High Power Impulse Magnetron Sputtering (HiPIMS) comes as a new and promising PVD method for the development of high-performance coatings for cutting applications. This technique utilizes high energy and ionization which can produce a denser and stronger ceramic in comparison to traditional deposition techniques. Important coating characteristics that arise from this method such as enhanced hardness, adhesion, and less defects, can be applied when machining hard-to-cut materials. In this study, investigation of tool life and wear mechanisms, mechanical and physical properties of AlTiN coatings deposited on carbide tools by HiPIMS and Cathodic Arc Evaporation (CAE) were analyzed when machining Inconel 718 and Stainless Steel 304. Experimental turning tests were performed to evaluate tool life, and the wear mechanisms were analyzed by optical and scanning electron microscopy. Nanohardness, scratch test, fracture toughness and other methods were carried out to evaluate the coating properties. Impedance experiments were performed to determine the coating porosity and resistance to corrosion. The results showed that HiPIMS coating presented higher hardness, toughness to fracture and adhesion to the substrate in comparison to CAE coatings. The HiPIMS coated tool substantially improved tool life when machining Inconel. The dominant wear mechanism found was abrasion, which is induced by the presence of hard carbides. The main wear patterns observed were flank, notch, and crater wear. The tool performance of HiPIMS was found to have enhanced mechanical properties, lower porosity, and form a larger amount of tribo-oxides when machining, in comparison to CAE. / Thesis / Master of Applied Science (MASc)

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The magnetic field is a key feature that distinguishes magnetron sputtering from simple diode sputtering. It effectively increases the residence time of electrons close to the cathode surface and by that increases the energy efficiency of the discharge. This becomes apparent in high power impulse magnetron sputtering (HiPIMS) discharges, as small changes in the magnetic field can result in large variations in the discharge characteristics, notably the peak discharge current and/or the discharge voltage during a pulse. Here, we analyze the influence of the magnetic field on the electron density and temperature, how the discharge voltage is split between the cathode sheath and the ionization region, and the electron heating mechanism in a HiPIMS discharge. We relate the results to the energy efficiency of the discharge and discuss them in terms of the probability of target species ionization. The energy efficiency of the discharge is related to the fraction of pulse power absorbed by the electrons. Ohmic heating of electrons in the ionization region leads to higher energy efficiency than electron energization in the sheath. We find that the electron density and ionization probability of the sputtered species depend largely on the discharge current. The results suggest ways to adjust electron density and electron temperature using the discharge current and the magnetic field, respectively, and how they influence the ionization probability.

This thesis report presents a new design of a synchronization unit for high power impulse magnetron sputtering (HiPIMS) applications used for depositing thin films. The proposed system is composed of two major hardware parts: a microcontroller unit (MCU) and a field-programmable gate array (FPGA). The control range of the new system is increased by at least ten times compared to existing synchronization unit designed by Ionautics AB.In order to verify the system and benchmark its innovations, several batches of the thin film have been deposited using the new technology. It is shown that HiPIMS with synchronized pulsed substrate bias can effectively improve coating performance. Pulsed substrate bias with user-defined pulse width and delay time is possible to use in the new control mode proposed by this master thesis work; Bias mode. As a result, this master thesis work enables users to flexibly control the HiPIMS processes.

Vibration control requires high dynamic stiffness in mechanical structures for a reliable performance under extreme conditions. Dynamic stiffness composes the parameters of stiffness (K) and damping (η) that are usually in a trade-off relationship. This thesis study aims to break the trade-off relationship. After identifying the underlying mechanism of damping in composite materials and joint interfaces, this thesis studies the deposition technique and physical characteristics of nano-structured HDS (high dynamic stiffness) composite thick-layer coatings. The HDS composite were created by enlarging the internal grain boundary surface area through reduced grain size in nano scale (≤ 40 nm). The deposition process utilizes a PECVD (Plasma Enhanced Chemical Vapour Deposition) method combined with the HiPIMS (High Power Impulse Magnetron Sputtering) technology. The HDS composite exhibited significantly higher surface hardness and higher elastic modulus compared to Poly(methyl methacrylate) (PMMA), yet similar damping property. The HDS composites successfully realized vibration control of cutting tools while applied in their clamping interfaces. Compression preload at essential joint interfaces was found to play a major role in stability of cutting processes and a method was provided for characterizing joint interface properties directly on assembled structures. The detailed analysis of a build-up structure showed that the vibrational mode energy is shifted by varying the joint interface’s compression preload. In a build-up structure, the location shift of vibration mode’s strain energy affects the dynamic responses together with the stiffness and damping properties of joint interfaces. The thesis demonstrates that it is possible to achieve high stiffness and high damping simultaneously in materials and structures. Analysis of the vibrational strain energy distribution was found essential for the success of vibration control.

