Thesis (Ph. D.)--University of Hong Kong, 2001. / Includes bibliographical references (leaves 95-100).

Thesis (M.S.)--West Virginia University, 2002. / Title from document title page. Document formatted into pages; contains xi, 105 p. : ill. Includes abstract. Includes bibliographical references (p. 100-105).

Thesis (M. Phil.)--University of Hong Kong, 2002. / Includes bibliographical references (leaves 75-77).

Mid-infrared lasers in the 3-5 µm range are important for wide variety of applications including trace gas sensing, infrared counter measures, free space optical communications, etc. GaSb-based type-I quantum well (QW) diode lasers are an attractive choice due to their relatively simple design and growth tolerances, as compared with quantum cascade lasers and interband cascade lasers. Excellent diode lasers have been demonstrated for wavelengths up to ~3.0 µm, employing GaInAsSb/AlGaAsSb QW active regions. But, device performance tends to degrade at longer wavelengths, due to Auger recombination and decreasing QW valence band offsets. In this work we look into the feasibility of using highly strained GaInAsSb/GaSb QWs as active regions for diode lasers operating at wavelengths beyond 3.0 µm. Heavy strain in the QW can improve valence band offset and also increase the splitting between the heavy and light hole bands which can help minimize Auger recombination. Through optimized molecular beam epitaxy (MBE) growth conditions we were able to incorporate up to 2.45 % compressive strain in these QWs enabling laser operation up to 3.4 µm at room temperature. An alternate path to extend the emission wavelength is to incorporate dilute quantities of nitrogen into the QW. Incorporating dilute quantities of substitutional nitrogen into traditional III-V’s strongly reduces the bandgap of the alloy. The advantage for the case of GaSb based dilute-nitrides is that the bandgap reduction is almost exclusively due to the lowering of the conduction band leaving the valence band offsets unaffected; thus providing a path to mitigating hole leakage while extending the emission wavelength. Although GaSb-based dilute-nitrides are a potentially elegant solution for extending the operating wavelength of GaSb-based type-I QW diode lasers, the luminescence efficiency of this material system has been relatively poor. This is most likely due to the presence of a high concentration of point defects, like nitrogen substitutional clusters. Through careful optimization of MBE growth conditions and post growth annealing, we demonstrate improved luminescence efficiency. With further optimization this material system can potentially extend the emission wavelength of GaSb-based type-I QW diode lasers even further into the mid-infrared spectrum. / text

published_or_final_version / Physics / Master / Master of Philosophy

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No description available.

Semiconductors represent the enabling technology that underpins the many advances that define modern society. One semiconductor that shows considerable promise in the fabrication of new devices is zinc oxide (ZnO). A fundamental understanding of the properties of a material is required in order to exploit its properties. The behaviour of dopants and defects relevant to optoelectronic device fabrication is of particular interest. However, acceptor doping of ZnO is currently controversial, as successful and reproducible acceptor doping has not yet been achieved. Acceptor doping of ZnO using silver (Ag) is explored in this thesis to contribute towards the understanding of defect introduction in ZnO. In addition, there is also increasing interest in exploring materials with unconventional properties, commonly referred to as metamaterials, particularly for optical applications. The previously unexplored unique combination of Ag and ZnO may enable the fabrication of those devices. Several key factors that affect heteroepitaxy film quality, and ultimately its properties, are buffer layers and substrate temperature. A lattice match between sapphire and ZnO was provided by using buffer layers of 1 nm magnesium oxide (MgO) and 7.9 nm low temperature ZnO. The highest quality film was grown at the highest temperature (800°C), with rms roughness of 2.9 nm, carrier concentration of 3.6x10¹⁶ cm⁻³, and mobility of 105 cm²/Vs. In contrast, dopant (Ag) incorporation occurs more readily below 600°C, with dopant incorporation of up to 1020 cm⁻³ measured. Ag manifests as a deep acceptor (up to 94% substitutionally on Zn lattice sites), as evident from decreasing carrier concentration with increasing Ag flux, and DLTS measurements indicating an acceptor trap at 319 meV. This suggests that Ag is suitable for introducing compensation in ZnO, but Ag acceptors are not sufficiently shallow to result in p-type material. However, the unique combination of ZnO and Ag also enables the fabrication of a novel device, namely a superlens. Initial experimental results show the possibility of imaging a 100 nm line as 132 nm, compared with the diffraction-limited resolution of 332 nm for the same line feature.

[Truncated abstract] Infrared radiation detectors find application in a wide range of military and civilian applications: for example, target identification, astronomy, atmospheric sensing and medical imaging. The greatest sensitivity, response speed, and wavelength range is offered by infrared detectors based on HgCdTe semiconductor material, the growth and characterisation of which is the subject of this thesis. Molecular Beam Epitaxy (MBE) is a versatile method of depositing layers of semiconductor material on a suitable crystalline substrate. In particular, MBE facilitates the growth of multilayer structures, thus allowing bandgap engineered devices to be realised. By modulating the bandgap within the device structure it is possible to improve the sensitivity or increase the operating temperature of photodetectors when compared to devices fabricated on single layer material. Furthermore, dual-band detectors may be fabricated using multi-layered HgCdTe material. The bulk of this thesis is concerned with the development of the MBE process for multilayer growth, from modelling of the growth process to characterisation of the material produced, and measurement of photoconductive devices fabricated on these wafers. In this thesis a previously published model of HgCdTe growth by MBE is reviewed in detail, and is applied to the growth of double layer heterostructures in order to determine the optimum method of changing the mole fraction between layers. The model has been used to predict the change in the temperature of the phase limit when the mole fraction and growth rate change suddenly as is the case during growth of an abrupt heterostructure. Two options for growth of an abrupt heterostructure were examined (a) modulating the CdTe flux and (b) modulating the Te flux. The change in the phase limit temperature between the layers was calculated as being 4:1±C for option (a) and 5:2±C for option (b) when growing a Hg(0:7)Cd(0:3)Te/Hg(0:56)Cd(0:44)Te heterostructure

Thesis (Ph. D.)--West Virginia University, 2007. / Title from document title page. Document formatted into pages; contains xvi, 145 p. : ill. (some col.). Includes abstract. Includes bibliographical references (p. 142-145).