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This thesis deals with the analysis of nano-structured layers deposited by high-frequency magnetron sputtering on the monocrystalline silicon surface. The content of the work focuses on the magnetron sputtering application as an alternative method for passivation and antireflection layers deposition of silicon solar cells. The procedure of pre-deposite silicon surface cleaning by plasma etching in the Ar/H2 gas mixture atmosphere is suggested. In the next step the silicon nitride and aluminum nitride layers with hydrogen content in Ar/N2/H2 gas mixture by magnetron sputtering are deposited. One part of the thesis describes an experimental pseudo-carbide films deposition from a silicon target in the atmosphere of acetylene (C2H2). An emphasis is placed on the research of sputtered layers properties and on the conditions on the silicon-layer interface with the help of the standard as well as special measurement methods. Sputtered layers structure is analyzed by modern X-ray spectroscopy (XPS) and by Fourier infrared spectroscopy (FTIR). Optical ellipsometry and spectrophotometry is used for the diagnostic of the layers optical properties depending upon the wavelength of incident light. A special method of determining the surface lay-out of the charge´s carrier life in the volume and on the surface of silicon is employed to investigate the passivating effects of the sputtered layers.

O trabalho realizado nesta tese esteve apoiado em dois objetivos principais. O primeiro centrado na otimização das etapas e processos de fabricação de células solares de silício de alto rendimento envolvendo redução de custos. O segundo objetivo foi direcionado na implementação de células solares eficientes e não dependentes do armadilhamento de impurezas através da difusão de alumínio. Para levar a cabo estes objetivos de forma planejada, o trabalho dividiu-se em otimizações teóricas e implementações experimentais. As otimizações teóricas foram realizadas utilizando dois programas: um programa desenvolvido (simulacell.pas) e implementado no próprio LME (versão 2), e o outro adquirido comercialmente, PC1D. De acordo com os resultados obtidos em estruturas completas n+p e n++n+p foi possível concluir que tanto as estruturas formadas através de emissores homogêneos como as obtidas utilizando emissores duplamente difundidos permitem alcançar eficiências elevadas, 25,5% a 26,0%, respectivamente, em um amplo intervalo de espessuras e concentrações superficiais de dopantes. No que tange aos desenvolvimentos experimentais, este trabalho se inicia com o desenvolvimento de um processo simplificado de baixo custo, em células solares de silício Cz de baixa resistividade com estrutura n+pp+, tipo \"mesa\". Este processo simplificado também está baseado na difusão de fósforo e alumínio (P/Al), utilizando gases industriais e reagentes químicos de grau \"para análise\", como uma transposição do processo de fabricação anteriormente desenvolvido no LME-EPUSP em substratos de silício FZ utilizando tecnologia planar. A célula solar mais representativa do processo implementado, A-16-1, permitiu atingir eficiências no entorno de 17%. As implementações experimentais visaram inicialmente o desenvolvimento de um procedimento visando à qualificação de materiais de partida (silício), utilizando a técnica de decaimento fotocondutivo (PCD) através de dois procedimentos de passivação de superfícies; oxidações térmicas e difusões suaves de fósforo. Posteriormente, utilizando o sistema PCD, novas otimizações dos emissores de tipo n+ homogêneos e regiões de tipo p foram realizadas, seguidos por oxidações térmicas passivadoras hidrogenadas, preservando-se o tempo de vida do volume em valores elevados (aproximadamente 1ms, após a realização de todas as etapas térmicas). Estes resultados qualificam o silício e os materiais de consumo utilizados, assim como, o novo processo de fabricação desenvolvido. Esta técnica também permitiu qualificar os emissores com perfil Gaussianos processados, atingindo valores da ordem de 45fA/cm2 para densidades de recombinação em estruturas n+pn+. Desenvolveram-se também estruturas n+p em materiais Cz de baixa resistividade 2-3W.cm de dois diferentes fabricantes, e silício FZ com 0,5W.cm. Pôde ser comprovada a qualidade das etapas que compõem o processo completo otimizado tendo-se obtido tensões de circuito aberto-implícitas de 652,4mV (Si-Cz fabricante 1) e 662,6mV (Si-Cz fabricante 2), e 670,8mV (FZ). De acordo com simulações realizadas utilizando parâmetros habituais de dispositivos do próprio LME, estas tensões, quando associadas a um conjunto óptico frontal típico das células solares de alto rendimento do LME (texturização química aleatória e filme de SiO2), permitirão atingir valores entre 19% - 20%. Entretanto, utilizando texturização e camada dupla torna-se plausível atingir o marco de 21% de rendimento, ultrapassando assim a barreira dos 17% (recorde nacional), e comprovando a potencialidade da infra-estrutura deste laboratório para o desenvolvimento de células solares não dependentes do efeito do armadilhamento de impurezas através da difusão