My thesis is devoted to the study of transport properties of Silicon Nanowires obtained by a bottom-up approach. The choice for the material system has been limited to undoped SiNWs because they are considered as the ultimate choice for ultrascaled electronic devices. For these systems, the problem of an effective carrier injection in the semiconductor is particularly important. The mechanism of carrier injection in Gate-All-Around Schottky barrier transistors was studied by temperature dependent measurements. Multiple gates are used to discriminate between different device switching mechanisms occurring either at the source and drain contacts, or at the level of the silicon channel. The gating scheme has proved be effective in suppressing the Schottky barrier enabling carrier injection at low temperature. Moreover, different electronic functionalities like p-n junctions and logic gates can be successfully implemented in such devices without the need of doping. I will describe a novel technique for the fabrication of metal silicide contacts to individual silicon nanowires based on an electrically-controlled Joule annealing process. This has enabled the realization of silicide-silicon-silicide tunnel junctions with silicon channel lengths down to 8nm. The silicidation of silicon nanowires by Nickel and Platinum could be observed in-situ and in real time by performing the experiments of Joule assisted silicidation in the chamber of a Scanning Electron Microscope. Lastly, signatures of resonant tunneling through an isolated Platinum Silicide cluster were detected in a Silicon tunnel junction. Tunneling spectroscopy in a magnetic field revealed the Zeeman splitting of the ground and the excited states.

Ce travail de thèse porte sur l’étude de l’influence des paramètres nano et microstructuraux pour l’optimisation des propriétés thermoélectriques des siliciures de magnésium Mg2(Si,Sn) de type -n. Ces matériaux thermoélectriques ont été choisis pour leurs compatibilités avec une utilisation en génération de puissance dans le domaine de l’automobile.Par une approche combinatoire utilisant les couples de diffusion, il est premièrement ré investigué le diagramme de phase pseudo-binaire Mg2Si-Mg2Sn dans le but d’interpréter les microstructures observées. Il est ensuite présenté les effets expérimentaux des paramètres de densification par frittage flash (SPS) sur les microstructures et les propriétés thermoélectriques résultantes. Finalement, il est explicité à l’aide de la modélisation l’influence des paramètres microstructuraux sur les propriétés thermoélectriques de l’alliage optimisé et nanostructuré Mg2Si0,3875Sn0,6Sb0,0125. / This study presents the influence of nano and microstructural parameters to optimize thermoelectric properties of n-type magnesium silicides Mg2(Si,Sn). These thermoelectric materials are chosen for their compatibilities with power generation in automotive.From a combinatorial approach using diffusion couples, it is first reinvestigated the pseudo-binary phase diagram Mg2Si-Mg2Sn to rationalize the observed microstructures. Then the experimental effects of sintering parameters (SPS) on resulting microstructures and thermoelectric properties are presented. Finally, the influence of microstructural parameters on the thermoelectric properties of optimized and nanostructured Mg2Si0,3875Sn0,6Sb0,0125 alloys are explained through modelling.

Submitted by Pedro Silva Filho (pfsilva@ipen.br) on 2017-11-22T17:00:26Z No. of bitstreams: 0 / Made available in DSpace on 2017-11-22T17:00:26Z (GMT). No. of bitstreams: 0 / Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq) / A demanda por combustível nuclear para reatores de pesquisa está aumentando em nível mundial, enquanto várias de suas fábricas têm pequeno volume de produção. Este trabalho estabeleceu um modelo conceitual com duas estratégias para o aumento da capacidade produtiva dessas fábricas. Foram abordadas as fábricas que produzem elementos combustíveis tipo placa carregados com LEU U3Si2-Al, tipicamente usados em reatores nucleares de pesquisa. A primeira estratégia baseia-se na literatura da área de administração da produção e é uma prática frequente nas fábricas em geral. A segunda estratégia aproveita a possibilidade de desmembrar setores produtivos, comum em instalações de produção de combustível nuclear. Ambas as estratégias geraram diferentes cenários de produção, os quais devem ser seguros em relação à criticalidade. Foram coletados dados de uma fábrica real de combustível nuclear para reatores de pesquisa. As duas estratégias foram aplicadas a esses dados com a finalidade de testar o modelo proposto, o que configurou um estudo de caso. A aplicação das estratégias aos dados coletados deu-se por meio de simulação de eventos discretos em computador. Foram criados diversos modelos de simulação para abranger todos os cenários gerados, de forma que o teste indicou um aumento da capacidade produtiva de até 207% sem necessidade de aquisição de novos equipamentos. Os resultados comprovam que o modelo atingiu plenamente o objetivo proposto. Como principal conclusão pode-se apontar a eficácia do modelo proposto, fato que foi validado pelos dados da fábrica. / Tese (Doutorado em Tecnologia Nuclear) / IPEN/T / Instituto de Pesquisas Energéticas e Nucleares - IPEN-CNEN/SP / CNPq:310274/2012-5

