High-temperature reactors make use of tri-structural coated fuel particles as basic fuel components. These TRISO particles consist of fissionable uranium dioxide fuel kernels, about 0.5 mm in diameter, with each kernel individually encased in four distinct coating layers, starting with a porous carbon buffer, then an inner pyrolytic carbon (IPyC) layer, followed by a layer of ceramic silicon carbide (SiC) and finally an outer pyrolytic carbon layer (OPyC). Collectively, the coating layers provide the primary barrier that prevents release of fission products generated during burn up in the UO2 fuel kernel. It is crucial to understand how the fission products contained within the fuel interact with the coating layers and how they are distributed within the fuel. The first step commonly performed to obtain the information on distribution is removal of the coating layers. The purpose of this study was to investigate the possible use of wet chemical etching techniques with the aim of removing the coating layers of ZrO2 coated fuel particles in a controlled way and to establish experimental parameters for controlled dissolution of irradiated fuel particles. Stepwise dissolution of coated fuel particle coating layers, containing zirconia kernels has been investigated by chemical etching experiments with acidic solutions of different mixtures. The heating methods used include heating by conventional methods, hot plates and a muffle furnace, a reflux-heating system and microwave-assisted digestion. The etching mixtures were prepared from a number of oxidizing acids and other dehydrating agents. The capability of each reagent to etch the layer completely and in a controlled manner was examined. On etching the first layer, the OPyC, the reflux heating method gave the best results in removing the layer, its advantage being that the reaction can be carried out at temperatures of about 130 ºC for a long time without the loss of the acid. The experimental results demonstrated that a mixture composed of equal amounts of concentrated nitric and sulfuric acid mixed with chromium trioxide dissolves the OPyC layer completely. The most favourable experimental conditions for removal of OPyC from a single coated fuel particle were identified and found to depend on the etching solution composition and etching temperature. Light microscopy yielded first-hand information on the surface features of the samples. It allowed fast comparison of etched and untreated sample features. The outer surface of particles prior to chemical etching of the outer pyrolytic carbon layer appeared black in colour with an even surface compared to the etched surfaces which appeared to have an uneven metallic grey, shiny texture. The scanning electron microscope (SEM) examination of the chemically treated outer carbon layer samples gave information on the microstructure and it demonstrated that the outer pyrolytic carbon layer could be readily removed using a solution of HNO3/H2SO4/CrO3, leaving the exposed SiC layer. Complete removal of the layer was confirmed by energy dispersive X-ray spectroscopic (EDS) analysis of the particle surface. For etching the second layer, the silicon carbide layer, microwave-assisted chemical etching was the only heating technique found to be useful. However, experimental results demonstrated that this method has limited ability to digest the sample completely. Also common chemical etchants were found to be ineffective for dissolving this layer. Only fluoride containing substances showed the potential to etch the layer. The results show that a mixture consisting of equal amounts of concentrated hydrofluoric and nitric acid under microwave heating at 200 ºC yielded partial removal of the coating and localized attack of the underlying coating layers. The SEM analyses at different intervals of etching showed: partial removal of the layer, attack of the underlying layers and, in some instances, that attack started at grain boundaries and progressed to the intra-granular features. The SEM results provide evidence that etching of the silicon carbide layer is strongly influenced by its microstructure. From these findings, it is concluded that etching of the silicon carbide under the investigated experimental conditions yields undesirable results and that it does not provide complete removal of the layer. This method has the potential to etch the layer to some extent but has limitations. Copyright / Dissertation (MSc)--University of Pretoria, 2013. / Chemical Engineering / unrestricted

