<p> An investigation has been made of the microwave reflections from the surface of a semiconducting medium with complex permittivity (^ε = εrεo -jσ/ω) at the open end of an empty rectangular waveguide. The approximate and exact solutions of the reflection coefficients at the surfaces of both finite and semi-infinite media have been found as a function of the complex permittivity of the medium. The computations of the reflection coefficients are made at the 10 and 35 GHz ranges. Measurements, which confirm these calculations, have been performed with n-type germanium, selectron, and air at the open end of a rectangular waveguide using a reflection type microwave bridge. The investigation has shown that it is possible to devise a convenient method of measuring the conductivity and dielectric constant of semiconductors.</p> <p> The theory of operation of the microwave reflection bridge together with the setting-up (matching) procedure of a practical form of the bridge has been presented. A method is also described for the correction of the measurement error which arises from the scattering coefficients at the input ports of the precision attenuator.</p> <p> A theoretical and experimental study has also been made of the small- signal microwave conductivity of n-type germanium at room temperature in the presence of a high electric field, directed at an angle θ to the microwave field. The study has shown that at frequencies such as 10 GHz, the microwave conductivity becomes anisotropic with respect to the direction of the d.c. field vector. Measurements are made on an 11.4 ohm cm, n-type germanium sample at 9.381 GHz with applied electric fields up to 1.8 KV/cm for θ = 0°, 40°, and 90°. The ''open-end-waveguide measuring technique", which allows the angle between the microwave and d.c. field vectors to be varied, was employed to measure the microwave conductivity. The results of measurements which agree with predictions, confirm the feasibility of operation of a new microwave device based on the anisotropic effect.</p> / Thesis / Doctor of Philosophy (PhD)

<p> A method for the measurement of the microwave conductivity of a semiconductor subjected to a high electric field is described, which provides for varying angles between the microwave and applied electric field vectors. The results of measurements on 10 ohm-em. n-type germanium at 9.522 GHz with applied electric fields up to 3KV/cm are given. </p> <p> The measurements show that the microwave conductivity is controlled by the differential carrier mobility (∂V/∂E) for the condition of microwave and applied electric field vectors parallel. For the case of the fields at right angles the microwave conductivity is controlled by a carrier mobility intermediate between the d. c. mobility (v/B) and the differential mobility (∂V/∂E). </p> <p> Theoretical expressions for the performance of a proposed "Hot Electron Microwave Rotator" are developed. </p> / Thesis / Master of Engineering (MEngr)

<p> A number of microwave measuring techniques for the measurement of the complex permittivity (^ɛ = ɛo ɛr - j σ/ω) have been investigated and a new method based on the replacement of the narrow wall of a rectangular wave-guide by a block of semi-conductor has been developed. This technique is shown to be suitable for the measurement of σ when σ >> ωɛo ɛr and for the measurement of σ and ɛr for σ ≃ ωɛo ɛr. </p> <p> An investigation has been made of the propagation characteristics of a rectangular wave-guide containing a centrally placed slab of semi-conductor parallel to the narrow walls of the guide. A comparison of exact solutions for the propagation constant in such a structure with the approximate solutions normally used has shown that the conditions for the validity of the approximate solutions are much more stringent than has been reported previously. It is further shown that under certain conditions the structure offers a convenient method of measuring the conductivity of a semi-conductor. In addition, a theoretical and experimental investigation of the effects of the higher order modes excited at the interface of such a structure with an empty wave-guide has been made. The study has shown that under certain conditions, the effects of these modes can be significant.</p> <p> A theoretical and experimental study has also been made of the effects of temperature, frequency and doping on the complex permittivity of lightly doped n-type germanium. Measurements of these effects which have not been reported previously have been made over a temperature range 100°K - 500°K at frequencies 9.25 and 34.5 GHz and confirm the theoretical model used.</p> / Thesis / Doctor of Philosophy (PhD)

