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L’alliage germanium-étain est un semiconducteur qui suscite une grande attention en raison de ses propriétés électriques et optiques. L’incorporation de Sn dans le germanium permet d’ajuster la largeur de bande interdite (gap) et d’améliorer la mobilité des électrons et des trous, et pour une quantité suffisante d’étain, le matériau passe d’un gap indirect à direct. Cet alliage est versatile parce qu’il peut être intégré d’une façon monolithique sur le Si, c’est ce qui en fait un matériau idéal dans les domaines de l'optoélectronique à base de silicium. Cette thèse est sur la fabrication et la caractérisation de nanofils cristallins Ge1-xSnx à haute concentration en Sn. Des nouvelles stratégies ont été employées pour fabriquer de nombreux types de nanofils GeSn. Les résultats ont été expliqués en fonction des modèles cinétiques existants. Un nouveau mécanisme de croissance y est décrit: le mécanisme solide-solide-solide – SSS. Il consiste à faire croître des nanofils de GeSn dans le plan du substrat à l’aide de catalyseurs d’étain à une température inférieure au point de fusion de Sn. Quatre modèles de transport de masse sont proposés pour le mécanisme de croissance du SSS. Diverses caractérisations (par exemple TEM et APT) ont été effectuées pour étudier les propriétés physiques, et chimiques des nanofils. / Germanium-Tin alloy is a unique class semiconductor gaining a strong attention because of its significant electrical and optical properties. Sn incorporation in Ge allows straightforward band-gap engineering enabling to enhance the electron and hole mobilities, and for a sufficient Sn amount an indirect-to-direct band-gap transition occurs. Its versatility rises due the possible monolithic integration on Si-platforms making it an ideal material in domains of optoelectronics, and high speed electronic devices. This thesis has focused on the fabrication and characterization of crystalline Ge1-xSnx nanowires with high Sn concentrations. New strategies were designed to fabricate many types of GeSn nanowires. The results have been explained as function of the existing kinetic models. A new growth mechanism was reported (i.e. Solid-Solid-Solid mechanism – SSS), it consists of growing in-plane GeSn nanowires using Sn catalysts below the melting point of Sn. Four mass transport models were proposed for the SSS growth mechanism. Various characterizations (e.g. TEM and APT) were done to investigate the physical and chemical properties of the obtained nanowires.

Ge1-xSnx alloys are among a small class of benign semiconductors with composition tunable bandgaps in the near-infrared spectrum. As the amount of Sn is increased the band energy decreases and a transition from indirect to direct band structure occurs. Hence, they are prime candidates for fabrication of Si-compatible electronic and photonic devices, field effect transistors, and novel charge storage device applications. Success has been achieved with the growth of Ge1-xSnx thin film alloys with Sn compositions up to 34%. However, the synthesis of nanocrystalline alloys has proven difficult due to larger discrepancies (~14%) in lattice constants. Moreover, little is known about the chemical factors that govern the growth of Ge1-xSnx nanoalloys and the effects of quantum confinement on structure and optical properties. A synthesis has been developed to produce phase pure Ge1-xSnx nanoalloys which provides control over both size and composition. Three sets of Ge1-xSnx nanocrystals have been studied, 15–23 nm, 3.4–4.6 nm and 1.5–2.5 nm with Sn compositions from x = 0.000–0.279. Synthetic parameters were explored to control the nucleation and growth as well as the factors that have led to the elimination of undesired metallic impurities. The structural analysis of all nanocrystals suggests the diamond cubic structure typically reported for Ge1-xSnx thin films and nanocrystalline alloys. As-synthesized Ge1-xSnx nanoalloys exhibit high thermal stability and moderate resistance against sintering up to 400–500 °C and are devoid of crystalline and amorphous elemental Sn impurities.

Efficient and robust blue InGaN multiple quantum well (MQW) light emitters have become ubiquitous; however, they still have unattained theoretical potential. It is widely accepted that “localization” of carriers due to indium fluctuations theoretically enhance their efficiency by moderating defect-associated nonradiative recombination. To help develop a complete understanding of localization effects on carrier dynamics, this thesis explores degree of localization in InGaN MQWs and its dependence on well thickness and number of wells, through temperature and power dependent photoluminescence measurements. Additionally, silicon-compatible, nontoxic, colloidally synthesizable 2-5 nm Ge1-xSnx alloy quantum-dots (QDs) are explored for potential visible to near-IR optoelectronic applications. While bulk Ge is an indirect gap material, QD confinement allows enhanced direct transitions, and alloying with Sn improves transition oscillator strengths. Temperature dependent steady-state and time-resolved photoluminescence reveal relaxation pathways involving bright/dark excitons and surface states in Ge1-xSnx QDs, showing their great potential for future use.