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This dissertation describes the development of III-nitride (III-N) bipolar devices for optoelectronic and electronic applications. Research mainly involves device design, fabrication process development, and device characterization for Geiger-mode gallium nitride (GaN) deep-UV (DUV) p-i-n avalanche photodiodes (APDs), indium gallium nitride (InGaN)/GaN-based violet/blue laser diodes (LDs), and GaN/InGaN-based npn radio-frequency (RF) double-heterojunction bipolar transistors (DHBTs). All the epitaxial materials of these devices were grown in the Advanced Materials and Devices Group (AMDG) led by Prof. Russell D. Dupuis at the Georgia Institute of Technology using the metalorganic chemical vapor deposition (MOCVD) technique. Geiger-mode GaN p-i-n APDs have important applications in DUV and UV single-photon detections. In the fabrication of GaN p-i-n APDs, the major technical challenge is the sidewall leakage current. To address this issue, two surface leakage reduction schemes have been developed: a wet-etching surface treatment technique to recover the dry-etching-induced surface damage, and a ledged structure to form a surface depletion layer to partially passivate the sidewall. The first Geiger-mode DUV GaN p-i-n APD on a free-standing (FS) c-plane GaN substrate has been demonstrated. InGaN/GaN-based violet/blue/green LDs are the coherent light sources for high-density optical storage systems and the next-generation full-color LD display systems. The design of InGaN/GaN LDs has several challenges, such as the quantum-confined stark effect (QCSE), the efficiency droop issue, and the optical confinement design optimization. In this dissertation, a step-graded electron-blocking layer (EBL) is studied to address the efficiency droop issue. Enhanced internal quantum efficiency (ɳi) has been observed on 420-nm InGaN/GaN-based LDs. Moreover, an InGaN waveguide design is implemented, and the continuous-wave (CW)-mode operation on 460-nm InGaN/GaN-based LDs is achieved at room temperature (RT). III-N HBTs are promising devices for the next-generation RF and power electronics because of their advantages of high breakdown voltages, high power handling capability, and high-temperature and harsh-environment operation stability. One of the major technical challenges to fabricate high-performance RF III-N HBTs is to suppress the base surface recombination current on the extrinsic base region. The wet-etching surface treatment has also been employed to lower the surface recombination current. As a result, a record small-signal current gain (hfe) > 100 is achieved on GaN/InGaN-based npn DHBTs on sapphire substrates. A cut-off frequency (fT) > 5.3 GHz and a maximum oscillation frequency (fmax) > 1.3 GHz are also demonstrated for the first time. Furthermore, A FS c-plane GaN substrate with low epitaxial defect density and good thermal dissipation ability is used for reduced base bulk recombination current. The hfe > 115, collector current density (JC) > 141 kA/cm², and power density > 3.05 MW/cm² are achieved at RT, which are all the highest values reported ever on III-N HBTs.

Thesis (Ph.D.)--Mechanical Engineering, Georgia Institute of Technology, 2009. / Committee Chair: Graham, Samuel; Committee Co-Chair: Nair, Sankar; Committee Member: Grover - Gallivan, Martha; Committee Member: McDowell, David; Committee Member: Schelling, Patrick; Committee Member: Zhang, Zhuomin

