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  • About
  • The Global ETD Search service is a free service for researchers to find electronic theses and dissertations. This service is provided by the Networked Digital Library of Theses and Dissertations.
    Our metadata is collected from universities around the world. If you manage a university/consortium/country archive and want to be added, details can be found on the NDLTD website.
121

Surface bioactivity enhancement of polyetheretherketone (PEEK) by plasma immersion ion implantation

Lui, So-ching., 雷素青. January 2009 (has links)
published_or_final_version / Orthopaedics and Traumatology / Master / Master of Philosophy
122

Quantitative depth profiling of near surface semiconductor structures using ultra low energy SIMS analysis

Elliner, David I. January 1999 (has links)
No description available.
123

Deposition and interface modification of thin magnetic multilayer films by closed-field unbalanced magnetron sputtering

Ormston, Marcus Winston January 2000 (has links)
No description available.
124

Raman measurements of dye-laser-annealed, ion implanted GaAs

Yao, Huade. January 1986 (has links)
Call number: LD2668 .T4 1986 Y36 / Master of Science / Physics
125

Modificação superficial de titânio para promoção de osteointegração / Titanium modification for the promotion of osteointegration

Aburaya, Jim Heiji 09 May 2011 (has links)
O titânio é considerado um biomaterial (material biocompatível) pela baixa reatividade e pela grande estabilidade da sua camada de óxido superficial. Pelas suas propriedades mecânicas ele é usualmente utilizado na fabricação de substitutos ósseos e implantes dentários. Visando contribuir para o desenvolvimento de novas superfícies osteointegráveis, neste trabalho foram estudadas duas superfícies de titânio modificadas com implantação iônica de P e BF2 com energia de 30 e 77keV, respectivamente. As superfícies foram submetidas a ensaios in vitro de cultura celular de células osteoblásticas (MG-63) e os resultados foram comparados com duas superfícies comerciais: poliestireno tratado para meio de cultura celular (PC) e titânio comum utilizado em implante dentário (TI). A atividade enzimática da fosfatase alcalina (FA) associadas à formação de biofilme mineralizado pelas células diferenciadas foram avaliadas. Concentrações de cálcio e fósforo no biofilme foram determinadas por espectroscopia de raios-X induzida por prótons, PIXE. Imagens superficiais com microscopia eletrônica de varredura serviram para verificar a homogeneidade e integridade dos biofilmes formados. Medidas de ângulo de contato foram realizadas para determinar o caráter hidrofílico das superfícies e do biofilme formado. As superfícies PC e TI se apresentaram hidrofílicas com formação de biofilme menos homogêneo que as apresentadas pelas superfícies PT e BFT, ambas hidrofóbicas. As concentrações de FA medidas no meio de cultura indicaram consumo maior que a secreção em PC e TI. Em PT e BFT foram observados acúmulos de FA no meio de cultura. Concentrações maiores de cálcio e fósforo foram observadas em PC e TI. Destas observações, as quatro superfícies podem ser consideradas biocompatíveis (não citotóxicas) pela formação de biofilme mineralizado e pelas medidas de atividade enzimática. / Titanium is considered a biomaterial (biocompatible material) due to its low reactivity and the great stability of its surface native oxide layer. With excellent mechanical properties, titanium is widely used as bone substitutes and dental implants. Aiming to contribute for the development of new surfaces to promote osteoblastic cell grow, two ion-beam-modified titanium samples were compared with two commercially available surfaces: polystyrene treated for cellular cultures (PC), and regular titanium used in dental implants (TI). The modified titanium samples were ion beam implanted with 30 and 77 keV phosphorous and BF2, respectively. All surfaces were employed for in vitro assays using cultures of osteoblastic cells (MG-63). The Phosphatase Alkaline Enzymatic Activity (ALP) was measured and associated with the mineralized bio-film formed by the differentiated cells. The concentration of calcium and phosphorus in the mineralized bio-film was measured by Proton Induced X-ray Emission, PIXE. Scanning Electron Microscope images were used to access the bio-film homogeneity and integrity. Contact angle measurements were used to characterize the wettability of the surfaces and the resulting bio-film. In spite of being more hydrophilic, the surfaces PC and TI formed of a less homogeneous bio-film than the PT and BFT surfaces, which were less hydrophilic. The ALP in the cell culture medium indicated greater consumption than secretion for PC and TI, while for PT and BFT accumulation of ALP was observed. Concentrations of calcium and phosphorus were greater for PC and TI samples. The four surfaces can be considered biocompatible (not cytotoxic) due to mineral bio-film formation and enzymatic activity measurements.
126

\"Resistência à perda de corte de instrumentos rotatórios de níquel-titânio submetidos à implantação iônica de nitrogênio\" / utting ability resistance in nickel-titanium instruments submitted to nitrogen ion implantation

