Thesis (Ph. D.)--University of Texas at Austin, 2001. / Vita. Includes bibliographical references.

Thesis (Ph. D.)--University of Oregon, 2003. / Typescript. Includes vita and abstract. Includes bibliographical references (leaves 153-163). Also available for download via the World Wide Web; free to University of Oregon users.

Not available / text

Thesis (Ph. D.)--University of North Texas, Dec., 2009. / Title from title page display. Includes bibliographical references.

Thesis (Ph. D.)--University of Wisconsin. / Bibliography: p. 314-318.

Literature on the processing, microstructure and properties of NbSi2 and other disilicides have been briefly reviewed, along with earlier work on the alloying behaviour of NbSi2 and the oxidation of both niobium and niobium silicides. Solidification microstructures and phase selection in ingots and melt spun ribbons of binary and ternary NbSi2 based alloys with additions of Cr and Fe have been studied. Low levels of interstitial contamination were achieved in all alloys (< 200wppmO2, < 10wppmH2) using a cold hearth non-consumable tungsten arc melting technique. The following alloys were prepared (at%): Nb-67Si, Nb-58Si, Nb-67Si-8Cr, Nb-60Si-20Cr, Nb-67Si-8Fe and Nb-60Si-20Fe. Evaluation of the microstructure and properties was performed using optical microscopy, SEM, EPMA,TEM,XRD, DSC/TG, isothermal oxidation, room temperature hardness, microhardness, high temperature hardness and nano-indentation. Alloys containing increased levels of Nb or Fe additions exhibited less porosity and cracking in their as-cast structures and lower melt viscosities in comparison to the other alloys. Extensive solubility of Cr in the NbSi2 matrix and of Nb in the CrSi2 matrix was noted and upon heat treatment widescale partitioning between the two phases was evident. Increased Cr additions led to the formation of the ternary phase Nb2Cr3Si6. In contrast the solubility of Nb in both FeSi and FeSi2 was extremely limited along with that of Fe in NbSi2. Rapid solidification refined the microstructures of the alloys by two orders of magnitude. Suppression of Nb5Si3 and NbFeSi2 took place under RS conditions. Segregation free microstructures were formed in zone A of Nb-67Si ribbons. The addition of either Cr or Fe destabilised the S/L front in the ternary alloys preventing the formation of zone A in the ribbons of these alloys. RS processing suppressed the eutectoidal decomposition of betaNb5Si3 to alphaNb5Si3 and the peretectoidal transformation of alphaFeSi2 to betaFeSi2. Three oxidation regimes were identified in binary Nb-67Si, which were associated with the oxidation kinetics of the various niobium oxide forms (NbO2, alphaNb2O5 and betaNb2O5). Pesting of the alloy occurred between 823 and 1123K, but was reduced in the ternary alloys and fully suppressed in Nb-60Si-20Cr. Duplex oxide structures were formed on the ternary alloys consisting of SiO2 and Cr2O3 layers in the Nb-Si-Cr alloys and two silicon oxide layers containing iron oxide particles in the Nb-Si-Fe alloys. Additions of Cr and Fe increased the hardness of the alloys. This was attributed to the volume fraction of the Fe and Cr silicide phases with FeSi and CrSi2 being harder than NbSi2. The elastic moduli of NbSi2 and Nb5Si3 were also measured using the nano-indentation technique. The hardness of Nb-67Si and Nb-67Si-8Cr were retained up to 1173K whilst that of the other ternary alloys decreased rapidly above 950K.