Light from the sun is an attractive source of energy for its renewability, supply, scalability, and cost. Silicon solar cells are the dominant technology of choice for harnessing solar energy in the form of electricity, but the designs are approaching their practical efficiency limits. New multijunction designs which use the tunable properties of the more expensive III-V semiconductors have historically been relegated to space applications where absolute power conversion efficiency, resilience to radiation, and weight are more important considerations than cost. Some of the more recent developments in the field of semiconductor materials are the so-called III-nitride materials which mainly use either indium, aluminum or gallium in combination with nitrogen. Indium gallium nitride (InGaN) is one of these III-nitride semiconductor alloys that can be tailored to span the vast majority of the solar spectrum. While InGaN growth traditionally requires expensive substrate materials such as sapphire, three-dimensional nanowire growth modes enable high quality lattice mismatched growth of InGaN directly on silicon without a metamorphic buffer layer. The absorption and electronic properties of InGaN can also be tuned by incorporating it into quantum confined regions in a GaN host material. This opens up a route towards cost-effective, high efficiency devices such as light emitted diodes and solar cells which can operate over a large range of wavelengths. The combination of the two material systems of InGaN/GaN and silicon can marry the low cost of silicon wafers with the desirable optoelectronic properties of III-nitride semiconductors. This thesis investigates the potential for highly nanostructured InGaN/GaN based devices using quantum-dot-in-nanowire designs as novel solar cells which can enable intermediate band absorption effects and multiple junctions within a single nanowire to absorb more of the solar spectrum and operating more efficiently. Such semiconductor nanostructures can in principle reach power conversion efficiencies of over 40\% on silicon, with a cost closer to conventional silicon solar cells as opposed to methods which use non-silicon substrates. In the primary strategy, the nanowires contain InGaN quantum dots which act as photon absorption/carrier generation centres to sequentially excite photons within the large band gap semiconductor. By using this intermediate band of states, large operating voltages between contacts can be maintained without sacrificing the collection of long wavelength solar photons. In this work, we characterize the properties of such nanowires and experimentally demonstrate sub-bandgap current generation in a large area InGaN/GaN dot-in-nanowire solar cell. Experimental characterization of InGaN / GaN quantum dots in nanowires as both LEDs and solar cells is performed to determine the nanowire material parameters to understand how they relate to the nanowire device performance. Multiple microscopy techniques are performed to determine the nanowire morphology and contact effectiveness. Optical characterization of bare and fabricated nanowires is used to determine the anti-reflection properties of nanowire arrays. Photoluminescence and electroluminescence spectroscopy are performed. Illuminated current-voltage characteristics and quantum efficiencies are determined. Specular and diffuse reflectivities are measured as a function of wavelength. Technology computer-aided design (TCAD) software is used to simulate the performance of the overall nanowire device. The contribution from quantum dots or quantum wells is simulated by solving for the carrier wavefunctions and density of states with the quantum structures. The discretized density of states from the quantum dots is modelled and used in a complete drift-diffusion device simulation to reproduce electroluminescence results. The carrier transport properties are modified to demonstrate effects on the overall device performance. An alternate design is also proposed which uses an InGaN nanowire subcell on top of a silicon bottom subcell. The dual-junction design allows a broader absorption of the solar spectrum, increasing the operating voltage through monolithically grown series-connected, current-matched subcells. The performance of such a cell is simulated through drift-diffusion simulations of a dual-junction InGaN/Si solar cell. The effects of switching to a nanowire subcell based on the nanowires studied in this thesis is discussed.

abstract: The state of the solar industry has reached a point where significant advancements in efficiency will require new materials and device concepts. The material class broadly known as the III-N's have a rich history as a commercially successful semiconductor. Since discovery in 2003 these materials have shown promise for the field of photovoltaic solar technologies. However, inherent material issues in crystal growth and the subsequent effects on device performance have hindered their development. This thesis explores new growth techniques for III-N materials in tandem with new device concepts that will either work around the previous hindrances or open pathways to device technologies with higher theoretical limits than much of current photovoltaics. These include a novel crystal growth reactor, efforts in production of better quality material at faster rates, and development of advanced photovoltaic devices: an inversion junction solar cell, material work for hot carrier solar cell, ground work for a selective carrier contact, and finally a refractory solar cell for operation at several hundred degrees Celsius. / Dissertation/Thesis / Doctoral Dissertation Materials Science and Engineering 2016

[Truncated abstract] Over the past decade, the group III-nitride semiconducting compounds (GaN, AlN, InN, and their alloys) have attracted tremendous research efforts due to their unique electronic and optical properties. Their low thermal carrier generation rates and large breakdown fields make them attractive for the development of robust electronic devices capable of reliable operation in extreme conditions, i.e. at high power/voltage levels, high temperatures and in radiation environments. For device applications in radiation environments, such as space electronics, GaN-based devices are expected to manifest superior radiation hardness and reliability without the need for cumber- some and expensive cooling systems and/or radiation shielding. The principle aim of this Thesis is to ascertain the level of susceptibility of current GaN-based elec- tron devices to radiation-induced degradation, by undertaking a detailed study of 60Co gamma-irradiation-induced defects and defect-related effects on the electrical characteristics of n-type GaN-based materials and devices . . . While the irradiation-induced effects on device threshold voltage could be regarded as relatively benign (taking into account that the irradiation levels employed in this study are equivalent to more than 60 years exposure at the average ionising dose rate levels present in space missions), the observed device instabilities and the degradation of gate current characteristics are deleterious effects which will have a significant impact on the performance of AlGaN/GaN HEMTs operating in radiation environments at low temperatures, a combination of conditions which are found in spaceborne electronic systems.

The calculation of the thermal conductivity of condensed matter has posed a significant challenge to engineers and scientists for almost a century. Thermal conductivity models have been successfully applied to many materials however many challenges still remain. One serious challenge is the inability of current thermal conductivity models to calculate the thermal conductivity of highly complex materials. Another challenge is managing error introduced by using an effective interatomic potential, for many materials this problem is exacerbated because their effective potentials have not been extensively used or characterized. Recent interest in nanostructures has initiated a new set of challenges and unanswered questions. This work addresses different aspects of the aforementioned challenges by using zeolite MFI and gallium nitride as case studies.

Thesis (Ph. D.)--Ohio State University, 2006. / Title from first page of PDF file. Includes bibliographical references (p. 209-217).

published_or_final_version / Physics / Doctoral / Doctor of Philosophy

published_or_final_version / abstract / Electrical and Electronic Engineering / Doctoral / Doctor of Philosophy