Block copolymers are an ideal solution for a wide variety of nanolithographic opportunities due to their tendency to self-assemble on nanoscopic length scales. High etch selectivity and thin-film orientation are crucial to the success of this technology. Most conventional block copolymers have poor etch selectivity; however, incorporating silicon into one block produces the desired etch selectivity. A positive side effect of the silicon addition is that the χ value (a block-to-block interaction parameter) of the block copolymer increases. This decreases the critical dimension of potential features. Unfortunately, one negative side effect is the increase in the surface energy difference between the blocks. Incorporating silicon decreases the surface energy of that block. Typically, annealing is used to induce the chain mobility that is required for the block copolymer to reach its minimum thermodynamic energy state. Thermal annealing is the easiest annealing technique; however, if the glass transition temperature (Tg) of one block is above the thermal decomposition temperature of the other block, the latter will degrade before the former can reorient. In addition, annealing silicon-containing block copolymers usually results in a wetting layer and parallel orientation since the lower surface energy block favors the air interface, minimizing the free energy. Solvent annealing replaces the air interface with a solvent, thereby changing the surface energy. The solvent plasticizes the block copolymer, effectively decreasing the Tgs of both blocks. Another benefit is the ability to reversibly alter the orientation by changing the solvent or solvent concentration. The challenge with solvent annealing is that it depends on a number of parameters including: solvent selection, annealing time, and vapor concentration, which generate a very large variable space that must be searched to find optimum screening conditions. / text

No description available.

Block copolymers demonstrate potential in next-generation lithography as a solution for overcoming the limitations of conventional lithographic techniques. Ideal block copolymer materials for this application can be synthesized on a commercial scale, have high [chi]-parameters promoting self-assembly into sub-20 nm pitch domains, have controllable alignment and orientation, and have high etch contrast between the domains for facilitating pattern transfer into the underlying substrate. Block copolymers that contain silicon in one domain are attractive for nanopatterning since they often fulfill at least three of these requirements. However, silicon-containing materials are notoriously difficult to orient in thin films due to the low surface energy of the silicon-containing block, which typically wets the free surface interface. In this work, the methodology behind material choice and the synthesis of new silicon-containing block copolymers by a variety of polymerization techniques will be described. Thin film self-assembly of the block copolymers with domains oriented perpendicular to the plane of the substrate is achieved using different solvent annealing and neutral surface treatments with thermal annealing conditions. Block copolymer patterns are transferred to the underlying substrate by reactive ion etching and directed self-assembly of the polymers is demonstrated using chemical contrast patterns. Interesting thermodynamics governing the self-assembly of block copolymers with solvent annealing will also be discussed. Finally, new amphiphilic block copolymers will be described that were created with lithographic applications in mind but that are most useful for biological applications in drug delivery. / text

Using block copolymers for large-area periodic structure fabrication is of great interest because of the potential for low fabrication costs and simplicity of the processing. The concept is that by selective inclusion of the nanoparticles into one of the blocks of a self-assembling copolymer, the nanoparticles are forced into a defined spatial arrangement determined by the phase morphology of the copolymer. Although copolymers can form well defined structures, they inherently have a 'polycrystalline' structure in the bulk, meaning that there is no long-range order of the domains. This thesis addresses both the effect of inclusion of the nanoparticles and the long range ordering of block copolymer domains. The first part of the thesis focuses on the study of the effect of nanoparticle inclusions on the phase morphology of the poly(styrene-butadiene) diblock and poly(styrene-butadiene-styrene) triblock copolymers. For gold inclusions, it was found that even at relatively low concentrations of inclusions (less than 1 wt./vol.%) the block copolymer phase morphology is altered from that of the native copolymer. By contrast to the block copolymer-gold system, no significant changes in bulk morphology is observed for similar fullerene concentrations. In the second part of the thesis, the evolution of the order in cylinder forming poly(styrene-butadiene-styrene) triblock copolymer thin films as a function of the type of solvent vapor, exposure time to the saturated vapors and substrate surface energy is discussed. Solvent vapors of dimethoxyethane, ethyl acetate and cyclohexanone were found to be the most effective for our polymer films. Solvent vapors differing in their selectivity towards the block copolymer domains have different kinetics of ordering which is explained in terms of the difference in the interaction of the solvent between the two different copolymer blocks.

No description available.

