The purpose of this study is to investigate the role of strain in the accumulation of crystalline defects created by ion irradiation. Previous studies state that strained Si1xGex is more easily amorphized by ion irradiation than unstrained, bulk Si in a periodic superlattice structure; however, the reason for preferential amorphization of the strained Si1xGex layer in the periodic structure of strained and unstrained layers is not well understood. In this study, various ion irradiations will be carried out on SiGe strained layer superlattices grown on (100)-orientation bulk Si by low temperature molecular beam epitaxy. The samples under investigation are 50 nm surface Si0:8Ge0:2/bulk Si and 50 nm surface Si/60 nm Si0:8Ge0:2/bulk Si. Defects will be created in both surface and buried SiGe strained layers by medium and high energy light ion irradiation. The amount of permanently displaced atoms will be quantified by channeling Rutherford backscattering spectrometry. The amorphization model, the path to permanent damage creation, of bulk Si and surface strained SiGe will be investigated. The strain in surface and buried Si0:8Ge0:2 layers will be measured by comparison to bulk Si with Rutherford backscattering spectrometry by a novel technique, channeling analysis by multi-axial Rutherford backscatter- ing spectrometry, and the limitations of measuring strain by this technique will be explored. Results of this study indicated that the amorphization model, the number of ion collision cascades that must overlap to cause permanent damage, of strained Si0:8Ge0:2 is similar to that of bulk Si, suggesting that point defect recombination is less efficient in strained Si0:8Ge0:2. Additionally, a surface strained Si0:8Ge0:2 is less stable under ion irradiation than buried strained Si0:8Ge0:2. Repeated analysis by multi-axial channeling Rutherford backscattering spectrometry, which requires high fluence of 2 MeV He ions, proved destructive to the surface strained Si0:8Ge0:2 layer.

Self-organization is a hot topic as it has the potential to create surface patterns on the nanoscale avoiding cost-intensive top-down approaches. Although chemists have promising results in this area, ion irradiation can create self-organized surface patterns in a more controlled manner. Different regimes of pattern formation under ion irradiation were described so far by 2D models. Here, two new regimes have been studied experimentally, which require modeling in 3D: subsurface point defect kinetics as well as ion impact-induced melt pool formation. This thesis deals with self-organized pattern formation on Ge and Si surfaces under normal incidence irradiation with heavy monatomic and polyatomic ions of energies up to several tens of keV. Irradiation has been performed using liquid metal ion sources in a focused ion beam facility with mass-separation as well as by conventional broad beam ion implantation. Irradiated samples have been analyzed mainly by scanning electron microscopy. Related to the specific irradiation conditions, investigation and discussion of pattern formation has been divided into two parts: (i) formation of Ge morphologies due to point defect kinetics and (ii) formation of Ge and Si morphologies due to melt pool dynamics. Point defect kinetics dominates pattern formation on Ge under irradiation with monatomic ions at room temperature. Irradiation of Ge with Bi and Ge ions at fluences up to 10^17 cm^(-2) has been performed. Comprehensive studies show for the first time that morphologies change from flat surfaces over hole to nanoporous, sponge-like patterns with increasing ion energy. This study is consistent with former irradiations of Ge with a few ion energies. Based on my studies, a consistent, qualitative 3D model of morphology evolution has been developed, which attributes the ion energy dependency of the surface morphology to the depth dependency of point defect creation and relaxation. This model has been proven by atomistic computer experiments, which reproduce the patterns found in real irradiation experiments. At extremely high energy densities deposited by very heavy ions another mechanism dominates pattern formation. The formation of Ge and Si dot patterns by very heavy, monatomic and polyatomic Bi ion irradiation has been studied in detail for the first time. So far, this formation of pronounced dot pattern cannot be explained by any model. Comprehensive, experimental studies have shown that pattern formation on Ge is related to extremely high energy densities deposited by each polyatomic ion locally. The simultaneous impact of several atoms leads to local energy densities sufficient to cause local melting. Heating of Ge substrates under ion irradiation increases the achievable energy density in the collision cascade substantially. This prediction has been confirmed experimentally: it has been found that the threshold for nanomelting can be lowered by substrate heating, which allows pattern formation also under heavy, monatomic ion irradiation. Extensive studies of monatomic Bi irradiation of heated Ge have shown that morphologies change from sponge-like over highly regular dot patterns to smooth surfaces with increasing substrate temperature. The change from sponge-like to dot pattern is correlated to the melting of the ion collision cascade volume, with energy densities sufficient for melt pool formation at the surface. The model of pattern formation on Ge due to extremely high deposited energy densities is not specific to a single element. Therefore, Si has been studied too. Dot patterns have been found for polyatomic Bi ion irradiation of hot Si, which creates sufficiently high energy densities to allow ion impact-induced melt pool formation. This proves that pattern formation by melt pool formation is a novel, general pattern formation mechanism. Using molecular dynamics simulations of project partners, the correlation between dot patterning and ion impact-induced melt pool formation has been proven. The driving force for dot pattern formation due to high deposited energy densities has been identified and approximated in a first continuum description.

