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In decades, the tremendous development of integrated circuits industry could be mostly attributed to SiO2, since its satisfactory properties as a gate dielectric candidate. The effectivity of SiO2 has been challenged since dielectric layer was scaled down below 3nm, when the gate leakage current of SiO2 became unacceptable. Institution to silicon-based CMOS techniques were proposed, but they have their own limitations. Nowadays, materials with high dielectric constants are mainstream gate dielectric materials in industry, but a SiO2 interfacial layer is still necessary to avoid gap between gate dielectric layer and Si substrate, and to minimize interface trap charges. In this thesis work, by applying lateral heating process on Si wafer with thermally grown ultrathin SiO2, the gate leakage current density could be reduced by 3-5 order of magnitude. MOS capacitors were fabricated, and electrical properties were tested with semiconductor parameter analyzer and LCR meter. The underlying mechanism of this appealing phenomenon was explored. Since unacceptable gate leakage current is one of the main reasons which prevent the scaling trend in semiconductor industry, this technology brings a possibility to post-pone the end of scaling trend, and pave a way for extensive application in industry. A new method for fabrication of MOS capacitors metal gate has been developed, and lift-off process has been replaced by wet etching process. This method provides better contact between dielectric layer and metal gate, meanwhile much easier operation.

The research presented in this dissertation explores the possibility of using colloidal indium tin oxide (ITO) nanoparticle solutions to direct write transparent conducting coatings (TCCs), as an alternative route for TCC fabrication. ITO nanoparticles with narrow size distribution of 5-7 nm were synthesized using a non-aqueous synthesis technique, and fabricated into films using spin coating on substrates made from glass and fused quartz. The as-coated films were very transparent (>95% transmittance), but highly resistive, with sheet resistances around 10¹³ Ω/sq . Pre-annealing plasma treatments were investigated in order to improve the electrical properties while avoiding high temperature treatments. Composite RIE treatment recipes consisting of alternating RIE treatments in O₂ plasma and in Ar plasma were able to reduce the sheet resistance of as spin coated ITO films by 4-5 orders of magnitude, from about 10¹³ Ω/sq in as-coated films to about 3 x 10⁸ Ω/sq without any annealing. Plasma treatment, in combination with annealing treatments were able to decrease the sheet resistance by 8-9 orders of magnitude down to almost 10 kΩ/sq , equivalent to bulk resistivity of ~0.67 Ω.cm. Investigation into effectiveness of various RIE parameters in removing residual organics and in reducing the sheet resistance of colloidal ITO films suggested that while reactive ion annealing (RIE) pressure is an important parameter; parameters like plasma power, number of alternating O₂-Ar RIE cycles were also effective in reducing the residual organic content. Impedance spectroscopy analysis of the colloidal ITO films indicated the dominance of the various interfaces, such as grain boundaries, insulating secondary phases, charge traps, and others in determining the observed electrical properties.

The three-dimensional (3-D) writing capability of a high repetition rate (1 MHz) fiber-amplified femtosecond laser with a wavelength of 522 nm was harnessed together with wet-chemical etching for laser-patterning of 3-D optofluidic microsystems in fused silica glass, by the method of Femtosecond Laser Irradiation followed by Chemical Etching (FLICE). Selective chemical etching of laser irradiated glass with dilute hydrofluoric acid (HF) enabled micro-fabrication of high aspect-ratio embedded micro-channels and fine-period 3-D glass meshes in a 3-D inverted woodpile (IWP) arrangement that permitted high density lab-on-a-chip (LOC) integration of flow channels, reservoirs, glass chromatography columns, and optical circuit devices. Optical waveguides, reservoirs, micro-channels, and IWP structures were first laser patterned and followed by selective wet etching controlled by the polarization orientation of the writing laser. With the laser polarization perpendicular to the scanning direction, the volume nanogratings were aligned perpendicular to glass surfaces to facilitate HF etching and thus created designer shaped micro-channels with the smoothest sidewall surfaces measured at present and terminated with open reservoirs. An array of vertical access holes spaced periodically apart facilitated etching of continuous and highly uniform buried channels of unrestricted length in the glass to interconnect flow channels and reservoirs. Alternatively, laser polarization parallel to the scan direction provided low-loss optical waveguides with nanograting walls resisting the acid etching, providing a convenient one-step laser scanning process of optofluidic microsystems prior to wet etching. For the first time, dual-channel capillary electrophoresis was demonstrated by simultaneous fluorescent detection of separating dyes in a 3-D microsystem having over- and under-passing crossed channels in fused silica. In addition, an on-chip particle counting device based on capillary force to drive analytes through an embedded micro-channel into a calibrated reservoir for particle counting was designed and demonstrated. Further, a new type of glass mesh structure is presented where a 3-D IWP micro-channel array with diamond-like symmetry was integrated inside a micro-channel for capillary electrophoretic chromatography. The FLICE technique thus enables rapid prototyping of fully integrated 3-D optofluidic systems in bulk fused silica glasses for numerous applications, and these provide the groundwork and open new 3-D design approaches for advanced microsystems in the future.

