La complexification des intégrations sur les puces électroniques et la course à la miniaturisation sont les deux moteurs actuels de la microélectronique. Les limites optiques de la lithographie sont déjà atteintes depuis longtemps. Ainsi, la fabrication doit aussi être contrôlée de plus en plus étroitement afin d’éviter des variabilités qui nuiraient au bon fonctionnement du produit. Cette thèse présente une approche holistique du contrôle d’un des paramètres les plus importants de la photolithographie : le focus. Celui-ci est directement lié à la qualité de l’image transférée dans la résine photosensible pendant l’exposition. Son contrôle est donc primordial. Les sources de variabilités du focus sur le wafer sont multiples et diverses mais le cas particulier de la topographie du substrat a été privilégié dans cette étude. L’approche holistique de cet effet en particulier a conduit à l’utilisation d’outils de « data mining » telle la régression par la méthode des moindres carrés partiels qui a permis de pointer les principales causes de cette topographie, de créer un modèle prédictif de la topologie mais aussi d’évaluer des solutions d’améliorations comme l’amélioration des corrections qu’effectue le scanner permettant un meilleur contrôle généralisé de toutes les technologies sans toutefois changer l’intégration et le design ou encore la mise en place d’une méthode qui permet d’évaluer les erreurs de focus sur le wafer sans pour autant avoir recours à des mesures intensives sur silicium. D’autres solutions permettent de corriger les facteurs de risques à la source en modifiant le design afin de limiter la formation de la topologie de surface / The increasing complexity in chip integration (co-integration, increasing diversity of matérials…) and the race to dimension shrinkage are the two main drivers of research in microelectronics today. The optical limitations of lithography have been reached some years ago so that double patterning is now a typical process flow in production and helps reducing pattern size and increasing design density. Because of these, the manufacturing itself needs to be more tightly controlled in order to avoid marginalities. Which will affect the chip operation. The cross-effects between these elements are more numerous and their ratio in the total budget is larger whereas the needs for tighter process control are rising. This thesis presents a holistic approach of the control of one of the main parameters for photolithography: focus. It is directly linked to the quality of the image transferred into the photoresist during exposure. Its control is then essential. Variability sources for focus are manifold and diverse: laser, mask, optical column, servo-controllers, wafer flatness, integration, design, substrate reflectivity, material quality etc. All these are added to each other, leading to the creation of defects which can be catastrophic such as shorts. The first objective of this work was to show current challenges raised by STMicroelectronics new technologies, specifically photolithography-wise and focus-wise. A budget breakdown of two critical processes (Metal line patterning in 28nm FD-SOI and Contact patterning for 14nm FD-SOI) has been established which gives the impact of every effect. The product layout effects were evaluated to represent up to 20% of the complete budget and 50% of its intra-chip component. Topography contributes to a large part of these effects and offline measurements showed up to 32nm 3s of height variation in a single field. This may lead to local defocuses of the same order of magnitude. The usable depth of field being about 60 to 70nm for the studied layers, it is clear that focus control is really tight here. The holistic approach of topology leaded to the use of data mining tooling as PLS regression (Partial least Square). It allowed the highlighting of main causes of topography, the creation of a predictive model of topology and the evaluation of several improvement solutions. One may distinguish “palliative” and “curative” solutions. In the first category, on may put scanner levelling improvements which might be effective for every technology without any modification to make on integration and design. The emulated wafer map methodology providing on-product focus non-uniformities without any measurements is also a solution for investigation. “Curative” solutions may concern the mitigation of risk factors by modifying the design topography built-up main factors

