The aim of this thesis is a study of processes during organosilicone thin film deposition via plasma polymerization. Recently, thin films are the most expanding way of surface modification of materials. They are used as protective coatings, functional layers, they can increase or decrease adhesion to different compounds (e.g. water), or just improve mechanical properties of bulk materials. Plasma polymers, which are not known so long, are a modern trend in evolution of thin film deposition. They have perfect adhesion to the substrate and they are highly resistant against most of chemical compounds. Their structure is quite different from the structure of classical polymers. Recently, organosilicon compounds are used as precursors for plasma polymers because silicon built in the structure of plasma polymer allows thin film deposition on glass substrate and the organic part of monomer gives us infinite possibilities of modification. In our case dimethylphenylsilane (DMPS) was used as a monomer. Various RF low pressure discharges were used during this study. Plasma diagnostic was performed by optical emission spectroscopy of inductive coupled plasma. This method allows us to determine plasma composition during the deposition process. Thus we can predict the composition of deposited thin film according to input parameters. From relative populations of fragments we are able to find out optimal conditions for deposition process. We can also calculate temperature of particles in plasma which gives us some information about particle energies. The first part of the study deals with the identification of particles (fragments) created by fragmentation of monomer in plasma environment. We successfully identified hydrogen atomic lines of Balmer’s series in the spectra. Many rotational lines of hydrogen molecule were also detected. Atomic carbon occurred only in small amount. Much more carbon was detected in the form of CH radical. We also found some weak lines connected to atomic silicon. When we used a mixture of DMPS and oxygen, OH radical and O2+ were present in spectra. Next, optimal settings of deposition were determined for particular fragments from relative intensities of these fragments in optical emission spectra. Using this information we are able to set up the process to deposit thin films of desired composition and properties. We calculated electron temperature from intensities of hydrogen lines in Balmer’s series. Rotational temperature was obtained from CH radical intensity. Unfortunately, there was no convenient radical from which intensity we would be able to calculate vibrational temperature. All results and information obtained during the research can be used in industrial plasma polymerization processes and development of new coatings and functional thin films. Other studies on DMPS or similar monomer may also be realized to get more knowledge about processes in plasma and this thesis could serve as a basis for further research. Moreover, this study is a part of an international project. The aim of this project is to study processes during plasma polymerization both theoretically and practically. Once finished, the project and its results will be presented in scientific literature and at international conferences.

No description available.

Ablation controlled electrothermal (ET) plasma discharge devices consist of a small diameter capillary through which a large amount of energy is discharged. The high energy in the discharge ablates an inner sleeve material, ionizes the material, and a high energy-density plasma jet accelerates out the open end. ET devices can find applications in internal combustion engines, Tokamak fusion fueling and stabilization, hypervelocity launchers, and propulsion. The ballistic properties of an ET device are highly dependent on the propellant and ablated material. A useful noninvasive technique to characterize a propellant in these types of devices is spectroscopy. The purpose of this study is to design and conduct experiments on the ET facility called PIPE to verify results and assumptions in the ETFLOW simulation code as well as resolve data collection issues such as equipment triggering as spectrometer saturation. Experiments are carried out using an Ocean Optics LIBS2500plus high resolution spectrometer and a Photron FASTCAM SA4 high speed camera. Electron plasma temperatures are estimated using copper peaks in the UV region with the relative line intensity method, and electron plasma density is estimated by measuring the full width at half maximum (FWHM) of the stark broadened H--β line at 486 nm. Electron temperatures between 0.19 eV and 0.49 eV, and electron densities between 4.68*1022 m-3 and 5.75*10²² m⁻³ were measured in the expanding plasma jet about an inch outside the source with values as expected for this region. Velocity measurements of PIPE match well with simulations at around 5333 m/s. This study concluded that the assumption that the propellant Lexan is completely dissociated is a valid assumption, and that the ETFLOW results for electron temperature, density, and bulk plasma velocity match experimental values. / Master of Science

No description available.

