Copper Indium Gallium DiSelenide absorber layers are fabricated using a two stage manufacturing friendly process. The first step involves the sequential deposition of Copper and Gallium and co-deposition of indium and selenium at 275oC. This is followed by the second stage where the substrate is annealed in the presence of Selenium and a thin layer of copper is deposited to neutralize the excess Indium and Gallium on the surface to form the CIGS absorber layer. The top copper thickness as well as the time of deposition was varied to study the effect of Copper on the performance of the cells. Another recipe was developed for the precursor formation, where Gallium was co-evaporated with Indium and Selenium. A large bandgap shift was seen with this recipe and the open circuit voltage was increased. The performance of CIGS/CdS/ZnO solar cells thus fabricated was characterized using techniques like I-V, C-V, Spectral Response and EDS/SEM. Cells with open circuit voltages of 420-450 mV, short circuit currents of 33-38 mA/cm², fill factors of 58-62% and efficiencies of 9-11% were routinely fabricated.

This research describes an investigation on the fabrication of CuInSe2-based thin-film solar cells with the device structure of Al/ZnO:Al/ZnO/CdS/CIS/Mo/SLG at the substrate temperature of 450oC, which is at least 100oC below the temperature currently used for depositing CIS thin films. A great advantage for the low temperature process is that the polymer material can be used as substrate and it is feasible to make lightweight and flexible thin-film solar cells. In this work, we used a co-evaporation technique with an introduction of Sb during the film deposition process to modify the film growth mechanisms and produce the CIS film with compact grain structure and smooth surface morphology. In most cases, there was only tiny amount of Sb existed in the film as a p-type dopant. In some cases, second phases of Sb compounds could be detected in the film as the Sb flux was kept too high during the film deposition stage. The I-V characteristics measured under the AM1.5 condition for the solar cell using a CIS:Sb film as the absorber showed that the open circuit voltage (Voc) was 0.364 V, short circuit current (Jsc) was 48.16 mA/cm2, fill factor (FF) was 44.5%, and energy conversion efficiency (£b) was 8%. The device with the same layer structure except the use of CIS film prepared without the addition of Sb and at a higher substrate temperature of 550oC had a comparable device performance but a slightly lower efficiency, i.e. Voc=0.325 V, Jsc=48.54 mA/cm2, FF=45.1%, £b=7.4%. It is clear that a lower temperature process using Sb to modify the growth process can be successful to obtain a device quality CIS layer. In addition, a CIGS thin-film solar cell was also fabricated and its device properties were Voc=0.392 V, Jsc=37.28 mA/cm2, FF=46.2%, and £b=7.0%. We see that the addition of Ga to increase the bandgap do increase the Voc and decrease the Jsc. However, a low efficiency of this cell indicates that further improvement in fill factor of the cell is a necessary.

The study focus on low temperature process with doping antimony to refine the quality of the CI(G)S thin film, and doping gallium to increase energy band gap in two-stage co-evaporation process. Furthermore, we discuss about the variety of crystal structure, and recognize the value of energy band gap in transmission spectra. It has been achieved to increase the energy band gap of material with doping gallium. Recognizing the shift of XRD pattern and research result from papers, I estimate the content ratio of gallium in ¢»A atoms is 0.28~0.29, near my establishment ratio 0.3. By tuning the molecular beam flux of antimony effusion cell from 1.1¡Ñ1013 atoms/cm2second to 2.2¡Ñ1014 atoms/cm2second , to find out the property content of antimony involving of co-evaporation to optimize the quality of the CI(G)S polycrystalline thin film. We just observed that the thin film with antimony involving make effect of smoother and denser surface morphology. In our study, we also try discontinue supplying the antimony vapor to reduce the amount of antimony which involves the reaction process, and make low content of antimony leaved in the CI(G)S thin film. Here, We found out a special effect of the grain- growth of the CI(G)S thin film supplying antimony continually or not in the process. It should be strong (112) prefer orientation when we deposit the thin film using SLG substrate. However, we found out that antimony enhance the (220/204) .

No description available.