de alumínio. / The work developed at this thesis has been based on two main objectives. First, it was focused on the optimization of the steps and processes for the fabrication of high efficiency solar cells, reducing production costs. The latter objective was directed to develop solar cells that were efficient and non-dependent on impurities gettering performed through the aluminum diffusion. In order to attend the planned objectives the work was divided into the theoretical objectives and experimental developments. The theoretical optimizations were performed using two different program codes: one was developed at LME (simulacell.pas), being upgraded afterwards (version 2); and the other was acquired commercially, the PC1D. According to the obtained results in complete structures n+p and n++n+p, it was possible to conclude that the homogeneous and double diffused emitter structures can provide high efficiencies, from 25,5% to 26,0%, respectively, for a wide range of thicknesses and surface doping levels. Concerning the experimental developments, this work starts with a low cost simplified process, using Cz silicon solar cells with low base resistivity and the structure n+pp+, \"mesa\" type. This simplified process was also based on the phosphorus/ aluminum diffusion (P/Al), using industrial gases and for analysis grade chemical reagents, as a fabrication process transposition of the process previously developed at LME-EPUSP using silicon substrates with planar technology. The most representative solar cells of the implemented process, A-16-1, provided about a 17% efficiency. The experimental implementations aimed the development of procedure for starting material (silicon) qualification, by using the photoconductive decay technique (PCD) with two surface passivation procedures: thermal oxidation and light phosphorus diffusion. Later, using PCD system, new optimizations of n+ homogeneous emitters and p-type region were performed, followed by passivating thermal oxidations with hydrogenation, maintaining the volume lifetime at high values (approximately 1ms, after each thermal step). These results qualified the used silicon and the consumer materials, as well the new fabrication process developed. This technique has also allowed qualifying the processed Gaussian profile emitters, providing values about 45fA/cm2 for the recombination current density in n+pp+ structures. N+p structures were also developed using Cz silicon with low resistivity 2- 3W.cm of two different manufacturers and FZ with 0.5W.cm. It could be proved the quality of the steps of a complete optimized process resulting implicit open circuit voltages of 652.4mV (Cz silicon - manufacturer type 1), 662.6mV (Cz silicon - manufacturer type 2), and 670.8mV (FZ silicon). According to the theoretical simulations performed using the usual parameters of devices processed at LME (random chemical texturization and SiO2 film), efficiencies between 19%-20% can be reached. However, using a random texturization and a double layer anti-reflection system, a 21% efficiency becomes possible, surpassing the 17% barrier (national record), and proving the potentiality of this laboratory facility for the development of solar cells non-dependent on impurity gettering through the aluminum diffusion.

O trabalho realizado nesta tese esteve apoiado em dois objetivos principais. O primeiro centrado na otimização das etapas e processos de fabricação de células solares de silício de alto rendimento envolvendo redução de custos. O segundo objetivo foi direcionado na implementação de células solares eficientes e não dependentes do armadilhamento de impurezas através da difusão de alumínio. Para levar a cabo estes objetivos de forma planejada, o trabalho dividiu-se em otimizações teóricas e implementações experimentais. As otimizações teóricas foram realizadas utilizando dois programas: um programa desenvolvido (simulacell.pas) e implementado no próprio LME (versão 2), e o outro adquirido comercialmente, PC1D. De acordo com os resultados obtidos em estruturas completas n+p e n++n+p foi possível concluir que tanto as estruturas formadas através de emissores homogêneos como as obtidas utilizando emissores duplamente difundidos permitem alcançar eficiências elevadas, 25,5% a 26,0%, respectivamente, em um amplo intervalo de espessuras e concentrações superficiais de dopantes. No que tange aos desenvolvimentos experimentais, este trabalho se inicia com o desenvolvimento de um processo simplificado de baixo custo, em células solares de silício Cz de baixa resistividade com estrutura n+pp+, tipo \"mesa\". Este processo simplificado também está baseado na difusão de fósforo e alumínio (P/Al), utilizando gases industriais e reagentes químicos de grau \"para análise\", como uma transposição do processo de fabricação anteriormente desenvolvido no LME-EPUSP em substratos de silício FZ utilizando tecnologia planar. A célula solar mais representativa do processo implementado, A-16-1, permitiu atingir eficiências no entorno de 17%. As implementações experimentais visaram inicialmente o desenvolvimento de um procedimento visando à qualificação de materiais