"The ablative Teflon pulsed plasma thruster (PPT) is an onboard electromagnetic propulsion enabling technology for small spacecraft missions. The integration of PPTs onboard spacecraft requires the understanding and evaluation of possible thruster/spacecraft interactions. To aid in this effort the work presented in this thesis is directed towards the development and application of Langmuir probe techniques for use in the plume of PPTs. Double and triple Langmuir probes were developed and used to measure electron temperature and density of the PPT plume. The PPT used in this thesis was a laboratory model parallel plate ablative Teflon® PPT similar in size to the Earth Observing (EO-1) PPT operating in discharge energies between 5 and 40 Joules. The triple Langmuir probe was operated in the current-mode technique that requires biasing all three electrodes and measuring the resulting probe currents. This new implementation differs from the traditional voltage-mode technique that keeps one probe floating and requires a voltage measurement that is often susceptible to noise in the fluctuating PPT plume environment. The triple Langmuir probe theory developed in this work incorporates Laframboise’s current collection model for Debye length to probe radius ratios less than 100 in order to account for sheath expansion effects on ion collection, and incorporates the thin-sheath current collection model for Debye length to probe radius ratios greater than 100. Error analysis of the non-linear system of current collection equations that describe the operation of the current-mode triple Langmuir probe is performed as well. Measurements were taken at three radial locations, 5, 10, and 15 cm from the Teflon® surface of the PPT and at angles of 20 and 40 degrees to either side of the thruster centerline as well as at the centerline. These measurements were taken on two orthogonal planes, parallel and perpendicular to the PPT electrodes. A data-processing software was developed and implements the current-mode triple Langmuir probe theory and associated error analysis. Results show the time evolution of the electron temperature and density. Characteristic to all the data is the presence of hot electrons of approximately 5 to 10 eV at the beginning of the pulse, occurring near the peak of the discharge current. The electron temperature quickly drops off from its peak values to 1-2 eV for the remainder of the pulse. Peak electron densities occur after the peak temperatures. The maximum electron density values on the centerline of the plume of a laboratory PPT 10 cm from the Teflon® surface are 6.6x10^19 +/- 1.3x10^19 m^-3 for the 5 J PPT, 7.2x10^20 +/- 1.4x10^20 m^-3 for the 20 J PPT, and 1.2x10^21 +/- 2.7x10^20 m^-3 for the 40 J PPT. Results from the double Langmuir probe taken at r=10 cm, theta perpendicular=70 degrees and 90 degrees of a laboratory PPT showed good agreement with the triple probe method."

Methods of temperature measurement by mass spectrometry have been critically reviewed. It was concluded that the most appropriate method depended critically on the availability of fundamental data, hence a database of fundamental spectroscopic constants, for diatomic ions which cause interferences in ICP-MS, was compiled. The equilibration temperature, calculated using the different methods and using various diatomic ions as the thermometric probes, was between c.a. 400 - 10,000 K in the central channel, and between c.a. 600 - 16,000 K when the plasma was moved 1.8 mm off-centre. The wide range in temperature reflected the range of temperature measurement methods and uncertainty in the fundamental data. Optical studies using a fibre optic connected to a monochromator were performed in order to investigate the presence of interferences both in the plasma and the interface region of the ICP-MS, and the influence of a shielded torch on these interferences. It was possible to determine the presence of some species in the plasma, such as the strongly bound metal oxides, however, no species other than OH were detected in the interface region of the ICP-MS. The OH rotational temperature within the interface region of the ICP-MS was calculated to be between 2,000 - 4,000 K. The effect of sampling depth, operating power, radial position and solvent loading, with and without the shielded torch, on the dissociation temperature of a variety of polyatomic interferences was investigated. These calculated temperatures were then used to elucidate the site of formation for different polyatomic interferences. Results confirmed that strongly bound ions such as MO+ were formed in the plasma, whereas weakly bound ions such as ArO+ were formed in the interface region due to gross deviation of the calculated temperatures from those expected for a system in thermal equilibrium.