Orientador: Ivo Milton Raimundo Junior / Tese (doutorado) - Universidade Estadual de Campinas, Instituto de Quimica / Made available in DSpace on 2018-08-11T10:12:39Z (GMT). No. of bitstreams: 1 Fonseca_Alexandre_D.pdf: 7116553 bytes, checksum: dfa6bce9b276600fe0ac2ff916aa79e1 (MD5) Previous issue date: 2008 / Resumo: Este trabalho descreve a construção, caracterização e aplicação de microssistemas para análise em fluxo. A ablação por laser foi utilizada para o desenvolvimento de um sistema em poli(metilmetacrilato), cujos canais, com seções transversais retangulares medindo 200 mm de largura e 4,5 mm de profundidade, foram selados com um filme plástico adesivo. Este dispositivo suportou vazões de até 2,0 mL min sem apresentar vazamentos e a sua aplicação para a determinação fotométrica de Fe(II) em medicamentos proporcionou resultados que não diferiram significativamente daqueles obtidos por espectrometria de absorção atômica ao nível de 95 % de confiança. A fotolitografia profunda no ultravioleta foi empregada para a construção de microssistemas em resina a base de uretana-acrilato. Os canais com seções transversais triangulares e dimensões entre 200 e 600 mm foram selados com uma camada do próprio substrato, formando uma estrutura monolítica que suportou vazões de ate 3,0 mL min. Fibras ópticas plásticas e agulhas hipodérmicas foram acopladas aos dispositivos e utilizadas para a integração dos sistemas ópticos de detecção e para o acesso das soluções de trabalho, respectivamente. Um microssistema com célula integrada para detecção fluorimétrica e dois pontos de confluência foi aplicado a determinação de íons Ca e Mg em águas minerais. Outros dois dispositivos foram aplicados separadamente a determinação fotométrica de íons Cr(VI) em águas contaminadas e em ligas metálicas e a determinação de íons ions Cl em águas minerais. Para todas as aplicações, as concentrações determinadas através dos métodos com os microssistemas foram concordantes com aquelas determinadas através dos métodos em batelada (espectrofotometria e volumetria de complexação). A geração de volumes extremamente pequenos de resíduos (cerca de 25 mL de solução para uma jornada de 8 horas de trabalho) indicou que os dispositivos propostos cumprem adequadamente os requisitos estabelecidos pela Química Verde / Abstract: This work describes the construction, characterization and application of microsystems for flow analysis. Laser ablation was employed for the development of a system in poly(methylmethacrylate), whose channels, with rectangular cross sections measuring 200 mm width by 4,5 mm depth, were sealed with an adhesive plastic film. This device supported flow rates up to 2,0 mL min without leaking and its application for the photometric determination of Fe(II) in medicines provided results that did not differ significantly of those obtained by flame atomic absorption spectrometry at a confidence level of 95 %. The deep UV-photolithography was used for the construction of microsystems in urethane / acrylate based resin. The channels with triangular cross sections and dimensions between 200 e 600 mm were sealed with a layer of the same resin, forming a monolithic structure that supported flow rates up to 3.0 mL min. Plastic optical fibers and hypodermic needles were coupled to the devices and used for the integration of the optical detection systems and for the access of the working solutions, respectively. A microsystem with an integrated flow cell for fluorimetric detection and two confluence points was applied to the determination of Ca e Mg in mineral waters. Other two devices were separately applied to the photometric determination of Cr(VI) in contaminated waters and in metallic alloys, and to the determination of Cl in mineral waters. For all the applications, the concentrations obtained agreed with those determined by batch methods (spectrophotomety and complexometric titration). The generation of extremely small volumes of residues (ca. 25 mL of solution after an 8-h working day) indicates that the proposed devices appropriately accomplish the requirements established by the Green Chemistry / Doutorado / Quimica Analitica / Doutor em Ciências

Metastatic cancer is more dangerous and difficult to treat than pre-metastatic cancer. Ninety percent of cancer-related deaths are caused by metastatic cancer. When cells go through metastases, they go through changes that allow them to break away from the primary tumor and invade secondary tissues. These changes, in lipid membrane composition and cellular glycocalyx, make the cell more resistant to therapeutics. Actin cytoskeleton contractility plays a major role in these changes, as increased contractility has been linked to upregulation of phosphoinositides and production of glycoproteins. Light induced molecular adsorption of proteins (LIMAP) was used to control the actin arrangement and cell shape in order to mimic and study metastatic cells. Negatively charged proteins electrostatically adhere to the surface in order to create patterns for the cells to stick. Neutravidin was conjugated to poly(glutamic acid) to improve attachment to the surface. We observed differences in cell shape and phosphoinositide behavior based on LIMAP patterning. Additionally, expression of key glycoproteins related to cancer metastasis increased with increased actin contractility. The actin cytoskeleton was the main driver of changes to the cell membrane and glycocalyx.

