One-dimensional vertical nanostructures, nanowire arrays, are investigated for applications in photovoltaics. Specifically, III-V core-shell p-i-n nanowire arrays are grown by molecular beam epitaxy on silicon substrates, using the self-assisted vapour-liquid-solid growth method. GaAs1-xPx nanowires are grown with an optimized composition to maximize the potential efficiency of a GaAsP nanowire-on-silicon tandem solar cell under AM1.5G illumination. Photovoltaic devices are fabricated and assessed by optical and electrical characterization techniques, to identify areas for refinement of device design and processing. Combining the unique properties of nanowire arrays, the quality and tunability of III-V materials, and the economics and infrastructure of silicon-based device fabrication, this work examines a novel approach to affordable renewable energy. Methods of substrate removal via etching are investigated for optical characterization of nanowire arrays, and an improved technique for electrical characterization of ITO contacts is explored. The first nanowire-on-silicon tandem device utilizing a radial p-n junction nanowire structure is reported, achieving an open circuit voltage of 1.2 V, a short circuit current density of 7.6 mA/cm2, a fill factor of 40%, and an efficiency of 3.5%. Finally, projects for future improvements to the work described herein are suggested. / Thesis / Master of Applied Science (MASc)

Amostras de Semicondutores III-V foram crescidas usando a técnica de Epitaxia por feixes Moleculares. As propriedades elétricas das estruturas de GaAs com dopagem planar com Silício foram investigadas, e também a saturação e a difusão do Silício nestas amostras. As propriedades ópticas e elétricas das estruturas dopadas planarmente com Selênio foram analisadas, usando as técnicas de Capacitância-voltagem e a de Tunelamento resonante. As propriedades elétricas dos poços quânticos a base de InGaAs/GaAs foram investigadas, em função da posição da impureza planarmente dopada com Silício. / III-V semiconductor samples were grown using the Molecular beam epitaxy technique, the electrical properties of the GaAs structures planar doped with silicon were investigated as well as the Silicon saturation and diffusion in these samles. The optcal and electrical properties of structures planar doped with Selenium were analyzed using the Capacitance Voltage and resonant Tunneling techniques. The electrical properties of InGaAs/ GaAs based quantum wells were investigated as a function of the planar doped with Silicon impurity position.

La miniaturisation des transistors a progressé par noeud technologique avec l’introduction successive de nouveaux matériaux (high k) et de nouvelles architectures (FinFET, NWFET). Pour les noeuds technologiques avancés, une nouvelle rupture en matériau est envisagée pour remplacer le Silicium du canal de conduction par des matériaux à forte mobilité (2D, III-V). Les matériaux III-V sont de bons candidats pour répondre à cette problématique grâce à leur forte mobilité de type n (InGaAs, InAs, InSb) ou de type p (GaSb). Au cours de cette thèse, un intérêt particulier a été porté au couple de matériaux InAs/GaSb, qui offre un avantagesupplémentaire de par son accord de paramètre de maille permettant d’accéder dans une même structure à des couches de mobilités n et p. La croissance de matériau III-V directement sur substrat (001)-Si 300mm est aujourd’hui un challenge d’intérêt majeur pour proposer des procédés compatibles avec les plateformes industriels CMOS. Ces croissances restent complexes à cause de la formation de défauts : parois d’antiphase, dislocations, fissures ; générées respectivement par la différence depolarité, de paramètre de maille et de coefficient d’expansion thermique, entre le Silicium et les matériaux III-V. Dans cette thèse nous présentons une première démonstration de croissance par MOVPE de GaSb directement sur substrat (001)-Si nominal 300mm compatible avec les plateformes industrielles CMOS. Les couches de GaSb présentent une rugosité de surface sub-1nm, et une qualité cristalline au niveau de l’état de l’art en MBE. La croissance d’une couche d’InAs a ensuite permis la réalisation d’un démonstrateur FinFET à canaux multiples d’InAs. Ce derniera été élaboré via une technique lithographique alternative à haute résolution basée sur l’utilisation de copolymère à bloc. Ce procédé simple pour réaliser des canaux de conduction permet d’accéder à une forte densité de fils, de faibles dimensions, et en seulement cinq étapes de fabrication. / The transistors’s miniaturization evolved through technological nodes with the