Title: Structure analysis of some transition metal silicides using X-ray diffraction and dynamical refinement against electron diffraction data Author: Cinthia Antunes Corrˆea Department: Physics of Materials Supervisor: prof. RNDr. Miloš Janeček, CSc., Department of Physics of Materials Abstract: This thesis presents the crystal structure analysis of several transition metal silicides. The crystal structures were studied primarily by precession electron diffraction tomography (PEDT) employing the dynamical refinement, a method recently developed for accurate crystal structure refinement of electron diffraction data. The optimal values of the parameters of the method were proposed based on the comparison between the dynamical refinement of PEDT data and a high- quality reference structure. We present the results of the comparison using a Ni2Si nanowire with the diameter of 15 nm. The average atomic distance between the model obtained by the dynamical refinement on PEDT data and the one by single crystal X-ray diffraction was 0.006 ˚A. Knowing the accuracy and limitations of the method, the crystal structure of Ni3Si2 was redetermined on a nanowire with 35 nm of diameter. The model obtained had an average error in the atomic posi- tions of 0.006 ˚A. These results show that the accuracy achieved by the dynamical...

In dieser Dissertation wird die Darstellung tetrelreicher Seltenerdmetall–Verbindungen in den Systemen SE:Tt (SE = La, Nd, Sm, Gd, Tb, Ho, Lu; Tt = Si, Ge) und die Charakterisierung ihrer Eigenschaften beschrieben. Diese Verbindungen, welche mittels der Hochdruck–Hochtemperatur–Methode dargestellt wurden, zeigen neuartige Verknüpfungsmuster in der Tetrel–Partialstruktur. Neben der Charakterisierung der Verbindungen hinsichtlich der thermischen Stabilität und der physikalischen Eigenschaften bei Normaldruck wurde bei den Germanium–reichen Seltenerdmetall–Verbindungen eine Untersuchung der Veränderungen der Kristallstruktur bei Variation des Drucks oder der Temperatur vorgenommen. Die dargestellten Seltenerdmetall–Trisilicide SESi3 (SE = Gd, Ho, Lu) kristallisieren tetragonal isotyp zu YbSi3. LuSi3 zeigt Supraleitung mit Tc = 7.0 K. In den Systemen Gd–Si und SE–Ge (SE = La, Nd, Sm, Gd, Tb) wurden die Verbindungen GdSi5 und SEGe5 (SE = La, Nd, Sm, Gd, Tb) synthetisiert. Sie kristallisieren orthorhombisch isotyp zu LaGe5. Durch in–situ Röntgenbeugungsexperimente bei erhöhten Temperaturen kann die Existenz metastabiler Germanium–ärmerer Verbindungen SE2Ge9 (SE = Nd, Sm) nachgewiesen werden. Es handelt sich um Defektvarianten der Verbindungen SEGe5 (SE = Nd, Sm). Die strukturelle Verwandtschaft zum Aristotyp SEGe5 wird anhand einer Gruppe–Untergruppe–Beziehung aufgezeigt. Eine alternative Synthesemethode zur Darstellung tetrelreicher Verbindungen mit Gerüststrukturen bei extremen Reaktionsbedingungen stellt das Spark–Plasma–Sinterverfahren (SPS) dar. Die Darstellung der Clathratphase Ba8Ga16±xGe30∓x (x = 0, 1) erfolgte mittels SPS aus den Precursoren BaGa2±x (x = 0, 0.125) und Germanium. Die Untersuchungen der thermoelektrischen Eigenschaften zeigen, dass durch Variation der nominellen Zusammensetzung sowohl n–leitende als auch p–leitende Eigenschaften erhalten werden können. / In this thesis the synthesis of tetrel–rich rare–earth metal compounds in the systems RE:Tt (RE = La, Nd, Sm, Gd, Tb, Ho, Lu; Tt = Si, Ge) and the characterization of their properties is described. These compounds, synthesized by means of high–pressure high–temperature method, show new structural motifs in the tetrel partial structure. The compounds were characterized with respect to their thermal stability and their physical properties at ambient pressure. In addition, the changes in the crystal structure of the germanium-rich rare–earth metal compounds by variation of pressure or temperature were investigated. The synthesized rare–earth trisilicides SESi3 (SE = Gd, Ho, Lu) crystallize tetragonal, isotypic to YbSi3. LuSi3 is a superconductor with Tc = 7.0 K. In the systems Gd–Si and SE–Ge (SE = La, Nd, Sm, Gd, Tb) the compounds GdSi5 and SEGe5 (SE = La, Nd, Sm, Gd, Tb) were synthesized. They crystallize orthorhombic isotypic to LaGe5. Using in-situ high–temperature X-ray experiments the metastable germanium-poorer compounds SE2Ge9 (SE = Nd, Sm) could be observed. These compounds are defect variants of the pentagermanides SEGe5 (SE = Nd, Sm). The structural relationship to the aristotype SEGe5 is given via a group-subgroup relation. An alternative synthesis route for the preparation of tetrel–rich compounds with framework structures at extreme reaction conditions is the spark plasma sintering method (SPS). The clathrate phase Ba8Ga16±xGe30∓x (x = 0, 1) was synthesized from the precursors BaGa2±x (x = 0, 0.125) and germanium by means of SPS. The investigation of the thermoelectric properties shows, that through variation of the nominal composition both n-type and p-type conduction properties can be obtained.

