaces. The low adhesion improvement when gradually changing the chemical composition at the interface is assumed to stem from that the radiation induced defects and strain diminished the positive effect of this gradient.

With the increase in wireless technology devices and mobile users, wireless radio spectrum is coming under strain. Networks are becoming more and more congested and free usable spectrum is running out. This creates a resource allocation problem. The resource, wireless spectrum, needs to be allocated to users in a manner such that it is utilised efficiently and fairly. The objective of this research is to find a solution to the resource allocation problem in radio networks, i.e to increase the efficiency of spectrum utilisation by making maximum use of the spectrum that is currently available through taking advantage of co-existence and exploiting interference limits. The solution proposed entails adding more secondary users (SU) on a cognitive radio network (CRN) and having them transmit simultaneously with the primary user. A typical network layout was defined for the scenario. The interference temperature limit (ITL) was exploited to allow multiple SUs to share capacity. Weighting was applied to the SUs and was based on allowable transmission power under the ITL. Thus a more highly weighted SU will be allowed to transmit at more power. The weighting can be determined by some network-defined rule. Specific models that define the behaviour of the network were then developed using queuing theory, specifically weighted processor sharing techniques. Optimisation was finally applied to the models to maximize system performance. Convex optimization was deployed to minimize the length of the queue through the power allocation ratio. The system was simulated and results for the system performance obtained. Firstly, the performance of the proposed models under the processor-sharing techniques was determined and discussed, with explanations given. Then optimisation was applied to the processor-sharing results and the performance was measured. In addition, the system performance was compared to other existing solutions that were deemed closest to the proposed models. / Dissertation (MEng)--University of Pretoria, 2017. / Electrical, Electronic and Computer Engineering / MEng / Unrestricted

O presente trabalho tem como objetivo contribuir para o conhecimento da morfologia, microestrutura e modulação composicional (perfil da composição química) de recobrimentos NbN/CrN multicamadas nanoestruturados com diferentes periodicidades (entre 4 e 20 nm) depositado por PVD pela técnica de arco catódico. Foi alcançada espessura total do recobrimento de 30 ?m mantendo-se a homogeneidade da periodicidade ao longo de toda a espessura. Análises de difração de Raios-X, aliadas a modelamento computacional (difração dinâmica), e análise de microscopia eletrônica de transmissão (MET), permitiram a determinação da periodicidade das multicamadas e a espessura das camadas individuais de NbN e CrN e análise qualitativa da coerência entre as camadas. O modo de varredura (SMET) acoplado com espectroscopia de perda de energia de elétrons (EELS), permitiu medir a variação da composição química ao longo das nano-camadas individuais. A análise por EELS mostrou que, mesmo para a menor periodicidade estudada - 4nm, não há eliminação da modulação composicional. Assim, um modelo de Análise de Elementos Finitos (FEA) foi utilizado para avaliar a componente das tensões residuais intrínsecas ao longo das multicamadas, alimentado com o cáculo da deformação do parâmetro de rede, que pela Lei de Vergards varia em função da modulação química, ao longo das camadas de NbN e CrN. A microindentação instrumentada e o teste de riscamento mostraram aumento de dureza e maior resistência ao risco com a redução da periodicidade das multicamadas nanoestruturadas de NbN/CrN. O cruzamento dos resultados das diversas técnicas empregadas permitiu análise detalhada da estrutura e morfologia destes recobrimentos e a influência das periodicidades na modulação química das camadas individuais, possibilitando o desenvolvimento de um modelo qualitativo. Este aprendizado irá permitir a deposição de recobrimentos multicamadas nanoestruturados com melhor controle das propriedades mecânicas objetivadas em função da aplicação final do produto. / The present work aims at contributing to the knowledge, microstructure and compositional modulation (Chemical composition profile) of NbN/CrN multilayer nanostructured coatings with different periodicities (between 4 and 20nm) deposited by cathodic arc technique. It was reached a total coating thickness of 30 ?m preserving the periodicity homogeneity along the thickness. X-Ray Diffraction analisys, combined with computational modeling (dinamic diffraction) and Transmission Eletron Microscopy analysis (TEM), allowed the multilayer periodicity determination, the individual NbN and CrN layer thicknesses as well as the qualitative analysis of coherency among layers. The scanning mode (STEM) combined with Electron Energy Loss Spectroscopy (EELS), allowed the measurement of the chemical composition variation along the individual nanolayers. The EELS analysis showed that, even for the lowest periodicity studied - 4nm, there is no elimination of the compositional modulation. Thus, the Finite Element Analysis model (FEA) was used to evaluate the intrinsic residual stress component along the multilayers, fed with the lattice parameter deformation calculation, which, by Vegards Law varies as a function of the chemical modulation, along the NbN and CrN layers. The instrumented microindentation and the Scratch test showed hardness increase and higher scratch resistance as periodicity decreases on the nanostructured multilayer of NbN/CrN. The cross-linking data of the several techniques employed enabled a detailed analysis of the structure and morphology of such coatings and the influence of the periodicities on the individual layer chemical modulation, allowing the development of a qualitative model. This learning will allow multilayer nanostructured coatings deposition with a better control of desired mechanical properties as a function of the final product application.

