In this thesis CIGS absorber layers have been deposited by gas flow sputtering with an extra supply of selenium, a method that displays promise for large scale production because of its one-step sputtering route which deposits low energy particles in a high deposition rate. In this thesis a method was developed where selenium was added to the sputtering process inside the sputter chamber in a controllable manner and in larger amount than done in previous projects. A total of five samples were manufactured with altered evaporation temperatures and an extra supply of selenium which then were finalized to solar cells using the standard baseline process of the Ångström solar center. The characteristics of the CIGS layer and solar cells were analyzed by XRF, IV- and QE measurements. A cell with a conversion efficiency of 11.6 %, Jsc of 27.9 mA/cm2, Voc of 0.63 V and fill factor of 66.2 % was obtained on a 0.5 cm2 cell area without an antireflective coating. All samples contained cells with obtained efficiencies above 10 %, but over the whole samples the efficiencies varied considerably. The samples that were deposited with moderately large selenium evaporation provided the highest efficiencies with a relatively good homogeneity over the substrate. Results show a deficiency of copper in the CIGS films compared to the target composition. The copper content was lower than 70 % expressed in Cu/(Ga+In), which probably resulted in a low diffusion length for electrons, leading to limited cell efficiencies.  Through the duration of the thesis issues that concerned the power supply- and the controls to the substrate heaters as well as the control of the evaporation temperature during the depositions arose that required problem solving and needs to be resolved for the future progression of this work. The conclusions drawn from this thesis are that it is possible to vary the temperature of the selenium source and thereby control the amount of selenium that evaporates during the deposition process even though there is a lot of additional heating in the sputter chamber from both the substrate heaters and the sputter source which could affect the ability to control the amount of selenium being evaporated. That the most likely reason for the limited efficiencies is due to the low copper content in the CIGS films and that a larger amount of evaporated selenium compared to previous work did not result in higher obtained efficiencies.

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Semiconductors represent the enabling technology that underpins the many advances that define modern society. One semiconductor that shows considerable promise in the fabrication of new devices is zinc oxide (ZnO). A fundamental understanding of the properties of a material is required in order to exploit its properties. The behaviour of dopants and defects relevant to optoelectronic device fabrication is of particular interest. However, acceptor doping of ZnO is currently controversial, as successful and reproducible acceptor doping has not yet been achieved. Acceptor doping of ZnO using silver (Ag) is explored in this thesis to contribute towards the understanding of defect introduction in ZnO. In addition, there is also increasing interest in exploring materials with unconventional properties, commonly referred to as metamaterials, particularly for optical applications. The previously unexplored unique combination of Ag and ZnO may enable the fabrication of those devices. Several key factors that affect heteroepitaxy film quality, and ultimately its properties, are buffer layers and substrate temperature. A lattice match between sapphire and ZnO was provided by using buffer layers of 1 nm magnesium oxide (MgO) and 7.9 nm low temperature ZnO. The highest quality film was grown at the highest temperature (800°C), with rms roughness of 2.9 nm, carrier concentration of 3.6x10¹⁶ cm⁻³, and mobility of 105 cm²/Vs. In contrast, dopant (Ag) incorporation occurs more readily below 600°C, with dopant incorporation of up to 1020 cm⁻³ measured. Ag manifests as a deep acceptor (up to 94% substitutionally on Zn lattice sites), as evident from decreasing carrier concentration with increasing Ag flux, and DLTS measurements indicating an acceptor trap at 319 meV. This suggests that Ag is suitable for introducing compensation in ZnO, but Ag acceptors are not sufficiently shallow to result in p-type material. However, the unique combination of ZnO and Ag also enables the fabrication of a novel device, namely a superlens. Initial experimental results show the possibility of imaging a 100 nm line as 132 nm, compared with the diffraction-limited resolution of 332 nm for the same line feature.

The thin film technology is of great importance in modern society and is a key technology in wide spread applications from electronics and solar cells to hard protective coatings on cutting tools and diffusion barriers in food packaging. This thesis deals with various aspects of thin film processing and the aim of the work is twofold; firstly, to obtain a fundamental understanding of the sputter deposition and the reactive sputter deposition processes, and secondly, to evaluate sputter deposition of specific material systems with low friction properties and to improve their performance.From studies of the reactive sputtering process, two new methods of eliminating the problematic and undesirable hysteresis effect were found. In the first method it was demonstrated that an increased process pressure caused a reduction and, in some cases, even elimination of the hysteresis. In the second method it was shown that sufficiently high oxide content in the target will eliminate the hysteresis. Further studies of non-reactive magnetron sputtering of multi-element targets at different pressures resulted in huge pressure dependent compositional gradients over the chamber due to different gas phase scattering of the elements. This has been qualitatively known for a long time but the results presented here now enable a quantitative estimation of such effects. For example, by taking gas phase scattering into consideration during sputtering from a WS2 target it was possible to deposit WSx films with a sulphur content going from sub-stoichiometric to over-stoichiometric composition depending on the substrate position relative the target. By alloying tungsten disulphide (WS2) with carbon and titanium (W-S-C-Ti) its hardness was significantly increased due to the formation of a new titanium carbide phase (TiCxSy). The best sample increased its hardness to 18 GPa (compared to 4 GPa for the corresponding W-S-C coating) while still maintaining a low friction (µ=0.02) due to the formation of easily sheared WS2 planes in the wear track.

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Doctor of Philosophy / First part of the thesis is focused on experimental preparation of new hard quaternary amorphous materials Si-B-C-N with high thermal stability. Materials were prepared in the form of thin films using reactive magnetron sputtering. The technique used proved to be suitable for reproducible synthesis of these materials. The Si-B-C-N films were generally found to be amorphous with low compressive stress and good adhesion to silicon or glass substrates. The process and film characteristics were controlled by varying the sputter target composition, the Ar fraction in the N2–Ar gas mixture, the negative rf-induced substrate bias, and the substrate temperature. Main conclusions describe the relationships between process parameters, discharge and deposition characteristics and film properties (elemental composition, chemical bonding structure, material hardness, compressive stress or electrical conductivity of materials prepared). Second part of the thesis is focused on ab-initio simulations of structures of experimentally prepared Si-B-C-N materials. In the performed liquid-quench simulations, the Kohn-Sham equations for the valence electrons are expanded in a basis of plane wave functions, while core electrons were represented using Goedecker-type pseudopotentials. We simplified the ion bombardment process by assuming that the primary impact creates a localized molten region of high temperature and sufficiently short cooling time, commonly referred to as a thermal spike. Main conclusions deal with N2 formation in studied materials, effect of implanted Ar on structure and properties of prepared materials, ability of Si to relieve that part of compressive stress which is caused by implanted Ar, and ability of B to improve thermal stability of Si-B-C-N materials. The calculated results are compared with experiment.

Thesis (M.S.)--Auburn University, 2007. / Abstract. Vita. Includes bibliographic references (ℓ. 70-73)

Thesis (M.S.)--Ohio University, August, 1999. / Title from PDF t.p.