Minority carrier transport properties and the effects of electron irradiation/injection were studied in GaN and ZnO containing dopants known to form acceptor states deep within the materials' bandgap. Minority carrier diffusion length and lifetime changes were investigated using Electron Beam Induced Current (EBIC) method, cathodoluminescence spectroscopy, spectral photoresponse and persistent photoconductivity measurements. It is shown that electron irradiation by the beam of a scanning electron microscope results in a significant increase of minority carrier diffusion length. These findings are supported by the cathodoluminescence measurements that demonstrate the decay of near-band-edge intensity as a consequence of increasing carrier lifetime under continuous irradiation by the electron beam. Temperature-dependent measurements were used to determine the activation energies for the electron irradiation-induced effects. The latter energies were found to be consistent with the involvement of deep acceptor states. Based on these findings, the effects of electron irradiation are explained via the mechanism involving carrier trapping on these levels. Solid-state electron injection was also shown to result in a similar increase of minority carrier lifetime and diffusion length. Solid-state injection was carried out by applying the forward bias to a ZnO homojunction and resulted in a significant improvement of the peak photoresponse of the junction. This improvement was unambiguously correlated with the increase of the minority carrier diffusion length due to electron injection.

Gallium Nitride (GaN) high electron mobility transistors (HEMT) have superior performance characteristics compared to Silicon (Si) and Gallium Arsenide (GaAs) based transistors. GaN is a wide bandgap semiconductor which allows it to operate at higher breakdown voltages and power. Unlike traditional semiconductor devices, the GaN HEMT channel region is undoped and relies on the piezoelectric effect created at the GaN and Aluminum Gallium Nitride (AlGaN) heterojunction to create a conduction channel in the form of a quantum well known as the two dimensional electron gas (2DEG). Because the GaN HEMTs are undoped, these devices have higher electron mobility crucial for high frequency operation. However, over time and use these devices degrade in a manner that is not well understood. This research utilizes low frequency noise (LFN) as a method for analyzing changes and degradation mechanisms in GaN-on-Si devices due to gate stress. LFN is a useful tool for probing different regions of the device that cannot be measured through direct means. LFN generation in GaN HEMTs is based on the carrier fluctuation theory of 1/f noise generation which states fluctuations in the number of charge carriers results in conductance fluctuations that produce a Lorentzian noise spectrum. The summing Lorentzian noise spectra from multiple traps leads to 1/f and random telegraph signal (RTS) noise. The primary cause of carrier fluctuations are electron traps near the 2DEG and in the AlGaN bulk. These traps occur naturally due to dislocations and impurities in the manufacturing process, but new traps can be generated by the inverse-piezoelectric effect during gate stress. This thesis introduces noise and presents a circuit to bias the devices and measure gate and drain LFN simultaneously. Three measurements are performed before and after gate DC stress at three different temperatures: DC characterization, capacitance-voltage (C-V) measurements, and LFN measurements. The DC characteristics show an increase in gate leakage after stress caused by an increase in traps after degradation consistent with trap assisted tunneling. However, the leakage current on the drain and source side differ before and after stress leading to the conclusion that the source side of the gate is more sensitive to gate stress. Gate leakage current on the drain side is also sensitive to temperature due to thermionic trap assisted tunneling. Hooge parameter calculations agree with previous research. The LFN results show an increase in gate and drain noise power, SIg(f) and SId(f), in accordance with increased gate leakage current under cutoff bias. RTS noise is also observed to increase in frequency with increased temperature. Activation energies for RTS noise are extracted and qualitatively linked to trap depth based on the McWhorter trap model.

Density functional theory (DFT) calculations of polyethylene (PE) HVDC cable insulation have been performed for systems containing four different chemical impurities: acetophenone, cumene, $\alpha$-methyl styrene and $\alpha$-cumyl alcohol. Systems were generated by molecular dynamics (MD) equilibration at four different temperatures relevant for cable insulation applications: 277 K, 293 K, 343 K and 363 K. With the goal of gaining better measure of variations in hole and electron traps energies, four initial configurations were also stochastically generated at each temperature, which yielded four different final configurations after equilibration. The counterpoise correction scheme was implemented for DFT calculations, by distributing ghost atoms thought any empty pockets of space in between the PE chains. The PBE functional was selected for DFT simulations. The resulting band gaps were in agreement with those of earlier GGA-based studies, and thus lower by 3 eV than empirical band gaps. For all impurities, the first HOMO state and the first two LUMO states were generally located on the impurity molecule, forming one hole trap and two electron traps, but certain configurations generated increased electron trap numbers, or eliminated hole traps. No dependence could be derived between temperature and trap depth for either electron or hole traps. Mean electron trap energies were largely in agreement with results from earlier studies, they were deepest for acetophenone, and they varied by as much as 0.6 eV between different configurations. Hole traps are universally shallow and vary by up to 0.7 eV between configurations, and are similar in depth for all impurities. Results suggest that electron trap depths correlate with the presence of molecular features such as oxygen atoms and conjugated double bonds. The dependence of trap depth on the spatial configuration of the impurity molecule suggests that results could be improved by more precise quantum mechanical treatment of the dynamics of the impurity. / Täthetsfunktionalteori (DFT) har använts för beräkningar av isolering till HVDC kablar som består av polyeten innehållande fyra olika kemiska orenheter: acetofenon, kumen, alfa-metylstyren och alfa-kumylalkohol. System att studera genererades genom molekylärdynamisk ekvilibrering vid fyra olika temperaturer relevanta för tillämning till kabelisolering: 277 K, 293 K, 343 K och 363 K. För att få ett mått på de variationer som existerar i energierna på hål- och elektronfällor genererades stokastiskt fyra initialkonfigurationer vid varje temperatur, vilket fyra olika konfigurationer efter relaxering. Motviktskorrigering implementerades för DFT-beräkningar, genom att fördela "spökatomer" i de tomrum som bildas mellan PE-kedjorna i den amorfa fasen. PBE-funktionalen användes för DFT-simuleringar. De resulterande bandgapen stämde överens med tidigare GGA-baserade studier, och var därmed runt 3 eV smalare än empiriskt uppmätta bandgap. För alla orenheter var det första HOMO-tillståndet och de två första LUMO-tillstånden i allmänhet placerade på orenheten, vilket resulterade i en hålfälla och två elektronfällor, men vissa konfigurationer gav upphov till fler elektronfällor, eller eliminerade hålfällorna. Inget samband kunde härledas mellan temperaturen och djupet på fällorna för vare sig elektron- eller hålfällor. Medelvärdet på elektronfällornas energier överensstämde till stor del med resultat från tidigare studier, energierna var högst för acetofenon, och de varierade med så mycket som 0,6 eV mellan olika konfigurationer. Hålfällorna var genomgående grunda, varierade med upp till 0,7 eV mellan olika konfigurationer, och hade likartat djup för alla orenheter. Resultaten indikerar att variationerna elektronfällornas medeldjup uppstår på grund av orenheternas olika molekylära uppbyggnad: förekomst av syreatomer och konjugerade dubbelbindningar i orenheterna leder till djupare elektronfällor. Det faktum att djupet på elektron- och hålfällor varierar mellan olika rumsliga konfigurationer av av orenheten och polyetenstrukturen ger en antydan om att resultaten kan komma att förbättras om dynamiken hos orenheten simuleras med mer exakta kvantmekanisk metoder.