Parmi d’autres caractéristiques, la mémoire électronique idéale doit présenter une faible consommation d'énergie, haute densité et de la rapidité en lecture/écriture/effacement. Différents types de mémoires ont été ainsi développées. Un exemple en l’eSTM (Embedded Select Trench Memory). Ce travail de thèse étudie la caractérisation et l'optimisation des procédés de gravure plasma utilisés dans la fabrication de cette nouvelle technologie développée par STMicroelectronics Rousset, l'eSTM. Ce travail a été fortement lié à la caractérisation des parois du réacteur, le plasma lui-même et la surface de la plaquette de silicium. La caractérisation chimique des surfaces exposées aux plasmas a permis de caractériser et d'optimiser ce nouveau procédé de gravure. De plus, cette étude vise également à comprendre les dépôts sur les parois du réacteur qui se produisent pendant la gravure de la tranchée de l’eSTM. Ces interactions sont responsables de l’absence de reproductibilité des procédés de gravure. La gravure plasma est contrôlée par la formation d'une couche de passivation se formant en surface des flancs du silicium. La maitrise de cette couche par les conditions du plasma (pression, puissance source débit de gaz...) a permis de développer un model innovant afin d'optimiser le CD de la tranchée. De plus, cette thèse a également porté sur l'étude des dérives des CD au niveau des STI (Shallow Trench Isolation). Des mesures correctives ont été développées afin de contrôler les sources de variations en créant une nouvelle stratégie de gravure pour corriger la dispersion des CD entre lots (25 plaquettes de silicium). / Among other characteristics, the ideal memory should have low power consumption, fast read/write/erase and high density solution. Different types of memories have been developed to pursuit these specific properties. Example of this attempt is the eSTM (Embedded Select Trench Memory). This PhD work studies the characterization and optimization of the plasma etching processes for this new technology developed by STMicroelectronics, the eSTM. This work has been highly related to the characterization of the reactor walls, the plasma itself and the wafer surface. The main objectives of this thesis are to understand the fundamental mechanisms of the etching processes and to propose innovative solutions to reduce the variations of CD by reaching the good control of the process desired. This thesis would help for the enhancement of our knowledge on the physical phenomena which happens during this process, especially the passivation. This would offer the possibility of optimize the etch process and get the best CD (Critical Dimension) in terms of electrical results. The emphasis, was put on the characterization to get the maximum knowledge about the interactions taking place during the process, such as plasma-surface interactions and plasma-reactor wall interactions. Furthermore, this thesis was also focused on the optimization of the process drifts at STI (Shallow Trench Isolation) level, since the reproducibility of production processes generates serious concerns in making the component of the chips. Therefore, corrective actions were developed to control the source of variations by creating a regulation loop able to correct the CD dispersion between lots (25wafers).

The aim of the work presented in this thesis is to clarify one of the most fundamental aspects of fatigue damage in bearings steels through critical experiments, in particular whether damage in the form of cracks precedes hard “white-etching matter" formation, which is carbon supersaturated nanoscaled ferrite. Heat treatments have been designed to create four different crack types and distributions: scarce martensite plate cracks, fine grain boundary cracks, abundant martensite plate cracks, and surface cracks. Subsequent rolling contact fatigue experiments showed that the amount of hard white-etching matter is higher in pre-cracked samples compared to those without prior damage and that its formation mechanism is the frictional contact of disconnected surfaces within the bulk that elevate the temperature and localise deformation. These key experiments indicate that hard white-etching matter is the consequence, not the cause, of damage. Therefore, one way to avoid white-etching matter is by increasing the toughness of the material. The macroscopically homogenous distribution of microcracks proved also to be a useful rolling contact fatigue life enhancer due to damage deflection via crack branching and a powerful trap for diffusible hydrogen. Successful trapping was corroborated by the inability of hydrogen to cause crack propagation via embrittlement or accelerate white-etching matter generation during rolling contact fatigue. By also studying the behaviour of a nanostructured bainitic steel under rolling contact fatigue, it was found that its degradation mechanism is ductile void formation at bainitic ferrite/stress-induced martensite interfaces, followed by growth and coalescence into larger voids that lead to fracture along the direction of the softer phase as opposed to the conventional damage mechanism in 52100 steel of crack initiation at inclusions and propagation. Given the relevance of phase quantification in nanobainite and the possible surface artefacts introduced by preparation, alternative methods to X-ray diffraction such as magnetic measurements were also investigated. The lack of hard white-etching matter obtained in the carbide-free nanostructured bainite led to conclude that an alternative route to mitigate hard white-etching matter could be by eliminating pre-eutectoid carbides from the microstructure, therefore restricting their dissolution and ultimate carbon supersaturation of the mechanically deformed and homogenised nanoferrite.