Made available in DSpace on 2014-10-09T12:25:08Z (GMT). No. of bitstreams: 0 / Made available in DSpace on 2014-10-09T14:02:30Z (GMT). No. of bitstreams: 1 00938.pdf: 5133182 bytes, checksum: 3758f9324fbe5e9b7635b66a84dba275 (MD5) / Tese (Doutoramento) / IEA/T / Escola Politecnica, Universidade de Sao Paulo - POLI/USP

Made available in DSpace on 2014-10-09T12:25:08Z (GMT). No. of bitstreams: 0 / Made available in DSpace on 2014-10-09T14:02:30Z (GMT). No. of bitstreams: 1 00938.pdf: 5133182 bytes, checksum: 3758f9324fbe5e9b7635b66a84dba275 (MD5) / Tese (Doutoramento) / IEA/T / Escola Politecnica, Universidade de Sao Paulo - POLI/USP

The knowledge of diffusion parameters provides important understanding of many physical and mechanical properties of materials. In most of the applications silicides are grown by a diffusion controlled process mainly in thin film condition. Because of this reason, most of the studies till date are available in thin film condition. Although more than one phase is present in all these systems, mainly disilicides were found at the interface. In this thesis bulk interdiffusion studies are conducted by coupling pure refractory metals (group IVB, VB and VIB elements) with single crystal Si. Several phase layers grow between binary refractory metal and Si systems. The layer thicknesses of the phases are measured from the microstructures. Composition profiles were measured in electron probe microanalyzer. Different diffusion parameters are estimated such as parabolic growth constants, integrated diffusion coefficients, activation energy for diffusion and ratio of tracer diffusivities of the components are estimated. Growth mechanisms of the phases are discussed with the help of diffusion parameters. The atomic mechanism of the diffusion is discussed considering crystal structure of the phases along with possible defects present. Solid diffusion couple experiments are conducted to analyse the growth mechanism of the phases and the diffusion mechanism of the components in the Ti-Si system. The calculation of the parabolic growth constant and of the integrated diffusion coefficients substantiates that the analysis is intrinsically prone to erroneous conclusions if it is based just on the parabolic growth constants determined for a multiphase interdiffusion zone. The location of the marker plane is detected based on the uniform grain morphology in the TiSi2 phase, which indicates that this phase grows mainly because of Si diffusion. The growth mechanism of the phases and morphological evolution in the interdiffusion zone are explained with the help of imaginary diffusion couples. The activation enthalpies for the integrated diffusion coefficient of TiSi2 and the Si tracer diffusion are calculated as 190±9 and 170±12 kJ/mol, respectively. The crystal structure, details on the nearest neighbours of the elements and the relative mobilities of the components indicate that the vacancies are mainly present on the Si sublattice. Diffusion controlled growth of the phases in the Hf-Si and Zr-Si are studied by bulk diffusion couple technique. Only two phases grow in the interdiffusion zone, although several phases are present in both the systems. The location of the Kirkendall marker plane detected based on the grain morphology indicates that the disilicides grow by the diffusion of Si. Diffusion of the metal species in these phases is negligible. This indicates that vacancies are present mainly on the Si sublattice. The activation energies for integrated diffusion coefficients in the HfSi2 and ZrSi2 are estimated as 394 ± 37 and 346 ± 34 kJ/mol, respectively. The same is calculated for the HfSi phase as 485±42 kJ/mol. The activation energies for Si tracer diffusion in the HfSi2 and ZrSi2 phases are estimated as 430 ± 36 and 348 ± 34 kJ/mol, respectively. We conducted interdiffusion studies to understand the atomic mechanism of the diffusing species and the growth mechanism of the phases. Integrated diffusion coefficients and the ratio of tracer diffusion coefficients were estimated for these analyses. The activation energies for the integrated diffusion coefficients were calculated as 550 ± 70 and 410 ± 39 kJ/mol in the TaSi2 and the Ta5Si3 phases, respectively. In the TaSi2 phase, Ta has a slightly lower but comparable diffusion rate with respect to Si, although no TaTa bonds are present in the crystal. In the Ta5Si3 phase, Si has higher diffusion rate, which is rather unusual, if we consider the atoms in the nearest-neighbor positions for both the elements. The ratio of Si to Ta tracer diffusion coefficients is found to be lower in the Si-rich phase, TaSi2, compared to the Si-lean phase, Ta5Si3, which is also unusual. This indicates the type of structural defects present. An analysis on the growth mechanism of the phases indicates that duplex morphology and the Kirkendall marker plane should only be present in the TaSi2 phase. This is not present in the Ta5Si3 phase because of the very high growth rate of the TaSi2 phase, which consumes most of the Ta5Si3 phase layer. The problems in the calculation method used previously by others in this system are also explained. Experiments are conducted in the W-Si system to understand the diffusion mechanism of the species. The activation energies for integrated diffusion are found to be 152±7 and 301±40 kJ/mol in the WSi2 and W5Si3 phases, respectively. In both the phases, Si has a much higher diffusion rate compared to W. The result found in the WSi2 phase is not surprising, if we consider the nearest neighbors in the crystal. However, it is rather unusual to find that Si has higher diffusion rate in the W5Si3 phase, indicating the presence of high concentration of Si antisites in this phase. In the group IVB, VB and VIB M-Si systems are considered to show an interesting pattern in diffusion of components with the change in atomic number in a particular group. MSi2 and M5Si3 are considered for this discussion. Except in the Ta-Si system, activation energy for integrated diffusion of MSi2 is always lower than M5Si3. Interestingly, in both the phases, the relative mobilities measured by the ratio of tracer D* diffusion coefficients, S i decreases with the increase in atomic number in both the DM* groups. Both the phases have similar crystal structures in a particular group in which these parameters are calculated. In both the phases Si has higher diffusion rate compared to M. Absence of any M-M bonds in MSi2 and increase in the diffusivities of M with the increase in atomic number substantiates the increasing concentration of M anti-sites and higher interactions of M with vacancies. Only one or two Si-Si bonds are present in M5Si3, however, the higher diffusion rate of Si indicates the presence of vacancies mainly D* on its sublattice. On the other hand, increase in S i with increasing atomic number in DM* Both the groups substantiates increasing interactions of M and vacancies.

