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  • About
  • The Global ETD Search service is a free service for researchers to find electronic theses and dissertations. This service is provided by the Networked Digital Library of Theses and Dissertations.
    Our metadata is collected from universities around the world. If you manage a university/consortium/country archive and want to be added, details can be found on the NDLTD website.
1

The Study of Tin Whisker Growth with Irregular Tin Grain Structure

Yu, Cheng-fu 24 June 2010 (has links)
In past years, legislative pressures (particularly in Japan and Europe) had forced the electronics industry to eliminate Pb from their end products and manufacturing processes. With respect to factors such as ease of converting existing tin-lead plating systems, ease of manufacture and compatibility with existing assembly methods, pure tin plating is seen by many in the industry as a potentially simple and cost effective alternative to SnPb-based systems. The problem of spontaneous tin whisker formation, a characteristic of pure tin, still needs to be addressed, as it can lead to device failure by shorting two terminals on electronic devices. This possibility gives rise to major reliability concerns. The study relates to an electronic component with pure tin deposit layer on the part for electric connection, wherein pure tin deposit layer is a fine grained tin deposit layer composed of grains with smaller size in the direction perpendicular to the deposit surface than in the direction parallel to the deposit surface. It is called irregular tin grain structure. It applies a process for plating an electronic component, so as to form a pure tin deposit layer on the part for electric connection, comprising the steps of: adjusting the composition of tin plating solution in which starter additive and brighter additive are included; moving the electronic component through the tin plating solution, so as to form a fine grained tin deposit layer on the part for electric connection. We performed a DoE by depositing different tin grain structures with variant thickness. After whisker test in high temperature/high humidity and room condition, we confirmed corrosion mechanism, intermetallic morphology, and different behaviour of tin atoms. To summarize the studies, as compared with the prior arts, irregular grain structure can validly inhibit the whisker growth.
2

The Relationship of Sn Whisker Growth and Sn-plating Process

Lu, Min-hsien 29 June 2007 (has links)
New environmental regulations enforce the electronic industry to replace Pb-Sn solder due to Pb could contaminate our environment. Pure Sn has good material properties such as solderability, conductivity and anti-corrosion. Pure Sn is a good candidate to replace Pb-Sn solder. One of the disadvantages of pure Sn is the whisker growth phenomenon. Whisker problem has become a major concern in electronic industry due to the trend toward component miniaturization and pitch reduction. It is well understood that the root cause for tin whisker growth is the compressive stress within the tin layer. In the literature, the main stress sources are, (1) the intermetallic layer induced interface stress, (2) the difference of thermal expansion coefficient between Sn layer and substrate and (3) the mechanical residual stress from trim-form operation after tin plating. In our study, we used the electrochemical electrolysis method and Cross-section Polisher (CP) to examine the tin whisker growth mechanism. In the result, we can clearly show the Cu6Sn5 phase grow up in the tin grain boundary regions and demonstrate that the Cu6Sn5 phase formation is the main cause of the tin whisker growth. We also discuss the relationship of tin whisker growth and tin-plating process parameters that include the temperature effect; Ni underlay effect and tin-plating bath effect. For the temperature effect, the Cu6Sn5 is the major phase at 150¢XC aging. The mechanism behind its growth mechanism was grain boundary diffusion at the earlier stage and then the bulk diffusion in the later stage. The application of 150¢XC post-heat treatment could drive the bulk diffusion and form a layer type Cu6Sn5 phase to eliminate the whisker growth. For the Ni underlay effect, the Ni underlay can block the Cu atom diffusion to the tin layer and changed the tin layer stress state from compressive to tensile. Therefore, the tin whisker can be eliminated. For the tin-plating bath effect, in the sulfuric acid base and uses Triton X-100 as the surface active agent, may transform the whisker type to particular tin grain type. Thus, this tin-plating solution can restrain the tin whisker growth.

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