successive introduction of new materials (high k) and new architectures (FinFET, NWFET). For the advanced technological nodes, a new break in material is considered to replace the silicon of the conduction channel with high mobility materials (2D, III-V). III-V materials are good candidates to address a solution to this problem thanks to their n-type (InGaAs, InAs, InSb)or p-type (GaSb) high mobility. During this PhD, a particular interest has been given to the InAs/GaSb pair of materials, which offers an additional advantage by its lattice parameter agreement making it possible to access n-type and p-type high mobility layers in the same structure.Nowadays, the growth of III-V materials directly on (001) -Si 300mm substrates is a challenge of major interest to develop industrial platforms compatible processes. These growths remain complex because of defects formation: antiphase boundaries, dislocations, cracks; generated respectively by the difference in polarity, lattice mismatch and difference in thermal expansion coefficient, between the silicon and III-V materials. In this PhD, we present a first demonstration of GaSb growth by MOVPE directly on nominal (001) -Si 300mm substrate compatible with industrial platforms. The GaSb layers have a sub-1nm surface roughness, and an equal to MBE state of the art crystalline quality. The growth of a InAs layer then allowed the realization of an InAs FinFET multi-channel demonstrator. The latter was developed via a high resolution alternative lithographic technique based on the use of block copolymer. This simple method for producing conduction channels makes it possible to access a high density of wires, of small dimensions, and in only five manufacturingsteps.

Les MOSFET III-V sont considérés comme des candidats potentiels pour les futures générations d'applications à base de logique CMOS, grâce à leurs remarquables propriétés de transport.D'un autre côté, ils souffrent de désavantages physiques (tels que les courants tunnels ou leur faible densité d'états), et de difficultés technologiques (en particulier les états d'interface), qui peuvent détériorer leur performance.Dans cette thèse, un modèle physique et compact du MOSFET III-V est établi. Il inclut une description des effets canaux courts, de la charge d'inversion (considérant aussi les effets de structure de bandes dans les canaux fins), les caractéristiques de transport, les courants tunnels, et les composants externes tels que les résistances d'accès et les capacités parasites.En utilisant ce modèle, la performance des MOSFET III-V est évaluée par rapport à celle du Si, et une feuille de route incluant ces dispositifs est présentée.Il est démontré que les canaux à matériaux III-V pourraient présenter une meilleure performance que le Si, pourvu que le problème des pièges d'interface soit résolu. Si tel est le cas, ils pourraient être introduits au noeud "7nm".La densité de pièges, à partir de laquelle la performance des MOSFET III-V devient pire que celle du Si, dépend de l'architecture considérée.Enfin, les canaux très fins nécessaires pour atteindre une bonne performance avec les matériaux III-V risquent de poser des problèmes de variabilité, qui pourraient avec des répercussions négatives au niveau de la conception du circuit. / III-V MOSFETs are considered as a potential candidate for next generation CMOS logic applications thanks to their remarkable transport properties.On the other hand, they suffer from several physical drawbacks (such as tunneling currents or low density-of-states) and technological difficulties (in particular interface traps), which may deteriorate their performance.In this thesis, a physical compact model of the III-V MOSFET is established. It includes a description of short-channel effects, inversion charge (also considering bandstructure effects in thin channels), transport characteristics, tunneling currents, and external components such as access resistances and fringe capacitances. Using this model, the performance of III-V MOSFETs is benchmarked against Si, and a possible roadmap including these devices is presented. It has been found that the III-V channels may feature a significant performance advantage over Si, provided that the interface traps issue be solved. In that case, they may be introduced at the "7nm" node. The critical trap density, above which the performance of III-V MOSFETs degrades below Si, depends on the architecture considered. Finally, the very thin channels required to achieve a good performance with III-V materials may raise variability issues that could reverberate negatively at the circuit design level.

