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  • About
  • The Global ETD Search service is a free service for researchers to find electronic theses and dissertations. This service is provided by the Networked Digital Library of Theses and Dissertations.
    Our metadata is collected from universities around the world. If you manage a university/consortium/country archive and want to be added, details can be found on the NDLTD website.
1

Synthèse par faisceaux d'ions de nanocristaux semi-conducteurs fonctionnels en technologie silicium / Ion beam synthesis of functional semiconductor nanocrystals in silicon technology

Khelifi, Rim 05 March 2015 (has links)
Les boîtes quantiques sous formes de nanocristaux semi-conducteurs permettent de réaliser des matériaux à énergie de gap variable, propriété très intéressante pour les composants optoélectroniques. Ce travail est dédié à la création de nanocristaux de silicium dopés enfouis dans SiO2 et de nanocistaux binaires (InAs et GaAs) et ternaires d’InxGa1-xAs enfouis dans Si et à leurs caractérisations structurales, électriques et optiques. La synthèse par faisceaux d’ions permet d’avoir un contrôle de la quantité et de la taille des nanocristaux synthétisés. Des caractérisations structurales ont pu démontrer le dopage des nanocristaux de silicium avec le phosphore et l’arsenic à une concentration atomique moyenne de 8 %. Nous avons également montré la possibilité de moduler la taille et la composition chimique des nanocristaux d’InxGa1-xAs sur une large gamme à l’aide de la dose d’implantation et de la température de recuit. / Semiconductor nanocrystals can be used as quantum dots to produce band gap engineering by varying the nanocrystals size, which is a very interesting property for optoelectronic components. This work is dedicated to the creation of doped silicon nanocrystals embedded in SiO2 and binary (InAs and GaAs) and ternary nanocrystals of InxGa1-xAs embedded in Si and also to investigate their structural, electrical and optical properties. Ion beam synthesis allows a control of the nanocrystals amount and size. Structural characterizations were able to demonstrate the doping of silicon nanocrystals with phosphorus and arsenic at an average atomic concentration of 8 %. We have also shown the ability to modulate the size and the chemical composition of InxGa1-xAs nanocrystals in a large range by varying the implantation dose and the annealing temperature.
2

Crescimento e caracterização de heteroestruturas tensionadas de InxGa1-x-As/GaAs / Growth and characterization of stressed heterostructures of InxGa1-x-As/GaAs

Ceschin, Artemis Marti 17 December 1992 (has links)
Utilizando a técnica de epitaxia por feixe molecular (MBE), crescemos heteroestruturas tensionadas de InxGa1-xAs sobre substratos de GaAs (100). A composição de In, a espessura para a transição 2D-3D e a espessura crítica (hc) foram determinadas através da análise \"in situ\" pelo RHEED. Os valores da hc e da espessura para a transição 2D- 3D foram observadas ser funções da composição do In e da temperatura do substrato. Um estudo do efeito da desorientação do substrato de GaAs (100) de alguns graus sobre as qualidades ópticas (PL) de poços quânticos simples e múltiplos de InxGa1-xAs/GaAs também foi realizado. Microscopia eletrônica por transmissão (TEM) foi utilizada para a verificação da qualidade das interfaces dos poços quânticos de InxGa1-x/GaAs. Algumas estruturas de dupla barreira (AlGaAs/GaAs/InAs/GaAs/AlGaAs) foram crescidas e caracterizadas opticamente (PL) / InxGa1-xAs strained heterostructures were grown on GaAs (100) by Molecular Beam Epitaxy (MBE). Indium concentration (x), 2D-3D growth mode transition thickness and critical thickness (hc) were determined by \"in situ\" RHEED analysis. Hc and 2D-3D growth mode transition thickness values were verified to depend on In concentration and substrate temperature. The dependence of the InxGa1-xAs /GaAs simple and multiple quantum wells (SQW and MQW) PL optical quality on the GaAs (100) substrate misorientation was also studied. The SQW interfaces were investigated by Transmission Eletronic Microscopy (TEM). Some double-barrier structures (AlGaAs/GaAs/InAs/GaAs/AlGaAs was also grown and optically characterized
3

Crescimento e caracterização de heteroestruturas tensionadas de InxGa1-x-As/GaAs / Growth and characterization of stressed heterostructures of InxGa1-x-As/GaAs

Artemis Marti Ceschin 17 December 1992 (has links)
Utilizando a técnica de epitaxia por feixe molecular (MBE), crescemos heteroestruturas tensionadas de InxGa1-xAs sobre substratos de GaAs (100). A composição de In, a espessura para a transição 2D-3D e a espessura crítica (hc) foram determinadas através da análise \"in situ\" pelo RHEED. Os valores da hc e da espessura para a transição 2D- 3D foram observadas ser funções da composição do In e da temperatura do substrato. Um estudo do efeito da desorientação do substrato de GaAs (100) de alguns graus sobre as qualidades ópticas (PL) de poços quânticos simples e múltiplos de InxGa1-xAs/GaAs também foi realizado. Microscopia eletrônica por transmissão (TEM) foi utilizada para a verificação da qualidade das interfaces dos poços quânticos de InxGa1-x/GaAs. Algumas estruturas de dupla barreira (AlGaAs/GaAs/InAs/GaAs/AlGaAs) foram crescidas e caracterizadas opticamente (PL) / InxGa1-xAs strained heterostructures were grown on GaAs (100) by Molecular Beam Epitaxy (MBE). Indium concentration (x), 2D-3D growth mode transition thickness and critical thickness (hc) were determined by \"in situ\" RHEED analysis. Hc and 2D-3D growth mode transition thickness values were verified to depend on In concentration and substrate temperature. The dependence of the InxGa1-xAs /GaAs simple and multiple quantum wells (SQW and MQW) PL optical quality on the GaAs (100) substrate misorientation was also studied. The SQW interfaces were investigated by Transmission Eletronic Microscopy (TEM). Some double-barrier structures (AlGaAs/GaAs/InAs/GaAs/AlGaAs was also grown and optically characterized

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