La mission Darwin, un projet d'interférométrie spatiale initié par l'ESA, nécessite l'utilisation de filtres modaux fonctionnant dans la gamme spectrale [6-20 µm]. Dans le cadre de ce travail, nous proposons la réalisation de filtres modaux basés sur des guides d'onde « tout tellurures » obtenus par la méthode d'empilement et de gravure. L'originalité de ce travail réside dans le fait que les guides réalisés sont de grandes dimensions (couches épaisses et profondeurs de gravure importantes), pour satisfaire aux exigences du projet. La première étape a donc consisté à choisir une méthode de dépôt qui permette d'obtenir des couches épaisses. La co-évaporation thermique a ainsi été mise en place et les paramètres de dépôt optimisés. Des couches d'épaisseur pouvant atteindre 17 µm, de bonne qualité (adhérentes, amorphes, denses et homogènes), transparentes de 6 à 20 µm et d'indice de réfraction contrôlé ont pu être obtenues. La gravure physique réactive (RIE) de ces couches, en utilisant un mélange gazeux CHF3/O2/Ar, a constitué la deuxième partie de ce travail. L'obtention de marches de profondeur pouvant dépasser 10 µm, présentant des profils de gravure de qualité, a été démontrée. Les différents guides d'onde IR réalisés ont été caractérisés optiquement après préparation de leurs faces d'entrée et de sortie. L'observation d'un bon confinement de la lumière sur un banc de guidage à λ = 10,6 µm et l'obtention d'un taux de réjection de 10-3 sur un banc d'interférométrie annulante nous ont permis de confirmer que les guides d'onde à base de couches tellurures et réalisés par la méthode d'empilement et de gravure constituaient une solution de choix en tant que filtres modaux pour l'interférométrie spatiale. / The Darwin mission, an interferometric spatial project initiated by ESA, requires modal filters being able to work in the whole spectral range [6-20 µm]. In the framework of this work, we propose the realization of modal filters based on waveguides obtained by stacking and etching chalcogenide films. The originality of this work lies in the fact that the realized waveguides have large dimensions (thick films and deep etching), to satisfy the project requirements. The first step consisted in choosing the deposition method which allows obtaining thick films. The thermal co-evaporation was setting up and the deposition parameters were optimized. Films with thickness which can reach 17 µm, of good quality (adhesive, amorphous, dense and homogeneous), transparent from 6 to 20 µm and with controlled refractive index were obtained. The physical reactive etching of these films, by using a gas mixture CHF3/O2/Ar, constituted the second part of this work. The obtaining of deep rib which can exceed 10 µm, presenting etching profiles of good quality was demonstrated. The elaborated IR waveguides were optically characterized after preparation of their entrance and exit faces. The observation of light confinement on a guiding bench at λ = 10.6 µm and the obtaining of a rejection rate of 10-3 on a nulling interferometry bench allowed confirming that the waveguides based on the stacking and etching of telluride films was a choice solution as modal filters for the spatial interferometry.

Silicon carbide is a promising wide bandgap semiconductormaterial for high-temperature, high-power, and high-frequencydevice applications. However, there are still a number offactors that are limiting the device performance. Among them,one of the most important and critical factors is the formationof low resistivity Ohmic contacts and high-temperature stableSchottky diodes on silicon carbide. In this thesis, different metals (TiW, Ti, TiC, Al, and Ni)and different deposition techniques (sputtering andevaporation) were suggested and investigated for this purpose.Both electrical and material characterizations were performedusing various techniques, such as I-V, C-V, RBS, XRD, XPS,LEED, SEM, AFM, and SIMS. For the Schottky contacts to n- and p-type 4H-SiC, sputteredTiW Schottky contacts had excellent rectifying behavior afterannealing at 500 ºC in vacuum with a thermally stableideality factor of 1.06 and 1.08 for n- and p-type,respectively. It was also observed that the SBH for p-type SiC(ΦBp) strongly depends on the choice the metal with alinear relationship ΦBp= 4.51 - 0.58Φm, indicating no strong Fermi-level pinning.Finally, the behavior of Schottky diodes was investigated byincorporation of size-selected Au nano-particles in Ti Schottkycontacts on silicon carbide. The reduction of the SBH isexplained by using a simple dipole layer approach, withenhanced electric field at the interface due to the small sizeof the circular patch (Au nano-particles) and large differenceof the barrier height between two metals (Ti and Au) on both n-and p-SiC. For the Ohmic contacts, titanium carbide (TiC) was used ascontacts to both n- and p-type 4H-SiC epilayers as well as onAl implanted layers. The TiC contacts were epitaxiallydeposited using a co-evaporation method with an e-beam Tisource and a Knudsen cell for C60, in a UHV system at low substrate temperature(500 ºC). In addition, we extensively investigatedsputtered TiW (weight ratio 30:70) as well as evaporated NiOhmic contacts on both n- and p-type epilayers of SiC. The bestOhmic contacts to n-type SiC are annealed Ni (&gt;950ºC)with the specific contact resistance of ≈ 8× 10-6Ω cm2with doping concentration of 1.1 × 10-19cm-3while annealed TiW and TiC contacts are thepreferred contacts to p-type SiC. From long-term reliabilitytests at high temperature (500 ºC or 600 ºC) invacuum and oxidizing (20% O2/N2) ambient, TiW contacts with a platinum cappinglayer (Pt/Ti/TiW) had stable specific contact resistances for&gt;300 hours. <b>Keywords</b>: silicon carbide, Ohmic and Schottky contacts,co-evaporation, current-voltage, capacitance-voltagemeasurement, power devices, nano-particles, Schottky barrierheight lowering, and TLM structures.