La pulvérisation cathodique magnétron est un procédé plasma très répandu dans l'industrie pour le dépôt de couches minces. Néanmoins, les exigences des nouvelles applications nécessitent de mieux comprendre, contrôler et maîtriser les processus fondamentaux gouvernant le transport de la matière pour optimiser le procédé. Ce travail de thèse porte sur l'étude du transport des atomes pulvérisés de tungstène (W) en décharge magnétron continu (DC direct current) et pulsée haute puissance (HiPIMS_high power impulse magnétron sputtering). La fluorescence induite par diode laser (TD-LIF) a été mise au point afin de mesurer les fonctions de distribution en vitesse des atomes W pulvérisés. Les mesures ont été calibrées par absorption laser et validées en corrélant avec les vitesses de dépôt. En procédé DC, l'étude de l’influence des paramètres de la décharge (puissance, tension, mélange gazeux Ar/He, distance par rapport à la cible, etc.) a mis en évidence l'évolution spatiale des régimes de transport balistique (atomes énergétiques), diffusif (atomes thermalisés), et mixte (balistique+diffusif). Pour l'étude du procédé HiPIMS, le plasma pulsé a nécessité de développer la TD-LIF résolue en temps (TR-TDLIF). Le degré de liberté supplémentaire qu'offre la dimension temporelle du plasma HiPIMS a permis de mieux comprendre le transport mixte qui représente le cas le plus compliqué. En effet, cela a permis de mesurer la cinétique du transport des atomes pulvérisés en ayant la possibilité de séparer les temps caractéristiques des différents processus / Magnetron sputter deposition is an established and widely used method for the growth of thin films. Nevertheless, the high level of expectations regarding new applications require a better understanding, controlling, mastering of basic processes governing atoms transport in the view of process optimization. This work consist in the study of transport of sputtered W atoms in direct current and high power impulse magnetron discharges (DC and HiPIMS). A tunable diode laser induced fluorescence technique (TD-LIF) has been developed, in order to measure W sputtered atom velocity distribution function. Measurements were calibrated using laser absorption and were corroborated by deposition rate. In DC, the study of the influence of discharge parameters (power, voltage, Ar/He gas mixture, and distance from target, etc.) highlighted spatial evolution of different regimes of transport: ballistic (energetic atoms), diffusive (thermalized atoms), and mixed (ballistic + diffusive). In HiPIMS, pulsed plasma required to develop a time resolved TD-LIF technique (TR-TDLIF). The additional degree of freedom, given by time dimension allowed for a better understanding of mixed transport which represents the most complicated situation. This technique allowed to measure the kinetic of sputtered W atoms while at the same time providing the possibility to separate characteristic time scales of different processes