Ce travail porte sur la compréhension des mécanismes de nucléation-croissance et le développement de contraintes associé lors du dépôt par pulvérisation de films minces métalliques. Le développement d’un dispositif de mesure in-situ en cours de croissance de la résistivité électrique est présenté et les potentialités offertes par son couplage avec deux autres diagnostics in-situ : la mesure de courbure du substrat et la spectroscopie différentielle de surface, ainsi qu’avec des caractérisations structurales, morphologiques et chimiques ex-situ (DRX, XRR, METHR, EELS, AFM) ont permis de mettre en évidence : le rôle clé joué par la température homologue et la structure d’équilibre du matériau déposé pour guider le mode de croissance 2D ou 3D et les contraintes associées. Pour les métaux à croissance 3D étudiés (Ag, Au, Pd et Ir) tous de structure CC, nous avons montré que l’amplitude du pic de tension associée au stade de coalescence était liée à la mobilité atomique des adatomes ; son maximum correspondant à la continuité du film. Nous avons montré que l’épaisseur de coalescence et donc la microstructure et la contrainte des éléments de forte mobilité pouvaient être contrôlées par la présence d’un surfactant en cours de croissance. Il est exposé que pour les métaux de faible mobilité atomique (Mo, W, Ta, Fe) et/ou de structure CC, la croissance débute par la stabilisation d’une amorphe suivie par la cristallisation vers la phase d’équilibre CC (Mo, Fe) ou la structure quadratique dans le cas du Ta, induite par la minimisation des énergies de surface/interface. Les premiers stades de croissance complexes du système Pd/Si liés à une forte réactivité d’interface ont été expliqués par la formation d’un siliciure d’interface tout d’abord amorphe qui cristallise, lorsque l’épaisseur de Pd déposée devient suffisante, par ségrégation dynamique du Si dans le métal. La très forte dissymétrie des interfaces Pd/Si et Si/Pd ainsi que le rôle de la température et du réservoir de Si sur la formation du siliciure ont été étudiés. Les interdépendances entre contrainte de croissance en régime stationnaire, microstructure, énergie déposée et cinétique de croissance dans le cas de métaux de faible mobilité ont été élucidées et le rôle majeur des joints de grains et des puits de surface sur la relaxation des défauts de types interstitiels en excès induits lors de dépôts énergétiques démontré. Une extension aux dépôts énergétiques du modèle cinétique de Chason de développement des contraintes est proposée. / Size reduction for the race towards nanoscale devices impacts physical properties of materials due to morphology, microstructure, defects and presence of surfaces and interfaces, but also makes challenging their structural characterizations. Moreover, thin film growth by physical vapor deposition is a non-equilibrium process involving dynamics effects, which inherently affects nanostructure formation. Thanks to the development and use of in situ and real-time diagnostics, easily implementable in a vacuum chamber, as those based on the wafer curvature measurement, electrical resistivity or also the surface reflectance spectroscopy, described in this work, we are able to address these issues. An original 4 points probe resistivity setup, in situ and real-time, in a magnetron chamber, has been developed for this study, allowing samples introduction by a load-lock system and the growth of homogeneous, dense metallic films. Potentialities of these techniques are highlighted by studying magnetron sputtered metallic systems with various atomic mobility and interfacial reactivity. The sensibility of these techniques, at the sub monolayer scale, allows a better understanding of the firsts growth stages, nucleation processes, phase transformations and defects incorporation. Influence of microstructure (grain size), kinetics (growth rate) and deposited energy has been systematically studied. The main results obtained revealed: a correlation between the magnitude of tensile stress associated with the coalescence stage and the atomic mobility of adatoms during Volmer-Weber growth of Ag, Au, Pd and Ir thin films on a-SiOx; a two dimensional growth mode for films of lower mobility (Fe, Mo, Ta) on a-Si, with the stabilization of an amorphous layer before the crystallization of the equilibrium bcc structure (Fe and Mo) or the metastable tetragonal structure in the case of Ta, driven by the minimization of surface/interface energies; the strong reactivity of Pd films sputtered on Si or Ge (amorphous or crystalline) substrates, leading to the room-temperature formation of a crystalline silicide (germanide) Pd2Si (or Pd2Ge) phase whose crystallographic orientation depends on the nature of the sublayer and where the silicon is the fast diffuser; the complementary roles of surface and grain boundaries on the steady-state compressive stress regime observed under energetic conditions of growth (10-100eV). To account for these observations, an extension of Chason’s theoretical model is presented.

