Thermoelectric phenomena couple thermal and electric currents, allowing for solid-state conversion of heat into electricity. For decades Radioisotope Thermoelectric Generators have supplied power to NASA satellites and deep space probes. A more accessible application to consumers is the automotive industry's aspiration to incorporate thermoelectrics into active waste heat recovery systems. Higher power demands require these new thermoelectric devices to operate at higher temperatures and higher efficiencies, justifying new materials research. Recently, clathrates have gained interest for thermoelectric applications due to the unique properties they possess.These properties are directly related to their crystal structure. Therefore, clathrates are not only of interest from the standpoint of potential thermoelectric applications but are also of scientific interest as they presents an opportunity to investigate fundamental properties of group-IV elements in novel crystal structures. Clathrates are a class of novel open-structured materials in which molecules or atoms of one species are completely enclosed within a framework comprised of another species. This work presents a systematic investigation of the electrical properties of type I clathrate alloys, specifically Si-Ge alloys, for the first time. A series of Ba8Ga16-ySixGe30-x+y clathrates with varying Si content were synthesized and their structural and transport properties were studied. Two additional series of type I clathrates were also synthesized and characterized and their properties compared to those of the Si-Ge alloys in order to develop an understanding of their structure-property relationships. The increasing Si content correlates to a dramatic increase in Seebeck coefficient even as the resistivity decreases, suggesting the complex interaction between the Ba and the Si substitution within the Ga16Ge30 framework significantly modifies the band structure.

L'alliage Si-Ge est utilisé depuis de nombreuses années dans les modules thermoélectriques dans les sondes spatiales de la NASA. Ils convertissent la chaleur résultant de la désintégration radioactive de matériaux riches en un ou plusieurs radio-isotopes en électricité. Cet alliage est performant à haute température (à partir de 700 °C), c'est pourquoi il trouve également un fort intérêt dans l'industrie automobile. De nombreuses recherches dans ce secteur s'orientent vers la thermoélectricité, notamment vers des modules fonctionnant à haute température pour permettre la réduction de consommation de carburant.La meilleure composition de l'alliage en thermoélectricité est Si0,8Ge0,2. Le facteur de mérite réduit (ZT) de ces matériaux est généralement proche de 0,75 et de 0,45 à 700 °C pour les types n et p respectivement. Le germanium étant très onéreux, la composition retenue dans cette étude est Si0,92Ge0,08. Pour améliorer les performances de la composition choisie et se rapprocher de celles de la meilleure composition, la voie retenue est l'incorporation de nanoinclusions à base de siliciures de molybdène dans le matériau, permettant la diminution de la conductivité thermique.L'alliage Si-Ge est synthétisé par mécanosynthèse, et densifié par SPS. Les dopants utilisés sont le phosphore et le bore pour les types n et p respectivement. Le taux de dopage optimal est de 0,7 %. Ainsi, les ZT obtenus à 700 °C sont égaux à 0,7 et 0,5 pour les types n et p respectivement. La nature des inclusions stables dans la matrice est déterminée par la méthode CalPhad qui permet l'obtention du diagramme ternaire Mo-Si-Ge. La phase MoSi2 apparait alors comme étant la seule phase stable dans la matrice Si0,92Ge0,08. La fraction volumique optimale de molybdène est de 1,3 % lorsque les matériaux sont densifiés à 1280 °C. Le ZT obtenu est supérieur à 1 à 700 °C pour le type n, et proche de 0,8 pour le type p. L'ajout de nanoinclusions a permis d'augmenter les performances de 43 % et de 60 % à 700 °C. / Si-Ge alloys has been used for many years in the thermoelectric modules in the NASA space probes in which they convert heat produced by the radioactive decay of a heat source into electricity. This alloy is effective at high temperature (from 700 °C), so it is also a strong interest in the automotive industry. The strong incentive in this area to reduce fuel consumption leads researchers to develop thermoelectric modules that can operate at high temperatures. The composition at which SiGe alloys are the most thermoelectrically efficient is Si0.8Ge0.2. Their figure of merit (ZT) is generally close to 0.75 and 0.45 at 700 °C for type n and p respectively. As Germanium is very expensive, this study aims to develop a Si0.92Ge0.08 alloy that can compare to the existing Si0.8Ge0.2 alloys. To get to a higher level of performance, the thermal conductivity of the chosen composition has to be decreased, which is done by incorporating molybdenum silicides in the Si0.92Ge0.08 alloys.The Si-Ge alloy was synthesized by mechanical alloying, and sintered by SPS. The dopants used are phosphorous and boron for the n and p types respectively. The optimal doping level is 0.7%. ZT obtained for Si0.92Ge0.08 base alloys at 700 °C are equal to 0.7 and 0.5 for n and p types respectively. The nature of stable inclusions in the matrix has been determined by the CALPHAD method to obtain the ternary diagram Mo-Si-Ge. Then, the MoSi2 phase appears to be the only stable phase in the matrix Si0.92Ge0.08. The optimum volume fraction of molybdenum was 1.3% when the materials are sintered at 1280 °C. Therefore, the ZT obtained is higher than 1 at 700 °C for n-type and close to 0.8 for p-type. Adding nanoinclusions has increased performance by 43% (n-type) and 60% (p-type) at 700 °C.