The work presented in this thesis deals with experimental and theoretical studies related to alumina thin films. Alumina, Al2O3, is a polymorphic material utilized in a variety of applications, e.g., in the form of thin films. However, controlling thin film growth of this material, in particular at low substrate temperatures, is not straightforward. The aim of this work is to increase the understanding of the basic mechanisms governing alumina growth and to investigate novel ways of synthesizing alumina coatings. The thesis can be divided into two main parts, where the first part deals with fundamental studies of mechanisms affecting alumina growth and the second part with more application-oriented studies of high power impulse magnetron sputter (HiPIMS) deposition of the material. In the first part, it was shown that the thermodynamically stable α phase, which normally is synthesized at substrate temperatures of around 1000 °C, can be grown using reactive sputtering at a substrate temperature of merely 500 °C by controlling the nucleation surface. This was done by predepositing a Cr2O3 nucleation layer. Moreover, it was found that an additional requirement for the formation of the α phase is that the depositions are carried out at low enough total pressure and high enough oxygen partial pressure. Based on these observations, it was concluded that energetic bombardment, plausibly originating from energetic oxygen, is necessary for the formation of α-alumina (in addition to the effect of the chromia nucleation layer). Moreover, the effects of residual water on the growth of crystalline films were investigated by varying the partial pressure of water in the ultra high vacuum (UHV) chamber. Films deposited onto chromia nucleation layers exhibited a columnar structure and consisted of crystalline α-alumina if deposited under UHV conditions. However, as water to a partial pressure of 1*10-5 Torr was introduced, the columnar α-alumina growth was disrupted. Instead, a microstructure consisting of small, equiaxed grains was formed, and the γ-alumina content was found to increase with increasing film thickness. To gain a better understanding of the atomistic processes occurring on the surface, density functional theory based computational studies of adsorption and diffusion of Al, O, AlO, and O2 on different α-alumina (0001) surfaces were also performed. The results give possible reasons for the difficulties in growing the α phase at low temperatures through the identification of several metastable adsorption sites and also show how adsorbed hydrogen might inhibit further growth of α-alumina crystallites. In addition, it was shown that the Al surface diffusion activation energies are unexpectedly low, suggesting that limited surface diffusivity is not the main obstacle for low-temperature α-alumina growth. Instead, it is suggested to be more important to find ways of reducing the amount of impurities, especially hydrogen, in the process and to facilitate α-alumina nucleation when designing new processes for low-temperature deposition of α-alumina. In the second part of the thesis, reactive HiPIMS deposition of alumina was studied. In HiPIMS, a high-density plasma is created by applying very high power to the sputtering magnetron at a low duty cycle. It was found, both from experiments and modeling, that the use of HiPIMS drastically influences the characteristics of the reactive sputtering process, causing reduced target poisoning and thereby reduced or eliminated hysteresis effects and relatively high deposition rates of stoichiometric alumina films. This is not only of importance for alumina growth, but for reactive sputter deposition in general, where hysteresis effects and loss of deposition rate pose a substantial problem. Moreover, it was found that the energetic and ionized deposition flux in the HiPIMS discharge can be used to lower the deposition temperature of α-alumina. Coatings predominantly consisting of the α phase were grown at temperatures as low as 650 °C directly onto cemented carbide substrates without the use of nucleation layers. Such coatings were also deposited onto cutting inserts and were tested in a steel turning application. The coatings were found to increase the crater wear resistance compared to a benchmark TiAlN coating, and the process consequently shows great potential for further development towards industrial applications.

Ce mémoire présente les efforts effectués pour réduire l'angle de perte de couches de pentoxyde de tantale amorphes telles qu'utilisées pour les miroirs de LIGO. Afin d'améliorer le niveau de relaxation des couches, celles-ci ont été déposées par pulvérisation cathodique magnétron à des températures allant de 50 °C à 480 °C, elles ont subi un recuit thermique rapide, elles ont été implantées par des ions d'oxygène, elles ont été déposées par pulvérisation cathodique magnétron en appliquant une tension de polarisation sur le substrat lors du dépôt allant de 0 V à -450 V et elles ont été déposées par pulvérisation cathodique magnétron pulsée à haute puissance dans le cadre de différentes expériences. L'angle de perte, l'épaisseur, la rugosité, l'indice de réfraction, la composition atomique, la contrainte, l'état de relaxation et le module de Young des couches ont par la suite été trouvés à l'aide de l'ellipsométrie spectralement résolue, la spectrométrie de rétrodiffusion de Rutherford, la détection des reculs élastiques, la spectroscopie Raman, la diffraction de rayons X et la nano-indentation. Il a été trouvé que la température de dépôt améliorait légèrement le degré de relaxation des couches jusqu'à 250 °C, mais qu'elle avait peu d'impact après recuit. Aussi, lors de dépôt à température de la pièce, une forte tension de polarisation réduit l'angle de perte, mais cet effet est encore une fois perdu suite au recuit. Les autres méthodes mentionnées ci-dessus n'ont pas influencé le degré de relaxation des couches selon l'angle de perte, la spectroscopie Raman et la diffraction de rayons X. Cette recherche a été réalisée avec le support financier du CRSNG et du FRQNT (numéro de dossier 206976). / This master's thesis presents the experiments made to reduce the loss angle of tantala coatings similar to those used in LIGO. To improve the relxation level of the coatings they were deposited by magnetron sputtering at temperatures varying from 50 °C to 480 °C. They were also subjected to rapid thermal annealing, and oxygen implantation. In another experiment, the coatings were deposited by magnetron sputtering with substrate biasing varying from 0 V to -450 V at room temperature and at 250 °C. Finally, the coatings of tantala were deposited by high power impulse magnetron sputtering. The loss angle, thickness, roughness, refractive index, atomic composition, stress, the relaxation state and Young's modulus of the coatings were characterized using spectroscopic ellipsometry, Rutherford backscattering, elastic recoil detection, Raman spectroscopy, X-ray diffraction and nanoindentation. It was found that the deposition temperature improved the loss angle until it reached 250 °C. However, annealing the coatings had a superior impact and the influence of the deposition temperature was not visible after annealing. When was applied a high bias to the susbtrate at room temperature, the obtained coating was slightly more relaxed than when a low bias was applied but this effect is, once again, insignificant after annealing. The other methods of deposition mentioned did not improve the loss angle or modify the relaxation state found by Raman spectroscopy and X-ray diffraction of the tantala coatings. This research was made with the financial support of the NSERC and of the FRQNT (file number 206976).

