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Holographic lithography is a new technique developed for the fabrication of threedimensional photonic crystals in polymer. Four coherent laser beams are interfered to generate a three-dimensionally periodic interference pattern in a film of photoresist. Subsequent processing steps render a three-dimensional photonic crystal, whose structure is commensurate with the original interference pattern. Two interference patterns are discussed in detail: a face-centred cubic pattern with a conventional lattice constant of 922nm in air and a face-centred cubic pattern with a conventional cube side of 397nm in air (interference wavelength 355nm). Three types of basis are presented for the interference pattern with a 922nm lattice constant: a righthanded, a left-handed and a non-chiral basis. Photonic crystals have been fabricated with both a chiral and a non-chiral basis and evaluated by scanning electron microscopy. Optical transmission measurements are presented for the non-chiral photonic crystals and are interpreted in both a Bragg scattering model and a photonic bandstructure model. A 'GaAs' and a 'diamond' basis are presented for the interference pattern with a 397nm lattice constant. Photonic crystals have been fabricated with the 'GaAs' basis and evaluated by scanning electron microscopy.

This dissertation focuses on two aspects of integrating near-infrared plasmonics with electronics with the intent of developing the platform for future photonics. The first aspect focuses on fabrication by introducing and developing a simple, single reflective optical element capable of high–throughput, large scale fabrication of micro- and nano-sized structure templates using holographic lithography. This reflective optical element is then utilized to show proof of concept in fabricating three dimensional structures in negative photoresists as well as tuning subwavelength features in two dimensional compound lattices for the fabrication of dimer and trimer antenna templates. The second aspect focuses on the study of aluminum zinc oxide (AZO), which belongs to recently popularized material class of transparent conducting oxides, capable of tunable plasmonic capabilities in the near-IR regime. Holographic lithography is used to pattern an AZO film with a square lattice array that are shown to form standing wave resonances at the interface of the AZO and the substrate. To demonstrate device level integration the final experiment utilizes AZO patterned gratings and measures the variation of diffraction efficiency as a negative bias is applied to change the AZO optical properties. Additionally efforts to understand the behavior of these structures through optical measurements is complemented with finite difference time domain simulations.

In this dissertation, I am presenting my research on the fabrication and simulation of the optical properties of 3D photonic crystals and 2D graded photonic super-crystals. The 3D photonic crystals were fabricated using holographic lithography with a single, custom-built reflective optical element (ROE) and single exposure from a visible light laser. Fully 3D photonic crystals with 4-fold, 5- fold, and 6-fold symmetries were fabricated using the flexible, 3D printed ROE. In addition, novel 2D graded photonic super-crystals were fabricated using a spatial light modulator (SLM) in a 4f setup for pixel-by-pixel phase engineering. The SLM was used to control the phase and intensity of sets of beams to fabricate the 2D photonic crystals in a single exposure. The 2D photonic crystals integrate super-cell periodicities with 4-fold, 5-fold, and 6-fold symmetries and a graded fill fraction. The simulations of the 2D graded photonic super-crystals show extraordinary properties such as full photonic band gaps and cavity modes with Q-factors of ~106. This research could help in the development of organic light emitting diodes, high-efficiency solar cells, and other devices.

