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Développement de techniques de patterning avancées pour les filières CMOS-sub 10nm / Development of advanced techniques for patterning sub-10 nm CMOS processesSarrazin, Aurélien 16 February 2017 (has links)
Pour les technologies CMOS sub-10 nm, l’industrie du semi-conducteur est confrontée aux limites de résolution de la lithographie conventionnelle. Différentes techniques alternatives ont été proposées afin de permettre l’obtention de motifs avec des dimensions de l’ordre de 20 nm. Dans cette thèse, nous nous sommes intéressés au « spacer patterning » et à l’autoassemblage dirigé des copolymères à blocs. Nous avons développé une intégration de « spacer patterning » permettant l’obtention de lignes de 20 nm de largeur. Une étude a été menée à partir des matériaux disponibles au CEA-LETI. Ainsi, nous avons étudié les différents enjeux de cette intégration pour les prochains nœuds technologiques. Pour l’auto-assemblage dirigé des copolymères à blocs (DSA), un des enjeux concerne la création d’un masque avec le retrait d’un polymère sélectivement à l’autre. Dans le cadre de notre étude sur le PS-b-PMMA, nous nous sommes intéressés au retrait du PMMA sélectivement au PS par gravure plasma. Des chimies par plasma permettant le retrait du PMMA sélectivement au PS pour des motifs cylindriques et lamellaires ont été développées. / For sub-10 nm CMOS technologies, the semiconductor industry is facing the limits of conventionnal lithography. Several alternative techniques have been proposed to allow 20 nm patterns. In this thesis, we have proposed to focus on spacer patterning technique and Directed Self-Assembly of block copolymers (DSA). We have developped a spacer patterning integration which allows to pattern 20 nm-wide lines. A study has been carried out with materials available at CEA-LETI. Thus, we have studied the different challenges induced by this integration for the following technologic nodes. Concerning Directed Self-Assembly of block copolymers (DSA) technique, one of the main challenge concerns the mask creation by removing a polymer selectively to another. For our study on PS-b-PMMA, we have studied PMMA removal selectively to PS by plasma etching. Plasma chemistries have been developed for removing PMMA selectively to PS on cylidrical and lamellar patterns.
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Identification and characterisation of the velcro locus of Drosophila melanogasterRing, Jennifer M. January 1993 (has links)
No description available.
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Analysis of gene expression during early development of the zebrafish, Brachydanio rerioBlader, Patrick January 1995 (has links)
No description available.
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The development of some aspects of early Athenian red figure pottery and their links with black figure conventionsBreckenridge, Hedda E. January 1997 (has links)
No description available.
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Inkjet printing for commercial high efficiency silicon solar cellsUtama, Roland Yudadibrata, Photovoltaics & Renewable Energy Engineering, Faculty of Engineering, UNSW January 2009 (has links)
One way of reducing the cost of crystalline silicon solar cell fabrication is by increasing the conversion efficiency of the device. However, most high efficiency solar cell designs require more complex fabrication methods that also increase the fabrication cost. Photolithography is an example of such an indispensable but costly process. The most common use for photolithography in solar cell fabrication is for dielectric patterning. In this thesis, inkjet printing is proposed as an alternative method for dielectric patterning in solar cell fabrication. There are two inkjet printing methods developed in this thesis. The indirect inkjet patterning method involves the deposition of a suitable plasticiser droplet onto an intermediate resin coating layer on top of the dielectric surface. Diethylene glycol and novolac resin are used as the plasticiser and coating layer respectively. The plasticiser changes the permeability of the affected region of the resin such that it becomes permeable to liquid dielectric etchants. When the resin layer is removed, the printed pattern is transferred to the dielectric layer. The optimised process produces round openings with diameters as small as 30-35 μm and continuous line patterns with width as narrow as 40-50 μm. The direct inkjet patterning method involves the deposition of liquid phosphorus dopant sources onto both silicon and dielectric surfaces. Two types of phosphorus sources are used: phosphoric acid and specially-formulated dopant sources. Narrow lines as wide as 15-20 μm are produced after appropriate surface treatments on both silicon and dielectric surfaces. Using this method, a process that simultaneously pattern the dielectric layer and diffuse the silicon underneath is developed. Various high efficiency solar cell structures such as selective emitter, localised contacts, surface texturing and edge isolation are demonstrated using the indirect inkjet patterning method. Both inkjet patterning methods are then used in the fabrication of a selective emitter solar cell. Fill factors in the range of 0.79-0.80 are shown to be achievable with both patterning methods, thus indicating the high quality metal-silicon contacts formed by these inkjet techniques.
