High efficiency components are key elements of solid-state amplifiers for wireless application. We used HEMT (high-electron-mobility transistor) to obtain high mobility 2DEGs. AlGaN makes itself an attractive material for high frequency devices, and the system is particularly good for the investigation of quantum Hall effect. We studied the electronic properties of AlxGa1-xN/GaN heterostructures by using Shubnikov-de Haas (SdH) measurement. The T-dependent Hall measurement (from 4.2 K to 300K) was performed at the magnetic field 0.3T and the B-dependent Hall measurement (from 0.02T to 0.8 T) at constant temperature. From the field-dependent Hall measurements, we are able to calculate the individual mobility and carrier concentration for the two-subband-populated AlxGa1-xN/GaN heterostructures. Then, we can use T-dependent Hall effect measurement to calculate the binding energy of the deep-level trap Ed,which is a measure of the energy constant for the ionization of deep-level trap in thermal equilibrium.

The low-field magnetoresistance of colossal magnetic thin film can be enhanced by proton implantation. Compare with the as grown sample, the implantation samples has lower transition temperature and higher resistivity. By the hall measurement, we can get the carrier type and carrier concentration. The hall magnetoresistance (MRH) is much greater than the longitude magnetoresistance (MR). Chapter 1. Introduce experiment purpose and expected results. Chapter 2. Introduce the basic theorem of colossal magnetic materials. Chapter 3. The steps of experiment. Chapter 4. Results and discussion. Chapter 5. The conclusion.

In order to develop high speed photo-electronic device, first, we grew one layer of GaN by MOPVE to decline lattice mismatch. Then we used PA-MBE to grow AlxGa1-xN/GaN heterostructure III-V semiconductor. Via changing the content of aluminum, we can confer the characteristic of these samples. In these samples, we controlled the content of aluminum by changing the vapor of aluminum. And then we used X-ray diffraction, SEM, AFM, low temperature Hall measurement and SdH to study the characteristic of these samples. Throughout X-ray diffraction, the aluminum content x are 1.76%, 2.3%, 14.33%, 22.03% and 37.26%. Due to (004) AlGaN Rocking Curve F.W.H.M. are only 300 arcsec, the quality of the five samples are extraordinary. In addition, SEM and AFM measurement indicate that this series samples¡¦ interface are very smooth, and the roughest sample is only 2nm. It can make sure that samples were grown in mode of two-dimensional (2D). With low temperature Hall measurement, we can find out the Coulomb scattering which is from the defect are very small in the sample A, B, C, D. And the mobility of this series samples are very high, the highest mobility is sample A at 8K which is 19593 cm2/Vs. We can observe the oscillation of the sample C, D obviously in SdH measurement indicate that the 2DEG is confined in the potential well.

The n-type diamond has been shown to be very difficultly synthesized by CVD method. Nitrogen as a donor impurity shows a similar atom size of carbon for diamond lattice. However, nitrogen doped diamond reveals deep level and large carrier activation energy with much defects in diamond. The application of n-type diamond has less reported and the characteristic of nitrogen doped diamond seems varied due to different fabrication process. Our previous study of nitrogen doped diamond using mixture of N2 and argon gas synthesized by microwave CVD indicated that nitrogen atoms were precipitated in the grain boundaries of diamond crystallites. In this paper, it compared the synthesis of nitrogen doped diamond using the mixed gas of nitrogen/CH4/Ar and ammonia/CH4/Ar gases by microwave CVD method for different temperature, gas flow rate, pressure, and microwave power. The conductivities, carrier concentrations and mobility of the n-type doped diamond have been analyzed and discussed. The Hall measurement shows that the mixture of gas with Ar reveals different growth mechanism and carrier transportation properties in diamond. Nitrogen atoms of N2 were located in the grain boundaries and interfaces among diamond crystallites with the sp2 structure. Nitrogen atoms of NH3 are doped into the diamond crystallites.

abstract: Measurements of the geometrical magnetoresistance of a conventional semiconductor, gallium arsenide (GaAs), and a more recently developed semiconductor, iron pyrite (FeS2) were measured in the Corbino disc geometry as a function of magnetic field to determine the carrier mobility (μm). These results were compared with measurements of the Hall mobility (μH) made in the Van der Pauw configuration. The scattering coefficient (ξ), defined as the ratio between magnetoresistance and Hall mobility (μm/μH), was determined experimentally for GaAs and natural pyrite from 300 K to 4.2 K. The effect of contact resistance and heating on the measurement accuracy is discussed. / Dissertation/Thesis / Masters Thesis Materials Science and Engineering 2016

Zinc Oxide falls under the classification of transparent conductive oxides. They typical optical transmittance of Zinc Oxide is 90% in the visible wavelength region. Though stoichiometric ZnO is an insulator, due to the presence of internal defects such as Zn interstitials and Oxygen vacancies, it exists as a n-type conductor. The other important property of ZnO which could be used by the optical field is its widebandgap. ZnO has a wide bandgap of 3.2eV -3.3eV. The additional advantage of being a direct bandgap semiconductor has increased the probability of using ZnO for short wavelength applications. These practical applications are directly related to the fabrication of homostructural p-n junctions. ZnO can be readily doped n-type. Doping ZnO P-type is very difficult due to its native defects and the self-compensation that occurs during doping. But when P-type doping is obtained in ZnO it could be used in various optical applications such as light emitting diodes and laser diodes. This provided the motivation for this research. Theoretical studies have proposed nitrogen as a suitable material to achieve p-type ZnO. Literature provides a set of conditions that could be used to improve the doping in ZnO films. In this research, a set of these conditions were used to implement p-type doping in ZnO films. A sputtering system with a setup to support two Torus - 5M guns was used to deposit the ZnO films. A codoping technique using an aluminium doped zinc oxide target was the first method. Though an improvement in the nitrogen incorporation was found in this method in the beginning, a further increase in the nitrogen pressure did not show further improvement. A co-sputtering technique of a 99.999% pure ZnO target and a 99.99% pure Zn metal target was the second method. The ZnO target was rf sputtered while the Zn target was dc sputtered using the two guns provided in the deposition chamber. The extra Zinc obtained from sputtering the metallic Zn target was used to improve the incorporation of nitrogen. The films were later deposited in an oxygen ambient where the excess oxygen was used to suppress the oxygen vacancies that act as hole killers during the doping process. Four point probe measurement and Keithley 900 series Hall equipment were used for the electrical characterization of the films. An ORIEL monochromator was used to optically characterize the films. Hitachi S-800 T EDAX analysis system was used to measure the atomic weight % of nitrogen incorporated in the ZnO:N films. Deposition at an oxygen partial pressure of 0.3mT and 0.8mT of nitrogen produced p-type ZnO films. These films showed a carrier absorption in the short wavelength region. The carrier concentration and the mobility obtained for these films were 4.0 x1016 cm-3 and 0.12 cm2 /V-s respectively.