To ensure that photovoltaics contributes significantly to future world energy production, the cost per watt of producing solar cells needs to be drastically reduced. The use of n-type silicon wafers in conjunction with industrial print technology has the potential to lower the cost per watt of solar cells. The use of n-type silicon is expected to allow the use of cheaper Cz substrates, without a corresponding loss in device efficiency. Printed metallisation is well utilised by the PV industry due to its low cost, yet there are few examples of its application to n-type solar cells. This thesis explores the use of n-type Cz silicon with printed metallisation and diffusion from printed sources in creating industrially applicable solar cell structures. The thesis begins with an overview of existing n-type solar cell structures, previous printed thick film metallisation research and previous research into printed dopant sources. A study of printed thick-film metallisation for n-type solar cells is then presented, which details the fabrication of boron doped p-type emitters followed by a survey of thick film Ag, Al, and Ag/Al inks for making contact to a p-emitter layer. Drawbacks of the various inks include high contact resistance, low metal conductivity or both. A cofire regime for front and rear contacts is established and an optimal emitter selected. A study of printed dopant pastes is presented, with an objective to achieve selective, heavily doped regions under metal contacts without significantly compromising minority carrier lifetime in solar cells. It is found that heavily doped regions are achievable with both boron and phosphorus, but that only phosphorus paste was capable of post-processing lifetime compatible with good efficiencies. The effect of belt furnace processing on n-type silicon wafers is explored, with large losses in implied voltage observed due to contamination of Si wafers from transition metals present in the belt furnace. Due to exposure to chromium in the belt furnace, no significant advantage in using n-type wafers instead of p-type is observed during the belt furnace processing step. Finally, working solar cells with efficiencies up to 16.1% are fabricated utilising knowledge acquired in the earlier chapters. The solar cells are characterised using several new photoluminescence techniques, including photoluminescence with current extraction to measure the quality of metal contacts. The work in this thesis indicates that n-type printed silicon solar cell technology shows potential for good performance at low cost.

To ensure that photovoltaics contributes significantly to future world energy production, the cost per watt of producing solar cells needs to be drastically reduced. The use of n-type silicon wafers in conjunction with industrial print technology has the potential to lower the cost per watt of solar cells. The use of n-type silicon is expected to allow the use of cheaper Cz substrates, without a corresponding loss in device efficiency. Printed metallisation is well utilised by the PV industry due to its low cost, yet there are few examples of its application to n-type solar cells. This thesis explores the use of n-type Cz silicon with printed metallisation and diffusion from printed sources in creating industrially applicable solar cell structures. The thesis begins with an overview of existing n-type solar cell structures, previous printed thick film metallisation research and previous research into printed dopant sources. A study of printed thick-film metallisation for n-type solar cells is then presented, which details the fabrication of boron doped p-type emitters followed by a survey of thick film Ag, Al, and Ag/Al inks for making contact to a p-emitter layer. Drawbacks of the various inks include high contact resistance, low metal conductivity or both. A cofire regime for front and rear contacts is established and an optimal emitter selected. A study of printed dopant pastes is presented, with an objective to achieve selective, heavily doped regions under metal contacts without significantly compromising minority carrier lifetime in solar cells. It is found that heavily doped regions are achievable with both boron and phosphorus, but that only phosphorus paste was capable of post-processing lifetime compatible with good efficiencies. The effect of belt furnace processing on n-type silicon wafers is explored, with large losses in implied voltage observed due to contamination of Si wafers from transition metals present in the belt furnace. Due to exposure to chromium in the belt furnace, no significant advantage in using n-type wafers instead of p-type is observed during the belt furnace processing step. Finally, working solar cells with efficiencies up to 16.1% are fabricated utilising knowledge acquired in the earlier chapters. The solar cells are characterised using several new photoluminescence techniques, including photoluminescence with current extraction to measure the quality of metal contacts. The work in this thesis indicates that n-type printed silicon solar cell technology shows potential for good performance at low cost.

Diss. (sammanfattning) Stockholm : Karolinska institutet, 2005. / Härtill 4 uppsatser.

The history of silicon technology showed that controlled doping was a key step for the realization of e®ective, stable and reproducible devices. When the conduction type was no longer determined by impurities but could be controlled by doping, the breakthrough of classical microelectronics became possible. Unlike inorganic semiconductors, organic dyes are up to now usually prepared in a nominally undoped form. However, controlled and stable doping is desirable in many organic-based devices as well. If we succeed in shifting the Fermi level towards the transport states, this could reduce ohmic losses, ease carrier injection from contacts and increase the built-in potential of Schottky- or pn-junctions.