<p>Silicon carbide is a promising wide bandgap semiconductormaterial for high-temperature, high-power, and high-frequencydevice applications. However, there are still a number offactors that are limiting the device performance. Among them,one of the most important and critical factors is the formationof low resistivity Ohmic contacts and high-temperature stableSchottky diodes on silicon carbide.</p><p>In this thesis, different metals (TiW, Ti, TiC, Al, and Ni)and different deposition techniques (sputtering andevaporation) were suggested and investigated for this purpose.Both electrical and material characterizations were performedusing various techniques, such as I-V, C-V, RBS, XRD, XPS,LEED, SEM, AFM, and SIMS.</p><p>For the Schottky contacts to n- and p-type 4H-SiC, sputteredTiW Schottky contacts had excellent rectifying behavior afterannealing at 500 ºC in vacuum with a thermally stableideality factor of 1.06 and 1.08 for n- and p-type,respectively. It was also observed that the SBH for p-type SiC(Φ_Bp) strongly depends on the choice the metal with alinear relationship Φ_Bp= 4.51 - 0.58Φ_m, indicating no strong Fermi-level pinning.Finally, the behavior of Schottky diodes was investigated byincorporation of size-selected Au nano-particles in Ti Schottkycontacts on silicon carbide. The reduction of the SBH isexplained by using a simple dipole layer approach, withenhanced electric field at the interface due to the small sizeof the circular patch (Au nano-particles) and large differenceof the barrier height between two metals (Ti and Au) on both n-and p-SiC.</p><p>For the Ohmic contacts, titanium carbide (TiC) was used ascontacts to both n- and p-type 4H-SiC epilayers as well as onAl implanted layers. The TiC contacts were epitaxiallydeposited using a co-evaporation method with an e-beam Tisource and a Knudsen cell for C₆₀, in a UHV system at low substrate temperature(500 ºC). In addition, we extensively investigatedsputtered TiW (weight ratio 30:70) as well as evaporated NiOhmic contacts on both n- and p-type epilayers of SiC. The bestOhmic contacts to n-type SiC are annealed Ni (>950ºC)with the specific contact resistance of ≈ 8× 10^-6Ω cm²with doping concentration of 1.1 × 10^-19cm^-3while annealed TiW and TiC contacts are thepreferred contacts to p-type SiC. From long-term reliabilitytests at high temperature (500 ºC or 600 ºC) invacuum and oxidizing (20% O₂/N₂) ambient, TiW contacts with a platinum cappinglayer (Pt/Ti/TiW) had stable specific contact resistances for>300 hours.</p><p><b>Keywords</b>: silicon carbide, Ohmic and Schottky contacts,co-evaporation, current-voltage, capacitance-voltagemeasurement, power devices, nano-particles, Schottky barrierheight lowering, and TLM structures.</p>

No description available.