L'industrie de la microélectronique s'appuie sur l'évolution constante de la miniaturisation des transistors. D'ici 2016, cette industrie atteindra le nœud technologique 16 nm dans lequel il faudra être capable de graver des structures de dimensions nanométrique ayant de très forts facteurs d'aspect. Cependant, les procédés de gravure actuels montrent de sérieuses limitations en termes de contrôle des profils et des dimensions critiques lorsqu'il faut graver de telles structures. Les problèmes rencontrés sont liés d'une part à des limitations intrinsèques des procédés plasmas et d'autre part à l'apparition de nouveaux phénomènes lorsque la dimension des structures à graver devient nanométrique. Dans le cadre de cette thèse, un nouveau mode de fonctionnement des sources à plasma est étudié pour développer des procédés de gravure adaptés aux prochaines générations de circuits intégrés : les plasmas modulés en impulsions courtes. Les premiers travaux réalisés s'appuient sur de puissantes techniques d'analyses du plasma (spectroscopie d'absorption VUV, sonde de flux ionique, analyseur électrostatique) dans le but de mettre en évidence l'impact des paramètres de la modulation en impulsion du plasma sur ses caractéristiques physicochimiques (flux et énergie des radicaux et des ions). Ces diagnostics ont tout d'abord permis de définir très clairement les conséquences de la modulation en impulsion du plasma sur les flux de radicaux réactifs qui bombardent le substrat : le rapport de cycle est LE paramètre clé pour contrôler la chimie du plasma car il permet de contrôler le taux de fragmentation du gaz par impact électronique. Dans un second temps, nous avons également démontré que dans les plasmas électronégatifs et pour une puissance RF de polarisation donnée, l'énergie des ions augmente lorsque le rapport de cycle diminue. Fort de ces connaissances fondamentales sur les plasmas, des analyses des surfaces (XPS, MEB, Raman…) ont permis de comprendre les mécanismes mis en jeux lors de l'interaction plasma- surface. Ainsi, il a été possible de développer des procédés de gravure pulsés pour plusieurs étapes de la grille de transistor (prétraitement HBr, gravure du Si-ARC, gravure du pSi). Les prétraitements HBr sont incontournables pour réduire la rugosité de bord de ligne de transistor. Lors de cette étape, une couche riche en carbone limite l'effet bénéfique des UV du plasma sur la diminution de la rugosité. Grâce à l'utilisation des plasmas pulsés, l'origine de cette couche a été mise en évidence : elle résulte du dépôt sur les motifs d'espèces carbonées non volatiles issues de la photolyse de la résine qui sont relâchées dans le plasma. Dans ce système bicouche, les contraintes de la couche carbonée dure vont se relaxer dans le volume mou de la résine par phénomène de « buckling » qui se traduit par une hausse de la rugosité de bord de ligne. Nous avons montré que cela peut être évité en minimisant l'épaisseur de cette couche, ce qui peut être obtenu notamment en pulsant le plasma. La gravure de la couche anti-réflective Si-ARC qui sert de masque dur et celle de la grille en poly Silicium reposent sur l'utilisation de plasmas fluorocarbonés. Mais dans ce type de plasma, la production de précurseurs pour la polymérisation est diminuée quand le plasma est pulsé, conduisant à une perte de sélectivité et d'anisotropie. Les plasmas synchronisés pulsés ne sont donc pas de bons candidats pour les étapes de gravure considérées. Pour pallier à ce problème, un autre mode de polarisation a été étudié : les plasmas pour lesquels seule la puissance de polarisation est pulsée. Dans le cas de la gravure du Si-ARC, il est possible d'obtenir des profils très anisotropes avec une sélectivité vis-à-vis de la résine nettement améliorée. Pour la gravure du Silicium, les effets d'ARDE ont pu être diminués tout en améliorant la sélectivité. Ces résultats sont très