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Process simulation of roll forming and roll pass design /Duggal, Nitin, January 1995 (has links)
Thesis (M.S.)--Ohio State University, 1995. / Includes bibliographical references (leaves 125-127). Available online via OhioLINK's ETD Center.
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Optimalisation numérique des régulateurs de processusJahard, Jean-Philippe January 1969 (has links)
Le but de cette étude est de concevoir une procédure générale de synthèse directe sur ordinateur des systèmes de régulation, pour un service comparable à celui de la documentation technique inspirée de l'analyse dynamique et du critère de Naslin sur les régulateurs usuels. Une méthode numérique d'optimalisation est utilisée pour déterminer le réglage qui rend un critère quadratique minimum. La définition du critère permet son calcul en fonction des paramètres du régulateur à partir des équations d'état du système en boucle fermée. Grâce à la brièveté et à la précision de ce calcul, les résultats obtenus sont assez satisfaisants pour prouver la valeur pratique du procédé.
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Focused ion beam direct fabrication of micro-optical elements: features compared with laser beam and electron beam direct writingFu, Yongqi, Ngoi, Kok Ann Bryan 01 1900 (has links)
Three types of focused ion beam machine: focused ion beam milling (FIB milling), focused ion beam lithography (FIB lithography), and focused ion beam direct deposition (FIB deposition), are described in detail to compare with electron beam lithography (EBL) and laser beam direct writing (LBW). A diffractive optical element (DOE) with continuous relief, six-annulus, relief depth of 1.17µm, and diameter of 65 µm, fabricated by use of the FIB milling, is cited as an example to illustrate the FIB milling and the comparison with the EBL and the LBW. Micro-cylindrical lens with dimension of 2.8µm×7.5µm×0.95µm in width, length and height, NA=0.2, is given as another fabrication example to illustrate the FIB deposition, which is a unique function for all the direct writing methods. They are all superiors to the EBL and the LBW in the case that optical elements need to be directly fabricated in local area of a device. / Singapore-MIT Alliance (SMA)
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Ceramic fabrication using a continuous inkjet printerBlazdell, Philip Frank January 1998 (has links)
No description available.
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CMOS process simulationButtar, Alistair George January 1986 (has links)
No description available.
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Coupled electron gases fabricated by in situ ion beam lithography and MBE growthBrown, Karl January 1994 (has links)
No description available.
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The design, manufacture and testing of a low-cost cleanroom robot for handling silicon wafersLopez Parra, Marcelo January 1994 (has links)
No description available.
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Investigation of materials based on pulverized fuel ash and sodium silicate solutionsSalem, Mahmoud January 1991 (has links)
No description available.
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The use of selective epitaxy to prevent latchup in CMOSSabine, K. A. January 1987 (has links)
No description available.
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Selective growth of silicon with application to CMOS processingHamed, M. M. January 1988 (has links)
No description available.
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