Orientador: Luís Alexandre Maffei Sartini Paulillo / Dissertação (mestrado) - Universidade Estadual de Campinas, Faculdade de Odontologia de Piracicaba / Made available in DSpace on 2018-08-24T07:41:05Z (GMT). No. of bitstreams: 1 Coppini_ErickKamiya_M.pdf: 3349153 bytes, checksum: e0323d6512c30cee2e8ea17128a4c6e6 (MD5) Previous issue date: 2013 / Resumo: The aim of this study was to evaluate the cavosuperficial enamel acid-etching influence in class I cavities, filled with composites on microtensile bond strength, Knoop microhardness and nanoleakage after thermomechanic ageing. It was selected 76 sound molar splitted on: 32 teeth to microtensile test (n=8); 32 teeth to Knoop microhardness (n=8); and 12 teeth (n=3) to nanoleakage analysis. The cavities were prepared on a standard cavity preparation machine. Half of the teeth had the cavosuperficial enamel etched with 35% phosphoric acid and restored with a Silorane restorative system or a Methacrylate restorative system. After the conclusion of the restoration procedures, the teeth were taken to a thermomechanic cycling machine where the artificial ageing was performed with 200.000 mechanical cycles with an 80 N load in a 2HZ frequency and thermocycling by filling the chambers for 30 seconds and 15 seconds drainage with the temperatures varying between 5ºC and 55ºC. The samples were submitted to the microtensile bond strength test, Knoop microhardness and nanoleakage evaluation. To statistical analysis it was performed the ANOVA two-way and Tuckey test (p ? 0,05). The group restored with methacrylate without acid-etching showed the lowest values of microtensile bond strength and it was statistically different to the other groups that have no difference between them. The methacrylate composite presented statistically higher values on Knoop microhardness compared to silorane composite. The nanoleakage analysis showed low infiltration to silorane restorative system and moderate infiltration to the methacrylate restorative system. The methacrylate group restored without enamel acid-etching showed the formation of Water Trees. It can be concluded that the acid-etching improved the bond strength to the methacylate system. The methacrylate composite has bigger Knoop microhardness than silorane composite. The methacrylate restorative system showed moderate infiltration on nanoleakage analysis / Abstract: The aim of this study was to evaluate the cavosuperficial enamel acid-etching influence in class I cavities, filled with composites on microtensile bond strength, Knoop microhardness and nanoleakage after thermomechanic ageing. It was selected 76 sound molar splitted on: 32 teeth to microtensile test (n=8); 32 teeth to Knoop microhardness (n=8); and 12 teeth (n=3) to nanoleakage analysis. The cavities were prepared on a standard cavity preparation machine. Half of the teeth had the cavosuperficial enamel etched with 35% phosphoric acid and restored with a Silorane restorative system or a Methacrylate restorative system. After the conclusion of the restoration procedures, the teeth were taken to a thermomechanic cycling machine where the artificial ageing was performed with 200.000 mechanical cycles with an 80 N load in a 2HZ frequency and thermocycling by filling the chambers for 30 seconds and 15 seconds drainage with the temperatures varying between 5ºC and 55ºC. The samples were submitted to the microtensile bond strength test, Knoop microhardness and nanoleakage evaluation. To statistical analysis it was performed the ANOVA two-way and Tuckey test (p ? 0,05). The group restored with methacrylate without acid-etching showed the lowest values of microtensile bond strength and it was statistically different to the other groups that have no difference between them. The methacrylate composite presented statistically higher values on Knoop microhardness compared to silorane composite. The nanoleakage analysis showed low infiltration to silorane restorative system and moderate infiltration to the methacrylate restorative system. The methacrylate group restored without enamel acid-etching showed the formation of Water Trees. It can be concluded that the acid-etching improved the bond strength to the methacylate system. The methacrylate composite has bigger Knoop microhardness than silorane composite. The methacrylate restorative system showed moderate infiltration on nanoleakage analysis / Mestrado / Dentística / Mestre em Clínica Odontológica