O presente trabalho tem como objetivo contribuir para o conhecimento da morfologia, microestrutura e modulação composicional (perfil da composição química) de recobrimentos NbN/CrN multicamadas nanoestruturados com diferentes periodicidades (entre 4 e 20 nm) depositado por PVD pela técnica de arco catódico. Foi alcançada espessura total do recobrimento de 30 ?m mantendo-se a homogeneidade da periodicidade ao longo de toda a espessura. Análises de difração de Raios-X, aliadas a modelamento computacional (difração dinâmica), e análise de microscopia eletrônica de transmissão (MET), permitiram a determinação da periodicidade das multicamadas e a espessura das camadas individuais de NbN e CrN e análise qualitativa da coerência entre as camadas. O modo de varredura (SMET) acoplado com espectroscopia de perda de energia de elétrons (EELS), permitiu medir a variação da composição química ao longo das nano-camadas individuais. A análise por EELS mostrou que, mesmo para a menor periodicidade estudada - 4nm, não há eliminação da modulação composicional. Assim, um modelo de Análise de Elementos Finitos (FEA) foi utilizado para avaliar a componente das tensões residuais intrínsecas ao longo das multicamadas, alimentado com o cáculo da deformação do parâmetro de rede, que pela Lei de Vergards varia em função da modulação química, ao longo das camadas de NbN e CrN. A microindentação instrumentada e o teste de riscamento mostraram aumento de dureza e maior resistência ao risco com a redução da periodicidade das multicamadas nanoestruturadas de NbN/CrN. O cruzamento dos resultados das diversas técnicas empregadas permitiu análise detalhada da estrutura e morfologia destes recobrimentos e a influência das periodicidades na modulação química das camadas individuais, possibilitando o desenvolvimento de um modelo qualitativo. Este aprendizado irá permitir a deposição de recobrimentos multicamadas nanoestruturados com melhor controle das propriedades mecânicas objetivadas em função da aplicação final do produto. / The present work aims at contributing to the knowledge, microstructure and compositional modulation (Chemical composition profile) of NbN/CrN multilayer nanostructured coatings with different periodicities (between 4 and 20nm) deposited by cathodic arc technique. It was reached a total coating thickness of 30 ?m preserving the periodicity homogeneity along the thickness. X-Ray Diffraction analisys, combined with computational modeling (dinamic diffraction) and Transmission Eletron Microscopy analysis (TEM), allowed the multilayer periodicity determination, the individual NbN and CrN layer thicknesses as well as the qualitative analysis of coherency among layers. The scanning mode (STEM) combined with Electron Energy Loss Spectroscopy (EELS), allowed the measurement of the chemical composition variation along the individual nanolayers. The EELS analysis showed that, even for the lowest periodicity studied - 4nm, there is no elimination of the compositional modulation. Thus, the Finite Element Analysis model (FEA) was used to evaluate the intrinsic residual stress component along the multilayers, fed with the lattice parameter deformation calculation, which, by Vegards Law varies as a function of the chemical modulation, along the NbN and CrN layers. The instrumented microindentation and the Scratch test showed hardness increase and higher scratch resistance as periodicity decreases on the nanostructured multilayer of NbN/CrN. The cross-linking data of the several techniques employed enabled a detailed analysis of the structure and morphology of such coatings and the influence of the periodicities on the individual layer chemical modulation, allowing the development of a qualitative model. This learning will allow multilayer nanostructured coatings deposition with a better control of desired mechanical properties as a function of the final product application.

Le but de ce travail est de développer et de caractériser une nouvelle génération de revêtements multicouches anti-usure et anticorrosif à base de nitrure de chrome. A cause des conditions de sollicitations sévères auxquelles les outils de coupe sont soumis en plus des enjeux environnementaux liés à l’utilisation des fluides de coupe lors de l’usinage du bois, les monocouches qui constituent notre système multicouches doivent présenter des caractéristiques spécifiques. De ce fait, des couches minces de Cr, CrN et CrAlN ont été déposées sur un acier à outils de coupe du bois et sur des substrats de siliciums par pulvérisation magnétron réactive DC. Nous nous sommes intéressés dans un premier temps à optimiser les monocouches. Ensuite, ces revêtements ont été associés pour élaborer des multicouches Cr/CrN/CrAlN qui ont alors été caractérisées. Nous avons étudié les propriétés physico-chimiques, mécaniques, tribologiques et le comportement à la corrosion de différents revêtements multicouches. Les résultats obtenus indiquent que l’application d’un revêtement multicouches pouvait apporter des améliorations considérables à la résistance à l’usure et à la corrosion des outils de coupe du bois. / The aim of this study was to develop and characterize a new generation of wear and corrosion resistant multilayers Cr-N based coatings. Due to the severe conditions that wood cutting tools are subjected in addition to the environmental issue associated with the use of cutting fluids during wood machining, the monolayers that constitute our multilayers system must have specific characteristics. As a result, thin layers of Cr, CrN and CrAlN have been deposited on wood cutting tools steel and silicon substrates by DC reactive magnetron sputtering to be optimized. Then, the optimal monolayerscoatings were combined to develop the Cr/CrN/CrAlN multilayers. that were characterized to determine their physicochemical, mechanical, tribological properties and their corrosion behavior. The results obtained indicated that the application of a multilayer coating can greatly improve the wear and corrosion resistance of a wood cutting tools steel.