Costa, Cristiane da 05 December 2006 (has links)
O presente estudo verificou o aumento da resistência à perda de corte de instrumentos produzidos em liga de níquel-titânio, após tratamento de implantação iônica de nitrogênio. Para tal, foram utilizados vinte e um instrumentos da marca K3 ?ENDO, de n° 25.02, com 21 mm, divididos em dois grupos. O grupo 1 foi constituído por onze instrumentos submetidos à ação de uma câmara de implantação iônica de nitrogênio, servindo um deles como controle para a determinação da quantidade de íons implantados. O grupo 2 foi composto por dez instrumentos não submetidos ao processo de implantação iônica. Cada lima instrumentou 20 blocos de canais simulados 20.02 de 21 mm, previamente lavados em cuba ultra-sônica com detergente a 40°C por 10 minutos e depois com água bidestilada por mais 10 minutos. Os mesmos foram secos com jato de ar, voltaram para estufa a 40°C por 2 dias e finalmente pesados em balança analítica. Após cada instrumentação os blocos foram lavados em cuba ultra-sônica com detergente a 40°C por 20 minutos e pesados novamente. O ensaio de resistência à perda de corte foi realizado mediante a instrumentação de cada bloco com auxílio de um simulador de ação da instrumentação endodôntica, sendo a amplitude percorrida pelo contra-ângulo padronizada em 2,5 mm a cada penetração por 8 vezes atingindo um total de 2,0 cm para dentro do canal simulado, com força de penetração de 1,5 N. Quanto a resistência à perda de corte os resultados mostraram que os instrumentos implantados não apresentaram diferença estatisticamente significante em nível de 5 % (? = 0,5 %) até 20 usos. Porém, os instrumentos não implantados mostraram diferença estatisticamente significante (? = 0,5 %) entre 5 e 15 usos, 5 e 20 usos, bem como entre 10 e 20 usos. Ao compararem-se instrumentos implantados e não implantados, observou-se que em 5 e 10 usos não houve diferença estatisticamente significante (p>5%). Já na comparação entre ambos com 15 e 20 usos a diferença foi estatisticamente significante (? = 0,5 %). Lícito foi concluir, portanto, que o processo de implantação de íons de nitrogênio manteve a resistência à perda de corte de instrumentos produzidos em liga de níquel-titânio até 20 usos. Os instrumentos não implantados mostraram perda progressiva do poder de corte significativamente entre 5 e 15 usos, 5 e 20 usos, bem como entre 10 e 20 usos. Comparando-se instrumentos implantados e não implantados, observou-se que até 10 usos ambos comportaram-se igualmente no que respeita à perda de corte. Já na comparação entre ambos com 15 e 20 usos a diferença foi significativa. / The present study investigated the cutting ability resistance in nickel-titanium instruments after nitrogen ion implantation treatment. Twenty-one instruments of K3 ?ENDO brand, number 20.02, with 21 mm, were divided in two groups. The group 1 submitted 11 instruments to nitrogen ion implantation chamber, while on served as positive control for the determination of the ion implantation quantity. In group 2, the 10 instruments were not submitted to ion implantation treatment. Each file instrumented 20 acrylic blocks 20.02 with 21 mm, previously washed in ultrasonic container with detergent in 40°C for 10 minutes and then with bidestiled water for 10 minutes. They were dried and put in a 40°C stove for 2 days and finally weighed in analytic balance. After instrumentation the blocks were washed for 20 minutes and weighed again. The usage essay was realized through the instrumentation of each block using an endodontic instrumentation simulated action, with a 2,5 mm standardized distance for 8 times, getting a total of 2,0 cm inside the simulated canal with a strong penetration of 1,5 N. The results showed that there was no statistical difference in cutting resistance of instruments treated with ionic implantation process until 20 uses. Although in the non treated instruments there was a gradual reduce in cutting ability resistance from 5 to 20 uses. The conclusion was that the nitrogen ion implantation process increases the cutting resistance of nickel-titanium instruments.
127

Resistência à corrosão do aço inoxidável AISI 304 com implantação de íons de cobre