The dissociation of fast hydrogen and nitrogen molecular ions with kinetic energies ranging from 200 to 2000 eV/atom is studied for grazing collisions with various fcc metal surfaces. Within this energy range, the dissociation is either caused by electron capture into antibonding molecular states or by vibrational and rotational excitation. In contrast to hydrogen, nitrogen is chemically inert and interacts mainly elastically with the surfaces; thus there is no dissociation via electron capture. The processes of vibrational and rotational excitation are simulated using a molecular dynamics simulation with interaction potentials based on density functional theory. The comparison with the data obtained from Time-Of-Flight experiments reveals that an additional electronic effect has to be taken into account: The intramolecular bond of the molecules is softened due to electronic screening during the interaction with the surface. Hence, the softened molecules are more likely to dissociate through elastic collisions with surface atoms. The dissociation of hydrogen at low energies on metallic surfaces is dominated by electronic processes. An analysis of the kinetic energy distributions of the scattered dissociation products reveals information about the energy which is released during the dissociation process. The model of electronically induced dissociation is clearly confirmed by this method. However, an increasing contribution of additional mechanical processes becomes apparent at higher energies.

Self-organization is a hot topic as it has the potential to create surface patterns on the nanoscale avoiding cost-intensive top-down approaches. Although chemists have promising results in this area, ion irradiation can create self-organized surface patterns in a more controlled manner. Different regimes of pattern formation under ion irradiation were described so far by 2D models. Here, two new regimes have been studied experimentally, which require modeling in 3D: subsurface point defect kinetics as well as ion impact-induced melt pool formation. This thesis deals with self-organized pattern formation on Ge and Si surfaces under normal incidence irradiation with heavy monatomic and polyatomic ions of energies up to several tens of keV. Irradiation has been performed using liquid metal ion sources in a focused ion beam facility with mass-separation as well as by conventional broad beam ion implantation. Irradiated samples have been analyzed mainly by scanning electron microscopy. Related to the specific irradiation conditions, investigation and discussion of pattern formation has been divided into two parts: (i) formation of Ge morphologies due to point defect kinetics and (ii) formation of Ge and Si morphologies due to melt pool dynamics. Point defect kinetics dominates pattern formation on Ge under irradiation with monatomic ions at room temperature. Irradiation of Ge with Bi and Ge ions at fluences up to 10^17 cm^(-2) has been performed. Comprehensive studies show for the first time that morphologies change from flat surfaces over hole to nanoporous, sponge-like patterns with increasing ion energy. This study is consistent with former irradiations of Ge with a few ion energies. Based on my studies, a consistent, qualitative 3D model of morphology evolution has been developed, which attributes the ion energy dependency of the surface morphology to the depth dependency of point defect creation and relaxation. This model has been proven by atomistic computer experiments, which reproduce the patterns found in real irradiation experiments. At extremely high energy densities deposited by very heavy ions another mechanism dominates pattern formation. The formation of Ge and Si dot patterns by very heavy, monatomic and polyatomic Bi ion irradiation has been studied in detail for the first time. So far, this formation of pronounced dot pattern cannot be explained by any model. Comprehensive, experimental studies have shown that pattern formation on Ge is related to extremely high energy densities deposited by each polyatomic ion locally. The simultaneous impact of several atoms leads to local energy densities sufficient to cause local melting. Heating of Ge substrates under ion irradiation increases the achievable energy density in the collision cascade substantially. This prediction has been confirmed experimentally: it has been found that the threshold for nanomelting can be lowered by substrate heating, which allows pattern formation also under heavy, monatomic ion irradiation. Extensive studies of monatomic Bi irradiation of heated Ge have shown that morphologies change from sponge-like over highly regular dot patterns to smooth surfaces with increasing substrate temperature. The change from sponge-like to dot pattern is correlated to the melting of the ion collision cascade volume, with energy densities sufficient for melt pool formation at the surface. The model of pattern formation on Ge due to extremely high deposited energy densities is not specific to a single element. Therefore, Si has been studied too. Dot patterns have been found for polyatomic Bi ion irradiation of hot Si, which creates sufficiently high energy densities to allow ion impact-induced melt pool formation. This proves that pattern formation by melt pool formation is a novel, general pattern formation mechanism. Using molecular dynamics simulations of project partners, the correlation between dot patterning and ion impact-induced melt pool formation has been proven. The driving force for dot pattern formation due to high deposited energy densities has been identified and approximated in a first continuum description.