encourageants. / Microelectronics industry is based on the continuous transistor downscaling. By the year 2016, the 16nm technological node would be achieved, so that structures with nanometric dimensions and high aspect ratio would have to be etch. However, traditional etching processes shows major limitations in terms of pattern profiles control and critical dimensions when such structures have to be etch. The encountered problems are related directly to intrinsic limitations of plasmas processes but also to the emergence of new phenomena’s when the dimensions of structures to etch become nanometric. In the framework of this thesis, a new strategy to produce plasma has been evaluated to develop etching plasmas processes adapted to next integration circuit generations: the pulsed plasmas. Over a first phase, the impact of plasma pulsing parameters (frequency and duty cycle) on the plasma physico-chemical characteristics has been highlight. This has been achievable thanks to advanced plasma analyse techniques (VUV broad band absorption spectroscopy, ion flux probe, retarding electrical field analyser…) developed to allow time resolved measurements. For the neutral flux, diagnostics have revealed that duty cycle is THE key control knob to tune the plasma. Indeed, a low duty cycle leads to reduced parent gas fragmentation and thus a reduced chemical reactivity. On the other hand, in electronegative plasmas and for constant RF power, we have demonstrated that ion energy is considerably increased when the ions flux is decreased (i.e. when the duty cycle is decreased). Then, surface analyses (XPS, SEM, Raman spectroscopy…) brought out the mechanisms involved during the plasma-surface interaction. Deeper comprehension of impact of pulsing parameters enables to develop pulsed plasmas processes more easily. These works are focused on the top of the transistor gate and deal with the following steps: HBr cure, Si-ARC etching, poly-silicon etching. HBr cure is an essential pre-treatment of the 193 nm photoresist to decrease the Line Width Roughness (LWR) of transistor gate. During this step, a carbon rich layer is formed on the surface of the resist pattern and degrades the beneficial action of UV plasma light on LWR reduction. Thanks to use of pulsed plasmas, the origin of this carbon rich layer has been highlight: UV induced modifications in polymer bulk lead to outgassing of volatiles carbon-based products in the plasma. These carbon containing moieties are fragmented by electron impact dissociation reaction in the plasma, which create sticking carbon based precursors available for re-deposition on the resist patterns. The impact of this layer on the LWR and resist pattern reflow is studied, and a possible mechanical origin (i.e. buckling instabilities) is highlighted. Finally, we showed that the use of pulsed HBr curing plasma allows to reduce and control the thickness of the graphite-like layer and to obtain LWR reduction that are comparable to VUV treatment only. The Si-ARC layer, used as hard mask, and the poly-silicon gate etching are based on the use of fluorocarbon plasmas. However, in these plasmas, the production of radicals enable for the polymerisation is decreased when the duty cycle is reduced. It leads to loss of both anisotropy and selectivity. Synchronised pulsed plasmas are then not adapted to such etching processes. To overcome this problem, a new way to produce plasma has been studied: the ICP source power is maintained constant and only the bias power is pulsed. Regarding Si-ARC etching, very anisotropic profiles are obtained and the Si-ARC to resist selectivity is enhanced while pulsing the rf bias to the wafer. In the case of poly-silicon etching, the ARDE effects are significantly reduced while the selectivity regarding the oxide is improved. These results are very promising for the development of polymerising plasmas processes.