The three-dimensional (3-D) writing capability of a high repetition rate (1 MHz) fiber-amplified femtosecond laser with a wavelength of 522 nm was harnessed together with wet-chemical etching for laser-patterning of 3-D optofluidic microsystems in fused silica glass, by the method of Femtosecond Laser Irradiation followed by Chemical Etching (FLICE). Selective chemical etching of laser irradiated glass with dilute hydrofluoric acid (HF) enabled micro-fabrication of high aspect-ratio embedded micro-channels and fine-period 3-D glass meshes in a 3-D inverted woodpile (IWP) arrangement that permitted high density lab-on-a-chip (LOC) integration of flow channels, reservoirs, glass chromatography columns, and optical circuit devices. Optical waveguides, reservoirs, micro-channels, and IWP structures were first laser patterned and followed by selective wet etching controlled by the polarization orientation of the writing laser. With the laser polarization perpendicular to the scanning direction, the volume nanogratings were aligned perpendicular to glass surfaces to facilitate HF etching and thus created designer shaped micro-channels with the smoothest sidewall surfaces measured at present and terminated with open reservoirs. An array of vertical access holes spaced periodically apart facilitated etching of continuous and highly uniform buried channels of unrestricted length in the glass to interconnect flow channels and reservoirs. Alternatively, laser polarization parallel to the scan direction provided low-loss optical waveguides with nanograting walls resisting the acid etching, providing a convenient one-step laser scanning process of optofluidic microsystems prior to wet etching. For the first time, dual-channel capillary electrophoresis was demonstrated by simultaneous fluorescent detection of separating dyes in a 3-D microsystem having over- and under-passing crossed channels in fused silica. In addition, an on-chip particle counting device based on capillary force to drive analytes through an embedded micro-channel into a calibrated reservoir for particle counting was designed and demonstrated. Further, a new type of glass mesh structure is presented where a 3-D IWP micro-channel array with diamond-like symmetry was integrated inside a micro-channel for capillary electrophoretic chromatography. The FLICE technique thus enables rapid prototyping of fully integrated 3-D optofluidic systems in bulk fused silica glasses for numerous applications, and these provide the groundwork and open new 3-D design approaches for advanced microsystems in the future.

In our study, the superhydrophobic surface based on biomimetic lotus leave is explored to maintain the desired properties for self-cleaning. In controlling bead-up and roll-off characteristics of water droplets the contact angle and contact angle hysteresis were very important and we investigated the determining conditions on different model surfaces with micro- and nanostructures. Two governing equations were proposed, one for contact angle based on Laplace pressure and one for contact angle hysteresis based on Young-Dupré equation. Based on these understanding on superhydrophobicity, possible applications of the superhydrophobicity for self-cleaning and water repellency were explored and application related technical issues were addressed. Based on our understanding of the roughness effect on superhydrophobicity (both contact angle and hysteresis), structured surfaces from polybutadiene, polyurethane, silica, and Si etc were successfully prepared. For engineering applications of superhydrophobic surfaces, stability issues regarding UV, mechanical robustness and humid environment need to be investigated. Among these factors, UV stability is the first one to be studied. Silica surfaces with excellent UV stability were prepared. UV stability on the surface currently is 5,500 h according the standard test method of ASTM D 4329. No degradation on surface superhydrophobicity was observed. New methods for preparing superhydrophobic and transparent silica surfaces were investigated using urea-choline chloride eutectic liquid to generate fine roughness and reduce the cost for preparation of surface structures. Another possible application for self-cleaning in photovoltaic panels was investigated on Si surfaces by construction of the two-scale rough structures followed by fluoroalkyl silane treatment. Regarding the mechanical robustness, epoxy-silica superhydrophobic surfaces were prepared by O2 plasma etching to generate enough surface roughness of silica spheres followed by fluoroalkyl silane treatment. A robustness test method was proposed and the test results showed that the surface is among the most robust surfaces for the superhydrophobic surfaces we prepared and currently reported in literature.

Diss. Stockholm : Karol. inst.

Thesis (M.Mat.S.E.)--University of Delaware, 2007. / Principal faculty advisor: Robert L. Opila, Dept. of Materials Science & Engineering. Includes bibliographical references.

Thesis (M.S.)--University of Alabama at Birmingham, 2009. / Title from PDF title page (viewed on Sept. 3, 2009). Includes bibliographical references (p. 32-37).