Submitted by Alison Vanceto (alison-vanceto@hotmail.com) on 2017-01-03T13:08:29Z No. of bitstreams: 1 DissFSC.pdf: 3416104 bytes, checksum: 8ad6353644ccdd0f0d768fbd0ed2324f (MD5) / Approved for entry into archive by Marina Freitas (marinapf@ufscar.br) on 2017-01-16T16:14:02Z (GMT) No. of bitstreams: 1 DissFSC.pdf: 3416104 bytes, checksum: 8ad6353644ccdd0f0d768fbd0ed2324f (MD5) / Approved for entry into archive by Marina Freitas (marinapf@ufscar.br) on 2017-01-16T16:14:09Z (GMT) No. of bitstreams: 1 DissFSC.pdf: 3416104 bytes, checksum: 8ad6353644ccdd0f0d768fbd0ed2324f (MD5) / Made available in DSpace on 2017-01-16T16:14:17Z (GMT). No. of bitstreams: 1 DissFSC.pdf: 3416104 bytes, checksum: 8ad6353644ccdd0f0d768fbd0ed2324f (MD5) Previous issue date: 2016-09-08 / Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES) / Diluted nitride III-V semiconductor leagues have physical properties that make them interesting for applications on optoelectronic devices. The possibility to lattice matching GaAsPN with silicon makes this semiconductor interesting for studies. In this dissertation we investigated the optical and magneto optical properties of semiconductors nanostructures of the type GaP(N)/GaAsPN. Mesures of photoluminescence (PL), photoluminescence excitation (PLE) and magneto photoluminescence (Magneto-PL) under high fields (B≤ 15T) were performed in films of GaAsPN and multiple quantum wells (MQW) of GaAsPN/GaPN. We have studied localizations effects with measures of diamagnetic shift, stoke shift and the dependence of photoluminescence peak with temperature. We observed a negative diamagnetic shift for some samples, which is an anomalous effect in these systems. It was also seen a red shift of the PL peak when the MQW samples suffered a thermal treatment. Analyzing the spin polarization properties of this material, utilizing magneto photoluminescence resolved with circular polarization, we observed polarization of the samples as high as 30% on fields of 15T. / Ligas semicondutoras III-V nitreto diluídas possuem propriedades físicas que as tornam interessantes para aplicações em dispositivos optoeletrônicos. A possibilidade de casar liga de GaAsPN com silício faz com que esse semicondutor se torne interessante para estudos. Nesta dissertação investigamos as propriedades ópticas e magneto ópticas de nanoestruturas semicondutoras do tipo GaP(N)/GaAsPN. Foram realizadas medidas de fotoluminescência (PL), fotoluminescência de excitação (PLE) e magneto fotoluminescência (Magneto-PL) sob altos campos magnéticos (B ≤ 15T), em filmes finos de GaAsPN e múltiplos poços quânticos (MQW) de GaAsPN/GaPN. Estudamos efeitos de localização dos portadores através da análise do deslocamento diamagnético da PL, deslocamento Stoke e a dependência da posição do pico de fotoluminescência com a temperatura. Verificamos um deslocamento diamagnético negativo para algumas das amostras, o que é um comportamento anômalo nesse tipo de sistema. Foi verificado também um deslocamento para o vermelho do pico de PL quando realizado tratamento térmico nas amostras de MQWs. Analisando as propriedades de polarização de spin desse material, utilizando magneto-PL resolvida em polarização circular, foi observada uma polarização circular de até 30% num campo de 15 T.

Amostras de Semicondutores III-V foram crescidas usando a técnica de Epitaxia por feixes Moleculares. As propriedades elétricas das estruturas de GaAs com dopagem planar com Silício foram investigadas, e também a saturação e a difusão do Silício nestas amostras. As propriedades ópticas e elétricas das estruturas dopadas planarmente com Selênio foram analisadas, usando as técnicas de Capacitância-voltagem e a de Tunelamento resonante. As propriedades elétricas dos poços quânticos a base de InGaAs/GaAs foram investigadas, em função da posição da impureza planarmente dopada com Silício. / III-V semiconductor samples were grown using the Molecular beam epitaxy technique, the electrical properties of the GaAs structures planar doped with silicon were investigated as well as the Silicon saturation and diffusion in these samles. The optcal and electrical properties of structures planar doped with Selenium were analyzed using the Capacitance Voltage and resonant Tunneling techniques. The electrical properties of InGaAs/ GaAs based quantum wells were investigated as a function of the planar doped with Silicon impurity position.