Orientadores: Jayr de Amorim Filho, Marco Aurélio Pinheiro de Lima / Tese (doutorado) - Universidade Estadual de Campinas, Instituto de Física Gleb Wataghin / Made available in DSpace on 2018-08-24T21:57:52Z (GMT). No. of bitstreams: 1 Ridenti_MarcoAntonio_D.pdf: 6265448 bytes, checksum: 384897ffe1b8b10a23a0ab7c3b206b76 (MD5) Previous issue date: 2014 / Resumo: Neste trabalho plasmas não térmicos gerados em pressão atmosférica e sustentados por ondas de superfície em micro-ondas, tendo o argônio como gás de alimentação, foram estudados experimentalmente e teoricamente tendo em vista aspectos pouco compreendidos de suas propriedades físicas e aplicações voltadas ao tratamento de biomassa. Medições da composição elementar e dos parâmetros físicos foram realizados por meio de técnicas de diagnóstico baseadas em espectrometria de massa e espectroscopia óptica de emissão. O sistema físico foi modelado por meio das equações de continuidade das espécies neutras e carregadas, da equação do calor e da equação de Boltzmann dos elétrons, que foram acopladas utilizando um procedimento auto-consistente. Uma vez obtido o quadro geral das propriedades do plasma, foi estabelecida a condição de operação adequada ao tratamento das amostras derivadas de biomassa. O tratamento foi realizado sobre quatro tipo de amostras: lignina, xilana, celulose e bagaço de cana-de-açúcar. Dentre as contribuições importantes deste trabalho podem ser destacadas: (i) a verificação experimental do papel dos íons moleculares do argônio no processo de contração da descarga; (ii) a determinação do perfil axial no plasma dos principais íon positivos e negativos, da densidade e temperatura eletrônicas, da temperatura do gás e da densidade do estado metaestável Ar(1s5); (iii) verificação da seletividade do tratamento a plasma, tendo sido observada uma alteração significativa dos espectros de absorção no infravermelho nos casos da lignina e da xilana, mas não no caso da celulose. Esse último resultado sugere uma rota inusitada para novas tecnologias de deslignificação e síntese de novos materiais a partir de biomassa / Abstract: In this work non-thermal argon plasmas produced at atmospheric pressure and sustained by microwave surface waves were theoretically and experimentally studied in view of their non understood aspects and also the applications aimed at biomass treatment. Measurements of elemental composition and physical parameters were carried by means of plasma diagnostic techniques such as mass spectrometry and optical emission spectroscopy. Plasma modelling based on the self-consistent solution of the continuity equations of the neutral and charged species, the heat equation and the electron Boltzmann equation was developed to describe the plasma properties. Once a complete picture of the plasma behaviour was obtained, a promising condition for plasma treatment was established. Four types of biomass derived material were plasma treated: lignin, cellulose, xylan and sugarcane bagasse. Among the important contributions of this work one may highlight the following: (i) the experimental verification of the crucial role of argon molecular ions in the discharge contraction; (ii) axial profile determination of the main positive and negative ions, the electronic temperature and density, the gas temperature and the metastable state Ar(1s5) density; (iii) important modification of the infrared absorption spectra after plasma treatment in the cases of lignin and xylan, but not in the case of cellulose, suggesting a unexpected route for delignification and new materials synthesis from biomass / Doutorado / Física / Doutor em Ciências

Orientadores: Munemasa Machida, José Helder Facundo Severo / Tese (doutorado) - Universidade Estadual de Campinas, Instituto de Fisica Gleb Wataghin / Made available in DSpace on 2018-08-23T20:24:15Z (GMT). No. of bitstreams: 1 Nascimento_Fellypedo_D.pdf: 5773174 bytes, checksum: 260b32bb9f860cd7cda3a4c349ce7817 (MD5) Previous issue date: 2013 / Resumo: Este trabalho tinha como objetivo desenvolver um diagnostico para medir temperaturas e densidades de elétrons (Te e ne) em plasmas de tokamaks, utilizando espectroscopia no visível de emissões de impurezas presentes no plasma. Foram obtidos resultados para medidas locais de temperaturas e densidades de elétrons no plasma dos tokamaks NOVA-UNICAMP e TCABR, a partir de medidas de emissões espectrais de íons de carbono e oxigênio. Para este propósito foi utilizada a relação entre o fluxo de partículas de impurezas e as emissões