The deposition of WOx and FeOx thin films by reactive PLD and post-deposition annealing in an oxygen environment have been investigated. The influence of the deposition parameters on the growth and structure of WOx as well as the electronic and structural properties of FeOx thin films are presented. WOx thin films have been deposited onto native oxide Si (100) and SrTiO3 (100) substrates, whilst FeOx films were deposited onto glass and MgO (100). The films have been analysed using X-ray diffraction (XRD), texture pole figure analysis, X-ray reflectivity (XRR), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), atomic force microscopy (AFM) and resistance vs temperature measurements. The WOx films deposited on both Si and SrTiO3 substrates were found to exhibit a dependence on the primary texture with fluence in the range of 5.3 J cm-2 to 14.7 J cm-2. The WOx films deposited on SrTiO3 were observed to exhibit a biaxial texture whilst the films on Si displayed a (002) WO3 out of plane fibre texture. The primary texture of the WOx films on SrTiO3 was observed to evolve from (200)/(020) WO3 to a single (002) WO3 texture with increasing fluence. The FeOx films deposited via reactive PLD onto glass substrates were found to exist in the Fe2O3 oxidation state for all parameters used. The production of Fe3O4 by post-deposition annealing of Fe films on glass and MgO (100) substrates in an oxygen environment is also presented. On both substrates it was necessary to use a two-stage anneal process to produce Fe3O4; an initial 175 °C oxygen anneal followed by a 500 °C vacuum anneal. The presence of Fe3O4 was confirmed by the existence of the Verwey transition at close to 120 K, during resistance vs temperature scans. The anneal parameters required to produce Fe3O4 are shown to be different for MgO substrates in comparison to glass.

The present research seeks to characterization of an additively manufactured and heat-treated Ti-xMn gradient alloy, a binary system that has largely been unexplored. In order to rapidly assess this binary system, compositionally graded Ti-xMn (0<x<15 wt%) specimens were fabricated using the LENS (Laser Engineered Net Shaping) and were subsequently heat-treated and characterized using a wide range of techniques. Microstructural changes with respect to the change in thermal treatments, hardness and chemical composition were observed and will be presented. These include assessments of both continuous cooling, leading to observations of both equilibrium and metastable phases, including the titanium martensites, and to direct aging studies looking for composition regimes that produce highly refined alpha precipitates – a subject of great interest given recent understandings of non-classical nucleation and growth mechanisms. The samples were characterized using SEM, EDS, TEM, and XRD and the properties probed using a Vickers Microhardness tester.

Thesis (M.S.)--University of Missouri--Rolla, 2007. / Vita. The entire thesis text is included in file. Title from title screen of thesis/dissertation PDF file (viewed December 6, 2007) Includes bibliographical references.

Pulsed laser deposition method was employed to grow MgO thin films with preferred orientation on bare Si(100) and SiO₂/Si(100) substrates. The orientation of MgO thin films was systematically investigated by varying deposition parameters. XRD analysis showed that the preferred orientation of MgO thin films would change from (111) to (100) when laser fluence decreased and oxygen pressure increased to certain extend. But it was difficult to fabricate completely (100)-oriented MgO films. Substrate temperature seemed to have little influence on the orientation of MgO thin films at high laser fluence. SEM images of the MgO thin films on Si(100) deposited at 400°C and the laser fluence of 5J/cm² in the oxygen ambient of 200mTorr demonstrated that there was no presence of interfacial reactions or cracks and the film surface was very smooth. Such film is suitable as buffer layers for the growth of high-quality ferroelectric and superconducting overlayers. / Singapore-MIT Alliance (SMA)

Thin film lithium microbatteries were investigated in this project in which LiCoO₂ cathodes about 200 to 500 nm were fabricated by pulsed-laser deposition (PLD) at different processing parameters such as laser energy and fluence, substrate temperature, background gas pressure, and target-substrate distance. Structure, microstructure and composition of as-deposited LiCoO₂ films were determined by XRD, SEM and XPS. Optimal deposition parameters were identified. Relaxation of open-circuit voltage of as-prepared cells and charge-discharge cycling were conducted to characterize the electrochemical properties of microbatteries made of these LiCoO₂ films. / Singapore-MIT Alliance (SMA)

Thesis (Ph. D.)--Worcester Polytechnic Institute. / Keywords: rapid prototyping; solid freeform fabrication; LENS; laser engineered net shaping; laser; titanium. Includes bibliographical references (p. 83-85).

Thesis (Ph. D.)--Oregon State University, 2009. / Printout. Some pages left blank intentionally. Includes bibliographical references (leaves 125-130). Also available on the World Wide Web.

Thesis (Ph.D.)--University of Nebraska-Lincoln, 2008. / Title from title screen (site viewed Nov. 20, 2008). PDF text: xvii, 187 p. : ill. (some col.) ; 11 Mb. UMI publication number: AAT 3311304. Includes bibliographical references. Also available in microfilm and microfiche formats.

Thesis (M.S.)--University of Missouri-Columbia, 2005. / The entire dissertation/thesis text is included in the research.pdf file; the official abstract appears in the short.pdf file (which also appears in the research.pdf); a non-technical general description, or public abstract, appears in the public.pdf file. Title from title screen of research.pdf file viewed on (July 14, 2006) Includes bibliographical references.

LiNi₀.₅Mn₁.₅O₄ thin films have been grown by pulsed laser deposition (PLD) on stainless steel (SS) substrates. The crystallinity and structure of thin films were investigated by X-ray diffraction (XRD). Microstructure and surface morphology of the thin films were examined using a field-emission scanning electron microscope (FESEM). The electrochemical properties of the thin films were studied with cyclic voltammetry (CV) and galvanostatic charge-discharge in the potential range between 3.0 and 4.9 V. The electrochemical behavior of LiNi₀.₅Mn₁.₅O₄ thin films showed reversible capacity above 4.7 V and good cycle performance up to 50 cycles. / Singapore-MIT Alliance (SMA)