The rise in the world population can be correlated with an increase in energy need. Fossil fuels are not going to able to cover this need in energy because not only are they limited, they also have a negative effect on the environment. A reason the more to switch renewable energy. One of the most popular renewable energy source is solar energy. The organic solar cell could be a low-cost, light-weight and flexible option for photovoltaics. This thesis will discuss the morphology of the active layer of an organic solar cell. The polymer poly(9,9-dioctylfluorenyl-2,7-diyl) and the fullerene derivate [6,6]-phenyl C61-butyric acid methyl ester were used as model components for the active layer. These two components were processed in different solvents, different ratios, different total concentrations and were either dip- or spin-coated on glass substrates. These samples were analyzed with atomic force microscopy, steady state and time resolved fluorescence and UV/Vis spectroscopy. The analysis show that the morphology of the films processed in chloroform and tetrahydrofuran would react very similar in α-phase and β-phase by dip- and spin-coated samples. Xylene would react the opposite as tetrahydrofuran and chloroform while ethylbenzene would react little with different samples. / De stijging in wereldpopulatie kan gelinkt worden met een stijging in energieverbruik. Het is niet aan te raden om fossiele brandstoffen te gebruiken voor deze energiestijging want niet alleen zijn ze beperkt aanwezig op aarde ook zijn ze niet goed voor het milieu. Een reden te meer om naar duurzame energie over te schakelen. Één van de meeste populaire energiebronnen is zonne-energie. Hierbij zou de organische zonnecel een goedkope, lichte en flexibele optie zijn. Deze thesis zal de morfologie van de actieve laag van een zonnecel bespreken. Het polymeer poly(9,9-dioctylfluorenyl-2,7-diyl) en het fullereen derivaat [6,6]-fenyl C61-butylzuur waren de twee model componenten voor de actieve laag. Deze twee componenten werden in verschillende oplosmiddelen, verschillende verhoudingen en verschillende totaal concentraties bereidt en werden vervolgens gedipcoated of gespincoated op glazen substraten. De stalen werden vervolgens geanalyseerd door atomic force microscopy, steady state en time resolved fluorescence en UV/Vis spectroscopy. De analyse toont dat de morfologie van de films bereidt in chloroform en tetrahydrofuraan gelijkaardig reageren in α- fase en β-fase bij gedipt- en gespincoaten stalen. Terwijl xyleen net omgekeerd reageert als chloroform en tetrahydrofuraan. Bij ethylbenzeen zou de fases maar heel weinig veranderen bij de verschillende stalen.

Bien que ce soit un procédé industriel répandu, les films de copolymères à blocs préparés par trempage (« dip-coating ») sont moins étudiés que ceux obtenus par tournette (« spin-coating »). Pourtant, il est possible grâce à cette technique de contrôler précisément les caractéristiques de ces films. Au-delà de la méthode de fabrication, la capacité de modifier la morphologie des films trempés à l’aide d’autres facteurs externes est un enjeu primordial pour leur utilisation dans les nanotechnologies. Nous avons choisi, ici, d’étudier l’influence d’une petite molécule sur la morphologie de films supramoléculaires réalisés par « dip-coating » à partir de solutions de poly(styrène-b-4-vinyl pyridine) (PS-P4VP) dans le tétrahydrofurane (THF). En présence de 1-naphtol (NOH) et d’1-acide napthoïque (NCOOH), qui se complexent par pont hydrogène au bloc P4VP, ces films donnent, respectivement, une morphologie en nodules (sphères) et en stries (cylindres horizontaux). Des études par spectroscopie infrarouge ont permis de mesurer la quantité de petite molécule dans ces films minces, qui varie avec la vitesse de retrait mais qui s’avère être identique pour les deux petites molécules, à une vitesse de retrait donnée. Cependant, des études thermiques ont montré qu’une faible fraction de petite molécule est dispersée dans le PS (davantage de NOH que de NCOOH à cause de la plus faible liaison hydrogène du premier). La vitesse de retrait est un paramètre clé permettant de contrôler à la fois l’épaisseur et la composition du film supramoléculaire. L’évolution de l’épaisseur peut être modélisée par deux régimes récemment découverts. Aux faibles vitesses, l’épaisseur décroît (régime de capillarité), atteint un minimum, puis augmente aux vitesses plus élevées (régime de drainage). La quantité de petite molécule augmente aux faibles vitesses pour atteindre un plateau correspondant à la composition de la solution aux vitesses les plus élevées. Des changements de morphologie, à la fois liés à l’épaisseur et à la quantité de petite molécule, sont alors observés lorsque la vitesse de retrait est modifiée. Le choix du solvant est aussi primordial dans le procédé de « dip-coating » et a été étudié en utilisant le chloroforme, qui est un bon solvant pour les deux blocs. Il s’avère qu’à la fois la composition ainsi que la morphologie des films de PS-P4VP complexés sont différentes par rapport aux expériences réalisées dans le THF. Premièrement, la quantité de petite molécule reste constante avec la vitesse de retrait mais les films sont plus riches en NCOOH qu’en NOH. Deuxièmement, la morphologie des films contenant du NOH présente des stries ainsi que des lamelles à plat, tandis que seules ces dernières sont observables pour le NCOOH. Ce comportement est essentiellement dû à la quantité différente de petite molécule modulée par leur force de complexation différente avec le P4VP dans le chloroforme. Enfin, ces films ont été utilisés pour l’adsorption contrôlée de nanoparticules d’or afin de guider leur organisation sur des surfaces recouvertes de PS-P4VP. Avant de servir comme gabarits, un recuit en vapeurs de solvant permet soit d’améliorer l’ordre à longue distance des nodules de P4VP, soit de modifier la morphologie des films selon le solvant utilisé (THF ou chloroforme). Ils peuvent être ensuite exposés à une solution de nanoparticules d’or de 15 nm de diamètre qui permet leur adsorption sélective sur les nodules (ou stries) de P4VP. / Although it is an important industrial process, block copolymer thin films obtained by dip-coating have been far less studied than those obtained by spin-coating. However, this technique allows precise control of film properties and morphologies without the need for subsequent annealing. Besides the process itself, the ability to modify the morphology of block copolymer thin films is of interest for their use in nanotechnology applications. Here, we investigated supramolecular thin films of poly(styrene-b-4-vinyl pyridine) (PS-P4VP) dip-coated from tetrahydrofuran (THF) solutions containing small molecules that hydrogen bond to P4VP. In the initial dip-coating conditions, films complexed with 1-naphthol (NOH) show a dot morphology (spheres), whereas those containing 1-naphthoic acid (NCOOH) show a stripe morphology (horizontal cylinders). It was discovered that the amount of small molecule in the film, measured by infrared spectroscopy, varies with dip-coating rate, but is the same for both small molecules at any given rate. A thermal study showed that a small fraction of the small molecule, more NOH than NCOOH due to the weaker H-bond of the former, is dispersed in the PS phase, thus rationalizing the difference in their morphology evolution with rate. Thus, the dip-coating rate is a key parameter for controlling both the average film thickness and, for supramolecular polymers, the film composition. We observed that the evolution of the thickness with rate can be modeled by two regimes, in accordance with a recent literature study on dip-coated sol-gel films. At low rates, the thickness first decreases (capillarity regime), reaches a minimum and, at higher rates, increases (draining regime), resulting in a V-shaped film thickness/dip-coating rate curve. In parallel, the amount of small molecule in the film increases with rate in the capillarity regime before reaching a plateau corresponding to the solution composition in the draining regime. Morphology changes, related to the film thickness and the small molecule content, are therefore observed by modifying the dip-coating rate. We further show that the dip-coating solvent also influences the composition and morphology of the film, by comparing the use of chloroform (CHCl3), which is a good solvent for both blocks, with THF, which is a non-solvent for P4VP. With CHCl3, the small molecule content remains constant with the dip-coating rate, although it is higher for NCOOH than for NOH. Furthermore, the morphology of NOH-containing PS-P4VP thin films shows stripes and flat-on lamellae, whereas those containing NCOOH show only flat-on lamellae. This is attributed to the difference in their small molecule content, possibly modulated by the reduction in solubility of the P4VP block in CHCl3 when complexed with the small molecule. Finally, dip-coated films were used as templates for the controlled adsorption of gold nanoparticles. Prior to adsorption, solvent annealing was applied to the films either to improve the long-range order of the P4VP dots or to change the film morphology, which is dependent on the solvent used (THF or chloroform). They were then exposed to a 15-nm gold nanoparticles solution, which allows the selective adsorption on the P4VP dots (or stripes). It was possible to adsorb one nanoparticle per P4VP dot by matching their diameters.