Ce travail de thèse s’est inscrit dans un cadre fondamental d’étude de la formation contrôlée d’oxydes en couches ultra-minces. Un bâti ultra-vide dédié à la croissance contrôlée de ces oxydes et à leur analyse in-situ (STM-STS, AES et LEED) a été développé. Par une méthode originale de phases alternées de dépôt d’une monocouche atomique de Mg et oxydation à RT, les mécanismes impliqués dans la formation de deux systèmes à fort potentiel applicatif : MgO/Si(100) et MgO/Ag(111) ont été étudiés .Le système MgO/Si(100) a révélé la formation d’une couche ultra-mince de Mg2Si à l’interface entre le MgO et le substrat. En bon accord avec les calculs thermodynamiques réalisés, une cristallisation de cette couche interfaciale dans un processus de dissociation partielle du Mg2Si en MgO à température ambiante a été observée. Identifiée ex-situ par TEM, la relation d’épitaxie associée à cette cristallisation a permis de conclure à la formation d’une hétérostructure MgO / Mg2Si (11-1) / Si(001), témoignant d’une grande qualité d’interface avec le silicium et de la formation d’une couche ultra-mince et amorphe de MgO homogène et isolante (gap de 6 eV).Pour le système MgO/Ag(111), nos résultats expérimentaux couplés aux calculs ab initio de nos partenaires du LAAS ont révélé l’absence de formation d’un alliage de surface ainsi qu’une croissance « liquid-like » du magnésium à RT. Un double empilement O/Mg/O/Mg/Ag(111) suivi d’un recuit UHV à 430°C a ensuite permis la stabilisation d’une couche ultra-mince polaire de MgO(111) qui a été caractérisée par LEED et STM-STS. Les propriétés physico-chimiques et origines possibles de stabilité de cet oxyde polaire ont ensuite été discutées. / This PhD work was dedicated to studying the fundamental mechanisms driving the controlled growth of ultra-thin oxide films. An experimental set-up was designed to finely control the growth parameters under UHV conditions while allowing the study of such oxide layers in situ with STM-STS, AES and LEED. Using an original method based on alternate cycles of Mg monolayer adsorption and RT oxidation, we focused on the formation of systems exhibiting a wide range of potential applications: MgO/Si(100) and MgO/Ag(111). The MgO/Si(100) system revealed the growth of an ultra-thin Mg2Si layer at the interface between the MgO and the silicon. In agreement with thermodynamic calculations, a crystallization of this interlayer driven by a partial decomposition of the Mg2Si to a MgO oxide was shown to occur at RT. From ex situ TEM experiments, the involved epitaxial relationship highlighted the formation of an MgO / Mg2Si (11-1) / Si(001) heterostructure. A sharp interface with the silicon was formed, as much as an ultra-thin and amorphous MgO layer exhibiting both a good homogeneity and a high insulating character (bandgap of 6 eV).In the MgO/Ag(111) system, no interfacial alloy formation and a « liquid-like » growth for the Mg were evidenced at RT, using our experimental results coupled with the ab initio calculations performed by our co-workers at LAAS laboratory. Later, a double-layering O/Mg/O/Mg/Ag(111) grown at RT followed by UHV annealing at 430°C resulted in the stabilization of a polar MgO(111) ultra-thin film, which was characterized using LEED and STM-STS. The physicochemical properties of this polar oxide and the potential origin of its stability were discussed.