Canabarro, Felipe Ariel Furlan January 2018 (has links)
O efeito bactericida de íons cobre é bem conhecido; no entanto a atividade inibitória depende diretamente da concentração desses íons no material base. Contudo, essa concentração deve ser controlada, pois o excesso destes íons pode ser tóxico e além disso, a implantação de cobre pode comprometer a resistência a corrosão do substrato metálico. A propriedade bactericida é desejável para aplicação em ligas metálicas empregadas em diversos setores, na assepsia de materiais que tenham contato direto com subprodutos que necessitam alta pureza e com baixíssimos índices de contaminação. O aço inoxidável austenítico AISI 304 é amplamente utilizado devido às suas propriedades mecânicas e de resistência à corrosão. Considerando isso, o aço AISI 304 é o foco do presente estudo, mesclando as características anticorrosivas naturais com a assepsia oligodinâmica proveniente da dopagem com íons de cobre. Nesse sentido, avaliou a resistência à corrosão do aço inoxidável AISI 304 com diferentes doses de cobre implantado (1015 íons.cm-2 e 1016 íons.cm-2) por monitoramento do potencial de circuito aberto e voltametria cíclica em uma solução eletrolítica de NaCl 3,5 % em peso. Através de simulações computacionais, previu-se que nos parâmetros escolhidos, a profundidade de implantação dos íons no substrato atingiu até 40 nm da superfície, com uma concentração de pico, maior teor de cobre, na profundidade de 12 nm. As amostras com doses de 1015 íons.cm-2 de cobre apresentaram o potencial de pites semelhante ao aço inoxidável austenítico AISI 304 sem implantação de Cu. Na análise de EDS observou-se que as áreas que não sofreram corrosão, apresentaram melhor distribuição dos elementos de liga e do cobre implantado em comparação com as regiões com maior incidência de pites. A maior intensidade de pites foi encontrada para a amostra com maior dose de cobre implantado (1016 íons.cm-2 de cobre). / The bactericidal effect of copper ions is well known; however, the inhibitory activity depends directly on the concentration of these ions in the base material. However, this concentration should be controlled because the excess of these ions can be toxic and the implantation of copper may compromise the corrosion resistance of the metal substrate. The bactericidal property is desirable for application in metal alloys used in the several sectors, in the asepsis of materials that have direct contact with by-products that require high purity and with very low contamination rates. The AISI 304 austenitic stainless steel is widely used because of its mechanical properties and corrosion resistance. Considering this, the AISI 304 is the focus of the present study, mixing the natural anticorrosive characteristics with the oligodynamic aseptic from the copper ions doping. The corrosion resistance of AISI 304 stainless steel with different doses of implanted copper (1015 ions.cm-2 and 1016 ions.cm-2) was evaluated by monitoring the open circuit potential and cyclic voltammetry in an electrolytic solution of NaCl 3,5% by weight. Through computational simulations, it was predicted that in the chosen parameters, the implantation depth of the ions in the substrate reached up to 40 nm from the surface, with a peak concentration, higher copper content, at the depth of 12 nm. The samples with doses of 1015 ions.cm-2 of copper had the pit potential similar to the austenitic stainless steel AISI 304 without implantation of Cu. In EDS analysis, it was observed that the areas that did not undergo corrosion had better distribution of the alloying elements and of the implanted copper compared to the regions with a higher incidence of pitting. The highest pitting intensity was found for the sample with the highest dose of implanted copper (1016 ions.cm-2 copper).
128

A study of cobalt silicide formed by MEVVA implantation.

January 1999 (has links)
by Li Chi Pui. / Thesis (M.Phil.)--Chinese University of Hong Kong, 1999. / Includes bibliographical references (leaves [105]-[109]). / Abstracts in English and Chinese. / Abstract / Acknowledgement --- p.Page no / Chapter Chapter 1. --- Introduction / Chapter 1.1 --- Metal silicides --- p.1 / Chapter 1.2 --- Cobalt silicides --- p.3 / Chapter 1.3 --- Ion beam synthesis of metal silicides by metal implantation into silicon --- p.4 / Chapter 1.4 --- Feature of MEVVA implantation --- p.5 / Chapter 1.5 --- Motivation and organisation of this thesis --- p.6 / Chapter Chapter 2. --- Sample Preparation and Characterisation Methods / Chapter 2.1 --- MEVVA implantation --- p.7 / Chapter 2.2 --- Simulation by TRIM --- p.9 / Chapter 2.3 --- Sample preparation --- p.12 / Chapter 2.4 --- Sheet resistivity measurements --- p.14 / Chapter 2.5 --- Rutherford backscattering spectroscopy (RBS) --- p.17 / Chapter 2.6 --- Transmission electron microscopy (TEM) --- p.19 / Chapter 2.6.1 --- Transmission electron microscopy (TEM) sample preparation --- p.21 / Chapter 2.7 --- Atom force microscopy (AFM) and conducting AFM --- p.31 / Chapter Chapter 3. --- Characterisation of As-implanted Samples / Chapter 3.1 --- Experimental details / Chapter 3.1.1 --- Sheet resistance measurements --- p.33 / Chapter 3.1.2 --- Rutherford backscattering spectroscopy (RES) --- p.36 / Chapter 3.1.3 --- Sputtering depth measurements --- p.43 / Chapter 3.1.4 --- Transmission electron microscopy (TEM) --- p.44 / Chapter 3.1.5 --- Spreading resistance profiling (SRP) --- p.61 / Chapter 3.1.6 --- Atom force microscopy (AFM) and conducting AFM --- p.64 / Chapter 3.2 --- Results and discussion --- p.71 / Chapter 3.3 --- Summary --- p.81 / Chapter Chapter 4. --- Characterisation of Annealed Samples / Chapter 4.1 --- Experimental details / Chapter 4.1.1 --- Rutherford backscattering spectroscopy (RBS) --- p.82 / Chapter 4.1.2 --- Transmission electron microscopy (TEM) --- p.87 / Chapter 4.1.3 --- Sheet resistance measurements --- p.98 / Chapter 4.2 --- Summary --- p.101 / Chapter Chapter 5. --- Conclusion --- p.102 / Appendix / Reference
129