No description available.

Active layer morphology of polymer-based solar cells plays an important role in improving power conversion efficiency (PCE). In this thesis, the focus is to improve the device efficiency of polymer-based solar cells. In the first objective, active layer morphology of polymer-solar cells was optimized though a novel solvent annealing technique. The second objective was to explore the possibility of replacing the highly sensitive aluminum cathode layer with a low-cost and stable alternative, copper metal. Large scale manufacturing of these solar cells is also explored using roll-to-roll printing techniques. Poly (3-hexylthiophene) (P3HT) and phenyl-C61-butyric acid methyl (PCBM) were used as the active layer blend for fabricating the solar cell devices using bulk heterojunction (BHJ), which is a blend of a donor polymer and an acceptor material. Blends of the donor polymer, P3HT and acceptor, PCBM were cast using spin coating and the resulting active layers were solvent annealed with dichlorobenzene in an inert atmosphere. Solvent annealed devices showed improved morphology with nano-phase segregation revealed by atomic force microscopy (AFM) analysis. The roughness of the active layer was found to be 6.5 nm. The nano-phase segregation was attributed to PCBM clusters and P3HT domains being arranged under the solvent annealing conditions. These test devices showed PCE up to 9.2 % with current density of 32.32 mA/cm2, which is the highest PCE reported to date for a P3HT-PCBM based system. Copper was deposited instead of the traditional aluminum for device fabrication. We were able to achieve similar PCEs with copper-based devices. Conductivity measurements were done on thermally deposited copper films using the two-probe method. Further, for these two configurations, PCE and other photovoltaic parameters were compared. Finally, we studied new techniques of large scale fabrication such as ultrasonic spray coating, screen-printing, and intense pulse light sintering, using the facilities at the Conn Center for Renewable Energy Research at the University of Louisville. In this study, prototype devices were fabricated on flexible ITO coated plastics. Sintering greatly improved the conductivity of the copper nano-ink cathode layer. We will explore this technique’s application to large-scale fabrication of solar cell devices in the future work.