Der Einfluss der Modifikation der technologisch relevanten GaAs(100) Oberfläche durch Chalkogene, i.e. Selen, Schwefel und Tellur, wird in dieser Arbeit untersucht. Es wird ein Modell vorgestellt, das die Eigenschaften der modifizierten Oberfläche beschreibt. In einem zweiten Schritt werden die so modifizierten Oberflächen mit Metallen unterschiedlicher Reaktivität und verschiedenen Elektronegativitäten bedampft. Die Bandbreite dieser Eigenschaften wird durch die Metalle Indium und Silber, das Alkalimetall Natrium, das Erdalkalimetall Magnesium und das Halbmetall Antimon abgebildet. Die Untersuchung des Einflusses der Chalkogene auf die chemischen Eigenschaften und die Barrierenhöhe der Metall/GaAs(100) Grenzfläche bilden einen weiteren Schwerpunkt. Die Änderung der Barrierenhöhe wird dabei mit Hilfe des Modells metallinduzierter Bandlückenzustände (metal induced gap states) erklärt. Als experimentelle Techniken werden Photoemissionsspektroskopie, Raman Spektroskopie und Strom-Spannungsmessungen verwendet. / The influence of a modification of the technological relevant GaAs(100) surface by chalcogens, i.e. selenium, sulphur and tellurium, is evaluated in this work. A model is proposed, which describes the properties of the modified surface. In a second step metals of different reactivity and electronegativity have been evaporated onto these modified surfaces. Among these materials were the metals indium and silver, the alkali metal sodium, the earth alkali metal magnesium and the half metal antimony. The investigation of the influence of chalcogens on the chemical properties and the barrier height of the metal/GaAs(100) interface is another point of interest. The change in barrier height is explained by the model of metal induced gap states (MIGS). Photoemission spectroscopy, Raman spectroscopy and current-voltage-measurement have been used as experimental techniques.

This diploma thesis deals with evaluation of efficiency of protection conversion coatings created by passivation metals and alloys in passivation baths without chromium compounds. The theoretical part is initially concerned with question of electrochemical corrosion of metals, consequently there are mentioned different methods of corrosion protection. The main section of theoretical part of this thesis deals with chromate conversion coatings, description of their protective efficiency (including their unique self-healing effect) and then with account of new chromate-free conversion coatings occurring as chromate alternatives, whose usage is constrained because of their content of hexavalent chromium, which is highly toxic, oxidizing and also carcinogenic and thereby very dangerous for human body and the environment. Experimental part of this thesis is concerned with evaluation of efficiency of particular conversion coating which is quite commonly use in some applications as chromate alternative. It is chromate-free conversion coating which is created by passivation of metals or alloys in passivation bath Pragokor BP, which contains zirconium fluorocomplexes and is without any chromium or other toxic or ecologically unhealthy compounds. The influence of sealing of the coating in preparation Pragokor Seal Al and also other surface treatments such as application of conservation wax WAXENG or cold application of zinc coating were tested too. Efficiency of mentioned surface treatments was then evaluated on aluminum and steel by laboratory accelerated and atmospheric corrosion testing.

The thesis is focused on high temperature processes in crystalline solar cells production. Main topic is diffusion of traditional dopants phosphorus and boron. Diffusion processes for creating solar cells are different from classical diffusion in semiconductor industrial. It is reason why the thesis describes crated layers in detail. Knowledge of diffusion processes is used for creating bifacial solar cells and development of a new phosphorus emitter for conventional solar cells. Bifacial cells are a new type of cells. Developed new emitter increases efficiency and decreases cost of solar cells production. Another part the thesis is devoted to the prediction of diffusion processes. New models of phosphorus and boron diffusion for photovoltaic industrial are created in software SILVACO. Models correspond with real results.