Submitted by Renata Lopes (renatasil82@gmail.com) on 2015-12-07T17:01:41Z No. of bitstreams: 1 carolinaoliveiradeandradefurtado.pdf: 2894297 bytes, checksum: f089f62fc6081d6501fc211279a846ba (MD5) / Approved for entry into archive by Adriana Oliveira (adriana.oliveira@ufjf.edu.br) on 2015-12-07T21:41:56Z (GMT) No. of bitstreams: 1 carolinaoliveiradeandradefurtado.pdf: 2894297 bytes, checksum: f089f62fc6081d6501fc211279a846ba (MD5) / Made available in DSpace on 2015-12-07T21:41:56Z (GMT). No. of bitstreams: 1 carolinaoliveiradeandradefurtado.pdf: 2894297 bytes, checksum: f089f62fc6081d6501fc211279a846ba (MD5) Previous issue date: 2015-04-29 / CAPES - Coordenação de Aperfeiçoamento de Pessoal de Nível Superior / A clorexidina (CHX) é um agente antimicrobiano com capacidade de retardar a ação das metaloproteinases em tecido dentinário condicionado com ácido fosfórico. Mas, especula-se que os produtos de sua reação podem interferir química e fisicamente sobre os valores imediatos de resistência da união (TBS) dos adesivos autocondicionantes universais. O objetivo foi analisar a influência do tratamento da destina com solução de CHX a 2% previamente a aplicação dos adesivos autocondicionantes e universais sobre TBS. Superfícies oclusais de 20 molares humanos hígidos foram removidas para expor superfície dentinária média. Estes foram divididos em 8 grupos de acordo com o tipo de tratamento submetido: SEself- aplicação do sistema adesivo Clearfil SE Bond de acordo com as instruções do fabricante; SEself + CHX: aplicação prévia da clorexidina por 20 s seguido pela lavagem; SBself: aplicação do adesivo Scotchbond Universal de acordo com as instruções do fabricante no modo autocondicionante; SBself + CHX: aplicação prévia de CHX por 20 s seguido da secagem; SEtotal: condicionamento com ácido fosfórico a 35% por 15 s seguido da lavagem, secagem, primer ácido por 10 s, adesivo e fotoativação deste por 10 s; SEtotal + CHX: sequência técnica semelhante ao anterior, porém com aplicação de CHX após o condicionamento ácido; SBtotal: aplicação do adesivo de acordo com as instruções do fabricante no modo condiciomento ácido total; SBtotal + CHX: após o condicionamento com ácido fósforico, a CHX foi aplicada por 20 s seguido pela secagem e aplicação do adesivo. Blocos em resina composta com 5 mm foram construídos sobre as superfícies hibridizadas, seccionados em palitos de 1 mm2 e armazenados em água deionizada a 37 ºC por 24 horas. Após, os corpos de prova foram submetidos ao teste de microtração com velocidade de 1 mm/min até a fratura. As médias obtidas foram submetidas a ANOVA dois fatores e ao teste Tukey (p = 0.05). No modo autocondicionante, os grupos SEself (39,77 ± 11,56MPa) e SBself (40,84 ± 12,49MPa) não diferiram entre si e foram superiores estatisticamente aos grupos Seself + CHX (22,86 ± 5,18MPa) e Sbself + CHX (27,02 ± 5,58MPa), os quais não apresentam diferença estatística entre si. No modo com condicionamento ácido total, o grupo SBU + CHX apresentou a maior média (37,81 ± 11,69MPa), seguido pelos grupos SBtotal (31,53 ± 9,22MPa) e SEtotal+CHX (28,09 ± 4,2MPa). Já o grupo SEtotal (25,95 ± 5,43MPa) apresentou a menor média e foi inferior estatisticamente aos demais. Conclui-se que a aplicação prévia da CHX sobre a dentina interferiu na efetividade dos valores de resistência da união dos sistemas autocondicionantes e universais à dentina. / Chlorhexidine (CHX) is an antimicrobial agent with ability to slow down the action of metalloproteinases in dentin tissue conditioning with phosphoric acid. But, it is speculated that the products of their reaction may interfere chemically and physically on the immediate values of bond strength (TBS) of self-etching universal adhesives. The objective was to analyze the influence of treatment designed with CHX solution 2% prior to application of self-etch and universal adhesives on TBS. Occlusal surfaces of 20 sound human molars were removed to expose middle dentin surface. These were divided into 8 groups according to the type of treatment submitted: SEself- application of Clearfil SE Bond adhesive system according to the manufacturer's instructions; SEself + CHX: prior use of chlorhexidine for 20 s followed by washing; SBself: applying Scotchbond Universal according to the manufacturer's instructions in self-etching mode; SBself + CHX: previous application of CHX for 20 s followed by drying; SEtotal: phosphoric acid etching to 35% for 15 sec followed by washing, drying, primer acid for 10 seconds, adhesive and curing this for 10 seconds; SEtotal + CHX: Technical sequence similar to the above, but with application of CHX after acid etching; SBtotal: applying the adhesive according to the manufacturer's instructions in order condiciomento Total acid; SBtotal + CHX: after phosphoric acid etching, CHX was applied for 20 s followed by drying and application of the adhesive. Composite resin blocks with 5mm were built on the hybridized surfaces, cut into sticks of 1 mm2 and stored in deionized water at 37 °C for 24 hours. Afterwards, the samples were submitted to microtensile test speed of 1 mm/min until failure. The averages were submitted to two factors ANOVA and Tukey test (p = 0.05). In the self-etching mode, the SEself groups (39.77 ± 11,56MPa) and SBself (40.84 ± 12.49) did not differ statistically and were superior to SEself + CHX groups (22.86 ± 5,18MPa) and SBself + CHX (27.02 ± 5,58MPa), which have no statistical difference between them. On the total etching mode, SBU + CHX group had the highest average (37.81 ± 11,69MPa), followed by SBtotal groups (31.53 ± 9,22MPa) and SEtotal + CHX (28.09 ± 4, 2 MPa). Already SEtotal group (25.95 ± 5.43MPa) had the lowest average and was statistically lower to the other groups. It was concluded that the prior application of CHX on dentine interfered in the effectiveness of bond strength values of self-etching dentin and universal systems.

