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Design and analysis of fast low power SRAMsAmrutur, Bharadwaj S. January 1900 (has links)
Thesis (Ph.D)--Stanford University, 1999. / Title from pdf t.p. (viewed April 3, 2002). "August 1999." "Adminitrivia V1/Prg/20000907"--Metadata.
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Fabrication and characterization of Pac-man shaped magnetic tunneling junctions /Han, Hongmei. January 1900 (has links)
Thesis (Ph. D., Materials Science and Engineering)--University of Idaho, December 2008. / Major professor: Yang-Ki Hong. Includes bibliographical references (leaves 124-132). Also available online (PDF file) by subscription or by purchasing the individual file.
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The cache coherence problem in shared-memory multiprocessors /Archibald, James K. January 1987 (has links)
Thesis (Ph. D.)--University of Washington, 1987. / Vita. Bibliography: leaves [213]-215.
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The Development of Embedded DRAM Statistical Quality Models at Test and Use ConditionsSuzuki, Satoshi 01 January 2010 (has links)
Today, the use of embedded Dynamic Random Access Memory (eDRAM) is increasing in our electronics that require large memories, such as gaming consoles and computer network routers. Unlike external DRAMs, eDRAMs are embedded inside ASICs for faster read and write operations. Until recently, eDRAMs required high manufacturing cost. Present process technology developments enabled the manufacturing of eDRAM at competitive costs. Unlike SRAM, eDRAM exhibits retention time bit fails from defects and capacitor leakage current. This retention time fail causes memory bits to lose stored values before refresh. Also, a small portion of the memory bits are known to fail at a random retention time. At test conditions, more stringent than use conditions, if all possible retention time fail bits are detected and replaced, there will be no additional fail bits during use. However, detecting all the retention time fails requires long time and also rejects bits that do not fail at the use condition. This research seeks to maximize the detection of eDRAM fail bits during test by determining effective test conditions and model the failure rate of eDRAM retention time during use conditions.
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Design of integrated CMOS circuits for parallel detection and storage of optical dataSayles, Andre Harding 08 1900 (has links)
No description available.
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On Markov modeling of random access in communication systemsAbdel-Hamid, Yousry Salaheldin 10 May 2012 (has links)
This dissertation considers the random access process in the Medium Access Control (MAC) of communications system.
New MAC models are developed to improve the performance of random access based systems.
The first contribution is the introduction of a general multichannel random access model with a variable radix. This model is general and can be applied to many existing MAC protocols that utilize random access.
It is shown that using the standard Binary Exponential Backoff (BEB) to resolve collisions is not always the best choice.
By adjusting the radix, contention efficiency can be improved significantly.
The analytical results obtained are confirmed by simulation.
The second contribution is the investigation of the variable radix backoff strategy with the contention-based
bandwidth request (BW-REQ) mechanism in IEEE 802.16 systems.
An analytical model of the BW-REQ procedure is presented which includes a variable radix in the backoff process.
Analytical results are presented which show that the variable radix can easily be adjusted to the number of users and the available
resources to enhance the efficiency of the Random Access Channel in the uplink subframe.
Simulations results are presented to confirm the theory.
The third contribution is the development of a reliable Quality of Service (QoS) mechanism for random access systems.
The available resources are quantitatively categorized to provide differential services to two classes of users.
The model is extended to employ a variable radix strategy. Results show that this strategy can be
used in combination with differential services to provide an efficient QoS technique for random access.
The fourth contribution is an optimized packet-based finite state Markov chain (FSMC) model for the physical channel.
This model employs an equal average fade range duration (AFRD) strategy to partition the signal-to-noise ratio (SNR).
The Nakagami-m fading channel model is used as it can span a wide range of fading conditions.
The accuracy of the analytical results is confirmed by simulation.
A cross-layer Markov model encompassing the FSMC model and a general multichannel random access model is introduced.
Finally, a simulation toolbox using object oriented programming is presented.
It was used to accurately simulate the models developed in this dissertation.