<p>III-V nanowire (NW) ensemble devices were fabricated using novel approaches to address key NW optoelectronic issues concerning electrical contacts, doping, surface effects and underlying electrostatics physics.</p> <p>NWs were first embedded in a filling medium, thus achieving low sheet resistance front contacts while preventing shunts. Various filling materials were assessed for porosity, surface roughness and thermal stability, giving Cyclotene as an ideal filing material. Sonication was also introduced as a novel method to achieve perfect planarization.</p> <p>The presence of the Cyclotene also enabled the NWs to be characterized precisely and easily by secondary ion mass spectrometry (SIMS) to give the NW dopant concentration with excellent spatial resolution. Additionally, SIMS characterization demonstrated the ability to characterize the height uniformity of individual segments in a heterostructure NW ensemble.</p> <p>The focus of the work shifted towards surface effects on NW device performance. Therefore, Poisson's equation was solved to provide a comprehensive model of NW surface depletion as a function of interface state density, NW radius and doping density. Underlying physics was examined where surface depletion was found to significantly reduce the conductivity of thin NWs, leading to carrier inversion for some.</p> <p>This model was then applied in conjunction with a transport model to fit current-voltage curves of an AlInP-passivated GaAs NW ensemble device. A 55% decrease in surface state density was achieved upon passivation, corresponding to an impressive four order of magnitude increase in the effective carrier concentration. Additionally, conventional and time-resolved photoluminescence measurements showed intensity and carrier lifetime improvement greater than 20x upon passivation.</p> <p>Finally, the model was extended to describe radial pn junction NWs with surface depletion to give radial energy band profiles for any arbitrary set of NW parameters. Specific cases were analyzed to extract pertinent underlying physics, while the built-in potential was optimized for the design for an optimal device.</p> / Doctor of Philosophy (PhD)

Silizium (Si) wird für eine breite Palette von Anwendungen wie z.B. in Solarzellen, Mikroelektronik, Biochips und so weiter eingesetzt. In dieser Arbeit wurden neue Hybridsysteme aus Si und organischen Molekülen, bezüglich der Oberflächenpassivierung des Halbleiters und der resultierenden elektronischen Eigenschaften untersucht. Insbesondere wurden Methyl-Gruppen (CH3 und CD3), Ethynyl-Derivate (H−C≡C-, CH3−C≡C-, und C6H5−C≡C-), sowie Pyrrol und Thiophen aus Grignardlösungen untersucht. Bezüglich Stabilität und Defektkonzentration konnte gezeigt werden, dass organisch modifizierte Si-Oberflächen eine höhere Stabilität an Luft haben als Standard wasserstoffpassivierte Si-Oberflächen und dabei eine nur geringfügig höhere Defektkonzentration aufweisen. Untersuchungen mit Infrarot Spektroskopischer Ellipsometrie (IRSE) und Synchrotron Röntgen Photoemissions Spektroskopie (SXPS) zeigen, dass die Oxidationsrate für Oberflächen mit CH3-Terminierung stark reduziert ist. In der vorliegenden Arbeit gelang es erstmalig mittels IRSE die charakteristische „Umbrella“-Schwingungsmode zu beobachten und SXPS Messungen zeigten die Spin-Orbit-Aufspaltung der Si 2p Emission für CH3-passivierte Si-Oberflächen. Die CH3-Gruppen besitzen einen hohen Grad von Ordnung auf der Si(111)-Oberfläche. Das Aufbringen von Ethynyl-Derivaten führt zu extrem dünnen polymerisierten Schichten auf Si durch elektrochemische Radikaloxidation der C≡C Dreifachbindung. Diese Schichten sind homogen und haften sehr gut an der Si-Oberfläche. Weiterhin konnte gezeigt werden, dass die Abscheidung von Ethynyl-Derivaten vom Typ des Halogenatoms im Grignard-Precursor abhängig ist, wobei Br im Vergleich zu Cl zu geringeren Rekombinationsgeschwindigkeiten an der Polymer/Si-Grenzfläche führen. Eine Änderung der Austrittsarbeit von bis zu 0.5 eV und der Bandverbiegung von bis zu 0.24 eV wurde nach der Abscheidung dieser Moleküle gemessen. Diese elektronischen Eigenschaften hängen linear vom Oberflächendipol ab. / Organic functionalization of silicon (Si) surfaces has received a tremendous interest in the development of organic/semiconductor hetero-structures for plenty of potential applications from microelectronics, molecular electronics, photovoltaics to bio-applications. In this thesis, tailoring of the electronic properties and passivation properties of such organic hetero-structures have been investigated. Direct grafting of organic layers like methyl groups (CH3 and CD3), ethynyl derivatives (H−C≡C-, CH3−C≡C-, and C6H5−C≡C-), and heterocyclic molecules (pyrrole and thiophene) onto Si(111) surfaces have been performed in a one-step electrochemical process by anodic treatment in Grignard electrolytes. Organically modified Si surfaces show low interface recombination rates as measured by photoluminescence technique and reveal also a much better passivation with respect to stability in ambient air than H-terminated Si surfaces. Grafting of ethynyl derivatives and heterocyclic molecules lead to the formation of ultrathin polymeric layers, where the thickness depends on charge flow applied to the Si electrode, while methyl groups lead to a monolayer on Si(111) surfaces. Only a very small amount of oxidation states of Si has been observed by infrared spectroscopic ellipsometry (IRSE) and synchrotron X-ray photoemission spectroscopy (SXPS). For the first time, IRSE and SXPS measurements reveal the “umbrella” vibrational mode characteristic from methyl groups and a well-defined spin-orbit splitting of the Si 2p core level emission, respectively, in the case of methylated Si(111) surfaces. For all ethynyl derivatives, high-resolution SXPS investigations reveal the incorporation of halogen atoms in the organic layers obtained. Thereby, exchanging Br for Cl in the Grignard compound leads to lower interface recombination rates at the polymer/Si interface. A shift in work function and surface band bending of up to 0.5 and 0.24 eV has been observed, respectively. The electronic properties reveal a linear relation between the work function and the surface dipole.