No description available.

Influence optical response on underetching of plasmonic antennas is observed in this thesis. When light falls with resonant wavelength on the optical antennas, the electromagnetic field is amplified near this antennas. The resonant wavelength depends on the length of the antenna and on effective refractive index given by the ambient properties around the antenna. The contact surface with substrate (dielectric) is reduced by underetching the antenna and the effective refractive index is changed and thus the optical response of the antenna is changed.

This master's thesis deals with growth of germanium nanowires using different catalyst particles. The emphasis is mainly layed on fabrication of specific alloyed catalyst consisting of (AgGa). In the first part of the thesis are mentioned two most common concepts of nanowire growth and the importance of phase diagrams for their interpretation. Method for production of alloyed catalyst is demonstrated and experiments focused on the growth of germanium nanowires using this catalyst were performed. Moreover, method for modification of germanium surface via anisotropic etching is demonstrated as well. Such etched structures are suitable for nanowire growth with the help of different kinds of catalyst particles or for the growth of nanowires made of various materials.

This thesis presents a novel method of modulating silicon photonic circuits using 3D printed microfluidic devices. The fluids that pass through the microfluidic device interact directly with the silicon waveguides. This method changes the refractive index of the waveguide cladding, thus changing the effective index of the system. Through using this technique we demonstrate the shift in resonant wavelength by a full free spectral range (FSR) by increasing the concentration of the salt water in the microfluidic device from 0% to 10%. On a 60 μm microring resonator, this equals a resonant wavelength shift of 1.514 nm when the index of the cladding changes by 0.017 refractive index units (RIU), or at a rate of 89.05 nm/RIU. These results are confirmed by simulations that use both analytical and numerical methods. This thesis also outlines the development of a process that uses two-photon absorption(TPA) in silicon to produce a photoelectrochemical (PEC) etching effect. TPA induces free carriers in silicon that then interact with the Hydroflouric Acid (HF) solution that the wafer is submerged in. This interaction removes silicon away from the wafer, which is the etching observed in our experiments. Non-line-of-sight PEC etching is demonstrated. The optical assemblies used in these experiments are presented, as are several of the results of the etching experiments.

This study produced and analyzed shaped tungsten wire tips formed through electrochemical etching. Specifically, the cone length and the radius of curvature of the tip were analyzed. Having the tips move dynamically through an electrolytic solution, such as potassium hydroxide, and tuning the initial starting depth of the tungsten wire along with the dynamic speed of the tungsten wire as it passed throughout the solution allowed various types of tip profiles to be produced. The tip's radius of curvature was able to be reproduced with an accuracy between 88 - 92 %. The method provided would be applicable for the production of various styles of liquid-metal ion source (LMIS) probes and scanning probe microscope (SPM) tips.