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In this thesis the in-plane pattern distortion resulting from the use of Evanescent Near Field Optical Lithography (ENFOL) masks was investigated. ENFOL is a high resolution low-cost technique of lithography that is able to pattern features beyond the diffraction limit of light. Due to its use of the evanescent near field, ENFOL requires the use of conformable masks for intimate contact. Such masks can stretch and skew as they come into contact with silicon substrates and therefore distort the high resolution features patterned on them. It was desired to measure this distortion to ascertain the patterning performance of ENFOL masks and possibly correct for any uniform distortion found. To this end a sophisticated measuring process was successfully demonstrated. This involved the use of a Raith 150 Electron Beam Lithography (EBL) system with precision laser interferometer stage and metrology software module for automated measurements. Custom software was written for the Raith to enable it to take additional measurements to compensate for electron beam drift. Processing algorithms were then employed to using the measurements to compensate for beam drift and correcting for shift and rotation systematic errors. The performance of the in-plane distortion measuring process was found to have a precision of 60nm. With the ability to measure distortion, ENFOL masks were used to pattern substrates and distortion was found to be large, on the order of 1µm. This is much larger than desired for sub 100nm patterning as is expected of ENFOL. The distortions were non-uniform patterns of localised displacements. This, the observation of Newton's rings beneath a test mask and the observation of a single particle distortion across measurements of the same mask across different loadings in the EBL pointed to particulate contamination causing the distortion. In order to prove beyond doubt that particulate contamination was the cause of the spurious distortions, mechanical modelling using the Finite Element Method (FEM) of analysis was employed. The results from this matched the distortions observed experimentally, particles 20-40µm modelling the observed distortion.

Although a large number of works on nanoimprint lithography (NIL) techniques have been reported, the the ability for three-dimensional (3-D) patterning using NIL has not been fully addressed in terms of the mold fabrication and imprint processes. Patterning 3-D and multilevel features are important because they eliminate multiple steps and complex interlevel alignments in the nanofabrication process. The 3-D and multilevel mold design and fabrication, and imprint processes have been studied and investigated in this research work. In the UV-NIL technique, a transparent mold with micro/nanostructure patterns on its surface is allowed to be replicated on UV curable polymer without the need of high applied pressure or temperature. UV-NIL has the potential to fabricate micro/nanostructures with high resolution, high reproducibility, low cost, high throughput and is capable of 3-D patterning. This research focuses on two aspects; the development of mold making and imprint processes. In the process of making a master mold, an EBL technique was employed for writing patterns on e-beam resists. PMMA positive resist was used for 2-D patterning and ma-N2403 negative resist from Microresist Technology was used for 3-D patterning. After being developed, the 3-D mold pattern was transferred onto quartz substrate using a single-step reactive ion etching (RIE) technique. A number of challenging issues such as surface charging, electron scattering and proximity effects surfaced during the EBL pattern writing on insulating and transparent molds. A number of new approaches have been developed for suppressing the charging effects in the 2-D and 3-D patterning. Using thin metallic coating on the quartz substrates or on top of the resist, or conductive polymer coating using PEDOT/PSS on top of the resist has demonstrated excellent results in a 2-D structure with a high aspect-ratio of 1:10 and feature sizes down to 60 nm. In 3-D patterning, two approaches have been followed; the critical energy method and/or a top coating of conductive polymer (PEDOT/PSS) layer. Isolated 3-D structures with feature sizes down to 500 nm were successfully fabricated using the first method while by using the second method, dense 3-D structures patterns with feature sizes down to 300 nm, on 400 nm pitch have been demonstrated. In UV-NIL, the surface roughness Rq(rms) should be less than 5 nm, which is important for replicating optical structures and devices. In this work, the RIE process been optimized to yield 2 nm roughness on a patterned quartz surface. This was achieved by optimizing the RIE process pressure of below 6 mTorr. The other part of this thesis is on replication or imprinting of 2-D and 3-D structures. In the process of replicating the master mold profiles, the imprint processes were carried out using a vacuum operated manual imprint tool which was attached to a Mask Aligner UV illumination system. In 2-D imprinting, resist sticking on the vertical side wall was the main issue, especially on high aspect ratio structures. Meanwhile in 3-D imprinting, the imprint results have shown good reproducibility in up to 15 imprint cycles, where the issue of Ormocomp soft/daughter mold cracking after long UV exposure had limited the repetition of the imprint cycles. In this thesis, the 2-D and 3-D resist patterning on insulating substrates using the EBL technique have been demonstrated with the assistance of a number of developed charge suppression methods. Single-step RIE pattern transfer onto quartz substrates with surface roughness below 5nm has been achieved. Replication of 3-D and multilevel structures reliably make the UV-NIL technique suitable for future applications such as surface texturing, optical devices and many other complex structures including MEMS.