Aufkonvertierende (upconverting; UC) Nanomaterialien bilden eine neue Klasse nichtlinearer lumineszenter Reporter, die nah-infrarotes (NIR) Anregungslicht in Photonen von höherer Energie umwandeln. Das effizienteste bekannte UC-System bildet hierbei β-NaYF4: 20%Yb(III), 2%Er(III) mikrokristallines Bulkmaterial, für welches UC-Quantenausbeuten (ΦUC) von 10 % berichtet werden, während ΦUC von Nanokristallen (nanocrystals; NC) um mehrere Größenordnungen niedriger sein können. Um die Effizienz von UC-Nanomaterialien zu erhöhen, werden NC üblicherweise mit inerten Schalen versehen. In dieser Arbeit werden mehrere verschiedene Bulkmaterialien spektroskopisch untersucht, um ein Vergleichsmaterial auszuwählen, das als Maßstab für alle folgenden, vergleichbaren Messungen an NC dient. Die Oberfläche von ultrakleinen (3.7±0.5) nm NC wird mit Schalen von bis zu 10 nm Dicke versehen, um die optimale Schalendicke für vollständige Oberflächenpassivierung zu identifizieren, allerdings weisen die Ergebnisse auf eine mögliche Kern-Schale-Durchmischung hin. In einer zweiten Studie werden die unterschiedlichen Dotanden, Er(III) und Yb(III), auf ihre optischen Eigenschaften sowie die Einflüsse von Energietransfer (ET) und von ihrer Umgebung spektroskopisch untersucht. Dabei kann klar zwischen Oberflächeneffekten und oberflächenunabhängigen Volumeneffekten unterschieden werden. Die Ergebnisse werden durch ein einfaches Monte-Carlo-Modell gestützt, durch das die größen- und leistungsdichte-(P-)abhängigen Populierungsdynamiken der strahlenden Banden von Er(III) vorhergesagt werden können. Zuletzt werden durch eine verbesserte Synthesemethode UCNC mit stark verbesserten Lumineszenzeigenschaften hergestellt, mit denen bei vergleichsweise niedrigen P die gleichen ΦUC wie beim Bulkmaterial erreicht werden. Dies liefert einen Einblick in vielfältige Anwendungsmöglichkeiten für UCNC. / Upconversion (UC) nanomaterials are an emerging new class of non-linear luminescent reporters which convert near-infrared (NIR) excitation light into higher-energy photons. The most efficient known UC material is the β-NaYF4: 20%Yb(III), 2%Er(III) bulk (microcrystalline) phosphor with reported UC quantum yields (ΦUC) of 10 %, while ΦUC of nanocrystals (NC) can be several orders of magnitude lower. Strategies to improve the efficiency of UC nanomaterials include surface passivation with inert shells. In this work, several different bulk materials are compared to select one benchmark material for comparisons with NC analyzed with the same measurement techniques. The surface of ultrasmall (3.7 ± 0.5) nm NC is coated with inert shells of up to 10 nm thickness to identify an optimal shell thickness for complete surface passivation, but the results suggest core-shell intermixing. To distinguish between the different dopant ions, Er(III) and Yb(III), and the effect of energy transfer (ET) in a second study, single- and co-doped UCNC are investigated spectroscopically and the influence of their environment is determined thoroughly. Herein, a clear distinction between surface-related and surface-independent, volume-related effects is achieved and the results are emphasized by the use of a simple random walk model which accurately predicts size- and power density (P)-dependent population dynamics of the emissive bands of Er(III). Finally, utilizing an improved synthesis technique, UCNC with enhanced luminescence properties are produced, reaching the same ΦUC as the benchmarked bulk material at reasonably low P, providing an insight into numerous possible applications of UCNC.

