Electric propulsion for spacecraft has become increasingly commonplace in recent decades as designers take advantage of the significant propellant savings it can provide over traditional chemical propulsion. As electric propulsion systems are designed for very low thrust, the operational time required over the course of an entire mission is often quite long. The two most common types of electric thrusters both use hollow cathodes as electron emitters in the process of ionizing the propellant gas. These cathodes are one of the main life-limiting components of both ion and Hall thrusters designed to operate for tens of thousands of hours. Failure often occurs as a result of erosion by sputtering from high-energy ions generated in the plasma. The mechanism that is responsible for creating these high-energy ions is not well understood, and significant efforts have gone into characterizing the plasma produced by hollow cathodes. This work uses both a Langmuir probe and an emissive probe to characterize the variation of the plasma potential and density, the electron temperature, and the electron energy distribution function in the near plume region of a hollow cathode. The cathode used in this experiment is typical of one used in a 200-W class Hall thruster. Measurements were made to determine the variation of these parameters with radial position from the cathode orifice. Changes associated with varying the propellant and flow rate were also investigated. Results obtained from the cathode while running on both argon and xenon are shown. Two different methods for calculating the plasma density and electron temperature were used and are compared. The density and temperature were not strongly affected by reductions in the propellant flow rate. The electron energy distribution functions showed distinct shifts toward higher energies when the cathode was operated at lower flow rates. The plasma potential also displayed an abrupt change in magnitude near the cathode centerline. Significant increases in the magnitude of plasma potential oscillations at lower propellant flow rates were observed. Ions formed at the highest instantaneous plasma potentials may be responsible for the life-limiting erosion that is observed during long-duration operation of hollow cathodes.

The use of electric propulsion for spacecraft primary propulsion, attitude control and station-keeping is ever-increasing as the technology matures and is qualified for flight. In addition, alternative propellants are under investigation, which have the potential to offer systems-level benefits that can enable particular classes of missions. Condensable propellants, particularly iodine, have the potential to significantly reduce the propellant storage system volume and mass. Some of the most widely used electric thrusters are electrostatic thrusters, which require a thermionic hollow cathode electron source to ionize the propellant for the main discharge and for beam neutralization. Failure of the hollow cathode, which often needs to operate for thousands of hours, is one of the main life-limiting factors of an electrostatic propulsion system. Common failure modes for hollow cathodes include poisoning or evaporation of the thermionic emitter material and erosion of electrodes due to sputtering. The mechanism responsible for the high energy ion production resulting in sputtering is not well understood, nor is the compatibility of traditional thermionic hollow cathodes with alternative propellants such as iodine. This work uses both an emissive probe and Langmuir probe to characterize the near-plume of several hollow cathodes operating on both xenon and iodine by measuring the plasma potential, plasma density, electron temperature and electron energy distribution function (EEDF). Using the EEDF the reaction rate coefficients for relevant collisional processes are calculated. A low current (< 5 A discharge current) hollow cathode with two different hexaboride emitters, lanthanum hexaboride (LaB6) and cerium hexaboride (CeB6), was operated on xenon propellant. The plasma potential, plasma density, electron temperature, EEDF and reaction rate coefficients were measured for both hexaboride emitter materials at a single cathode orifice diameter. The time-resolved plasma potential measurements showed low frequency oscillations (<100 kHz) of the plasma potential at low cathode flow rates (<4 SCCM) and spot mode operation between approximately 5 SCCM and 7 SCCM. The CeB6 and LaB6 emitters behave similarly in terms of discharge power (keeper and anode voltage) and plasma potential, based on results from a cathode with a 0.020�-diameter. Both emitters show almost identical operating conditions corresponding to the spot mode regime, reaction rates, as well as mean and RMS plasma potentials for the 0.020� orifice diameter at a flow rate of 6 SCCM and the same discharge current. The near-keeper region plasma was also characterized for several cathode orifice diameters using the CeB6 emitter over a range of propellant flow rates. The spot-plume mode transition appears to occur at lower flow rates as orifice size is increased, but has a minimum flow rate for stable operation. For two orifice diameters, the EEDF was measured in the near-plume region and reaction rate coefficients calculated for several electron- driven collisional processes. For the cathode with the larger orifice diameter (0.040�), the EEDFs show higher electron temperatures and drift velocities. The data for these cathodes also show lower reaction rate coefficients for specific electron transitions and ionization. To investigate the compatibility of a traditional thermionic emitter with iodine propellant, a low-power barium oxide (BaO) cathode was operated on xenon and iodine propellants. This required the construction and demonstration of a low flow rate iodine feed system. The cathode operating conditions are reported for both propellants. The emitter surface was inspected using a scanning electron microscope after various exposures to xenon and iodine propellants. The results of the inspection of the emitter surface are presented. Another low current (< 5 A), BaO hollow cathode was operated on xenon and iodine propellants. Its discharge current and voltage, and plume properties are reported for xenon and iodine with the cathode at similar operating conditions for each. The overall performance of the BaO cathode on iodine was comparable to xenon. The cathode operating on iodine required slightly higher power for ignition and discharge maintenance compared to xenon, as evident by the higher keeper and anode potentials. Plasma properties in the near- plume region were measured using an emissive probe and single Langmuir probe. For both propellants, the plasma density, electron energy distribution function (EEDF), electron temperature, select reaction rate coefficients and time-resolved plasma potentials are reported. For both propellants the cathode operated the same keeper (0.25 A) and discharge current (3.1 A), but the keeper and anode potentials were higher with iodine; 27 V and 51 V for xenon, and 30 V and 65 V for iodine, respectively. For xenon, the mean electron energy and electron temperature were 7.5 eV and 0.7 eV, with bulk drift energy of 6.6 eV. For iodine, the mean electron energy and electron temperature were 6.3 eV and 1.3 eV, with a bulk drift energy of 4.2 eV. A literature review of relevant collisional processes and associated cross sections for an iodine plasma is also presented.