Dans un contexte où les besoins en capteurs de gaz sont de plus en plus importants, en particulier pour la métrologie de l'environnement, il est proposé dans ce travail la réalisation de guides d'onde droits, de guides spirales, de jonctions Y,…, éléments indispensables pour la fabrication de micro-capteurs optiques infrarouges. La réalisation de ces différents éléments, par empilement et gravure de couches amorphes du système ternaire Ge-Se-Te, a nécessité en premier lieu l'étude du dit système. Des couches minces Ge-Se-Te de compositions très différentes ont été déposées par co-évaporation thermique, puis caractérisées en termes d'homogénéité, stabilité thermique, gap optique et indice de réfraction. L'évolution des propriétés en fonction de la composition a ensuite permis de mettre en évidence un domaine de compositions du système Ge-Se-Te particulièrement attractif : dans ce domaine, correspondant aux compositions riches en sélénium (plus de 55 % atomique) et contenant entre 20 et 30 % de germanium, les couches sont en effet monophasées, caractérisées par des températures de transition vitreuse élevées, une grande stabilité thermique, et un domaine de transparence s'étendant de 1 à 16 µm environ. Dans ce domaine de compositions, deux d'entre elles ont été choisies, Ge25Te10Se65 et Ge25Te20Se55, et utilisées pour fabriquer différents circuits d'optique intégrée. Les éléments les plus simples, à savoir des guides d'onde canaux, ont été réalisés en déposant successivement deux couches (Ge25Te10Se65 puis Ge25Te20Se55) sur un substrat silicium, puis en modifiant la géométrie de la couche supérieure d'indice de réfraction plus élevé par usinage ionique, de sorte à obtenir un confinement bidimensionnel de la lumière. Les pertes de propagation de ces guides ont été estimées à 1 dB.cm-1 à la longueur d'onde 1,55 µm. D'autres éléments plus complexes ont ensuite été fabriqués : des guides d'onde courbes pour lesquels les propriétés de guidage ont été obtenues quel que soit le rayon de courbure, des guides spirales ayant donné lieu à un bon guidage de la lumière, des jonctions Y caractérisées par une division satisfaisante de l'intensité lumineuse, ainsi que des interféromètres de type Mach-Zehnder en sortie desquels la lumière a été correctement recombinée. / In a context where the needs for gas sensors are increasingly important, especially for environmental metrology, it is proposed in this work to achieve straight waveguides, spirals, Y-junctions, ..., elements essential for the fabrication of infrared optical micro-sensors. The realization of these elements, by stacking and etching of amorphous thin films from the Ge-Se-Te ternary system, first required the study of this system. Ge-Se-Te thin films of very different compositions were deposited by thermal co-evaporation and characterized in terms of uniformity, thermal stability, optical band gap and refractive index. The evolution of the film properties with the composition was then used to highlight a particularly attractive area of compositions in the Ge-Se-Te system: in this domain, corresponding to compositions rich in Se (more than 55 atomic %) and containing between 20 and 30 atomic % in Ge, the layers are indeed single-phase, characterized by high glass transition temperatures, high thermal stability, and a transparency window extending from 1 to about 16 microns. In this composition region, two of them were selected, Ge25Te10Se65 and Ge25Te20Se55, and used to realize different integrated optics circuits. The simplest elements, which are channel waveguides, were made by depositing successively two layers (Ge25Te10Se65 then Ge25Te20Se55) on a silicon substrate, and then by modifying the geometry of the higher refractive index top layer by ion beam etching, so as to obtain a two-dimensional confinement of light. Propagation losses of these straight waveguides were estimated at 1 dB.cm-1 at the 1.55 µm wavelength. Other more complex elements were then fabricated: S-bent waveguides for which the guiding properties were obtained whatever the curvature radius, operational spiral waveguides, Y-junctions able of a satisfactory division of the light intensity, and Mach-Zehnder interferometers at the output of which the light was successfully recombined.

This diploma thesis deals with analysis and modification of thin layers using ion beams. The first part of this diploma thesis deals with phenomena accompanying ion beam bombardment of solid matter. The second part of this diploma thesis is concerned with Secondary Ion Mass Spectroscopy (SIMS) and Low Energy Ion Scattering (LAIS). This work convey some basic information about these two techniques and it also deals with some benefits result in their connection into parallel depth profiling mode (such as better depth resolution of the LEIS profile, quantification of the SIMS). These benefits are demonstrated on MoSi film measurement. Within the framework of this thesis a new UHV manipulator was designed. This new UHV manipulator is equipped with precise stepper UHV motor and since the proportions are smaller, the manipulation with a sample in a space limited UHV chamber is much more comfortable and more precise. The third part of this diploma thesis deals with ion-beam induced transformation of epitaxially grown Fe films with thickness of 22 monolayer (ML) and 44 ML on Cu(100) single crystal at room temperature. Metastable Fe films of 22 ML thickness were prepared in CO pressure and 44 ML Fe films were prepared by co-evaporation of Fe with Fe64Ni36 (invar). Structural changes are analyzed by scanning tunneling microscopy and low-energy electron diffraction. The aim of this thesis is to discuss the influence of the sputtering parameters such as ion dose and ion energy on the nucleation of bcc nanocrystals, their growth, final shape and size. The influence of different Ni concentration on stability of 44 ML thick Fe films is also discussed.