The deposition of boron oxide (B₂O₃) films on silicon substrates is of significant interest in microelectronics for ultrashallow doping applications. However, thickness control and conformality of such films has been an issue in high aspect ratio 3D structures which have long replaced traditional planar transistor architectures. B₂O₃ films are also unstable in atmosphere, requiring a suitable capping barrier for passivation. The growth of continuous, stoichiometric B₂O₃ and boron nitride (BN) films has been demonstrated in this dissertation using Atomic Layer Deposition (ALD) and enhanced ALD methods for doping and capping applications. Low temperature ALD of B₂O₃ was achieved using BCl₃/H₂O precursors at 300 K. In situ x-ray photoelectron spectroscopy (XPS) was used to assess the purity and stoichiometry of deposited films with a high reported growth rate of ~2.5 Å/cycle. Free-radical assisted ALD of B₂O₃ was also demonstrated using non-corrosive trimethyl borate (TMB) precursor, in conjunction with mixed O₂/O-radical effluent, at 300 K. The influence of O₂/O flux on TMB-saturated Si surface was investigated using in situ XPS, residual gas analysis mass spectrometer (RGA-MS) and ab initio molecular dynamics simulations (AIMD). Both low and high flux regimes were studied in order to understand the trade-off between ligand removal and B₂O₃ growth rate. Optimization of precursor flux was discovered to be imperative in plasma and radical-assisted ALD processes. BN was investigated as a novel capping barrier for B₂O₃ and B-Si-oxide films. A BN capping layer, deposited using BCl₃/NH₃ ALD at 600 K, demonstrated excellent stoichiometry and consistent growth rate (1.4 Å/cycle) on both films. Approximately 13 Å of BN was sufficient to protect ~13 Å of B₂O₃ and ~5 Å of B-Si-oxide from atmospheric moisture and prevent volatile boric acid formation. BN/B₂O₃/Si heterostructures are also stable at high temperatures (>1000 K) commonly used for dopant drive-in and activation. BN shows great promise in preventing upward boron diffusion which causes a loss in the dopant dose concentration in Si. The capping effects of BN were extended to electrochemical battery applications. ALD of BN was achieved on solid Li-garnet electrolytes using halide-free tris(dimethylamino)borane precursor, in conjunction with NH₃ at 723 K. Approximately 3 nm of BN cap successfully inhibited Li₂CO₃ formation, which is detrimental to Li-based electrolytes. BN capped Li-garnets demonstrated ambient stability for at least 2 months of storage in air as determined by XPS. BN also played a crucial role in stabilizing Li anode/electrolyte interface, which drastically reduced interfacial resistance to 18 Ω.cm², improved critical current density and demonstrated excellent capacitance retention of 98% over 100 cycles. This work established that ALD is key to achieving conformal growth of BN as a requirement for Li dendrite suppression, which in turn influences battery life and performance.

This thesis deals with the analysis of nano-structured layers deposited by high-frequency magnetron sputtering on the monocrystalline silicon surface. The content of the work focuses on the magnetron sputtering application as an alternative method for passivation and antireflection layers deposition of silicon solar cells. The procedure of pre-deposite silicon surface cleaning by plasma etching in the Ar/H2 gas mixture atmosphere is suggested. In the next step the silicon nitride and aluminum nitride layers with hydrogen content in Ar/N2/H2 gas mixture by magnetron sputtering are deposited. One part of the thesis describes an experimental pseudo-carbide films deposition from a silicon target in the atmosphere of acetylene (C2H2). An emphasis is placed on the research of sputtered layers properties and on the conditions on the silicon-layer interface with the help of the standard as well as special measurement methods. Sputtered layers structure is analyzed by modern X-ray spectroscopy (XPS) and by Fourier infrared spectroscopy (FTIR). Optical ellipsometry and spectrophotometry is used for the diagnostic of the layers optical properties depending upon the wavelength of incident light. A special method of determining the surface lay-out of the charge´s carrier life in the volume and on the surface of silicon is employed to investigate the passivating effects of the sputtered layers.