Orientador: Lucia Helena Deliesposte Cescato / Dissertação (mestrado) - Universidade Estadual de Campinas, Instituto de Fisica Gleb Wataghin / Made available in DSpace on 2018-08-08T11:13:35Z (GMT). No. of bitstreams: 1 Menezes_JacsonWeberde_M.pdf: 5177344 bytes, checksum: 63bfde864e58f6813890fced4db8f389 (MD5) Previous issue date: 2006 / Resumo: Nesta dissertação foi desenvolvido um novo método de gravação de estruturas bidimensionais em fotorresina, baseado na superposição de três exposições holográficas. Utilizando esta técnica, foi possível gravar estruturas de seção transversal circular. Isso resolve o problema da redução da área do gap fotonico que ocorre com as estruturas cilíndricas de seção transversal elíptica, obtida quando são utilizadas apenas duas exposições. Controlando-se a fase entre a terceira exposição e as duas anteriores é possível também gerar padrões hexagonais com diferentes formas de cilindros, que correspondem aos "átomos" do cristal fotonico, que podem apresentar novas propriedades fotonicas. Para projetar cristais fotonicos que apresentam gap fotonico na região de interesse do espectro eletromagnético, foi utilizado um programa baseado no método dos elementos finitos. Nestes projetos foram consideradas as dimensões e formas que podem ser fabricadas utilizando a técnica de dupla exposição holográfica assim como foi utilizada a aproximação de índice de refração equivalente para levar em conta a espessura da camada fotonica. Utilizando a superposição de duas exposições holográficas, associadas à litografia por corrosão por íon reativo, foram feitas tentativas de fabricação das camadas fotonicas projetadas em três materiais diferentes: silício policristalino, silício amorfo hidrogenado e silício cristalino / Abstract: In this work, it was developed a new recording method of the 2D structures in photoresist, based on the superimposition of three holographic expositions. This technique solves the problem of asymmetry of hexagonal structures, arising from the superimposition of only two expositions, which causes a strong reduction of the photonic band gap area. By controlling the phase-shift between the third exposition and the former two exposures, it is possible to generate new hexagonal patterns that can present different properties. In the design of the 2D photonic layers that present Photonic Band Gaps in the near infra-red region of the electromagnetic spectrum, it was used a software based on finite elements method. To consider the thickness of the photonic layer it was used the approach of equivalent refractive index. In the design we take into account the dimensions and shapes that can be fabricated using the technique of holographic lithography associated with RIE (Reactive Ion Etching). For fabrication of the structures we used double holographic exposures followed by RIE lithography in three different materials: poly-silicon, amorphous silicon and crystalline silicon / Mestrado / Física da Matéria Condensada / Mestre em Física

Orientador: Lucila Helena Deliesposte Cescato / Dissertação (mestrado) - Universidade Estadual de Campinas, Instituto de Fisica Gleb Wataghin / Made available in DSpace on 2018-08-07T11:04:51Z (GMT). No. of bitstreams: 1 Quinonez_FabiolaAzanha_M.pdf: 3774661 bytes, checksum: 43303e872404bf21c83ed4ea86d8befe (MD5) Previous issue date: 2006 / Resumo: Nesta tese foi utilizado um programa baseado em elementos finitos para projetar cristais fotônicos bidimensionais, assim como foram desenvolvidos processos de litografia holográfica para gravação destas estruturas fotônicas em filmes de carbono amorfo hidrogenado, depositados sobre substratos de vidro. O projeto dos parâmetros geométricos das estruturas que apresentam um gap fotônico, numa dada região de interesse do espectro óptico, foi feito através do cálculo dos diagramas de bandas das estruturas, levando-se em consideração as dimensões e formas que possam ser fabricadas utilizando a técnica de litografia holográfica. Para gravação dos cristais fotônicos bidimensionais, com simetrias cúbica e hexagonal, foi utilizada a técnica de superposições sucessivas de padrões, gerados pela interferência de duas ondas planas (exposições holográficas), associadas à litografia do filme de carbono por plasma reativo (RIE ¿ Reactive Ion Etching) / Abstract: In this thesis, we employed a software based on finite element method to design two-dimensional photonic crystals, as well as we developed a holographic lithography process to record these photonic structures in amorphous carbon films, coated on glass substrates. In order to present a photonic band gap in a desired region of the optical spectrum, the geometrical parameters of the structures were defined by analyzing the calculated band diagram of the structures. Such definition takes into account the dimensions and forms of the structures that can be fabricated using techniques of holographic lithography. To record the two-dimensional photonic crystals, with cubic and hexagonal symmetries, we used the technique of successive superimposition of fringe patterns. The patterns were generated by the interference of two plane waves (holographic exposures), associated to the lithography of the carbon film by reactive ion etching / Mestrado / Propriedades òticas e Espectroscopia da Matéria Condensada ; Outras Inter. da Mat. Com Rad. e Part / Mestre em Física

In this work, we study the use of a spatial light modulator (SLM) for local manipulation of phase in interfering laser beams to fabricate photonic crystal templates with embedded, engineered defects. A SLM displaying geometric phase patterns was used as a digitally programmable phase mask to fabricate 4-fold and 6-fold symmetric photonic crystal templates. Through pixel-by-pixel phase engineering, digital control of the phases of one or more of the interfering beams was demonstrated, thus allowing change in the interference pattern. The phases of the generated beams were programmed at specific locations, resulting in defect structures in the fabricated photonic lattices such as missing lattice line defects, and single-motif lattice defects in dual-motif lattice background. The diffraction efficiency from the phase pattern was used to locally modify the filling fraction in holographically fabricated structures, resulting in defects with a different fill fraction than the bulk lattice. Through two steps of phase engineering, a spatially variant lattice defect with a 90° bend in a periodic bulk lattice was fabricated. Finally, by reducing the relative phase shift of the defect line and utilizing the different diffraction efficiency between the defect line and the background phase pattern, desired and functional defect lattices can be registered into the background lattice through direct imaging of the designed phase patterns.