espectrais provenientes delas. Esta relação foi combinada com um método interativo para obter valores de Te e ne. Tais resultados foram alcançados baseados na teoria de que o fluxo de partículas de um determinado elemento presente no plasma não depende do comprimento de onda em que seus íons estão emitindo radiação, no regime de equilibrio colisional-radiativo. No tokamak NOVA-UNICAMP foram obtidos resultados utilizando emissões espectrais de carbono e oxigênio, porem apenas em um nível de ionização de tais elementos (C1+ e O1+). Nesta maquina, as medidas de três linhas de emissão provenientes de cada íon foram efetuadas de forma simultânea, ou seja, em um único disparo. Já no tokamak TCABR foram gerados resultados com emissões de três níveis de ionização do carbono (C1+, C2+ e C5+), mas as aquisições de dados nesta maquina foram realizadas em descargas diferentes, tendo sido medido um comprimento de onda emitido por um dado íon em cada disparo. Para todos os íons utilizados, e nas duas maquinas em que foram feitas medidas, os valores obtidos para as temperaturas de elétrons estão de acordo com os esperados para as regiões do plasma onde e maior a probabilidade de que cada íon em questão emita radiação. No caso especifico do TCABR, onde foram feitas medidas de emissões de três níveis de ionização do carbono, isto fica mais evidente, pois valores mais elevados de temperatura foram observados para maiores níveis de ionização. As densidades de elétrons que foram obtidas concordam em ordem de grandeza com os valores esperados, para todos os íons utilizados no trabalho, nos dois tokamaks. Porem os valores medidos estão acima do esperado, exceto para os resultados obtidos no TCABR com emissões de C5+. No tokamak TCABR foi possível comparar os resultados de ne obtidos pelo nosso método com os que são medidos por interferometria de micro-ondas. Na comparação, notou-se que o perfil temporal de ne medido com o nosso método esta em bom acordo com que foi obtido com o interferômetro. De um modo geral, os resultados obtidos foram bons, e podemos considerar que os objetivos deste trabalho de tese foram cumpridos / Abstract: In this work we got results for measurements of local electron temperatures and densities (Te and ne) at NOVA-UNICAMP and TCABR tokamak plasmas, by using visible spectroscopy of line emissions from carbon and oxygen ions, which are impurities in the plasma. For this purpose, we used the relationship between the particle flux and the photon flux emitted by an element (or an ion) at a fixed wavelength. That relationship was combined with an interactive method in order to determine Te e ne values. Such results were achieved based on the theory that the particle flux of a given ion specie in the plasma does not depend on the wavelength of the light emitted by the ion. For NOVA-UNICAMP tokamak we got results using spectral emissions of carbon and oxygen for only one ionization stage of these elements (C1+ and O1+). In this machine, we have made simultaneous measurements of each set of three spectral emissions from each ion specie in the same tokamak shot. For TCABR tokamak we got results using spectral emissions from three ionization stages of carbon (C1+, C2+ and C5+). But the data acquisition in this machine were made in different tokamak discharges, where we measured one spectral emission per time for each ion. The electron temperatures obtained with all ion emissions used in this work and in both machines are in good agreement with the expected values at the plasma position where each kind of ion has larger probability of be radiating. This fact become more evident in the TCABR tokamak, where we have emissions measurements of three carbon ionization stages, because higher Te values were measured for ions at higher ionization stages. All results obtained for electron densities agree in magnitude order, for both machines, with the expected values for this parameter. But the measured values are higher than the expected, except for the results obtained using C5+ emissions at TCABR tokamak. In TCABR was possible to compare the ne results obtained in our method with measurements made using a microwave interferometer. In that comparison we noted that the temporal profile of both diagnostics are in good agreement. The general conclusion is that the results obtained with our method were good and we consider that the objectives of this work were fulfilled / Doutorado / Física / Doutor em Ciências