The ball-pen probe is a relatively new diagnostic method, that has been designed for direct measurement of plasma potential in magnetized plasmas. Nowadays, it is routinely used at several high-temperature plasma devices in Europe and it has been tested also in conditions of low-temperature plasma, which are substantially different from that of high-temperature plasma. The measurements performed so far showed, that ball-pen probe could be used also in low-temperature plasma. However, more measurements were needed to prove the applicability of ball-pen probe. Therefore, the main aim of this work is to compare the method of ball-pen probe with simultaneous measurements using Langmuir and emissive probe. Measurements were performed in DC discharge of cylindrical magnetron at various discharge conditions and radial positions of probes. Powered by TCPDF (www.tcpdf.org)

京都大学 / 0048 / 新制・課程博士 / 博士(工学) / 甲第20401号 / 工博第4338号 / 新制||工||1672(附属図書館) / 京都大学大学院工学研究科高分子化学専攻 / (主査)教授 中條 善樹, 教授 赤木 和夫, 教授 秋吉 一成 / 学位規則第4条第1項該当 / Doctor of Philosophy (Engineering) / Kyoto University / DFAM

No description available.

Research on the characterisation and understanding of pulsed magnetron discharges used for the deposition of thin, especially dielectric, films has been carried out between 2003 and 2008 at Chemnitz University of Technology. This thesis is a collection and summary of the original research during this period. In the main part of the thesis, work published in peer-reviewed scientific papers is summarised and yet unpublished results are given in more detail. Different aspects highlighted in the publications are described in a general context of the characterisation of the pulsed discharges for the principal understanding. The cross-linking of the published results is addressed and where necessary extensions to the publications are given. The main part is organised in three sections. In the first one, basics of pulsed magnetron discharges, their application, and important questions are summarised. The second section describes general results and physics of the discharges that have been obtained during the research work. It also emphasises the successful development or modifications of experimental techniques for the time-resolved characterisation. The third section addresses the possibilities to modify and control the process by external parameters that are typically accessible during the application or required by it. An appendix to the thesis comprises selected published research work which is made available as reprints of the original publications. Other publications which are not included as reprints are referenced to in the main part. / Untersuchungen zur Charakterisierung und zum Verständnis gepulster Magnetronentladungen, die zur Abscheidung von dünnen Schichten, besonders von dielektrischen Schichten, verwendet werden, wurden in den Jahren 2003 bis 2008 an der Technischen Universität Chemnitz durchgeführt. Diese Arbeit ist eine Sammlung und Zusammenfassung von neuen Forschungsergebnissen, die in diesem Zeitraum gewonnen wurden. Im Hauptteil der Habilitationsschrift werden die Arbeiten, die in referierten wissenschaftlichen Zeitschriften erschienen sind, zusammengefasst und noch unveröffentlichte Ergebnisse ausführlicher beschrieben. Verschiedene Aspekte, die in den Veröffentlichungen herausgestrichen wurden, werden in einem allgemeinen Zusammenhang der Charakterisierung gepulster Entladungen für ein prinzipielles Verständnis dargestellt. Querverbindungen zwischen den veröffentlichten Ergebnissen werden herausgearbeitet und wo nötig werden Erweiterungen der Originalveröffentlichungen vorgenommen. Der Hauptteil der Habilitationsschrift ist in drei Abschnitte unterteilt. Im ersten Teil werden Grundzüge gepulster Entladungen, ihre Anwendung und wesentliche Fragestellungen zusammengefasst. Der zweite Abschnitt beschreibt allgemeine Ergebnisse und die Physik der Entladungen, die während der Forschungsarbeit herausgearbeitet wurden. Er stellt auch die erfolgreiche Neuentwicklung oder Modifikation von Messtechniken zur zeitaufgelösten Charakterisierung heraus. Der dritte Abschnitt befasst sich mit den Möglichkeiten, den Beschichtungsprozess durch externe Parameter, die typischerweise während der Prozessanwendung zugänglich oder auch erforderlich sind, zu modifizieren und zu steuern. Der Anhang der Schrift beinhaltet ausgewählte Originalveröffentlichungen, die in Form von Reprints zugänglich gemacht werden. Andere Veröffentlichungen, die nicht im Anhang enthalten sind, werden im Hauptteil zitiert.