O trabalho realizado nesta tese esteve apoiado em dois objetivos principais. O primeiro centrado na otimização das etapas e processos de fabricação de células solares de silício de alto rendimento envolvendo redução de custos. O segundo objetivo foi direcionado na implementação de células solares eficientes e não dependentes do armadilhamento de impurezas através da difusão de alumínio. Para levar a cabo estes objetivos de forma planejada, o trabalho dividiu-se em otimizações teóricas e implementações experimentais. As otimizações teóricas foram realizadas utilizando dois programas: um programa desenvolvido (simulacell.pas) e implementado no próprio LME (versão 2), e o outro adquirido comercialmente, PC1D. De acordo com os resultados obtidos em estruturas completas n+p e n++n+p foi possível concluir que tanto as estruturas formadas através de emissores homogêneos como as obtidas utilizando emissores duplamente difundidos permitem alcançar eficiências elevadas, 25,5% a 26,0%, respectivamente, em um amplo intervalo de espessuras e concentrações superficiais de dopantes. No que tange aos desenvolvimentos experimentais, este trabalho se inicia com o desenvolvimento de um processo simplificado de baixo custo, em células solares de silício Cz de baixa resistividade com estrutura n+pp+, tipo \"mesa\". Este processo simplificado também está baseado na difusão de fósforo e alumínio (P/Al), utilizando gases industriais e reagentes químicos de grau \"para análise\", como uma transposição do processo de fabricação anteriormente desenvolvido no LME-EPUSP em substratos de silício FZ utilizando tecnologia planar. A célula solar mais representativa do processo implementado, A-16-1, permitiu atingir eficiências no entorno de 17%. As implementações experimentais visaram inicialmente o desenvolvimento de um procedimento visando à qualificação de materiais de partida (silício), utilizando a técnica de decaimento fotocondutivo (PCD) através de dois procedimentos de passivação de superfícies; oxidações térmicas e difusões suaves de fósforo. Posteriormente, utilizando o sistema PCD, novas otimizações dos emissores de tipo n+ homogêneos e regiões de tipo p foram realizadas, seguidos por oxidações térmicas passivadoras hidrogenadas, preservando-se o tempo de vida do volume em valores elevados (aproximadamente 1ms, após a realização de todas as etapas térmicas). Estes resultados qualificam o silício e os materiais de consumo utilizados, assim como, o novo processo de fabricação desenvolvido. Esta técnica também permitiu qualificar os emissores com perfil Gaussianos processados, atingindo valores da ordem de 45fA/cm2 para densidades de recombinação em estruturas n+pn+. Desenvolveram-se também estruturas n+p em materiais Cz de baixa resistividade 2-3W.cm de dois diferentes fabricantes, e silício FZ com 0,5W.cm. Pôde ser comprovada a qualidade das etapas que compõem o processo completo otimizado tendo-se obtido tensões de circuito aberto-implícitas de 652,4mV (Si-Cz fabricante 1) e 662,6mV (Si-Cz fabricante 2), e 670,8mV (FZ). De acordo com simulações realizadas utilizando parâmetros habituais de dispositivos do próprio LME, estas tensões, quando associadas a um conjunto óptico frontal típico das células solares de alto rendimento do LME (texturização química aleatória e filme de SiO2), permitirão atingir valores entre 19% - 20%. Entretanto, utilizando texturização e camada dupla torna-se plausível atingir o marco de 21% de rendimento, ultrapassando assim a barreira dos 17% (recorde nacional), e comprovando a potencialidade da infra-estrutura deste laboratório para o desenvolvimento de células solares não dependentes do efeito do armadilhamento de impurezas através da difusão de alumínio. / The work developed at this thesis has been based on two main objectives. First, it was focused on the optimization of the steps and processes for the fabrication of high efficiency solar cells, reducing production costs. The latter objective was directed to develop solar cells that were efficient and non-dependent on impurities gettering performed through the aluminum diffusion. In order to attend the planned objectives the work was divided into the theoretical objectives and experimental developments. The theoretical optimizations were performed using two different program codes: one was developed at LME (simulacell.pas), being upgraded afterwards (version 2); and the other was acquired commercially, the PC1D. According to the obtained results in complete structures n+p and n++n+p, it was possible to conclude that the homogeneous and double diffused emitter structures can provide high efficiencies, from 25,5% to 26,0%, respectively, for