The recent discoveries of topological insulators (TI) has opened a new realm for study¬ing topological systems and exploring the exotic properties they offer. The in-built topological protection against direct backscattering and absence of localization makes two-dimensional (2D) surface states of bismuth chalcogenide-based strong TI a promising platform for studying interesting phenomena in condensed matter physics like dissipation-less transport, quantum anomalous hall effect, topological magnetoelectric effect, majo¬rana fermions etc. and also makes this system very suitable for applications in the fields of electronics and spintronics. However, realization of these novel states can be difficult because of scattering of surface states from different types of disorders (intrinsic or ex¬trinsic) or the presence of parallel channels in the bulk of the sample which can dominate over surface transport. The main goal of this thesis is to evaluate the performance of TI as an electronic element and look into elastic and inelastic scattering processes and kinetics of these scatterers. In most part of this work we concentrate on the magnitude and origin of low-frequency flicker noise or the 1/f-noise, a key performance marker in electronics, to characterize the electrical transport in TI. In this work we have studied 1/f-noise in both mechanically exfoliated TI-flakes and epitaxially grown TI films by varying chemical potential and temperature. Our study of exfoliated TI-flakes with a wide range of thickness (10 nm to 80 μm) suggests that whereas at thinner (<100 nm) samples and at low temperature (<70 K), the electrical transport happens entirely at the surface, resistance fluctuations in the surface states are mainly caused by potential fluctuations caused by generation-recombination processes in the bulk of TI. Study of 1/f-noise in MBE-grown magnetically doped TI reveals signature of hopping transport through localized bulk mid gap states. These states can either be Cr-impurity band or disorder-induced mobility edge states of bulk valence band. Our study of quantum transport in exfoliated TI-devices indicate presence of a de-coherence mechanism which saturates phase-coherence length and temperature below T< 3 K and results from a unique scattering mechanism caused by localized magnetic moments in these systems

The focus of the work is on the epitaxial growth of Mn5Ge3 layers on Ge (001) via ultra-fast solid-state reaction between Mn and Ge using millisecond range FLA at the ambient pressure in continuous N2 flow. Epitaxial Mn5Ge3 layers were obtained both on Ge (001) and Ge (111) substrates by optimizing the fabrication parameters, Mn thickness (30 nm), FLA energy density (100-110 Jcm-2) and FLA duration time. The epitaxial relationship between the alloy film and substrate is the (100) plane of Mn5Ge3 along [001] direction parallel with the [100] direction of Ge (001) plane. It is notable that the hexagonal c axis of Mn5Ge3 on Ge (001) is parallel to the film surface plane, while the reported Mn5Ge3’s c axis on Ge (111) tends to be perpendicular to the film plane. In fact, using ultrafast-SPE the c-axis of Mn5Ge3 is always parallel to the sample surface. Mn5Ge3 films exhibit ferromagnetism which is demonstrated by the anomalous Hall effect up to the TC = 283±5 K. The films exhibit their in-plane magnetic easy axis along the hexagonal c-axis independent of the Mn5Ge3 film thickness. This provides a new avenue for the fabrication of Ge-based spin-injectors fully compatible with industrial CMOS technology. The deeper understanding of the magnetic, structural and electrical properties of (100) epitaxial Mn5Ge3 grown on Ge (001) are presented by utilizing DFT calculation (by our collaborator M. Birowska) and various experimental methods. The Mn atoms in Mn5Ge3 occupy two distinct Wyckoff positions with fourfold (Mn1) and sixfold (Mn2) multiplicity. During cooling down to 100 K the Mn5Ge3 unit-cell shows remarkable structural deformation. The nearest distance d3 between Mn2-Mn2 atoms in the hexagonal a-b plane is shortened much faster than the nearest distance d1 between Mn1-Mn1 atoms along hexagonal c axis. The DFT calculations show that below critical distance d3 < 3.002 Å, the Mn2 atoms are AFM coupled while for d3 > 3.002 Å the coupling is FM. The FM coupling between Mn1 atoms weakly depends on the atomic distance d1. Moreover, there is a transition from collinear to noncollinear spin configuration at about 70±5 K. Simultaneously, at low temperature, the angular dependent magnetoresistance shows a switching from multi-fold component to twofold symmetry. The combination of different experimental techniques with theoretical calculations enabled us to conclude that the switching between non-collinear and collinear spin configurations and the variation of anisotropic magnetoresistance in Mn5Ge3 is due to the strain induced change of the magnetic coupling between Mn2-Mn2 atoms. Finally, the effects of strain on the structural and magnetic properties of epitaxial Mn5Ge3 on Ge (111) substrate by applying ms-range FLA are investigated. The X-ray diffraction results demonstrate that during FLA process the formation of nonmagnetic secondary phases of MnxGey is fully suppressed and the in-plane tensile strain is enhanced. The temperature dependent magnetization indicates that after FLA the Curie temperature of Mn5Ge3 increases from 283±5 K to above 400 K. Further Monte Carlo simulations manifest that the change of the strain in Mn5Ge3 during ms-range FLA modifies the distance between adjacent Mn atoms in the hexagonal basal plane, which provokes the different ferromagnetic interaction between them. Consequently, the significant increase of Curie temperature is observed. This provides a good way to improve the Curie temperature of Mn5Ge3 which is promising to realize room-temperature operated Ge based spin-injectors.