Orientadores: Luiz Fernando Zagonel, Mônica Alonso Cotta / Dissertação (mestrado) - Universidade Estadual de Campinas, Instituto de Física Gleb Wataghin / Made available in DSpace on 2017-05-11T13:05:53Z (GMT). No. of bitstreams: 1 Silva, Bruno Cesar da_M.pdf: 3758085 bytes, checksum: 042d8ff5a8d495ad70b0f10c888cd418 (MD5) Previous issue date: 2016 / Made available in DSpace on 2017-06-14T17:38:47Z (GMT). No. of bitstreams: 1 Silva_BrunoCesarda_M.pdf: 3758085 bytes, checksum: 042d8ff5a8d495ad70b0f10c888cd418 (MD5) Previous issue date: 2016 / Resumo: Neste trabalho, estudamos a dinâmica de crescimento de nanofios de GaP crescidos pelo método VLS (Vapor-Líquido-Sólido) via Epitaxia por Feixe Químico (CBE), usando nanopartículas catalisadoras de ouro. Investigando o efeito da temperatura na dinâmica de crescimento de nanofios de GaP encontramos uma grande variedade de nanofios em cada amostra, caracterizadas por diferentes direções de crescimento e/ou morfologias, apresentando sempre uma população dominante. Com o aumento da temperatura (510°C) observamos uma transição drástica na morfologia da população dominante, de nanofios típicos para uma nova e inesperada morfologia assimétrica. Mostramos ainda que modificando o tamanho da nanopartícula catalisadora de 5nm para 20nm os nanofios assimétricos ainda são favorecidos a alta temperatura. Procurando compreender o mecanismo de formação dos nanofios assimétricos, mostramos que estas estruturas cristalizam-se na fase WZ, com baixa densidade de defeitos, comparadas às outras amostras. Além disso, mostramos que a assimetria destes nanofios não é oriunda de diferenças de polaridade nas facetas laterais ou formação de defeitos cristalográficos que pudessem modificar a dinâmica de crescimento de modo a levar à morfologia assimétrica. Desta forma, propomos um cenário de crescimento simplificado, no qual a estrutura assimétrica é formada pela combinação do crescimento de nanofios ordinários, via VLS, junto com estruturas que crescem livre de catalizador via mecanismo VS (Vapor-Sólido), estas duas estruturas então se juntam, transferindo material e dando lugar a facetas de menor energia, resultando na formação da estrutura assimétrica. Por fim, medidas de fotoluminescência mostram a emissão característica no verde do GaP WZ para os nanofios assimétricos, mesmo com a estrutura não estando passivada, confirmando a boa qualidade cristalina das nossas amostras / Abstract: In this work, we study the growth dynamics of GaP nanowires grown by VLS (Vapor-Liquid-Solid) method via Chemical Beam Epitaxy (CBE) using gold nanoparticles as catalyst. Investigating the effect of temperature on the growth dynamics of GaP nanowires we find a wide variety of nanowires in each sample, characterized by different growth directions and/or morphologies, always having a dominant population. With increasing temperature (510°C), we observed a dramatic transition in the morphology of the dominant population of typical nanowires to a new and unexpected asymmetric morphology. We also show that modifying the size of the catalyst nanoparticle from 5nm to 20mn the asymmetric nanowires are still favored at high temperature. Looking forward to understand the mechanism of formation of the asymmetric nanowires, we show that these structures crystallize in the WZ phase with low defect density when compared to the other samples. Furthermore, we show that the asymmetry of these nanowires is not derived from differences in polarity in side facets or the formation of crystallographic defects which might modify the growth dynamics so as to bring the asymmetric morphology. Thus, we propose a simplified growth scenario, in which the asymmetric structure is formed by growth combination of ordinary nanowires via VLS, along with structures that grow catalyst-free via VS (vapor-solid) mechanism, these two structures joined and by transferring materials facets with lower energy facets appear, resulting in the formation of asymmetrical structure. Finally, photoluminescence measurements show the characteristic emission in the green of WZ GaP for asymmetric nanowires, even with no passivation, which confirms the good crystalline quality of our samples / Mestrado / Física / Mestre em Física