This thesis focuses on the theory, fabrication, and characterization of 2-port surface acoustic wave (SAW) resonators, as well as the application of their Fabry-Pérot resonance modes for strain sensing. The thesis includes three articles. In the first article, a fabrication method for high frequency SAW devices using traditional UV photolithography equipment is developed. It is well known that SAW sensors become more sensitive at higher frequencies but realizing high frequency devices requires small features which challenge existing photolithography methods. The proposed process is a modified version of a previously reported tri-layer lift-off photolithography process intended for Si or SiO2 substrates which allows for compatibility with materials that are piezoelectric and pyroelectric, often used as the substrate in SAW devices. The process uses a lithographic tri-layer consisting of layers of lift-off resist (LOR) on the bottom, back anti-reflection coating (BARC) in the middle, and photoresist (PR) on top, improving resolution by a factor of two over traditional lift-off photolithography techniques. We demonstrate the fabrication of a SAW device with an interdigital transducer (IDT) pitch of 4 μm (minimum feature size of 1 μm) on 128o Y-X cut lithium niobate, whose operating frequency is measured as 994.5 MHz. The 2-Port SAW devices that are used in subsequent chapters are fabricated using this process. The second article proposes a method of analyzing acoustic Fabry-Pérot spectra, by analogy with optical cavities, to determine key SAW parameters. In our experiment, 2-port SAW resonators, consisting of two interdigital transducers (IDTs) laterally separated by a free surface cavity length, are used to generate SAWs on 128o Y-X lithium niobate that are trapped between the two IDTs which also act as Bragg reflectors. Fabry-Pérot cavity peaks can be observed through the electrical S11 (reflection) spectrum measured on one IDT, hence a 2-Port resonator is equivalent to an acoustic Fabry-Pérot cavity/resonator. Measurements of the free spectral range and linewidths are then fitted to linear models to obtain the free surface velocity and attenuation of SAW waves, as well as the reflection of interdigital transducers (IDTs), all of which are crucial design parameters. Our method of analyzing Fabry-Pérot spectra provides a convenient method for determining key characteristics of SAW waves and cavities. In the third article, a surface acoustic wave (SAW) strain sensor based on measuring acoustic Fabry-Pérot resonance peaks from a 2-port SAW resonator is demonstrated. A theoretical analysis is proposed to estimate the frequency sensitivity to strain of IDT and cavity resonances and to predict strain distributions in both the cavity and IDT regions of a 2-port SAW resonator bonded to a tapered cantilever beam. The frequency stability of cavity resonance peaks for fabricated 2-port SAW resonators of different cavity length are measured and analyzed to determine the cavity length which exhibits maximum frequency stability. A cross-correlation analysis technique is then introduced to improve the detection of the frequency shift of SAW resonances and enable multimode frequency shift detection. The measured frequency sensitivity to strain of the cavity resonances of a resonator 10 mm in length (operating frequency = 97.7 MHz) was found to be -103.2 ± 0.2 Hz/με while demonstrating excellent linearity (R2 = 0.9999). By considering a minimum signal to noise ratio (SNR) of 3 dB, the device exhibits a minimum strain resolution of only 234 nε.

Indiana University-Purdue University Indianapolis (IUPUI) / A new process for fabricating a nano fluidic device that can be used in medical application is developed and demonstrated. Nano channels are fabricated using a nano tip in indentation mode on AFM (Atomic Force Microscopy). The nano channels are integrated between the micro channels and act as a filter to separate biomolecules. Nano channels of 4 to7 m in length, 80nm in width, and at varying depths from 100nm to 850 nm allow the resulting device to separate selected groups of lysosomes and other viruses. Sharply developed vertical micro channels are produced from a deep reaction ion etching followed by deposition of different materials, such as gold and polymers, on the top surface, allowing the study of alternative ways of manufacturing a nano fluidic device. PDMS (Polydimethylsiloxane) bonding is performed to close the top surface of the device. An experimental setup is used to test and validate the device by pouring fluid through the channels. A detailed cost evaluation is conducted to compare the economical merits of the proposed process. It is shown that there is a 47:7% manufacturing time savings and a 60:6% manufacturing cost savings.

No description available.