Rapid creation of devices with microscale features is a vital step in the commercialization of a wide variety of technologies, such as microfluidics, fuel cells and self-healing materials. The current standard for creating many of these microstructured devices utilizes the inexpensive, flexible material poly-dimethylsiloxane (PDMS) to replicate microstructured molds. This process is inexpensive and fast for small batches of devices, but lacks scalability and the ability to produce large surface-area materials. The novel fabrication process presented in this paper uses a cylindrical mold with microscale surface patterns to cure liquid PDMS prepolymer into continuous microstructured films. Results show that this process can create continuous sheets of micropatterned devices at a rate of 1.9 in2/sec (~1200 mm2/sec), almost an order of magnitude faster than soft lithography, while still retaining submicron patterning accuracy.

The deterministic microasperities play a vital role in reducing the coefficient of friction and wear of thrust surfaces and improve the tribological properties of the surfaces. Deterministic microasperities have a specific pattern in terms of size, shape and spacing. These specified geometries are controllable and repeatable. The microasperities are micron scaled asperities and cavities on a surface that form the surface roughness. The present thesis shows the detailed process to fabricate the deterministic microasperities on thrust surfaces, i.e. stainless substrate, using micro-fabrication processes such as lapping and ultra-violet photolithography in combination with an electroplating (nickel) process. A Novel alignment technique is used to align the photomask with the substrate to get repeatable and aligned patterns on the thrust surface. Deterministic microasperities are characterized by using precision instruments such as an Optical profilometer, Scanning Electron Microscope (SEM) and Optical microscope to study the various surface parameters such as Average roughness (Ra), Root mean square value (rms) and Peak value (PV) of the thrust surface.

Noble metal nanoparticles are of great interest due to their tunable optical and radiative properties. The specific wavelength of light at which the localized surface plasmon resonance occurs is dependent upon the shape, size and composition of the particle as well as the dielectric constant of the host medium. Thus, the optical properties of noble metal nanoparticles can be systematically tuned by altering these specific parameters. The purpose of this thesis is to investigate some of these properties related to metallic nanoparticles. The first several chapters focus on theoretical modeling to predict and explain various plasmonic properties of gold and silver nanoparticles while the later chapters focus on more accurately combining experimental and theoretical methods to explain the plasmonic properties of hollow gold nanoparticles of various shapes. The appendix contains a detailed description of the theoretical methods used throughout the thesis. It is intended to serve as a guide such that a user could carry out the various types of calculations discussed in this thesis simply by reading this appendix.

Carbon nanotubes (CNTs) are nanometer-scale structures that have attracted broad interest due to their exceptional thermal, electronic, and mechanical properties. As a result, there has been a large effort to develop applications of these materials in various fields including nanoelectronics and nanophotonics, energy storage, and biomedical fields. However, controlled production and manufacturing of CNTs still remains a challenge. In this work we demonstrate a method for controlling the placement and distribution of carbon nanotubes on surfaces using colloidal lithography. CNTs in ring-like geometries display interesting properties due to their nanoscale curved structure. Although several methods have been introduced for the fabrication of these structures, large scale fabrication of CNT rings with controllable diameter in a practical manner has thus far been elusive. Here, we use colloidal lithography to assemble nanotubes from solution into rings with tunable diameter and controllable placement in large-area periodic arrays. Several parameters and conditions such as the mask size, concentration and type of solvent for the CNT solutions are tested, and nanotubes with different quality and purity are used. Characterization of the CNT ring arrays using scanning electron microscopy (SEM) and atomic force microscopy (AFM) are performed. These results demonstrate large periodic areas of rings with good uniformity throughout the arrays. The arrays consist of rings with diameters between 180–220 nm when using 780 nm diameter sphere colloidal masks. Analysis of ring thickness for these rings indicated their cross-sections are composed of approximately 10-15 individual tubes. Rings made with 450 nm spheres had diameters between 100-150 nm, showing the tunability of the ring diameter enabled by our method. In some cases, mesh-like structures in the form of periodic interconnected carbon nanotubes were also observed. Our results demonstrate an efficient and straightforward approach for patterning carbon nanotubes into well-defined surface distributions with controlled and tunable dimensions.