L’objectif de ce travail de thèse a été d’étudier une alternative à la cellule photovoltaïque à hétérojonction classique de silicium amorphe/cristallin avec un matériau (GaP) qui permettrait une amélioration de rendement grâce à ses propriétés optiques et électriques. L’étude du potentiel des hétérojonctions GaP/Si pour des applications PV nous a amené à étudier chacun des aspects critiques inhérents à leur réalisation. La préparation chimique de la surface des substrats et les mécanismes qui contrôlent la structuration de la surface de Si(100) ont été étudiés afin d’obtenir une surface de silicium mono-domaine (à marches diatomiques) et faiblement rugueuse par homoépitaxie (dépôts par UHV-CVD). Cette étude a été complétée par l’étude de l’influence de la préparation de surface (préparation chimique et homoépitaxie) du substrat sur la qualité cristalline du GaP déposé en deux étapes par MEE et MBE. La croissance de GaP par MEE a par la suite été effectuée sur des substrats de Si(100) ayant uniquement subi une préparation chimique de surface. Les paramètres de la séquence de croissances MEE ont été étudiés et ajustés afin d’optimiser la phase de nucléation du GaP. La qualité structurale des dépôts a été évaluée par des caractérisations par AFM et DRX. Les couches minces de faibles épaisseurs (20nm) présentent une faible rugosité de surface équivalente à une homoépitaxie et une fraction volumique de MTs inférieure à la limite de détection. La croissance MEE permet d’assurer une nucléation 2D. Cependant les caractérisations par TEM et STM révèlent la présence de parois d’antiphase. En parallèle, la simulation de structures HET GaP/Si (effectuée grâce au programme AFORS-HET) et la réalisation de diodes et de démonstrateurs cellules GaP/Si ont permis de démontrer les optimisations apportées par l’utilisation d’un émetteur de GaP. Ces composants ont été étudiés par caractérisations optiques et électriques. Nous avons constaté une limitation des performances due à la présence de pièges à l’interface et dans le volume. Ces différentes études ont donc permis d’identifier les verrous technologiques à lever pour exploiter pleinement les cellules à hétérojonctions GaP sur silicium afin d’obtenir des hauts rendements photovoltaïques. / The main objective of this thesis is to study an alternative to conventional amorphous/crystalline silicon heterojunction solar cell using gallium phosphide (GaP) as an emitter layer. This would allow a performance improvement because of its optical and electrical properties. The potential of GaP/Si heterojunction solar cells have been evaluated by studying each of the critical issues inherent to their fabrication process. The chemical preparation of the substrates surface and the mechanisms controling the structure of the Si (100) surface have been studied in order to obtain a single domain silicon surface (with diatomic steps) and slightly roughened by homoepitaxy (UHV-CVD). This work was completed by the study of the impact of surface preparation (chemical preparation and homoepitaxy) of the substrate on the crystalline quality of GaP deposited in two steps by MBE and MEE. The growth of GaP by MEE was subsequently carried out on Si(100) substrates having only undergone a chemical surface preparation. MEE growth sequence parameters were studied and adjusted to optimize GaP nucleation. The structural quality of the thin films was evaluated by AFM and XRD characterizations. Thin films of 20 nm have lower surface roughness equivalent to an homoepitaxy and a volume fraction of MTs below the detection limit. The MEE growth ensures a 2D nucleation. However, TEM and STM characterizations reveal the presence of antiphase boundaries. In parallel, simulations of the structure HET GaP/Si (with AFORS-HET) have been performed to evaluate the potential of the structure. First, diodes and demonstrator cells with GaP/Si junction have been fabricated and optically/electrically characterized. Limitations in performance due to the presence of traps at the interface and silicon volume degradation have been observed. All this work has allowed us to identify the technological issues to overcome in order to fully exploit the GaP/Si heterojunction cells to improve solar cell performance.