Transition Metal Silicides (TMS) are well known refractory materials because of their high thermal and structural stability at elevated temperature. In addition TMS materials are known for their moderate thermoelectric applications at high temperature since they exhibit superior semiconducting behavior. But TMS materials have relatively higher thermal conductivity which limits their applications in the field of thermoelectrics. So it is important to reduce their thermal conductivity to enhance conversion efficiency. In this regard, the work is performed to reduce the thermal conductivity of selected silicides such as CrSi2, MnSi2, and β-FeSi2 through alloys scattering and nano-structuring by mechanical alloying. A brief introduction about basic principles of thermoelectricity and related parameters are described in the chapter 1. Thermoelectric material’s figure of merit (zT) depends on the ratio of carrier charge transport and thermal energy transport. The conversion efficiency can be significantly enhanced by increasing the zT value. This chapter discusses the methods to increase the zT and list out some of the state-of-art of thermoelectric materials which possesses high zT value. Chapter 2 covers the preparation of selected silicides, such as CrSi2, MnSi2 and β-FeSi2, and the characterization techniques used to define the thermoelectric performance. In this chapter the suitability and the performance of transition metal silicides for high temperature thermoelectric application are discussed. In summary, the objective of the thesis has been framed. Chapter 3 deals with thermoelectric properties of pure and Mn, Al doped chromium disilicide (CrSi2). This chapter has been divided into three parts and discussed the effect of composition variation (CrSi1.90-2.10), point defects (by introducing Al at Si site), and mass-fluctuation scattering (by co-substitution of Mn and Al) on thermoelectric properties of polycrystalline CrSi2 in the temperature range of 300K-800K. In the first part, it is observed that CrSi2 has a homogeneity range of CrSi1.95-CrSi2.02. The secondary phases evolve above and below this homogeneity range. These secondary phases significantly scatter phonons and reduce the thermal conductivity. In the second part, Al has been introduced at Si site in CrSi2 and creates the point defects which is also scatter the short wavelength phonons and lead to low thermal conductivity. The third part explores the influence of co-substitution of Mn at Cr site and Al at Si site on lattice thermal conductivity. Here, substitution of Al creates point defects and addition of Mn leads to mass fluctuation scattering. These combined effects result in huge reduction in lattice thermal conductivity and thereby enhanced the zT. Chapter 4 deals with efforts of nano-structuring the CrSi2 through Mechanical Alloying (MA) using SS (stainless steel) and WC (Tungsten Carbide) milling media. The effects of two milling media on crystallite size reduction are discussed. It is seen that as milling time increases the rate of crystallite size reduction also increases. The X-ray diffraction studies of hot pressed pellets show the formation of secondary metallic phase like Cr1-xFexSi from SS milled samples and CrSi from WC milled samples. It indicates that CrSi2 gains metallic Fe atoms during mechanical alloying and the secondary phases are formed. As milling time increases it is observed that weight loss from the milling balls also increases. The Fe content coming from SS ball forms a solid solution with CrSi phase. The transport properties like resistivity, Seebeck coefficient and thermal conductivity were measured for milled samples from 300K-800K. It is observed that