La technique laser-induced breakdown spectroscopy (LIBS), qui consiste à exploiter le spectre du plasma induit par laser sur la surface de l'échantillon pour déterminer sa composition élémentaire, a été inventée il y a plus de 50 ans. Récemment, elle connaît un développement rapide, poussée par des besoins d'application dans différents domaines, citons par exemple, exploration océanique, détection de pollution environnementale, ou contrôle de procédés industriels. Cette technique utilise le plasma généré par ablation laser comme la source spectroscopique. La particularité de LIBS est que le plasma induit par laser présente un comportement transitoire et une distribution spatiale qui ne soit pas uniforme en général. Bien que la détection résolue en temps puisse améliorer considérablement la performance de LIBS, surtout pour le procédé de LIBS autocalibration avec une meilleure détermination de température, l'évolution temporelle du plasma est souvent corrélée avec sa morphologie et son inhomogénéité spatiale. L'étude de la morphologie ainsi que la structure interne du plasma avec l'évolution pendant l'expansion de celui-ci dans un gaz ambiant, représente donc un point crucial pour l'optimisation du plasma entant qu'une source spectroscopique. Suite à la thèse de Qianli Ma réalisée dans notre équipe et soutenue en décembre 2012, qui a été notamment consacrée à l'étude de l'effet de la longueur d'onde du laser d'ablation sur les propriétés et l'évolution du plasma dans un gaz ambiant d'argon, la présente thèse s'intéresse aux effets des autres paramètres, la fluence du laser d'ablation, la durée de l'impulsion, et les différents gaz ambiants (argon ou air), sur la morphologie et la structure du plasma. Par ailleurs, les mécanismes microscopiques conduisant à l'onde de détonation soutenue par laser dans argon ou dans l'air sont aussi étudiés. Lors du refroidissant du plasma dans l'air, des oxydes métalliques peuvent se former. L'étude de la formation de molécules, au-delà de l'intérêt pratique pour la LIBS, fournit également un aperçu de la cinétique chimique dans le plasma, ce qui est intéressant pour l'étude de la transformation du plasma en phase gazeuse à une phase recondensée de nanoparticules / Laser-induced breakdown spectroscopy (LIBS) has been invented for more than 50 years, which analyzes the spectrum of the laser-induced plasma to determine the elemental composition of the ablated sample. Recently, LIBS technique has been well developed and applied in different domains, for example oceanic exploration, pollution monitoring in the environment. LIBS uses the ablation plasma as a light source that contains the elemental composition information of the sample. However, the laser-induced plasma exhibits a transient behavior. Although time-resolved and gated detection can greatly improve the performance of the LIBS technique especially that of calibration-free LIBS (CF-LIBS) with a better determination of plasma temperature, the temporal evolution of the plasma is correlated to its morphology and its spatial inhomogeneity. The determination of the morphology as well as the internal structure of the plasma together with their evolution during plasma expansion into the ambient gas is therefore crucial for the optimization of the use of ablation plasma as a spectroscopic emission source. Evolutions of the morphology and the internal structure of the ablation plasma are considered as the consequence of its hydrodynamic expansion into the ambient gas. Following the thesis of Qianli Ma which has studied the effect of laser wavelength on the behavior of the plasma induced in an ambient gas of argon, the present thesis has used the same diagnostic techniques (time- and space-resolved emission spectroscopy and fast spectroscopic images) together with 1064 nm ns laser pulse ablation of a target of aluminum to investigate the effects of other parameters, such as the fluence and the duration of laser pulse, the effect of different ambient gases (argon and air), on the morphology and internal structure of the plasma. Furthermore, in order to understand the effects of these parameters on the properties of the plasma, the microscopic mechanisms during post ablation and the propagation of the plasma are also studied. While the plasma cools down in air, molecules are formed, AlO for instance. So the thesis also studied the condition for the formation of the molecules in the plasma. Beyond the practical interest of this study for LIBS, it provides also insights to the kinetics of the AlO molecule formation in laserinduced plasma