a wide range of thicknesses and surface doping levels. Concerning the experimental developments, this work starts with a low cost simplified process, using Cz silicon solar cells with low base resistivity and the structure n+pp+, \"mesa\" type. This simplified process was also based on the phosphorus/ aluminum diffusion (P/Al), using industrial gases and for analysis grade chemical reagents, as a fabrication process transposition of the process previously developed at LME-EPUSP using silicon substrates with planar technology. The most representative solar cells of the implemented process, A-16-1, provided about a 17% efficiency. The experimental implementations aimed the development of procedure for starting material (silicon) qualification, by using the photoconductive decay technique (PCD) with two surface passivation procedures: thermal oxidation and light phosphorus diffusion. Later, using PCD system, new optimizations of n+ homogeneous emitters and p-type region were performed, followed by passivating thermal oxidations with hydrogenation, maintaining the volume lifetime at high values (approximately 1ms, after each thermal step). These results qualified the used silicon and the consumer materials, as well the new fabrication process developed. This technique has also allowed qualifying the processed Gaussian profile emitters, providing values about 45fA/cm2 for the recombination current density in n+pp+ structures. N+p structures were also developed using Cz silicon with low resistivity 2- 3W.cm of two different manufacturers and FZ with 0.5W.cm. It could be proved the quality of the steps of a complete optimized process resulting implicit open circuit voltages of 652.4mV (Cz silicon - manufacturer type 1), 662.6mV (Cz silicon - manufacturer type 2), and 670.8mV (FZ silicon). According to the theoretical simulations performed using the usual parameters of devices processed at LME (random chemical texturization and SiO2 film), efficiencies between 19%-20% can be reached. However, using a random texturization and a double layer anti-reflection system, a 21% efficiency becomes possible, surpassing the 17% barrier (national record), and proving the potentiality of this laboratory facility for the development of solar cells non-dependent on impurity gettering through the aluminum diffusion.

O trabalho realizado nesta tese esteve apoiado em dois objetivos principais. O primeiro centrado na otimização das etapas e processos de fabricação de células solares de silício de alto rendimento envolvendo redução de custos. O segundo objetivo foi direcionado na implementação de células solares eficientes e não dependentes do armadilhamento de impurezas através da difusão de alumínio. Para levar a cabo estes objetivos de forma planejada, o trabalho dividiu-se em otimizações teóricas e implementações experimentais. As otimizações teóricas foram realizadas utilizando dois programas: um programa desenvolvido (simulacell.pas) e implementado no próprio LME (versão 2), e o outro adquirido comercialmente, PC1D. De acordo com os resultados obtidos em estruturas completas n+p e n++n+p foi possível concluir que tanto as estruturas formadas através de emissores homogêneos como as obtidas utilizando emissores duplamente difundidos permitem alcançar eficiências elevadas, 25,5% a 26,0%, respectivamente, em um amplo intervalo de espessuras e concentrações superficiais de dopantes. No que tange aos desenvolvimentos experimentais, este trabalho se inicia com o desenvolvimento de um processo simplificado de baixo custo, em células solares de silício Cz de baixa resistividade com estrutura n+pp+, tipo \"mesa\". Este processo simplificado também está baseado na difusão de fósforo e alumínio (P/Al), utilizando gases industriais e reagentes químicos de grau \"para análise\", como uma transposição do processo de fabricação anteriormente desenvolvido no LME-EPUSP em substratos de silício FZ utilizando tecnologia planar. A célula solar mais representativa do processo implementado, A-16-1, permitiu atingir eficiências no entorno de 17%. As implementações experimentais visaram inicialmente o desenvolvimento de um procedimento visando à qualificação de materiais de partida (silício), utilizando a técnica de decaimento fotocondutivo (PCD) através de dois procedimentos de passivação de superfícies; oxidações térmicas e difusões suaves de fósforo. Posteriormente, utilizando o sistema PCD, novas otimizações dos emissores de tipo n+ homogêneos e regiões de tipo p foram realizadas, seguidos por oxidações térmicas passivadoras hidrogenadas, preservando-se o tempo de vida do volume em valores elevados (aproximadamente 1ms, após a