Avec le développement de l’usage d’internet et les nouveaux services tout en ligne, la quantité de données traitée par les data-centers ne cessent de croître. Ainsi, si la mise en parallèle de plusieurs serveurs permet de répondre à cette demande, un problème structurel apparaît. Comme dans les supercalculateurs entre les noeuds de calculs, les données ne circulent plus suffisamment rapidement entre les serveurs sur les câbles électriques classiques. Pour pallier à ce goulot d’étranglement, l’utilisation de l’optique permet d’obtenir des débits plus importants. Si les câbles actifs existants permettent une solution rapide, la photonique sur silicium présente un avantage certain. L’intégration des composants optiques au plus près des puces électroniques permet de réduire considérablement le chemin des interconnexions ainsi que leurs coûts énergétiques. Une chaine de communication optique complète nécessite différents composants. Si les modulateurs, multiplexeurs, coupleurs fibres, démultiplexeurs et photodetecteurs ont déjà été démontrés, les sources lasers utilisées sont toujours extérieures à la puce photonique. Il s’agit en effet du chainon manquant dans l’intégration complète de l’optique grâce à la photonique sur silicium. Plusieurs architectures ont déjà été proposées mais cette thèse s’appuie sur l’intégration hybride d’un matériau III-V sur le silicium. Le travail de cette thèse a consisté en la conception, la fabrication et la caractérisation de sources laser hybrides III-V sur silicium et a été entièrement accompli aux CEA/LETI. L’architecture du LETI d’un guide III-V couplé à un guide silicium a été améliorée grâce à un critère adiabatique pour obtenir une zone active de laser efficace et robuste. Cette architecture a été déclinée en différents types de lasers (Fabry-Pérot, DBR, racetrack et DFB). La fabrication de ces lasers a nécessité des développements de procédés de structuration du matériau III-V reporté sur du silicium dans les laboratoires du CEA/LETI. Les premiers résultats ont permis la validation de l’architecture utilisée. Les lasers DBR présentent des seuils inférieurs à 20mA et des puissances optiques maximales supérieures à 20mW dans le guide silicium. Ces lasers ont également un fonctionnement monomode avec un SMSR de plus de 50dB. Les lasers DFB possèdent quant à eux des seuils de 30mA et des puissances optiques maximales supérieurs à 40mW dans le guide silicium. Ils sont monomodes avec un SMSR de 40dB. Ces résultats sont à l’état de l’art mondial sur les sources lasers hybrides en photonique sur silicium. / With the development of the Internet and the new cloud services, the amount of data processed by data-centers is increasing. Though, if the paralleling of multiple server answer to this growing quantity, a structural problem arises. As in super calculators between nodes calculations, data are not transmitted quickly enough between servers on classical electric cables. This bottleneck can be overcome thanks to the optic which can access greater data rates. If existing active cables allow a quick resolution, silicon photonic has a clear benefit. The integration of the optical components closer to the electronic chips reduces substantially the path of interconnections and their energetic costs.An optical transmitter and receptor need different components. If modulators, multiplexers, fiber coupler, multiplexer and photo-detectors are already achieved, laser sources used are still outside the photonic chip. This is the missing link for a complete optical integration thanks to the silicon photonic. Several architectures have been proposed but this thesis relies on hybrid integration of III-V material on silicon.The work of this thesis consisted on the conception, the fabrication and the characterization of hybrid III-V on Silicon laser sources and was completely done at the CEA/LETI. The LETI architecture composed by a III-V waveguide coupled to a silicon waveguide was improved thanks to a adiabatic criterion to obtain an efficient and robust active area of the laser. This architecture was declined in different kinds of lasers (Fabry-Pérot, DBR, Racetrack and DFB). The fabrication required technological development for the structuration of the reported III-V material on silicon at the laboratories of the CEA/LETI. The first results validates the proposed architectures. The DBR lasers have threshold of less than 20mA and maximal optical power of more than 20mW inside the silicon waveguide. Those lasers are monomode with a SMSR of more than 50dB. The DFB Lasers have threshold of 30mA and maximal optical power of more than 40mW inside the silicon waveguide. They are monomode with SMSR more than 40dB. Those results are world state-of-the-art for hybrids laser sources in silicon photonic.

