Increasingly compact and powerful light emitting diodes require the development of efficient optical diffusers to manage their lighting capability according to the required application. In this study, a cost-effective strategy is demonstrated for fabricating micro-structured polymethylmethacrylate (PMMA) diffusers for white light sources. By combining different laserbased processes, namely direct laser engraving (DLE), direct laser writing (DLW), and direct laser interference patterning (DLIP), periodic patterns are fabricated in stainless steel surfaces with line- and dot-like geometries with feature sizes ranging from 1.7 to 900 μm. The fabricated hierarchical geometries are transferred to PMMA surfaces by plate-to-plate hot embossing. The relationship between the surface topography and the white light scattering behavior is investigated by confocal and scanning electron microscopy combined with photospectroscopy and image processing of photographs. The triple-scaled hierarchical structures can increase the haze up to 76% in the visible spectrum, while keeping the total transmittance over 90%, as the flat surface.

Laser patterning techniques have shown in the last decades to be capable of producing functional surfaces on a large variety of materials. A particular challenge for these techniques is the treatment of additively manufactured parts with high roughness levels. The presented study reports on the surface modification of additive-manufactured components of Ti64 and Al–Mg–Sc (Scalmalloy), with the aim of implementing water- and ice-repellent properties. Different laser-based microstructuring techniques, using nanosecond and picosecond pulses, are combined to create multiscale textures with feature sizes between ≈800 nm and 21 μm. The wettability could be set to static water contact angles between 141° and 153° for Ti64 and Al–Mg–Sc, respectively. In addition, surface free energy is analyzed for different surface conditions.

This paper describes advances in hybrid-lithography process, combining UV-lithography for planar, single mode redistribution layer (RDL) and 2-photon-polymerization direct-laser-writing (2PP-DLW) for micro-mirrors inside RDL-opening. Improvements to multi-layer direct patterning of OrmoCore/-Clad material system using UV-lithography and need for broadband UV-LED source are presented. Near square core cross sections and smooth sidewalls are achieved. Openings in full stack with steep sidewalls without residual layer are patterned. To optimize 2PP-DLW-process processing window for both OrmoComp and IP-DIP is thoroughly characterized. Roughness measurements prove feasibility even of coarsely printed structure as reflective μ-mirror for 1550 nm wavelength. Finally these results are applied to periscope probe for wafer-level-testing of edge emitting lasers and proof of concept is shown. Outlook to further research on UV-lithography of multi-layer waveguide stack and alignment with μ-mirror printing is given.

La construction d’un NSOM, dans ce manuscrit de thèse, est décrite en détail. Lacombinaison du système NSOM construit avec un interféromètre est proposée afin d’accéderà des mesures de phase, à la fois de ultra-haute sensibilité mais également de très granderésolution spatiale. Le nom de l’instrument développé est un interferomètre optique àbalayage en champ proche (NSOI, pour l’acronyme en anglais). Le principe est basé surl’utilisation d’un diapason accordable en cristal de quartz, sur lequel se trouve une pointe,afin de sonder le matériau étudié. La mesure de la force de cisaillement de la pointe sondeau voisinage de la surface permet d’assurer la régulation et la stabilité de la distance depositionnement de la pointe par rapport à la surface considérée. Le dispositif est construit encombinant différents éléments électroniques pilotés par un logiciel développé en langageLab-VIEW. Le bruit de la mesure en NSOI est supprimé par un calcul simple basé sur lathéorie de l’optique ondulatoire et des interférences associées. Le système permet deréaliser des mesures optiques en champ proche ainsi que la détermination en hauterésolution de la phase du champ optique. L’échantillon SNG01 (l’un des réseaux utilisés pourcaractériser notre microscope à balayage en champ proche), ainsi que des disques optiques(CD, DVD and disques blu-ray) ont été utilisés pour tester la faisabilité et les performancesde notre système.Dans ce manuscrit de thèse, le graphène et les monocouches de MoS2 sont étudiés. Nous montrons qu’une épaisseur à l’échelle atomique peut être résolue par notresystème NSOI, avec l’utilisation de l’algorithme de suppression du bruit de mesure. Lesjoints de grain du graphène sont observés à grande échelle, via la technique d’imagerie parcollection en champ proche et par la réalisation de cartographies de phase. En particulier,les tensions internes à une couche de graphène sont observées, uniquement dans le casd’une imagerie de phase. / In this thesis, near-field scanning optical interferometry (NSOI), which combinesNSOM with interferometer, is proposed for the phase measurement. The shear-forcedetection scheme is applied for distance regulation. The hardware of the systemis constructed by combining various electronic devices, and the operating softwareis coded by LabVIEW. Unwanted background signal is removed by simple calculationbased on interference theory. By using this, the near-field optical measurementand the ultra-sensitive phase investigation of nano-materials are performed. 2D materialssuch as graphene and monolayer MoS2 are investigated. It is shown thatatomic-scale thickness can be resolved by the NSOI. Especially, the grain boundariesof graphene and the seed of MoS2 can be found by phase detection. In addition,direct laser writing (DLW) on silver-containing glass is observed by using NSOM,and NSOI. For the first time, the writing threshold is correlatively observed in thefluorescence imaging and the near-field phase image.