Many cutting-edge computer and electronic products are powered by advanced Systems-on-Chip (SoC). Advanced SoCs encompass superb performance together with large number of functions. This is achieved by efficient integration of huge number of transistors. Such very large scale integration is enabled by a core-based design paradigm as well as deep-submicron and 3D-stacked-IC technologies. These technologies are susceptible to reliability and testing complications caused by thermal issues. Three crucial thermal issues related to temperature variations, temperature gradients, and temperature cycling are addressed in this thesis. Existing test scheduling techniques rely on temperature simulations to generate schedules that meet thermal constraints such as overheating prevention. The difference between the simulated temperatures and the actual temperatures is called temperature error. This error, for past technologies, is negligible. However, advanced SoCs experience large errors due to large process variations. Such large errors have costly consequences, such as overheating, and must be taken care of. This thesis presents an adaptive approach to generate test schedules that handle such temperature errors. Advanced SoCs manufactured as 3D stacked ICs experience large temperature gradients. Temperature gradients accelerate certain early-life defect mechanisms. These mechanisms can be artificially accelerated using gradient-based, burn-in like, operations so that the defects are detected before shipping. Moreover, temperature gradients exacerbate some delay-related defects. In order to detect such defects, testing must be performed when appropriate temperature-gradients are enforced. A schedule-based technique that enforces the temperature-gradients for burn-in like operations is proposed in this thesis. This technique is further developed to support testing for delay-related defects while appropriate gradients are enforced. The last thermal issue addressed by this thesis is related to temperature cycling. Temperature cycling test procedures are usually applied to safety-critical applications to detect cycling-related early-life failures. Such failures affect advanced SoCs, particularly through-silicon-via structures in 3D-stacked-ICs. An efficient schedule-based cycling-test technique that combines cycling acceleration with testing is proposed in this thesis. The proposed technique fits into existing 3D testing procedures and does not require temperature chambers. Therefore, the overall cycling acceleration and testing cost can be drastically reduced. All the proposed techniques have been implemented and evaluated with extensive experiments based on ITC’02 benchmarks as well as a number of 3D stacked ICs. Experiments show that the proposed techniques work effectively and reduce the costs, in particular the costs related to addressing thermal issues and early-life failures. We have also developed a fast temperature simulation technique based on a closed-form solution for the temperature equations. Experiments demonstrate that the proposed simulation technique reduces the schedule generation time by more than half.

Miniaturizing circuit size and increasing power density are the latest trends in modern power electronics development. In order to meet the requirements of higher frequency and higher power density in power electronics applications, planar interconnections are utilized to achieve a higher integration level. Power switching devices, passive power components, and EMI (Electromagnetic Interference) filters can all be integrated into planar power modules by using planar metallization, which is a technology involving electrical, mechanical, material, and thermal issues. By processing high dielectric materials, magnetic materials, or silicon chips using compatible manufacturing procedures, and by carefully designing structures and interconnections, we can realize the conventional discrete inductors, capacitors, and switch circuits with planar modules. Compared with conventional discrete components, the integrated planar modules have several advantages including lower profiles, better form factors, and less labor-intensive processing steps. In addition, planar interconnections reduce the wire bond inductive and resistive parasitic parameters, especially for high frequency applications. However, planar integration technology is a packaging approach with a large contact area between different materials. This may result in unknown failure mechanisms in power applications. Extensive research has already been done to study the performance, processing, and reliability of the planar interconnects in thin film structures. The thickness of the thin films used in integrated circuits (IC) or microelectronics applications ranges from the magnitude of nanometers to that of micrometers. In this work, we are interested in adopting planar interconnections to Integrated Power Electronics Modules (IPEM). In Integrated Power Electronics Modules (IPEMs), copper traces, especially bus traces, need to conduct current ranging from a few amps to tens of amps. One of the major differences between IC and IPEM is that the metal layer in IPEMs (normally >75µm) is much thicker than that of the thin films in IC (normally <1µm). The other major difference, which is also a feature of IPEM, is that the planar metallization is deposited on different brittle substrates. In active IPEM, switching devices are in a bare die form with no encapsulation. The copper deposition is on top of the silicon chips and the insulation polyimide layer. One of the key elements for passive IPEM and the EMI IPEM is the integrated inductor-capacitor (LC) module, which realizes equivalent inductors and capacitors in one single module. The deposition processes for silicon substrates and ceramic substrates are compatible and both the silicon and ceramic materials are brittle. Under high current and high temperature conditions, these copper depositions on brittle materials will cause detrimental failure spots. Over the last few years, the design, manufacture, optimization, and testing of the IPEMs has been developed and well documented. Up to this time , the research on failure mechanisms of conventional integrated power modules has led to the understanding of failures centered on wire bond or solder layer. However, investigation on the reliability and failure modes of IPEM is lacking, particularly that which uses metallization on brittle substrates for high current operations. In this study, we conduct experiments to measure and calculate the residual stresses induced during the process. We also, theoretically model and simulate the thermo-mechanical stresses caused by the mismatch of thermal expansion coefficients between different materials in the integrated power modules. In order to verify the simulation results, the integrated power modules are manufactured and subjected to the lifetime tests, in which both power cycling and temperature cycling tests are carried out. The failure mode analysis indicates that there are different failure modes for copper films under tensile or compressive stresses. The failure detection process verifies that delamination and silicon cracks happen to copper films due to compressive and tensile stresses respectively. This study confirms that the high stresses between the metallization and the silicon are the failure drivers in integrated power electronics modules.. We also discuss the driving forces behind several different failure modes. Further understanding of thesefailure mechanisms enables the failure modes to be engineered for safer electrical operation of IPEM modules and helps to enhance the reliability of system-level operation. It is also the basis to improve the design and to optimize the process parameters so that IPEM modules can have a high resistance to recognized failures. / Ph. D.