GaAs nanowires (NW) have been grown on Si (111) substrates by the self-assisted vapor-liquid-solid (VLS) mechanism using molecular beam epitaxy (MBE). Substrates were prepared with nano-patterned oxide templates using electron beam lithography (EBL) in order to achieve position controlled NW growth. Early experiments uncovered several key issues with regards to the patterning process. Cross-sectional lamella prepared using the focused-ion beam (FIB) technique were used to study the NW-substrate interface using transmission electron microscopy (TEM). Undesirable growth outcomes were found to be caused in part by an unintended residual layer of oxide. Uniform NW dimensions were then obtained by improving the pattern transfer method. The effects of deposition parameters on the growth results were then explored in further experiments. The first systematic study of the axial and radial growth rates of vertical NWs in the positioned array was conducted. It was proposed that the observed expansion of the Ga droplet in Ga-rich growth conditions results in a slight inverse tapered morphology, promoting significant radial growth. While the growth rates were shown to be approximately constant in time, their measured values were found to increase with increasing pattern pitch and decrease with increasing hole diameter. A phenomenological model was then developed based on the principle of mass conservation. A fit to the experimental data was obtained by calculating the collection of growth material supplied by a secondary flux of both gallium and arsenic species desorbing from the oxide surface between the NWs, subsequently impinging on the liquid droplet and NW sidewalls. The reduction of this contribution due to shading of the incident and scattered flux by neighboring NWs in the array was able to account for the differences in final NW morphologies observed with increasing pattern pitch. This model demonstrates the significant impact of secondary adsorption in patterned self-assisted NW growth. / Thesis / Doctor of Science (PhD)

No description available.

No description available.

This thesis mainly aims at application of principles of engineering technology in the field of molecular beam epitaxy (MBE). MBE is a versatile technique for growing epitaxial thin films of semiconductors and metals by impinging molecular beams of atoms onto a heated substrate under ultra-high vacuum (UHV) conditions. Here, a LabVIEW® (laboratory virtual instrument engineering workbench) software (National Instruments Corp., http://www.ni.com/legal/termsofuse/unitedstates/usH) program is developed that would form the basis of a real-time control system that would transform MBE into a true-production technology. Growth conditions can be monitored in real-time with the help of reflection high energy electron diffraction (RHEED) technique. The period of one RHEED oscillation corresponds exactly to the growth of one monolayer of atoms of the semiconductor material. The PCI-1409 frame grabber card supplied by National Instruments is used in conjunction with the LabVIEW software to capture the RHEED images and capture the intensity of RHEED oscillations. The intensity values are written to a text file and plotted in the form of a graph. A fast Fourier transform of these oscillations gives the growth rate of the epi-wafer being grown. All the data being captured by the LabVIEW program can be saved to file forming a growth pedigree for future use. Unattended automation can be achieved by designing a control system that monitors the growth in real-time and compares it with the data recorded from the LabVIEW program from the previous growth and adjusts the growth parameters automatically thereby growing accurate device structures.

No description available.

Molecular beam epitaxy (MBE) grown metal has been a renewed area of interest recently in order to achieve high quality metal films or nanostructures for plasmonics. Recently MBE grown silver films have been shown to possess optical constants closer to that of intrinsic silver leading to lower losses and thus allowing for higher quality plasmonics. MBE has also been used to grow silver nanocrystals and indium droplets, or islands, for plasmonics. These self-assembled nanostructures can be grown in close proximity to quantum confined structures such as InAs/GaAs quantum dots or InGaAs/GaAs quantum wells in a single process, without post-processing and fabrication, allowing for increased plasmonic enhancement due to the improved interface between the semiconductor and plasmonic structures.In this dissertation, widely tunable plasmonic resonances of indium islands will be discussed and plasmonic enhancement results will be presented and compared to those of nanoantennas constructed from standard fabrication processes. The coupling between near-surface quantum confined structures, both fabricated and self-assembled, will be compared to the coupling in typical dielectric cavities, such as photonic crystal nanobeams. Beyond the plasmonic possibilities of indium islands, indium becomes superconducting at 3.4 K. With the proximity effect allowing for electrons in materials in contact with a superconductor to occupy a superconducting like state, allowing for the possibility for a hybrid superconductor/semiconductor optical source. The observation of superconductivity in indium islands will be presented and considerations for a superconductor/semiconductor source will be discussed.

published_or_final_version / Physics / Doctoral / Doctor of Philosophy

published_or_final_version / abstract / Physics / Doctoral / Doctor of Philosophy

published_or_final_version / abstract / Physics / Master / Master of Philosophy

published_or_final_version / abstract / Physics / Master / Master of Philosophy