realização de todas as etapas térmicas). Estes resultados qualificam o silício e os materiais de consumo utilizados, assim como, o novo processo de fabricação desenvolvido. Esta técnica também permitiu qualificar os emissores com perfil Gaussianos processados, atingindo valores da ordem de 45fA/cm2 para densidades de recombinação em estruturas n+pn+. Desenvolveram-se também estruturas n+p em materiais Cz de baixa resistividade 2-3W.cm de dois diferentes fabricantes, e silício FZ com 0,5W.cm. Pôde ser comprovada a qualidade das etapas que compõem o processo completo otimizado tendo-se obtido tensões de circuito aberto-implícitas de 652,4mV (Si-Cz fabricante 1) e 662,6mV (Si-Cz fabricante 2), e 670,8mV (FZ). De acordo com simulações realizadas utilizando parâmetros habituais de dispositivos do próprio LME, estas tensões, quando associadas a um conjunto óptico frontal típico das células solares de alto rendimento do LME (texturização química aleatória e filme de SiO2), permitirão atingir valores entre 19% - 20%. Entretanto, utilizando texturização e camada dupla torna-se plausível atingir o marco de 21% de rendimento, ultrapassando assim a barreira dos 17% (recorde nacional), e comprovando a potencialidade da infra-estrutura deste laboratório para o desenvolvimento de células solares não dependentes do efeito do armadilhamento de impurezas através da difusão de alumínio. / The work developed at this thesis has been based on two main objectives. First, it was focused on the optimization of the steps and processes for the fabrication of high efficiency solar cells, reducing production costs. The latter objective was directed to develop solar cells that were efficient and non-dependent on impurities gettering performed through the aluminum diffusion. In order to attend the planned objectives the work was divided into the theoretical objectives and experimental developments. The theoretical optimizations were performed using two different program codes: one was developed at LME (simulacell.pas), being upgraded afterwards (version 2); and the other was acquired commercially, the PC1D. According to the obtained results in complete structures n+p and n++n+p, it was possible to conclude that the homogeneous and double diffused emitter structures can provide high efficiencies, from 25,5% to 26,0%, respectively, for a wide range of thicknesses and surface doping levels. Concerning the experimental developments, this work starts with a low cost simplified process, using Cz silicon solar cells with low base resistivity and the structure n+pp+, \"mesa\" type. This simplified process was also based on the phosphorus/ aluminum diffusion (P/Al), using industrial gases and for analysis grade chemical reagents, as a fabrication process transposition of the process previously developed at LME-EPUSP using silicon substrates with planar technology. The most representative solar cells of the implemented process, A-16-1, provided about a 17% efficiency. The experimental implementations aimed the development of procedure for starting material (silicon) qualification, by using the photoconductive decay technique (PCD) with two surface passivation procedures: thermal oxidation and light phosphorus diffusion. Later, using PCD system, new optimizations of n+ homogeneous emitters and p-type region were performed, followed by passivating thermal oxidations with hydrogenation, maintaining the volume lifetime at high values (approximately 1ms, after each thermal step). These results qualified the used silicon and the consumer materials, as well the new fabrication process developed. This technique has also allowed qualifying the processed Gaussian profile emitters, providing values about 45fA/cm2 for the recombination current density in n+pp+ structures. N+p structures were also developed using Cz silicon with low resistivity 2- 3W.cm of two different manufacturers and FZ with 0.5W.cm. It could be proved the quality of the steps of a complete optimized process resulting implicit open circuit voltages of 652.4mV (Cz silicon - manufacturer type 1), 662.6mV (Cz silicon - manufacturer type 2), and 670.8mV (FZ silicon). According to the theoretical simulations performed using the usual parameters of devices processed at LME (random chemical texturization and SiO2 film), efficiencies between 19%-20% can be reached. However, using a random texturization and a double layer anti-reflection system, a 21% efficiency becomes possible, surpassing the 17% barrier (national record), and proving the potentiality of this laboratory facility for the development of solar cells non-dependent on impurity gettering through the aluminum diffusion.