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Human patterning and chronic painRapacz, Katherine Emily January 1991 (has links)
No description available.
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Micro et nano-patterning de polymères conducteurs pour des applications biomédicales / Micro- and nano-patterning of conducting polymers for biomedical applicationsElmahmoudy, Mohammed 16 October 2017 (has links)
La bioélectronique utilise des signaux électriques pour interagir avec des systèmes biologiques. Les capteurs qui permettent la lecture électrique de marqueurs de maladies importantes et les implants/stimulateurs utilisés pour la détection et le traitement d'activité cellulaire pathologique ne sont que quelques exemples de ce que cette technologie peut offrir. Du fait de leurs propriétés électro-actives et mécaniques fascinantes, l'électronique organique ou les matériaux conjugués π ont été largement exploités dans le domaine de la bioélectronique. Le mélange intéressant entre conductivité électronique et ionique de ces polymères conducteurs permet le couplage entre les charges électroniques présentent dans le volume des films organiques avec les flux ioniques du milieu biologique. Le matériau prototypique de la bioélectronique organique est le polymère conducteur poly(3,4-éthylènedioxythiophène) (PEDOT) dopé avec du polystyrène sulfonate (PSS). Dans ce rapport, nous étudierons une approche pour moduler les propriétés mécaniques, électriques et électrochimiques du PEDOT: PSS et étudier leur impact sur la performance des transistors électrochimiques organiques. Par ailleurs, nous évaluerons l'effet de la micro-structuration et du nano-patterning sur l'impédance électrochimique des électrodes en or recouvertes de PEDOT: PSS utiles pour de futurs enregistrements et stimulations neurales. Enfin, nous démontrerons l'utilisation du PEDOT:PSS à micro-motifs pour l'adhésion et la migration de cellules. / Bioelectronics uses electrical signals to interact with biological systems. Sensors that allow for electrical read-out of important disease markers, and implants/stimulators used for the detection and treatment of pathological cellular activity are only a few examples of what this technology can offer. Due to their intriguing electroactive and mechanical properties, organic electronics or π-conjugated materials have been extensively explored regarding their use in bioelectronics applications. The attractive mixed electronic/ionic conductivity feature of conducting polymers enables coupling between the electronic charges in the bulk of the organic films with ion fluxes in biological medium. The prototypical material of organic bioelectronics is the conducting polymer poly(3,4-ethylenedioxythiophene) (PEDOT) doped with polystyrene sulfonate (PSS). PEDOT:PSS is commercially available, water-dispersible conjugated polymer complex that can be cast into films of high hole and cation conductivity, good charge storage capacity, biocompatibility, and chemical stability. In the present work we investigate an approach to tailor the mechanical, electrical, and electrochemical properties of PEDOT:PSS and study their impact on the performance of organic electrochemical transistors. In addition, we study the effect of micro-structuring and nano-patterning on the electrochemical impedance of PEDOT:PSS- coated gold electrodes for future neural recordings and stimulation. Moreover we demonstrate the use of micro-patterned PEDOT:PSS in cell adhesion and migration.
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Embryonic roles for the slug regulatory gene in hindbrain regulation and limb patterningBuxton, Paul Graeme January 1997 (has links)
No description available.
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Anatomical and behavioural studies investigating the role of serotonin in feeding-related behavioursSmart, Paul Richard January 1999 (has links)
No description available.
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The role of retinoic acid in patterning the zebrafish hindbrain /Hernandez, Rafael Epitacio. January 2006 (has links)
Thesis (Ph. D.)--University of Washington, 2006. / Vita. Includes bibliographical references (leaves 153-179).
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