En 2015, le Laser Interferometer Gravitational-Wave Observatory (LIGO) a observé pour la première fois des ondes gravitationnelles générées par la fusion de deux trous noirs. Cette observation résulte de 40 ans d’efforts afin de réduire au minimum les sources de bruit qui affectent l’interféromètre. À ce jour, la sensibilité de LIGO, dans son domaine de fréquence le plus sensible, est limitée par la granularité de la lumière d’une part et, d’autre part, par un phénomène de fluctuations thermiques résultat de la dissipation mécanique dans les couches minces qui constituent ses miroirs, en particulier dans le matériau ayant un haut indice de réfraction : l’oxyde de tantale. Une amélioration de la sensibilité permettrait d’observer davantage d’événement, d’autres phénomènes gravitationnels, ainsi que des détails importants permettant de mieux les comprendre. Ce mémoire présente les résultats de nos recherches afin de diminuer le bruit causé par la dissipation mécanique interne dans les couches à haut indice de réfraction. Pour ce faire, des couches d’oxyde de tantale ont été dopées soit au zirconium ou à la fois au zirconium et au titane, par co-dépôt. Des couches avec différentes quantités de dopant ont été synthétisées par pulvérisation cathodique magnétron sur des substrats de silice semblables à ceux de LIGO. Par la suite, la dissipation mécanique, l’épaisseur, la rugosité, la composition, la densité surfacique, et la microstructure ont été caractérisées par suspension nodale, ellipsométrie résolue spectralement, spectrométrie de rétrodiffusion de Rutherford et la spectroscopie Raman. Il appert que le zirconium permet d’augmenter la température de recuit avant la cristallisation, ce qui permet de diminuer plus amplement la dissipation mécanique interne, mais ne change pas la dissipation à une température de recuit donnée. Il a aussi été déterminé que la concentration de titane permettait de diminuer l’angle de perte, peu importe la concentration de zirconium. Une combinaison des deux dopages et un recuit à haute température permet ainsi de recuire par un facteur d’environ 1.5 la dissipation mécanique interne. La différence de coefficient d’expansion thermique durant les recuits à haute température induit cependant des problèmes de craquement des couches, partiellement résolus par l’application d’une couche de recouvrement en silice. / In 2015, the Laser Interferometer Gravitational-Wave Observatory (LIGO) observed for the first time gravitational waves generated by the merger of two black holes. This observation was the resut of 40 years of efforts to minimize the noise source which affect the the interferometer. To this date, the sensitivity of LIGO, in its most sensitive frequency domain, is limited by the granularity of the light on one hand, on the other, by a phenomenon of thermal fluctuations resulting from the mechanical dissipation in the thin film of the miroir, in particular in the high refractive index material: tantala. An improvement of the sensitivity would allow the measurement of more events, other gravitational phenomena and some details that would result in a better understanding. This master’s thesis presents results of our research to reduce the noise caused by internal mechanical dissipation in high refractive index layers. To do so, tantala layers were doped with either zirconium and titanium by co-deposition. Layers with different amounts of dopant were synthesized by magnetron sputtering on fused silica substrate similar to those of LIGO. Subsequently, mechanical dissipation, thickness, roughness, composition, areal density and microstructure were characterized by gentle nodal suspension, spectrally resolved ellipsometry, Rutherford backscattering spectroscopy, and Raman spectroscopy. It appears that zirconium allows the annealing temperature to be increased before crystallization which further decreases internal mechanical dissipation, but does not change dissipation at a given annealing temperature. It was also determined that the concentration of titanium reduced the loss angle regardless of the zirconium concentration. A combination of the two dopant and high annealing temperatures thus enables the internal mechanical dissipation to be lower by a factor of 1.5.The difference in thermal expansion coefficient during high temperature annealing, however, induces layer cracking problems, partially resolved by the application of a silica cap.