Lithium niobate (LiNbO3) and KTiOPO4 (KTP) are ferroelectric crystals of considerable interest in different fields of optics and optoelectronics. Due to its large values of the nonlinear optical, electro-optic (EO), piezoelectric and acousto-optical coefficients, LiNbO3 is widely used for laser frequency conversion using the quasiphase matching (QPM) approach where the sign of nonlinearity has been periodically modulated by electric field poling (EFP). In the microwave and telecommunication field LiNbO3 is used for surface acoustic devices and integrated optical modulators. KTP and its isomorphs, on the other hand, exhibit slightly lower nonlinear coefficients but have much higher photorefractive damage thresholds, so that it is mainly used in the fabrication of QPM devices for both UV, IR and visible light generation and in high power applications. This thesis focus on different key issues: (1) accurate characterization of specific optical properties of LiNbO3, which are of interest in nonlinear and EO applications; (2) in-situ visualization and characterization of domain reversal by EFP in LiNbO3 and KTP crystals for a through understanding of the ferroelectric domain switching; (3) fabrication of periodic surface structures at sub-micron scale in LiNbO for photonic applications. An interferometric method is used for accurate measurement of ordinary and extraordinary refractive indices in uniaxial crystals, which is of great interest in the proper design of QPM crystals. A digital holography (DH) based method is presented here for 2D characterization of the EO properties of LiNbO , which is considerably interesting in the applications where the proper design of the EO device requires a spatially resolved information about the EO behaviour and the existing pointwise techniques are not sufficient. A DH method for novel in-situ monitoring of domain reversal by EFP in both LiNbO3 and KTP, is also presented here. The technqiue could be used as a tool for high fidelity periodic domain engineering but also provides information about domain kinetics, internal field and crystals defects. 3 3 3 Finally this thesis presents novel results concerning nanoscale periodic surface structuring of congruent LiNbO3. Holographic lithography (HL) is used for sub-micron period resist patterning and electric overpoling for surface domain reversal. Surface structures are obtained by selective etching. Moiré effect is also used in the HL to fabricate complicated structures with multiple periods. The depth compatibility with waveguide implementation allows foreseeing possible applications of these structures for Bragg gratings or innovative photonic crystal devices, exploiting the additional nonlinear and EO properties typical of LiNbO3. / QC 20100824

This work builds up on the greatest minds of Cambridge Holography: Adrian Cable, Edward Buckley, Jonathan Freeman, and Christoph Bay. Cable and Buckley, developed an OSPR algorithm which was the first to provide high-quality real-time hologram generation using general-purpose hardware while Freeman designed a method to correct arbitrary aberrations. As ingenious as the method was, the calculations were extensively lengthy. Addressing this issue, a variant of OSPR suited for correcting spatially-varying aberration is presented. The algorithm combines the approaches of Cable, Buckley and Freeman to provide real-time hologram generation while incorporating various corrections (aberration, distortion, and pixel shape envelope). A high-performance implementation on a mid-range GPU achieved hologram generation up to 12 fps. Following topic studied is an adaptive optical correction. This work attempts to construct a set of methods, forming an automated testbed for holographic projectors. Each model, after exiting the production line is placed on such testbed, having all of its imperfections characterized. Once calibrated, each model is able to display highest-quality image throughout its life-span. An application of this work to industry was carried in collaboration with Dr Phillip Hands (University of Edinburgh) and LumeJET. Three demonstrators are constructed intending for a cost-effective system for holographic lithography. They are characterized using the developed testbed. Using the supersampled Adaptive OSPR algorithm, the diffraction limit was surpassed 2.75 times allowing to increase the patterning area. This combines approaches of Cable, Buckley, Freeman and Bay to achieve a wide field-of-view and high pixel-count replay field using off-the-shelf components. This thesis is finished describing the work on 3D holography carried with Penteract28. It is shown that the 2D hologram in the presence of spatially-varying aberrations is mathematically equivalent to a 3D hologram. The same implementation of the algorithm can be used to provide real-time 3D hologram generation.