Utilizando métodos de primeiros princípios, baseados na Teoria do Funcional da Desidade, investigamos, de forma sistemática, problemas de interesse na física de semicondutores: (i) A liga SixGe1-x: observa-se um pequeno desvio da linearidade, para o parâmetro de rede da liga, em função da concentração, sendo que as distâncias entre átomos de Ge são as que mais variam. O comportamento de vacâncias nessa liga se mostrou intermediário entre o Ge e o Si, e a energia de formação (EF) das vacâncias variou entre 2,06 eV e 2,90 eV, dependendo da vizinhança dessa. Propusemos um modelo para a difusão de Ge nessa liga. O fato das vacâncias com mais átomos de Ge como vizinhos ter menor energia de formação, faz com que a difusão das vacâncias se dê por caminhos lembrando o Ge puro, ou seja, a tendência será de que os vizinhos dessa vacância sejam de Ge, para ligas ricas em Ge; (ii) Superfícies: estudamos a adsorção de monômeros e dímeros de Ge sobre Si (100). Verificamos que, para monômeros, podem existir diversos mínimos locais da superfície de energia potencial para a mesma posição (x, y) na superfície, cuja diferença está na inclinação dos dímeros da superfície perto deste átomo. Mostramos que isso pode ser identificado em imagens teóricas de STM (Scanning Tunelling Microscopy) e propomos que isso seja verificado experimentalmente. Este tipo de efeito também ocorre com dímeros, sendo que isso já foi observado experimentalmente, mas com uma interpretação errônea. Através do nosso estudo podemos propor uma estrutura mais condizente com as imagens experimentais. O comportamento de átomos e dímeros de Si e Ge perto de degraus também foi analisado. Devido à diferença no parâmetro de rede do Si e do Ge, mostramos que a adsorção se torna diferente quando somente dois átomos estão na superfície. Através desses resultados, propomos um modelo para explicar a reversão da rugosidade dos degraus durante o crescimento de Ge sobre Si(100); (iii) Impurezas de Mn em Si: analisamos o comportamento de impurezas de Mn no cristal de Si e sobre a superfície. No cristal, observamos que a EF de sítios intersticiais é menor do que os sítios substitucionais. Sobre a superfície, existe um sítio substitucional que possue a mesma EF de um sítio intersticial. Esse é um fato importante para o desenvolvimento de semicondutores ferromagnéticos à base de Si. Propomos um método para que esse fato seja verificado experimentalmente, através de imagens de STM. / Using ab initio methods, based on Density Functional Theory, we have systematically investigated problems of interest for semiconductor physics: (i)The SixGe1-x alloy: we observe a small bowing in the lattice parameter, as a function of concentration, and that a larger variation in interatomic distances occurs for Ge-Ge bonds. The behavior of vacancies in this alloy is intermediate between Si and Ge, with formation energies (EF) varying from 2,06 eV to 2,90 eV, depending on the neighborhood of the vacancy. We propose a model for the diffusion of Ge in this alloy. As the vacancy with four Ge atoms as first neighbors hás smaller formation energy, the diffusion of the vacancies Will take place along paths that resemble purê Ge, for Ge-rich alloys; (ii)Surfaces: we study the adsorption of Ge monomers and dimers on Si(100). For monomers, there are several local mínima of the potential energy surface, for the same (x, y) position in the surface, depending on the buckling of the surface dimers near the adatom. We show that this can be identified in theoretical STM (Scanning Tunelling Microscopy) images. This kind of effect also occurs for dimers, and hás already been observed experimentally, but with a wrong interpretation. Through our study, we propose a new structure for the experimental images. The behavior of Si and Ge atoms and dimers near steps is also analyzed. Due to the differencein the lattice parameter of Si and Ge, we show that the adsorption becomes different when only two atoms are in the surface. Through these results, we propose a model to explain the reversion of step roughness due to Ge deposition on Si(100); (iii)Mn impurities in Si: we analise the behavior of Mn impurities in bulk Si ando n the surface. For the bulk, we observe that EF is lower for intersititial than for substitutional sites. On the surface, there is a substitutional site that hás the same EF AS A INTESTITIAL ONE. This fact may be important to the development of Si based ferromagnetic semiconductors. A method is proposed to verify this fact experimentally, through STM images.