de partida (silício), utilizando a técnica de decaimento fotocondutivo (PCD) através de dois procedimentos de passivação de superfícies; oxidações térmicas e difusões suaves de fósforo. Posteriormente, utilizando o sistema PCD, novas otimizações dos emissores de tipo n+ homogêneos e regiões de tipo p foram realizadas, seguidos por oxidações térmicas passivadoras hidrogenadas, preservando-se o tempo de vida do volume em valores elevados (aproximadamente 1ms, após a realização de todas as etapas térmicas). Estes resultados qualificam o silício e os materiais de consumo utilizados, assim como, o novo processo de fabricação desenvolvido. Esta técnica também permitiu qualificar os emissores com perfil Gaussianos processados, atingindo valores da ordem de 45fA/cm2 para densidades de recombinação em estruturas n+pn+. Desenvolveram-se também estruturas n+p em materiais Cz de baixa resistividade 2-3W.cm de dois diferentes fabricantes, e silício FZ com 0,5W.cm. Pôde ser comprovada a qualidade das etapas que compõem o processo completo otimizado tendo-se obtido tensões de circuito aberto-implícitas de 652,4mV (Si-Cz fabricante 1) e 662,6mV (Si-Cz fabricante 2), e 670,8mV (FZ). De acordo com simulações realizadas utilizando parâmetros habituais de dispositivos do próprio LME, estas tensões, quando associadas a um conjunto óptico frontal típico das células solares de alto rendimento do LME (texturização química aleatória e filme de SiO2), permitirão atingir valores entre 19% - 20%. Entretanto, utilizando texturização e camada dupla torna-se plausível atingir o marco de 21% de rendimento, ultrapassando assim a barreira dos 17% (recorde nacional), e comprovando a potencialidade da infra-estrutura deste laboratório para o desenvolvimento de células solares não dependentes do efeito do armadilhamento de impurezas através da difusão de alumínio. / The work developed at this thesis has been based on two main objectives. First, it was focused on the optimization of the steps and processes for the fabrication of high efficiency solar cells, reducing production costs. The latter objective was directed to develop solar cells that were efficient and non-dependent on impurities gettering performed through the aluminum diffusion. In order to attend the planned objectives the work was divided into the theoretical objectives and experimental developments. The theoretical optimizations were performed using two different program codes: one was developed at LME (simulacell.pas), being upgraded afterwards (version 2); and the other was acquired commercially, the PC1D. According to the obtained results in complete structures n+p and n++n+p, it was possible to conclude that the homogeneous and double diffused emitter structures can provide high efficiencies, from 25,5% to 26,0%, respectively, for a wide range of thicknesses and surface doping levels. Concerning the experimental developments, this work starts with a low cost simplified process, using Cz silicon solar cells with low base resistivity and the structure n+pp+, \"mesa\" type. This simplified process was also based on the phosphorus/ aluminum diffusion (P/Al), using industrial gases and for analysis grade chemical reagents, as a fabrication process transposition of the process previously developed at LME-EPUSP using silicon substrates with planar technology. The most representative solar cells of the implemented process, A-16-1, provided about a 17% efficiency. The experimental implementations aimed the development of procedure for starting material (silicon) qualification, by using the photoconductive decay technique (PCD) with two surface passivation procedures: thermal oxidation and light phosphorus diffusion. Later, using PCD system, new optimizations of n+ homogeneous emitters and p-type region were performed, followed by passivating thermal oxidations with hydrogenation, maintaining the volume lifetime at high values (approximately 1ms, after each thermal step). These results qualified the used silicon and the consumer materials, as well the new fabrication process developed. This technique has also allowed qualifying the processed Gaussian profile emitters, providing values about 45fA/cm2 for the recombination current density in n+pp+ structures. N+p structures were also developed using Cz silicon with low resistivity 2- 3W.cm of two different manufacturers and FZ with 0.5W.cm. It could be proved the quality of the steps of a complete optimized process resulting implicit open circuit voltages of 652.4mV (Cz silicon - manufacturer type 1), 662.6mV (Cz silicon - manufacturer type 2), and 670.8mV (FZ silicon). According to the theoretical simulations performed using the usual parameters of devices processed at LME (random chemical texturization and SiO2 film), efficiencies between 19%-20% can be reached. However, using a random texturization and a double layer anti-reflection system, a 21% efficiency becomes possible, surpassing the 17% barrier (national record), and proving the potentiality of this laboratory facility for the development of solar cells non-dependent on impurity gettering through the aluminum diffusion.

No description available.