Le domaine du photovoltaïque en couches minces s’attache à réduire le coût de l’énergie photovoltaïque, en réduisant considérablement la quantité de matières premières utilisées. Dans le cas du silicium cristallin en couches minces, la réduction de l’épaisseur de la cellule s’accompagne d’une baisse drastique de l’absorption, notamment pour les plus fortes longueurs d’onde. Nombreuses sont les techniques aujourd’hui mises en œuvre pour lutter contre cette baisse de performance, dont l’utilisation des effets plasmoniques induits par des nanostructures métalliques qui permettent un piégeage de la lumière accru dans la couche absorbante. Dans ces travaux, nous étudions l’influence de nanostructures d’argent organisées suivant un réseau périodique sur l’absorption d’une couche de silicium. Ces travaux s’articulent autour de deux axes majeurs. L’influence de ces effets plasmoniques sur l’absorption est d’abord mise en évidence à travers différentes simulations numériques réalisées par la méthode FDTD. Nous étudions ainsi les cas de réseaux périodiques finis et infinis de nanostructures d’argent situés sur la face arrière d’une couche mince de silicium. En variant les paramètres du réseau, nous montrons que l’absorption au sein du silicium peut être améliorée dans le proche infrarouge, sur une large plage de longueurs d’onde. Le second volet de la thèse concerne la réalisation des structures modélisées. Pour cela, deux voies de fabrication ont été explorées et développées. Pour chacune d’entre elles, trois briques élémentaires ont été identifiées : (i) définition du futur motif du réseau grâce à un masque, (ii) réalisation de pores dans le silicium et (iii) remplissage des pores par de l’argent pour former le réseau métallique. La première voie de fabrication développée fait appel à un masque d’alumine, réalisé par l’anodisation électrochimique d’une couche d’aluminium, pour définir les dimensions du réseau métallique. Une gravure chimique assistée par un métal est ensuite utilisée pour former les pores, qui seront alors comblés grâce à des dépôts d’argent par voie humide. La seconde voie de fabrication utilise un masque réalisé par lithographie holographique, une gravure des pores par RIE et un remplissage des pores par dépôt d’argent electroless. Les substrats plasmoniques fabriqués sont caractérisés optiquement, au moyen d’une sphère intégrante, par des mesures de transmission, réflexion et absorption. Pour tous les substrats plasmoniques caractérisés, les mesures optiques montrent une baisse de la réflexion et de la transmission et une hausse de l’absorption pour les plus grandes longueurs d’onde. / Thin-film photovoltaics focus on lowering the cost reduction of photovoltaic energy through the significant reduction of raw materials used. In the case of thin-films crystalline silicon, the reduction of the thickness of the cell is linked to a drastic decrease of the absorption, particularly for the higher wavelengths. This decrease of the absorption can be fought through the use of several different light trapping methods, and the use of plasmonic effects induced by metallic nanostructures is one of them. In this work, we study the influence of a periodic array of silver nanostructures on the absorption of a silicon layer. This work is decomposed into two main axes. First, the influence of the plasmonic effects on the silicon absorption is highlighted through different numerical simulations performed by the FDTD method. Both finite and infinite arrays of silver nanostructures, located at the rear side of a thin silicon layer, are studied. By varying the parameters of the array, we show that the silicon absorption can be improved in the near infrared spectral region, over a wide range of wavelengths. The second part of the thesis is dedicated to the fabrication of such modeled structures. Two different approaches have been explored and developed inside the lab. For each of these two strategies, three major building blocks have been identified: (i) definition of the future array pattern through a mask, (ii) etching of the pattern in the silicon layer and (iii) filling of the pores with silver in order to form the metallic array of nanostructures. In the first fabrication method, an anodic alumina mask, produced by the electrochemical anodization of an aluminium layer, is used in order to define the dimensions of the metallic array. A metal assisted chemical etching is then performed to produce the pores inside the silicon, which will then be filled with silver through a wet chemical process. The second fabrication method developed involves the use of holographic lithography to produce the mask, the pores in silicon are formed by reactive ion etching and they are filled during an electroless silver deposition step. The fabricated plasmonic substrates are optically characterized using an integrating sphere, and transmission, reflection and absorption are measured. All the characterized plasmonic substrates shown a decrease of their reflection and transmission and an absorption enhancement at the largest wavelengths.