Research on the characterisation and understanding of pulsed magnetron discharges used for the deposition of thin, especially dielectric, films has been carried out between 2003 and 2008 at Chemnitz University of Technology. This thesis is a collection and summary of the original research during this period. In the main part of the thesis, work published in peer-reviewed scientific papers is summarised and yet unpublished results are given in more detail. Different aspects highlighted in the publications are described in a general context of the characterisation of the pulsed discharges for the principal understanding. The cross-linking of the published results is addressed and where necessary extensions to the publications are given. The main part is organised in three sections. In the first one, basics of pulsed magnetron discharges, their application, and important questions are summarised. The second section describes general results and physics of the discharges that have been obtained during the research work. It also emphasises the successful development or modifications of experimental techniques for the time-resolved characterisation. The third section addresses the possibilities to modify and control the process by external parameters that are typically accessible during the application or required by it. An appendix to the thesis comprises selected published research work which is made available as reprints of the original publications. Other publications which are not included as reprints are referenced to in the main part. / Untersuchungen zur Charakterisierung und zum Verständnis gepulster Magnetronentladungen, die zur Abscheidung von dünnen Schichten, besonders von dielektrischen Schichten, verwendet werden, wurden in den Jahren 2003 bis 2008 an der Technischen Universität Chemnitz durchgeführt. Diese Arbeit ist eine Sammlung und Zusammenfassung von neuen Forschungsergebnissen, die in diesem Zeitraum gewonnen wurden. Im Hauptteil der Habilitationsschrift werden die Arbeiten, die in referierten wissenschaftlichen Zeitschriften erschienen sind, zusammengefasst und noch unveröffentlichte Ergebnisse ausführlicher beschrieben. Verschiedene Aspekte, die in den Veröffentlichungen herausgestrichen wurden, werden in einem allgemeinen Zusammenhang der Charakterisierung gepulster Entladungen für ein prinzipielles Verständnis dargestellt. Querverbindungen zwischen den veröffentlichten Ergebnissen werden herausgearbeitet und wo nötig werden Erweiterungen der Originalveröffentlichungen vorgenommen. Der Hauptteil der Habilitationsschrift ist in drei Abschnitte unterteilt. Im ersten Teil werden Grundzüge gepulster Entladungen, ihre Anwendung und wesentliche Fragestellungen zusammengefasst. Der zweite Abschnitt beschreibt allgemeine Ergebnisse und die Physik der Entladungen, die während der Forschungsarbeit herausgearbeitet wurden. Er stellt auch die erfolgreiche Neuentwicklung oder Modifikation von Messtechniken zur zeitaufgelösten Charakterisierung heraus. Der dritte Abschnitt befasst sich mit den Möglichkeiten, den Beschichtungsprozess durch externe Parameter, die typischerweise während der Prozessanwendung zugänglich oder auch erforderlich sind, zu modifizieren und zu steuern. Der Anhang der Schrift beinhaltet ausgewählte Originalveröffentlichungen, die in Form von Reprints zugänglich gemacht werden. Andere Veröffentlichungen, die nicht im Anhang enthalten sind, werden im Hauptteil zitiert.