Utilizando métodos de primeiros princípios, baseados na Teoria do Funcional da Desidade, investigamos, de forma sistemática, problemas de interesse na física de semicondutores: (i) A liga SixGe1-x: observa-se um pequeno desvio da linearidade, para o parâmetro de rede da liga, em função da concentração, sendo que as distâncias entre átomos de Ge são as que mais variam. O comportamento de vacâncias nessa liga se mostrou intermediário entre o Ge e o Si, e a energia de formação (EF) das vacâncias variou entre 2,06 eV e 2,90 eV, dependendo da vizinhança dessa. Propusemos um modelo para a difusão de Ge nessa liga. O fato das vacâncias com mais átomos de Ge como vizinhos ter menor energia de formação, faz com que a difusão das vacâncias se dê por caminhos lembrando o Ge puro, ou seja, a tendência será de que os vizinhos dessa vacância sejam de Ge, para ligas ricas em Ge; (ii) Superfícies: estudamos a adsorção de monômeros e dímeros de Ge sobre Si (100). Verificamos que, para monômeros, podem existir diversos mínimos locais da superfície de energia potencial para a mesma posição (x, y) na superfície, cuja diferença está na inclinação dos dímeros da superfície perto deste átomo. Mostramos que isso pode ser identificado em imagens teóricas de STM (Scanning Tunelling Microscopy) e propomos que isso seja verificado experimentalmente. Este tipo de efeito também ocorre com dímeros, sendo que isso já foi observado experimentalmente, mas com uma interpretação errônea. Através do nosso estudo podemos propor uma estrutura mais condizente com as imagens experimentais. O comportamento de átomos e dímeros de Si e Ge perto de degraus também foi analisado. Devido à diferença no parâmetro de rede do Si e do Ge, mostramos que a adsorção se torna diferente quando somente dois átomos estão na superfície. Através desses resultados, propomos um modelo para explicar a reversão da rugosidade dos degraus durante o crescimento de Ge sobre Si(100); (iii) Impurezas de Mn em Si: analisamos o comportamento de impurezas de Mn no cristal de Si e sobre a superfície. No cristal, observamos que a EF de sítios intersticiais é menor do que os sítios substitucionais. Sobre a superfície, existe um sítio substitucional que possue a mesma EF de um sítio intersticial. Esse é um fato importante para o desenvolvimento de semicondutores ferromagnéticos à base de Si. Propomos um método para que esse fato seja verificado experimentalmente, através de imagens de STM. / Using ab initio methods, based on Density Functional Theory, we have systematically investigated problems of interest for semiconductor physics: (i)The SixGe1-x alloy: we observe a small bowing in the lattice parameter, as a function of concentration, and that a larger variation in interatomic distances occurs for Ge-Ge bonds. The behavior of vacancies in this alloy is intermediate between Si and Ge, with formation energies (EF) varying from 2,06 eV to 2,90 eV, depending on the neighborhood of the vacancy. We propose a model for the diffusion of Ge in this alloy. As the vacancy with four Ge atoms as first neighbors hás smaller formation energy, the diffusion of the vacancies Will take place along paths that resemble purê Ge, for Ge-rich alloys; (ii)Surfaces: we study the adsorption of Ge monomers and dimers on Si(100). For monomers, there are several local mínima of the potential energy surface, for the same (x, y) position in the surface, depending on the buckling of the surface dimers near the adatom. We show that this can be identified in theoretical STM (Scanning Tunelling Microscopy) images. This kind of effect also occurs for dimers, and hás already been observed experimentally, but with a wrong interpretation. Through our study, we propose a new structure for the experimental images. The behavior of Si and Ge atoms and dimers near steps is also analyzed. Due to the differencein the lattice parameter of Si and Ge, we show that the adsorption becomes different when only two atoms are in the surface. Through these results, we propose a model to explain the reversion of step roughness due to Ge deposition on Si(100); (iii)Mn impurities in Si: we analise the behavior of Mn impurities in bulk Si ando n the surface. For the bulk, we observe that EF is lower for intersititial than for substitutional sites. On the surface, there is a substitutional site that hás the same EF AS A INTESTITIAL ONE. This fact may be important to the development of Si based ferromagnetic semiconductors. A method is proposed to verify this fact experimentally, through STM images.