Emissions from airport operations are of significant concern because of their potential impact on local air quality and human health. The currently limited scientific knowledge of aircraft emissions is an important issue worldwide, when considering air pollution associated with airport operation, and this is especially so for ultrafine particles. This limited knowledge is due to scientific complexities associated with measuring aircraft emissions during normal operations on the ground. In particular this type of research has required the development of novel sampling techniques which must take into account aircraft plume dispersion and dilution as well as the various particle dynamics that can affect the measurements of the aircraft engine plume from an operational aircraft. In order to address this scientific problem, a novel mobile emission measurement method called the Plume Capture and Analysis System (PCAS), was developed and tested. The PCAS permits the capture and analysis of aircraft exhaust during ground level operations including landing, taxiing, takeoff and idle. The PCAS uses a sampling bag to temporarily store a sample, providing sufficient time to utilize sensitive but slow instrumental techniques to be employed to measure gas and particle emissions simultaneously and to record detailed particle size distributions. The challenges in relation to the development of the technique include complexities associated with the assessment of the various particle loss and deposition mechanisms which are active during storage in the PCAS. Laboratory based assessment of the method showed that the bag sampling technique can be used to accurately measure particle emissions (e.g. particle number, mass and size distribution) from a moving aircraft or vehicle. Further assessment of the sensitivity of PCAS results to distance from the source and plume concentration was conducted in the airfield with taxiing aircraft. The results showed that the PCAS is a robust method capable of capturing the plume in only 10 seconds. The PCAS is able to account for aircraft plume dispersion and dilution at distances of 60 to 180 meters downwind of moving a aircraft along with particle deposition loss mechanisms during the measurements. Characterization of the plume in terms of particle number, mass (PM2.5), gaseous emissions and particle size distribution takes only 5 minutes allowing large numbers of tests to be completed in a short time. The results were broadly consistent and compared well with the available data. Comprehensive measurements and analyses of the aircraft plumes during various modes of the landing and takeoff (LTO) cycle (e.g. idle, taxi, landing and takeoff) were conducted at Brisbane Airport (BNE). Gaseous (NOx, CO2) emission factors, particle number and mass (PM2.5) emission factors and size distributions were determined for a range of Boeing and Airbus aircraft, as a function of aircraft type and engine thrust level. The scientific complexities including the analysis of the often multimodal particle size distributions to describe the contributions of different particle source processes during the various stages of aircraft operation were addressed through comprehensive data analysis and interpretation. The measurement results were used to develop an inventory of aircraft emissions at BNE, including all modes of the aircraft LTO cycle and ground running procedures (GRP). Measurements of the actual duration of aircraft activity in each mode of operation (time-in-mode) and compiling a comprehensive matrix of gas and particle emission rates as a function of aircraft type and engine thrust level for real world situations was crucial for developing the inventory. The significance of the resulting matrix of emission rates in this study lies in the estimate it provides of the annual particle emissions due to aircraft operations, especially in terms of particle number. In summary, this PhD thesis presents for the first time a comprehensive study of the particle and NOx emission factors and rates along with the particle size distributions from aircraft operations and provides a basis for estimating such emissions at other airports. This is a significant addition to the scientific knowledge in terms of particle emissions from aircraft operations, since the standard particle number emissions rates are not currently available for aircraft activities.

The presented thesis deals with the design of the product for intelligent control system for GILD. The first part of the diploma thesis contains a brief summary of the intelligent control system. The thesis is designed schematic diagram of the product, it is also designed printed circuit board according to the product requirements. An integral part of the diploma thesis is the design and implementation of the service algorithm for the product.

L'activació sostinguda de Hog1 porta a una inhibició del creixement cel·lular. En aquest treball, hem observat que el fenotip de letalitat causat per l'activació sostinguda de Hog1 és parcialment inhibida per la mutació del complexe SCFCDC4. La inhibició de la mort causada per l'activació sostinguda de Hog1 depèn de la via d'extensió de la vida. Quan Hog1 s'activa de manera sostinguda, la mutació al complexe SCFCDC4 fa que augmenti l'expressió gènica depenent de Msn2 i Msn4 que condueix a una sobreexpressió del gen PNC1 i a una hiperactivació de la deacetilassa Sir2. La hiperactivació de Sir2 és capaç d'inhibir la mort causada per l'activació sostinguda de Hog1. També hem observat que la mort cel·lular causada per l'activació sostinguda de Hog1 és deguda a una inducció d'apoptosi. L'apoptosi induïda per Hog1 és inhibida per la mutació al complexe SCFCDC4. Per tant, la via d'extensió de la vida és capaç de prevenir l'apoptosi a través d'un mecanisme desconegut. / Sustained Hog1 activation leads to an inhibition of cell growth. In this work, we have observed that the lethal phenotype caused by sustained Hog1 activation is prevented by SCFCDC4 mutants. The prevention of Hog1-induced cell death by SCFCDC4 mutation depends on the lifespan extension pathway. Upon sustained Hog1 activation, SCFCDC4 mutation increases Msn2 and Msn4 dependent gene expression that leads to a PNC1 overexpression and a Sir2 deacetylase hyperactivation. Then, hyperactivation of Sir2 is able to prevent cell death caused by sustained Hog1 activation. We have also observed that cell death upon sustained Hog1 activation is due to an induction of apoptosis. The apoptosis induced by Hog1 is decreased by SCFCDC4 mutation. Therefore, lifespan extension pathway is able to prevent apoptosis by an unknown mechanism.