One of the key issues of our society is to decrease energy demand. About 40 % of energy consumption in Europe is related to building operation, mostly for heating. The required thermal comfort is related mainly to temperature of air and temperature of surrounding surfaces. Especially in older buildings with low level of thermal insulation the inner surface of perimeter wall can be several degrees colder than air. In such case the perception of thermal comfort will be lowered also depending on the layout of the room. Other issue can be related to thermal radiation asymmetry. The amount of energy that is eradiated from a surface is driven by material property called emissivity. A surface with sufficiently low emissivity will became “thermal mirror”. It is possible to elaborate about intelligent thermal management of the internal space with usage of low-emissive surfaces; where thermal radiation can be suppressed or can be enhanced. This depends on the surface emissivity and its real temperature. Recently, growing interest about the low-emissive surfaces can be seen. They can represent reasonable complement to conventional insulation, but they have certain limits. Potentially, even higher energy savings can be reached with so called retro reflection. If the thermal radiation of an object is reflected back, its thermal loss will be lower. In such case it can be expected that equivalent thermal comfort can be reached even with lower overall temperature of the room. The aim of the work is study of material combinations with potential for utilization as low-emissive interior surfaces. Research has been conducted on low-emissive paints and low-emissive foils. Another part of the work is related to retro reflection of thermal radiation as a potential way to influence thermal comfort. The work shows, that energy saving up to 20% can be obtained.

Research on the characterisation and understanding of pulsed magnetron discharges used for the deposition of thin, especially dielectric, films has been carried out between 2003 and 2008 at Chemnitz University of Technology. This thesis is a collection and summary of the original research during this period. In the main part of the thesis, work published in peer-reviewed scientific papers is summarised and yet unpublished results are given in more detail. Different aspects highlighted in the publications are described in a general context of the characterisation of the pulsed discharges for the principal understanding. The cross-linking of the published results is addressed and where necessary extensions to the publications are given. The main part is organised in three sections. In the first one, basics of pulsed magnetron discharges, their application, and important questions are summarised. The second section describes general results and physics of the discharges that have been obtained during the research work. It also emphasises the successful development or modifications of experimental techniques for the time-resolved characterisation. The third section addresses the possibilities to modify and control the process by external parameters that are typically accessible during the application or required by it. An appendix to the thesis comprises selected published research work which is made available as reprints of the original publications. Other publications which are not included as reprints are referenced to in the main part. / Untersuchungen zur Charakterisierung und zum Verständnis gepulster Magnetronentladungen, die zur Abscheidung von dünnen Schichten, besonders von dielektrischen Schichten, verwendet werden, wurden in den Jahren 2003 bis 2008 an der Technischen Universität Chemnitz durchgeführt. Diese Arbeit ist eine Sammlung und Zusammenfassung von neuen Forschungsergebnissen, die in diesem Zeitraum gewonnen wurden. Im Hauptteil der Habilitationsschrift werden die Arbeiten, die in referierten wissenschaftlichen Zeitschriften erschienen sind, zusammengefasst und noch unveröffentlichte Ergebnisse ausführlicher beschrieben. Verschiedene Aspekte, die in den Veröffentlichungen herausgestrichen wurden, werden in einem allgemeinen Zusammenhang der Charakterisierung gepulster Entladungen für ein prinzipielles Verständnis dargestellt. Querverbindungen zwischen den veröffentlichten Ergebnissen werden herausgearbeitet und wo nötig werden Erweiterungen der Originalveröffentlichungen vorgenommen. Der Hauptteil der Habilitationsschrift ist in drei Abschnitte unterteilt. Im ersten Teil werden Grundzüge gepulster Entladungen, ihre Anwendung und wesentliche Fragestellungen zusammengefasst. Der zweite Abschnitt beschreibt allgemeine Ergebnisse und die Physik der Entladungen, die während der Forschungsarbeit herausgearbeitet wurden. Er stellt auch die erfolgreiche Neuentwicklung oder Modifikation von Messtechniken zur zeitaufgelösten Charakterisierung heraus. Der dritte Abschnitt befasst sich mit den Möglichkeiten, den Beschichtungsprozess durch externe Parameter, die typischerweise während der Prozessanwendung zugänglich oder auch erforderlich sind, zu modifizieren und zu steuern. Der Anhang der Schrift beinhaltet ausgewählte Originalveröffentlichungen, die in Form von Reprints zugänglich gemacht werden. Andere Veröffentlichungen, die nicht im Anhang enthalten sind, werden im Hauptteil zitiert.