This toolbox is general and can be used for a wide range of MAC models. / Graduate
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Multicarrier Diversity in Random Access NetworksGanesan, Ghurumuruhan 12 1900 (has links)
Random access schemes are primarily used for data transmission in the uplink of cellular networks. Every user in a random access network is programmed to follow a predetermined transmit control policy that is designed to achieve optimal network performance. This approach, however, is not very efficient in cellular networks where channel conditions vary from time to time. Employing a fixed transmission policy may not guarantee optimal performance. To alleviate this problem, recently, channel aware random access schemes have been proposed wherein information available at the physical (PHY) layer is utilized at the higher layers to maximize network throughput. Such a cross-layer approach naturally has its share of challenges and problems. The objective of the proposed research is to study the effect of multicarrier diversity on channel aware random access schemes. First, we describe two generic random access schemes - channel aware multicarrier random access (CAMCRA) and no selection random access (NS-RA) for multicarrier networks. The former is based on judicious carrier selection and exploits multicarrier diversity while the latter does not perform carrier selection. For illustration purposes, we consider the well-known Aloha protocol and study the effect of channel state imperfection on the overall network throughput. We show that networks employing the NS-RA scheme are extremely sensitive to channel measurement errors. More precisely, the asymptotic average throughput of the NS-RA scheme under uncertain channel conditions is zero. The CAMCRA scheme, however, is very robust to channel estimation errors and maintains the same order of throughput.
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Resistive switching in tantalum oxide for emerging non-volatile memory applicationsZhuo, Yiqian Victor January 2014 (has links)
No description available.
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Asynchronous memory design.January 1998 (has links)
by Vincent Wing-Yun Sit. / Thesis submitted in: June 1997. / Thesis (M.Phil.)--Chinese University of Hong Kong, 1998. / Includes bibliographical references (leaves 1-4 (3rd gp.)). / Abstract also in Chinese. / TABLE OF CONTENTS / LIST OF FIGURES / LIST OF TABLES / ACKNOWLEDGEMENTS / ABSTRACT / Chapter 1. --- INTRODUCTION --- p.1 / Chapter 1.1 --- ASYNCHRONOUS DESIGN --- p.2 / Chapter 1.1.1 --- POTENTIAL ADVANTAGES --- p.2 / Chapter 1.1.2 --- DESIGN METHODOLOGIES --- p.2 / Chapter 1.1.3 --- SYSTEM CHARACTERISTICS --- p.3 / Chapter 1.2 --- ASYNCHRONOUS MEMORY --- p.5 / Chapter 1.2.1 --- MOTIVATION --- p.5 / Chapter 1.2.2 --- DEFINITION --- p.9 / Chapter 1.3 --- PROPOSED MEMORY DESIGN --- p.10 / Chapter 1.3.1 --- CONTROL INTERFACE --- p.10 / Chapter 1.3.2 --- OVERVIEW --- p.11 / Chapter 1.3.3 --- HANDSHAKE CONTROL PROTOCOL --- p.13 / Chapter 2. --- THEORY --- p.16 / Chapter 2.1 --- VARIABLE BIT LINE LOAD --- p.17 / Chapter 2.1.1 --- DEFINITION --- p.17 / Chapter 2.1.2 --- ADVANTAGE --- p.17 / Chapter 2.2 --- CURRENT SENSING COMPLETION DETECTION --- p.18 / Chapter 2.2.1 --- BLOCK DIAGRAM --- p.19 / Chapter 2.2.2 --- GENERAL LSD CURRENT SENSOR --- p.21 / Chapter 2.2.3 --- CMOS LSD CURRENT SENSOR --- p.23 / Chapter 2.3 --- VOLTAGE SENSING COMPLETION DETECTION --- p.28 / Chapter 2.3.1 --- DATA READING IN MEMORY CIRCUIT --- p.29 / Chapter 2.3.2 --- BLOCK DIAGRAM --- p.30 / Chapter 2.4 --- MULTIPLE DELAYS COMPLETION GENERATION --- p.32 / Chapter 2.4.1 --- ADVANTAGE --- p.32 / Chapter 