京都大学 / 新制・課程博士 / 博士(工学) / 甲第23897号 / 工博第4984号 / 新制||工||1778(附属図書館) / 京都大学大学院工学研究科材料工学専攻 / (主査)教授 杉村 博之, 教授 山田 啓文, 教授 邑瀬 邦明 / 学位規則第4条第1項該当 / Doctor of Philosophy (Engineering) / Kyoto University / DFAM

Modern semiconductor manufacturing requires photolithographic printing of subillumination wavelength features in photoresist via electromagnetic energy scattered by complicated photomask designs. This results in aerial images which are subject to constructive and destructive wave interference, as well as electromagnetic resonances in the photomask features. This thesis proposes a 3-D full-wave frequency domain nonconformal Octree mesh based Finite Element Method (OFEM) electromagnetic scattering solver in combination with Fourier Optics to accurately simulate the entire projection photolithography system, from illumination source to final image intensity in the photoresist layer. A rapid 1-irregular octree based geometry model mesher is developed and shown to perform remarkably well compared to a tetrahedral mesher. A special set of nonconformal 1st and 2nd order hierarchal OFEM basis functions is presented, and 1st order numerical results show good performance compared to tetrahedral FEM. Optical and modern photomask phenomenology is examined, including optical proximity correction (OPC) with thick PEC metal layer, and chromeless phase inversion (PI) masks.

This dissertation focuses on fiction and pictorials (huabao, 畫報) in the early twentieth century and its relation with the new visual technologies of the time, mainly photolithography, but also lantern slides and photography. It explores how these visual mediums were self-reflected in fiction and pictorials and how they connected these two literary expressions, as well as their constant transformation. It concludes that this type of intermediality and self-reflexivity came as a response to China’s modernization during the late Qing Empire (1868-1911). Most scholars agreed that photolithography was the catalyst for reproducing visual images in large quantities, which facilitated the hybrid publishing space of pictorials and, in tandem with the other visual mediums, allowed them to act as a multimedia platform. My dissertation demonstrates how fiction also participated in this new visual media ecology created by photolithography and thus contributes to the exploration of an aesthetic, social, and political moment in the late Qing Empire. Major texts discussed in this dissertation include Sequel to Dreams of Shanghai Splendor 續海上繁華夢, The Flower of the Sea of Sin 孽海花, The Tales of the Moon Colony 月球殖民地小說, and The Current News Pictorial 時事畫報, as well as other critical works that also reflect modernization, propaganda, anti-imperialism, and cosmopolitanism. It is widely assumed that this intermedial experimentation was introduced to China with the global trend of modernism in the 1920s and 1930s. However, my dissertation demonstrates an earlier experiment in the 1900s in the literati’s first attempt to directly respond to modern visual and printing technologies. I argue this early experiment should be understood as one of the last attempts to revitalize the traditional Chinese chapter novels (Zhanghuixiaoshuo, 章回小說) during a time when they were gradually being displaced by Westernized modern fiction. I further demonstrate that by depicting the material production of the pictorials, the artists made them not merely a static medium that captured the development of the cities, but rather a transformative medium that developed alongside these cities. My approach will challenge the current methodology that views pictorials as the transparent publishing medium that passively recorded the sociopolitical changes, thus redefining the dynamics of the pictorial images, its production and modernization. These discoveries and analyses will illuminate the transformations of both Chinese pictorials and fiction, and the brave experimental spirit of their writers and artists during the technological transition at the turn of the twentieth century.

In the field of photolithography for micro-chip manufacturing, the photo-mask is used to print desired patterns on a proper photo-resist on wafer. The most common type of photo-mask is binary amplitude mask made an opaque layer of chrome. The principle and potential application of hybrid photo-mask with diffractive phase element and binary amplitude is presented in this dissertation paper from both numerical modeling and experimental research. The first important application is the characterization of aberration in the stepper system using hybrid diffractive photo-mask. By utilizing multiple diffractive illumination conditions, it is possible to characterize Zernike wave front aberration coefficients up to any desired order. And, the second application is the use of binary phase grating mask for analog micro-optics fabrication. This approach of using binary phase grating mask for fabricating analog micro-optics turned out to be a very effective alternative for gray-scale mask technology. Since this is a pure phase only mask, it doesn't cause any scattered noise light like half-tone mask and it results in smooth desired resist profile. The benefits and limitations of hybrid diffractive photo-mask approach for both applications are discussed.