This thesis deals with the synthesis and characterization of Ge-Te-Sb (GST) thin films. The films were deposited using a Pulsed Laser Deposition (PLD) method and mainly characterized with XRD, SEM, AFM and TEM. For amorphous and polycrystalline films, un-etched Si(100) was used. The amorphous films showed a similar crystallization behavior as films deposited with sputtering and evaporation techniques. When depositing GST on un-etched Si(100) substrates at elevated substrate temperatures (130-240°C), polycrystalline but highly textured films were obtained. The preferred growth orientation was either GST(111) or GST(0001) depending on if the films were cubic or hexagonal. Epitaxial films were prepared on crystalline substrates. On KCl(100), a mixed growth of hexagonal GST(0001) and cubic GST(100) was observed. The hexagonal phase dominates at low temperatures whereas the cubic phase dominates at high temperatures. The cubic phase is accompanied with a presumed GST(221) orientation when the film thickness exceeds ~70 nm. Epitaxial films were obtained with deposition rates as high as 250 nm/min. On BaF2(111), only (0001) oriented epitaxial hexagonal GST films are found, independent of substrate temperature, frequency or deposition background pressure. At high substrate temperatures there is a loss of Ge and Te which shifts the crystalline phase from Ge2Sb2Te5 towards GeSb2Te4. GST films deposited at room temperature on BaF2(111) were in an amorphous state, but after exposure to an annealing treatment they crystallize in an epitaxial cubic structure. Film deposition on pre-cleaned and buffered ammonium fluoride etched Si(111) show growth of epitaxial hexagonal GST, similar to that of the deposition on BaF2(111). When the Si-substrates were heated directly to the deposition temperature films of high crystal-line quality were obtained. An additional heat treatment of the Si-substrates prior to deposition deteriorated the crystal quality severely. The gained results show that PLD can be used as a method in order to obtain high quality epitaxial Ge-Sb-Te films from a compound target and using high deposition rates.

Die vorliegende Arbeit befasst sich mit dem Einfluss einer hyperthermischen Stickstoffionenbestrahlung (Ekin < 25 eV) auf das Galliumnitrid-Schichtwachstum. Dabei wird insbesondere der Einfluss einer Oberflächenrekonstruktion, einer Strukturierung der Oberfläche, einer Zwischenschicht (Pufferschicht) und der Einfluss verschiedener Siliziumsubstratorientierungen auf das epitaktische Wachstum von dünnen Galliumnitrid-Schichten nach einer hyperthermischen Stickstoffionenbestrahlung diskutiert. Ziel war es, möglichst dünne, epitaktische und defektarme Galliumnitrid-Schichten zu erhalten. Für die Charakterisierung der Galliumnitrid-Schichten und der Siliziumsubstrate standen diverse Analysemethoden zur Verfügung. Die kristalline Oberflächenstruktur konnte während des Wachstums mittels Reflexionsbeugung hochenergetischer Elektronen beobachtet werden. Nachfolgend wurde die Oberflächentopografie, die kristalline Struktur und Textur, sowie die optischen Eigenschaften der Galliumnitrid-Schichten mittels Rasterkraftmikroskopie, Röntgenstrahl-Diffraktometrie, hochauflösender Transmissionselektronenmikroskopie und Photolumineszenzspektroskopie untersucht.

A novel process for low-temperature (LT) epitaxial growth of silicon carbide (SiC) by replacing the growth precursor propane with chloro-methane was recently developed at Mississippi State University. However, only limited information was available about the defects and impurity incorporation in the various types of epitaxial layers produced by this new method like blanket epitaxial layers, selectively grown epitaxial mesas, and highly doped epitaxial layers, prior to their comprehensive characterization in this work. Molten potassium hydroxide (KOH) etching, mechanical polishing and a variety of other characterizing techniques were used to delineate and identify the defects both in the epilayer and substrates. Under optimum growth conditions, the concentration of defects in the epitaxial layers was found to be less than that in the substrate, which established the good quality of the LT growth process. Defect concentrations, on selectively grown epitaxial layers, strongly depended on the crystallographic orientation of the mesa sidewall. The addition of HCl to the growth process, aimed at increasing the growth rate, caused a significant concentration of triangular defects (TDs) to be formed in the epitaxial layers. The TDs were traced down to the substrate by a combination of repeated polishing and molten KOH etching steps. The TDs were found not to originate from any substrate defects. Their origin was traced to polycrystalline silicon islands which form on the surface during growth and subsequently get evaporated away, which had made it impossible to detect them and suspect their influence on the TD generation prior to this work. The TDs were found to include single or multiple stacking faults bound by partial dislocations and, in some cases, inclusions of other SiC polytypes. Gradual degradation of the epitaxial morphology was found in heavily aluminum doped p+ layers, with an increase in the level of doping, followed by much steeper degradation when approaching the solubility limit of Al in 4H-SiC. Precipitates were the dominating defect at the highest levels of doping and were observed beyond a doping of 3.5x1020 cm-3. A dislocation generation model for heavily doped epitaxial layers was developed accounting for the stress in the lattice caused by Al doping.