Orientadores: Luiz Fernando Zagonel, Mônica Alonso Cotta / Dissertação (mestrado) - Universidade Estadual de Campinas, Instituto de Física Gleb Wataghin / Made available in DSpace on 2018-08-30T22:54:17Z (GMT). No. of bitstreams: 1 Silva_BrunoCesarDa_M.pdf: 3896391 bytes, checksum: 02a6cadcf24734bcd669293dc473b75e (MD5) Previous issue date: 2016 / Resumo: Neste trabalho, estudamos a dinâmica de crescimento de nanofios de GaP crescidos pelo método VLS (Vapor-Líquido-Sólido) via Epitaxia por Feixe Químico (CBE), usando nanopartículas catalisadoras de ouro. Investigando o efeito da temperatura na dinâmica de crescimento de nanofios de GaP encontramos uma grande variedade de nanofios em cada amostra, caracterizadas por diferentes direções de crescimento e/ou morfologias, apresentando sempre uma população dominante. Com o aumento da temperatura (510°C) observamos uma transição drástica na morfologia da população dominante, de nanofios típicos para uma nova e inesperada morfologia assimétrica. Mostramos ainda que modificando o tamanho da nanopartícula catalisadora de 5nm para 20nm os nanofios assimétricos ainda são favorecidos a alta temperatura. Procurando compreender o mecanismo de formação dos nanofios assimétricos, mostramos que estas estruturas cristalizam-se na fase WZ, com baixa densidade de defeitos, comparadas às outras amostras. Além disso, mostramos que a assimetria destes nanofios não é oriunda de diferenças de polaridade nas facetas laterais ou formação de defeitos cristalográficos que pudessem modificar a dinâmica de crescimento de modo a levar à morfologia assimétrica. Desta forma, propomos um cenário de crescimento simplificado, no qual a estrutura assimétrica é formada pela combinação do crescimento de nanofios ordinários, via VLS, junto com estruturas que crescem livre de catalizador via mecanismo VS (Vapor-Sólido), estas duas estruturas então se juntam, transferindo material e dando lugar a facetas de menor energia, resultando na formação da estrutura assimétrica. Por fim, medidas de fotoluminescência mostram a emissão característica no verde do GaP WZ para os nanofios assimétricos, mesmo com a estrutura não estando passivada, confirmando a boa qualidade cristalina das nossas amostras / Abstract: In this work, we study the growth dynamics of GaP nanowires grown by VLS (Vapor-Liquid-Solid) method via Chemical Beam Epitaxy (CBE) using gold nanoparticles as catalyst. Investigating the effect of temperature on the growth dynamics of GaP nanowires we find a wide variety of nanowires in each sample, characterized by different growth directions and/or morphologies, always having a dominant population. With increasing temperature (510°C), we observed a dramatic transition in the morphology of the dominant population of typical nanowires to a new and unexpected asymmetric morphology. We also show that modifying the size of the catalyst nanoparticle from 5nm to 20mn the asymmetric nanowires are still favored at high temperature. Looking forward to understand the mechanism of formation of the asymmetric nanowires, we show that these structures crystallize in the WZ phase with low defect density when compared to the other samples. Furthermore, we show that the asymmetry of these nanowires is not derived from differences in polarity in side facets or the formation of crystallographic defects which might modify the growth dynamics so as to bring the asymmetric morphology. Thus, we propose a simplified growth scenario, in which the asymmetric structure is formed by growth combination of ordinary nanowires via VLS, along with structures that grow catalyst-free via VS (vapor-solid) mechanism, these two structures joined and by transferring materials facets with lower energy facets appear, resulting in the formation of asymmetrical structure. Finally, photoluminescence measurements show the characteristic emission in the green of WZ GaP for asymmetric nanowires, even with no passivation, which confirms the good crystalline quality of our samples / Mestrado / Física / Mestre em Física