The history of silicon technology showed that controlled doping was a key step for the realization of e®ective, stable and reproducible devices. When the conduction type was no longer determined by impurities but could be controlled by doping, the breakthrough of classical microelectronics became possible. Unlike inorganic semiconductors, organic dyes are up to now usually prepared in a nominally undoped form. However, controlled and stable doping is desirable in many organic-based devices as well. If we succeed in shifting the Fermi level towards the transport states, this could reduce ohmic losses, ease carrier injection from contacts and increase the built-in potential of Schottky- or pn-junctions.

The semiconducting properties of a bithiophene-naphthalene diimide copolymer (PNDIT2) prepared by Ni-catalyzed chain-growth polycondensation (P1) and commercially available N2200 synthesized by Pd-catalyzed step-growth polycondensation were compared. Both polymers show similar electron mobility of [similar]0.2 cm2 V−1 s−1, as measured in top-gate OFETs with Au source/drain electrodes. It is noteworthy that the new synthesis has several technological advantages compared to traditional Stille polycondensation, as it proceeds rapidly at room temperature and does not involve toxic tin-based monomers. Furthermore, a step forward to fully printed polymeric devices was achieved. To this end, transistors with PEDOT:PSS source/drain electrodes were fabricated on plastic foils by means of mass printing technologies in a roll-to-roll printing press. Surface treatment of the printed electrodes with PEIE, which reduces the work function of PEDOT:PSS, was essential to lower the threshold voltage and achieve high electron mobility. Fully polymeric P1 and N2200-based OFETs achieved average linear and saturation FET mobilities of >0.08 cm2 V−1 s−1. Hence, the performance of n-type, plastic OFET devices prepared in ambient laboratory conditions approaches those achieved by more sophisticated and expensive technologies, utilizing gold electrodes and time/energy consuming thermal annealing and lithographic steps. / Dieser Beitrag ist aufgrund einer (DFG-geförderten) Allianz- bzw. Nationallizenz frei zugänglich.

Ce travail étudie le potentiel du silicium de type n purifié par voie métallurgique pour la fabrication de cellules photovoltaïques à bas coût. Les teneurs élevées en dopants conduisent à des gammes de résistivités larges et faibles, ainsi qu’à une diminution de la durée de vie des porteurs de charge.La fabrication de cellules photovoltaïques a permis d’obtenir des rendements de conversion variant de 13.7% à 15.0% sur 148.6cm². Avec un procédé de fabrication amélioré, des rendements de 16.0% pourraient être obtenus. La résistivité des plaquettes a été identifiée comme facteur limitant les performances des cellules. Le co-dopage au gallium a été proposé pour augmenter la gamme de résistivité.Les cellules photovoltaïques réalisées montrent une excellente stabilité sous illumination et de faibles coefficients en température de la tension de circuit-ouvert. Ces travaux de thèse ont permis de définir le potentiel du silicium de type n purifié par voie métallurgique et de définir les spécifications nécessaires initiales au niveau de la charge à purifier pour permettre la fabrication de cellules photovoltaïques efficaces. / This work studies the potential of n-type silicon purified via the metallurgical route for the fabrication of low cost photovoltaic cells. The high level of doping species leads to a large range of low resistivity, as well as reduced carriers’ lifetime. The fabrication of photovoltaic cells led to conversion efficiencies varying from 13.7% to 15.0% on 148.6 cm². With an improved fabrication process, efficiencies of 16.0% could be obtained. The resistivity has been identified as the limiting factor on the cells’ efficiency. Gallium co-doping has been proposed in order to increase the resistivity range.The fabricated photovoltaic cells show an excellent stability under illumination with weak temperature coefficients of the open circuit voltage. This PhD work led to the knowledge of the potential of n-type silicon purified via the metallurgical route, and to define the charge specifications required to the fabrication of efficient photovoltaic cells.