The self-assembly of magnesium aluminate spinel as a result of dewetting an overlaid thin film of (chiefly) gold was investigated. Thin films of gold were deposited on single-crystalline spinel substrates and were heat-treated to dewet gold film which led to self-assembly of intricate structures consisting of faceted spherical particles atop of frustums. The current work was conducted in continuation of previous studies which reported formation of such intricate structures. The most recent studies had evidently overruled a pure gold self-assembly scenario as was pointed out in preliminary investigations. It was in fact proven that these structures consist of three distinct parts: (i) a single or polycrystalline gold faceted sphere, (ii) quasi-phase interfacial bilayer, and (iii) a crystalline MgAl2O4 necking structure spontaneously risen from spinel substrate. In the current work, samples were produced through different film deposition methods of sputter, thermal evaporation, and e-beam evaporation coating which underwent thermal annealing to induce dewetting of gold film and subsequent self-assembly of intricate structures. Several characterization methods such as electron microscopy, X-ray energy dispersive spectroscopy, electron energy loss spectroscopy, and atom probe tomography were utilized to survey the different features of the intricate structures with focus on chemical analysis of the gold-spinel interface. The results rejected the previous findings about formation of interface complexion at the boundary of gold-spinel. It was found out that gold-spinel interface is in fact an ordinary metal-oxide boundary with sharp atomic distinction and no inter-diffusion or formation of interfacial complexion. It was further discovered that dewetting pure gold thin films does not result in formation of spinel self-assembly and existence of elemental impurities of copper (Cu) in the initial film is vital in development of such structures. Finally, it was concluded that chemical composition of metallic overlayer and the heat treatment parameters most fundamentally influence formation and physical characteristics of those self-assembled structures. / Thesis / Master of Applied Science (MASc)

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No description available.

No description available.

L’intégration de matériaux ferromagnétiques dans des hétérostructures semi-conductrices offre aujourd'hui de nouvelles perspectives dans le domaine de l’électronique de spin. Dans ce manuscrit sont présentés les résultats de la croissance par épitaxie par jets moléculaires d’hétérostructures de Mn5Ge3 sur Ge(111). Le Mn5Ge3 est un composé ferromagnétique jusqu'à température ambiante qui a l’avantage de pouvoir s’intégrer directement au Ge, semiconducteur du groupe IV. S'agissant d'un matériau relativement nouveau, un des efforts majeurs a porté sur la maîtrise de la croissance des couches minces de Mn5Ge3 par la technique d'épitaxie en phase solide (SPE). Un fort accent a été mis sur les caractérisations structurales, la détermination des relations d'épitaxie avec le Ge(111), afin de les relier aux propriétés magnétiques des films. La seconde partie de ce travail a été consacrée à l'étude des processus cinétiques d'incorporation de carbone dans les couches minces de Mn5Ge3. La combinaison des différents moyens de caractérisations structurales et magnétiques a permis d'aboutir à une augmentation notable de la température de Curie tout en conservant une excellente qualité structurale de la couche et de l'interface avec le Ge et une stabilité thermique jusqu’à 850°C. Tous ces résultats indiquent que les couches minces de Mn5Ge3épitaxiées sur Ge(111) apparaissent comme des candidats à fort potentiel pour l'injection de spin dans les semi-conducteurs du groupe IV / Spin-electronics based on ferromagnetic metal/semiconductor systems offer a pathway toward integration of information storage and processing in a single material. This emerging fieldaims to create a new generation of electronic devices where two degrees of freedom will be associated: spin and charge of carriers. In this context, the outcome of this thesis is toelaborate a novel ferromagnetic compound, namely Mn5Ge3, on Ge using molecular beamepitaxy method. The interests in this compound are manyfold: it can be stabilized as a uniquephase on Ge(111) in the form of epitaxial thin films, it is ferromagnetic until room temperature and it is compatible with Si-based conventional microelectronics. In this work,one major effort was devoted to the epitaxial growth of Mn5Ge3 on Ge using Solid PhaseEpitaxy method. By combining structural and magnetic characterizations, we demonstrated high quality epitaxial thin Mn5Ge3 films with good magnetic properties. We also studied theeffect carbon incorporation on the structural and magnetic properties of epitaxial Mn5Ge3films. The carbon-doped films exhibit a high Curie temperature with an atomically smoothinterface and a high thermal stability. All these results show that Mn5Ge3 is a promisingcandidate opening up the ways for spin injection via tunnel effect through the Schottky barrierinto Ge