formation of the secondary metallic phase reduces resistivity and Seebeck coefficient of overall ceramics. Very large reduction in thermal conductivity was found for samples which were 15hrs-WC-milled (7.4 W/m.K at 375K) due to increased phonon scattering by grain boundaries. The 15hrs-SS-milled samples show thermal conductivity ~10 W/m.K which is considerably low as compared to the as-cast CrSi2 (13.5 W/m.K). This chapter explores the structural studies and mechano-chemical decomposition of CrSi2. In addition, the influences of mechanical milling media and micron size secondary phase on transport properties of CrSi2 are also discussed. Chapter 5 deals with the influence of microstructures of MnSi2 densified by hot uni-axial pressing (HP) and spark plasma sintering (SPS) on thermoelectric properties. The effects of these densification processes on arresting the grain growth during sintering are explored. The powder X-ray diffraction studies show higher manganese silicide (HMS) with secondary Si phase. The SEM and EPMA results confirmed the presence of Si phase. The TEM micrographs are shown the particle size distribution of HMS to be <200nm with fine precipitates of Si, of 5-10nm size, in the HMS matrix. The ball milled samples of MnSi2 showed increase in resistivity and Seebeck coefficient with large reduction in total thermal conductivity as compared to that seen in as-cast sample. The SPS densified samples show lower thermal conductivity, with reduction by about 52%, as compared to HP sample’s (45%) reduction for same conditions. An enhancement in zT by 73% could be achieved for the SPS densified for 2 min at 1060˚C. Chapter 6 examines (i) the decomposition of α–FeSi2, generally known as α-Fe2Si5, (eutectoid reaction) into β-FeSi2 with Si dispersoids (ii) formation of β-FeSi2 from ε-FeSi and α-Fe2Si5 (peritectoid reaction). This is accompanied by a discussion of the microstructural effect on thermoelectric properties. Prolonged annealing of peritectoid composition decomposes the α– FeSi2 phase, replaces the ε–FeSi phase, and forms pure β-FeSi2 whereas eutectoid composition of α–FeSi2 decomposes into lamellar structure of β-FeSi2 and Si dispersions. The aging heat treatment carried out for composition prepared from eutectoid reaction at various temperatures (600°C, 700°C, 800°C and 850°C for duration of 100hrs, 10hrs, 4hrs and 10hrs, respectively) below the equilibrium eutectoid temperature were found to have fine and homogenous dispersions of Si particles. The XRD and SEM studies confirmed the presence of a secondary Si phase on the matrix of β-FeSi2 for the heat treated eutectoid composition. The excess Si phase in β-FeSi2 increases the resistivity and Seebeck coefficient by the reducing carrier concentration of system as compared to those that of pure β-FeSi2, which is prepared from peritectoid composition. The samples heat treated at 600°C showed relatively low thermal conductivity as compared to that of β-FeSi2. This chapter gives a route map for reducing the thermal conductivity by micro structural engineering through Si dispersions on β-FeSi2. In addition, this comparison of two the decomposition processes and its influence on the microstructure and thermoelectric properties is made. Chapter 7 summarizes the key conclusions of the work performed in this thesis. The work reported in this thesis has been carried out by the candidate as a part of Ph.D training programme. He hopes that this would constitute a worthwhile contribution to the field of thermoelectrics for understanding the (i) effect of alloy scattering, (ii) mass fluctuation scattering, (iii) and nano-structuring of transition metal silicides for high temperature thermoelectric materials.