Preparation and characterization of granular magnetic cobalt silver thin film.

January 2000 (has links)
by Chiah Man Fat. / Thesis submitted in: September 1999. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2000. / Includes bibliographical references (leaves 94-97). / Abstracts in English and Chinese. / Acknowledgements --- p.2 / Abstract --- p.3 / Table of Contents --- p.5 / List of Figures --- p.7 / List of Tables --- p.13 / Chapter Chapter 1 --- Introduction --- p.14 / Chapter 1.1. --- Overview --- p.14 / Chapter 1.2. --- Giant Magnetoresistance (GMR) --- p.15 / Chapter 1.3. --- Application of GMR Materials --- p.20 / Chapter 1.4. --- Preparation Methods --- p.22 / Chapter 1.5. --- This Thesis --- p.23 / Chapter Chapter 2 --- Sample Preparation and Experimental Methods --- p.24 / Chapter 2.1. --- MEVVA Ion Source Implanter --- p.24 / Chapter 2.2. --- The Pulsed Filtered Cathodic Arc Co-deposition System --- p.26 / Chapter 2.3. --- Sample Preparation --- p.29 / Chapter 2.3.1 --- Implantation Condition --- p.29 / Chapter 2.3.2 --- Co-deposition Conditions --- p.31 / Chapter 2.4. --- Characterization methods --- p.32 / Chapter 2.4.1 --- Magnetoresistance Measurement --- p.32 / Chapter 2.4.2 --- Atomic Force Microscopy and Magnetic Force Microscopy --- p.34 / Chapter 2.4.3 --- Rutherford Backscattering Spectroscopy (RBS) --- p.37 / Chapter 2.4.4 --- SQUID Magnetometer --- p.38 / Chapter Chapter 3 --- Characterization of Implanted Samples --- p.39 / Chapter 3.1. --- Introduction --- p.39 / Chapter 3.2. --- Results and Discussion --- p.39 / Chapter 3.2.1 --- Ag Film Thickness Dependence --- p.39 / Chapter 3.2.2 --- Dose Dependence --- p.44 / Chapter 3.2.3 --- Extraction Voltage Dependence --- p.46 / Chapter 3.2.4 --- Annealing Temperature Dependence --- p.49 / Chapter 3.2.5 --- Thicker Layer Formation --- p.56 / Chapter 3.2.6 --- AFM and MFM Measurements --- p.58 / Chapter 3.3. --- Summary --- p.64 / Chapter Chapter 4 --- Characterization of Co-deposited Samples --- p.65 / Chapter 4.1. --- Introduction --- p.65 / Chapter 4.2. --- Results and discussion --- p.65 / Chapter 4.2.1 --- RBS Measurement --- p.65 / Chapter 4.2.2 --- Magnetoresistance Measurement --- p.66 / Chapter 4.2.3 --- AFM Measurement --- p.69 / Chapter 4.2.4 --- MFM Measurement --- p.76 / Chapter 4.3. --- Summary --- p.84 / Chapter Chapter 5 --- Conclusion --- p.85 / Chapter 5.1. --- Main Results of This Work --- p.85 / Chapter 5.2. --- Suggestions on Future Works --- p.87 / Appendix --- p.89 / Reference --- p.94 / Publications --- p.97
130

Formation and characterization of cobalt silicide by MEVVA implantation. / CUHK electronic theses & dissertations collection

January 1997 (has links)
by Peng Qicai. / Thesis (Ph.D.)--Chinese University of Hong Kong, 1997. / includes bibliographical references (p. 187-206). / Electronic reproduction. Hong Kong : Chinese University of Hong Kong, [2012] System requirements: Adobe Acrobat Reader. Available via World Wide Web. / Mode of access: World Wide Web.

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