Research on the characterisation and understanding of pulsed magnetron discharges used for the deposition of thin, especially dielectric, films has been carried out between 2003 and 2008 at Chemnitz University of Technology. This thesis is a collection and summary of the original research during this period. In the main part of the thesis, work published in peer-reviewed scientific papers is summarised and yet unpublished results are given in more detail. Different aspects highlighted in the publications are described in a general context of the characterisation of the pulsed discharges for the principal understanding. The cross-linking of the published results is addressed and where necessary extensions to the publications are given. The main part is organised in three sections. In the first one, basics of pulsed magnetron discharges, their application, and important questions are summarised. The second section describes general results and physics of the discharges that have been obtained during the research work. It also emphasises the successful development or modifications of experimental techniques for the time-resolved characterisation. The third section addresses the possibilities to modify and control the process by external parameters that are typically accessible during the application or required by it. An appendix to the thesis comprises selected published research work which is made available as reprints of the original publications. Other publications which are not included as reprints are referenced to in the main part. / Untersuchungen zur Charakterisierung und zum Verständnis gepulster Magnetronentladungen, die zur Abscheidung von dünnen Schichten, besonders von dielektrischen Schichten, verwendet werden, wurden in den Jahren 2003 bis 2008 an der Technischen Universität Chemnitz durchgeführt. Diese Arbeit ist eine Sammlung und Zusammenfassung von neuen Forschungsergebnissen, die in diesem Zeitraum gewonnen wurden. Im Hauptteil der Habilitationsschrift werden die Arbeiten, die in referierten wissenschaftlichen Zeitschriften erschienen sind, zusammengefasst und noch unveröffentlichte Ergebnisse ausführlicher beschrieben. Verschiedene Aspekte, die in den Veröffentlichungen herausgestrichen wurden, werden in einem allgemeinen Zusammenhang der Charakterisierung gepulster Entladungen für ein prinzipielles Verständnis dargestellt. Querverbindungen zwischen den veröffentlichten Ergebnissen werden herausgearbeitet und wo nötig werden Erweiterungen der Originalveröffentlichungen vorgenommen. Der Hauptteil der Habilitationsschrift ist in drei Abschnitte unterteilt. Im ersten Teil werden Grundzüge gepulster Entladungen, ihre Anwendung und wesentliche Fragestellungen zusammengefasst. Der zweite Abschnitt beschreibt allgemeine Ergebnisse und die Physik der Entladungen, die während der Forschungsarbeit herausgearbeitet wurden. Er stellt auch die erfolgreiche Neuentwicklung oder Modifikation von Messtechniken zur zeitaufgelösten Charakterisierung heraus. Der dritte Abschnitt befasst sich mit den Möglichkeiten, den Beschichtungsprozess durch externe Parameter, die typischerweise während der Prozessanwendung zugänglich oder auch erforderlich sind, zu modifizieren und zu steuern. Der Anhang der Schrift beinhaltet ausgewählte Originalveröffentlichungen, die in Form von Reprints zugänglich gemacht werden. Andere Veröffentlichungen, die nicht im Anhang enthalten sind, werden im Hauptteil zitiert.