2.4.2 --- BLOCK DIAGRAM --- p.33 / Chapter 3. --- IMPLEMENTATION --- p.35 / Chapter 3.1 --- 1M-BIT SRAM FRAMEWORK --- p.36 / Chapter 3.1.1 --- INTRODUCTION --- p.36 / Chapter 3.1.2 --- FRAMEWORK --- p.36 / Chapter 3.2 --- CONTROL CIRCUIT --- p.40 / Chapter 3.2.1 --- CONTROL SIGNALS --- p.40 / Chapter 3.2.1.1 --- EXTERNAL CONTROL SIGNALS --- p.40 / Chapter 3.2.1.2 --- INTERNAL CONTROL SIGNALS --- p.41 / Chapter 3.2.2 --- READ / WRITE STATE TRANSITION GRAPHS --- p.42 / Chapter 3.2.3 --- IMPLEMENTATION --- p.43 / Chapter 3.3 --- BIT LINE SEGMENTATION --- p.45 / Chapter 3.3.1 --- FOUR REGIONS SEGMENTATION --- p.46 / Chapter 3.3.2 --- OPERATION --- p.50 / Chapter 3.3.3 --- MEMORY CELL --- p.51 / Chapter 3.4 --- CURRENT SENSING COMPLETION DETECTION --- p.52 / Chapter 3.4.1 --- ONE BIT DATA BUS --- p.53 / Chapter 3.4.2 --- EIGHT BITS DATA BUS --- p.55 / Chapter 3.5 --- VOLTAGE SENSING COMPLETION DETECTION --- p.57 / Chapter 3.5.1 --- ONE BIT DATA BUS --- p.57 / Chapter 3.5.2 --- EIGHT BITS DATA BUS --- p.59 / Chapter 3.6 --- MULTIPLE DELAYS COMPLETION GENERATION --- p.60 / Chapter 4. --- SIMULATION --- p.63 / Chapter 4.1 --- SIMULATION ENVIRONMENT --- p.64 / Chapter 4.1.1 --- SIMULATION PARAMETERS --- p.64 / Chapter 4.1.2 --- MEMORY TIMING SPECIFICATIONS --- p.64 / Chapter 4.1.3 --- BIT LINE LOAD DETERMINATION --- p.67 / Chapter 4.2 --- BENCHMARK SIMULATION --- p.69 / Chapter 4.2.1 --- CIRCUIT SCHEMATIC --- p.69 / Chapter 4.2.2 --- RESULTS --- p.71 / Chapter 4.3 --- CURRENT SENSING COMPLETION DETECTION --- p.73 / Chapter 4.3.1 --- CIRCUIT SCHEMATIC --- p.73 / Chapter 4.3.2 --- SENSE AMPLIFIER CURRENT CHARACTERISTICS --- p.75 / Chapter 4.3.3 --- RESULTS --- p.76 / Chapter 4.3.4 --- OBSERVATIONS --- p.80 / Chapter 4.4 --- VOLTAGE SENSING COMPLETION DETECTION --- p.82 / Chapter 4.4.1 --- CIRCUIT SCHEMATIC --- p.82 / Chapter 4.4.2 --- RESULTS --- p.83 / Chapter 4.5 --- MULTIPLE DELAYS COMPLETION GENERATION --- p.89 / Chapter 4.5.1 --- CIRCUIT SCHEMATIC --- p.89 / Chapter 4.5.2 --- RESULTS --- p.90 / Chapter 5. --- TESTING --- p.97 / Chapter 5.1 --- TEST CHIP DESIGN --- p.98 / Chapter 5.1.1 --- BLOCK DIAGRAM --- p.98 / Chapter 5.1.2 --- SCHEMATIC --- p.100 / Chapter 5.1.3 --- LAYOUT --- p.102 / Chapter 5.2 --- HSPICE POST-LAYOUT SIMULATION RESULTS --- p.104 / Chapter 5.2.1 --- GRAPHICAL RESULTS --- p.105 / Chapter 5.2.2 --- VOLTAGE SENSING COMPLETION DETECTION --- p.108 / Chapter 5.2.3 --- MULTIPLE DELAYS COMPLETION GENERATION --- p.114 / Chapter 5.3 --- MEASUREMENTS --- p.117 / Chapter 5.3.1 --- LOGIC RESULTS --- p.118 / Chapter 5.3.1.1 --- METHOD --- p.118 / Chapter 5.3.1.2 --- RESULTS --- p.118 / Chapter 5.3.2 --- TIMING RESULTS --- p.119 / Chapter 5.3.2.1 --- METHOD --- p.119 / Chapter 5.3.2.2 --- GRAPHICAL RESULTS --- p.121 / Chapter 5.3.2.3 --- VOLTAGE SENSING COMPLETION DETECTION --- p.123 / Chapter 5.3.2.4 --- MULTIPLE DELAYS COMPLETION GENERATION --- p.125 / Chapter 6. --- DISCUSSION --- p.127 / Chapter 6.1 --- CURRENT SENSING COMPLETION DETECTION --- p.128 / Chapter 6.1.1 --- COMMENTS AND CONCLUSION --- p.128 / Chapter 6.1.2 --- SUGGESTION --- p.128 / Chapter 6.2 --- VOLTAGE SENSING COMPLETION DETECTION --- p.129 / Chapter 6.2.1 --- RESULTS COMPARISON --- p.129 / Chapter 6.2.1.1 --- GENERAL --- p.129 / Chapter 6.2.1.2 --- BIT LINE LOAD --- p.132 / Chapter 6.2.1.3 --- BIT LINE SEGMENTATION --- p.133 / Chapter 6.2.2 --- RESOURCE CONSUMPTION --- p.133 / Chapter 6.2.2.1 --- AREA --- p.133 / Chapter 6.2.2.2 --- POWER --- p.134 / Chapter 6.2.3 --- COMMENTS AND CONCLUSION --- p.134 / Chapter 6.3 --- MULTIPLE DELAY COMPLETION GENERATION --- p.135 / Chapter 6.3.1 --- RESULTS COMPARISON --- p.135 / Chapter 6.3.1.1 --- GENERAL --- p.135 / Chapter 6.3.1.2 --- BIT LINE LOAD --- p.136 / Chapter 6.3.1.3 --- BIT LINE SEGMENTATION --- p.137 / Chapter 6.3.2 --- RESOURCE CONSUMPTION --- p.138 / Chapter 6.3.2.1 --- AREA --- p.138 / Chapter 6.3.2.2 --- POWER --- p.138 / Chapter 6.3.3 --- COMMENTS AND CONCLUSION --- p.138 / Chapter 6.4 --- GENERAL COMMENTS --- p.139 / Chapter 6.4.1 --- COMPARISON OF THE THREE TECHNIQUES --- p.139 / Chapter 6.4.2 --- BIT LINE SEGMENTATION --- p.141 / Chapter 6.5 --- APPLICATION --- p.142 / Chapter 6.6 --- FURTHER DEVELOPMENTS --- p.144 / Chapter 6.6.1 --- INTERACE WITH TWO-PHASE HCP --- p.144 / Chapter 6.6.2 --- DATA BUS EXPANSION --- p.146 / Chapter 6.6.3 --- SPEED OPTIMIZATION --- p.147 / Chapter 6.6.4 --- MODIFIED WRITE COMPLETION METHOD --- p.150 / Chapter 7. --- CONCLUSION --- p.152 / Chapter 7.1 --- PROBLEM DEFINITION --- p.152 / Chapter 7.2 --- IMPLEMENTATION --- p.152 / Chapter 7.3 --- EVALUATION --- p.153 / Chapter 7.4 --- COMMENTS AND SUGGESTIONS --- p.155 / Chapter 8. --- REFERENCES --- p.R-l / Chapter 9. --- APPENDIX --- p.A-l / Chapter 9.1 --- HSPICE SIMULATION PARAMETERS --- p.A-l / Chapter 9.1.1 --- TYPICAL SIMULATION CONDITION --- p.A-l / Chapter 9.1.2 --- FAST SIMULATION CONDITION --- p.A-3 / Chapter 9.1.3 --- SLOW SIMULATION CONDITION --- p.A-4 / Chapter 9.2 --- SRAM CELL LAYOUT AND NETLIST --- p.A-5 / Chapter 9.3 --- TEST CHIP SPECIFICATIONS --- p.A-8 / Chapter 9.3.1 --- GENERAL SPECIFICATIONS --- p.A-8 / Chapter 9.3.2 --- PIN ASSIGNMENT --- p.A-9 / Chapter 9.3.3 --- TIMING DIAGRAMS AND SPECIFICATIONS --- p.A-10 / Chapter 9.3.4 --- SCHEMATICS AND LAYOUTS --- p.A-11 / Chapter 9.3.4.1 --- STANDARD MEMORY COMPONENTS --- p.A-12 / Chapter 9.3.4.2 --- DVSCD AND MDCG COMPONENTS --- p.A-20 / Chapter 9.3.5 --- MICROPHOTOGRAPH --- p.A-25
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Research on Fabrication and Physical Mechanisms of Next-Generation Novel Nonvolatile Resistive Memory DevicesSyu, Yong-En 17 July 2012 (has links)
Resistive Random Access Memory (RRAM) is considered as the most promising candidate for the next-generation nonvolatile memories due to their superior properties such as low operation voltage, fast operation speed, non-destructive read, simple metal-insulator-metal (MIM) sandwich structure, good scale-down ability. The main targets of this research are to clarify the corresponding physical mechanism, develop the potential material and structure of RRAM and stabilize the resistive switching characteristics, in which clarifying the physical mechanism will be the key factor for RRAM into production in the future.
Recent research has suggested that variation of the low and high resistance states in RRAM could be caused due to the by instability in the formation and /disruption of the filament. In addition, the endurance and stability of RRAM may be related to the dissipation of oxygen ions in the switching layer. In this study, new material (Si Introduced) and structure (oxygen confined layer) are employed to improve RRAM performance and to clarify the physical mechanism. Furthermore, constant switching energy results can be used to select the optimal materials and structures also can be used to correctly allocate voltage and time to control RRAM.
The detail physical mechanism is studied by the stable RRAM device (Ti/HfO2/TiN) which is offered from Industrial Technology Research Institute (ITRI). The switching process is proved as the formation/disruption of the filament. Furthermore, the dynamic switching behaviors during reset procedure in RRAM were analyzed by the sequential experimental design to illustrate the procedure of atomic quantized reaction at the ultra-cryogenic temperature.
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