Wide band-gap semiconductor materials such as silicon carbide (SiC) and gallium nitride (GaN) have been widely investigated these years for their preferred operation at higher switching frequency, higher blocking voltage, higher temperature, with a compacter volume, in comparison with the traditional silicon (Si) devices. SiC MOSFETs have been utilized in photovoltaic systems, wind turbine converters, electric vehicles, solid-state transformers, more electric ships, and airplanes. GaN based transistors have also been adopted in the DC-to-DC converters in data centers, personal computers, AC-to-DC power factor correction converters for the consumer electronic adaptors, and DC-to-AC photovoltaic micro-inverters. The first part of this dissertation is regarding the lifetime modeling and condition monitoring for the SiC MOSFETs. Since SiC-based devices have different failure modes and mechanisms compared with Si counterparts, a comprehensive review will be conducted to develop accurate lifetime prediction, condition monitoring, and lifetime extension strategies. First, a novel comprehensive online updated system-level lifetime modeling approach will be presented. Second, to monitor the SiC MOSFET ageing, the typical degradation indicators of SiC MOSFET gate oxide will be investigated. Third, to measure the junction temperature, the dynamic temperature-sensitive electrical parameters for the medium-voltage SiC devices will be studied. The other part is the topology investigation of these emerging wide band-gap devices. A generalized topology that would leverage the advantages of the wide band-gap devices will be introduced and analyzed in detail. Following it is a new evaluation index for comparing different topologies with the consideration of the semiconductor die information. The topology and its derivatives will be utilized in the subsequent chapters for three applications. First, a 100 kW switched tank converter (STC) will be designed using SiC MOSFETs for transportation power electronic systems. Second, an updated STC topology integrating with the partial-power voltage regulation will be introduced for electric vehicle applications. Third, two novel single-phase resonant multilevel modular boost inverters will be designed based on the voltage-regulated STC. These topologies will be validated through designed prototypes. As a result, the high power density and high efficiency will be realized by combining the well-suited topologies and the advantages of the WBG devices.

The design of a dc generation system is posed as a multi-objective optimization problem which simultaneously designs the generator and the power converter. The proposed design methodology captures the interaction between various system component models and utilizes the system steady state analysis, stability analysis, and disturbance rejection analysis. System mass and power loss are considered as the optimization metrics and minimized. The methodology is demonstrated through the design of a notional dc generation system which contains a Permanent Magnet Synchronous Machine (PMSM), passive rectifier, and a dc-dc converter. To this end, a high fidelity PMSM model, passive rectifier model, semiconductor model and passive component model are developed. The output of optimization is a set of designs forming a Pareto-optimal front. Based on the requirements and the application, a design can be chosen from this set of designs. The methodology is applied to SiC based dc generation system and Si based dc generation system to quantify the advantage of Wide Bandgap (WBG) devices. A prototype SiC based dc generation system is constructed and tested at steady state. Finally a thermal equivalent circuit (TEC) based PMSM thermal model is included in the design paradigm to quantify the impact of the PMSM’s thermal performance to the system design.

In this research, the transport properties of ZnO were studied through the use of electron and neutron beam irradiation. Acceptor states are known to form deep in the bandgap of doped ZnO material. By subjecting doped ZnO materials to electron and neutron beams we are able to probe, identify and modify transport characteristics relating to these deep accepter states. The impact of irradiation and temperature on minority carrier diffusion length and lifetime were monitored through the use of the Electron Beam Induced Current (EBIC) method and Cathodoluminescence (CL) spectroscopy. The minority carrier diffusion length, L, was shown to increase as it was subjected to increasing temperature as well as continuous electron irradiation. The near-band-edge (NBE) intensity in CL measurements was found to decay as a function of temperature and electron irradiation due to an increase in carrier lifetime. Electron injection through application of a forward bias also resulted in a similar increase of minority carrier diffusion length. Thermal and electron irradiation dependences were used to determine activation energies for the irradiation induced effects. This helps to further our understanding of the electron injection mechanism as well as to identify possible defects responsible for the observed effects. Thermal activation energies likely represent carrier delocalization energy and are related to the increase of diffusion length due to the reduction in recombination efficiency. The effect of electron irradiation on the minority carrier diffusion length and lifetime can be attributed to the trapping of non-equilibrium electrons on neutral acceptor levels. The effect of neutron irradiation on CL intensity can be attributed to an increase in shallow donor concentration. Thermal activation energies resulting from an increase in L or decay of CL intensity monitored through EBIC and CL measurements for p-type Sb doped ZnO were found to be the range of Ea = 112 to 145 meV. P-type Sb doped ZnO nanowires under the influence of temperature and electron injection either through continuous beam impacting or through forward bias, displayed an increase in L and corresponding decay of CL intensity when observed by EBIC or CL measurements. These measurements led to activation energies for the effect ranging from Ea = 217 to 233 meV. These values indicate the possible involvement of a SbZn-2VZn acceptor complex. For N-type unintentionally doped ZnO, CL measurements under the influence of temperature and electron irradiation by continuous beam impacting led to a decrease in CL intensity which resulted in an electron irradiation activation energy of approximately Ea = 259 meV. This value came close to the defect energy level of the zinc interstitial. CL measurements of neutron irradiated ZnO nanostructures revealed that intensity is redistributed in favor of the NBE transition indicating an increase of shallow donor concentration. With annealing contributing to the improvement of crystallinity, a decrease can be seen in the CL intensity due to the increase in majority carrier lifetime. Low energy emission seen from CL spectra can be due to oxygen vacancies and as an indicator of radiation defects.

No description available.

The demand for wide bandgap semiconductors for radiation detector applications has significantly increased in recent years due to an ever-growing need for safeguard measures and medical imaging systems amongst other applications. The need for these devices to be portable and efficient, and to operate at room temperature is important for practical applications. For radiation detectors, the semiconductor materials are mainly required to have an optimal energy gap, high average atomic number, good electrical resistivity and charge transport properties as well as purity and homogeneity. Cadmium zinc telluride (CZT) distinctly stands out among the other choices of semiconductor materials for radiation detector applications, due to its attractive material properties and the room temperature operation possibility. A tremendous amount of research is being conducted to improve CZT technology and its implementation into more commercial systems. Applications of CZT detector technology in national security, high energy physics, nuclear spectroscopy, and medical imaging systems are of special interests. However, CZT devices still face challenges that need to be understood and overcome in order to have more efficient radiation detector systems. One such challenge lies in the understanding of the surfaces of CZT detectors and surface recombination effects on charge transport, charge collection efficiency, and detector performance. Another common issue is the degradation of CZT detectors due to the presence of defects which can act as traps for the charge carriers and cause incomplete charge collection from the detectors. Thus, a major challenge is that, the commercial CZT crystals have large concentrations of defects and impurities that need to be characterized, and their effects on the detector performance should be studied. Photoluminescence (PL) spectroscopy is a sensitive, non-contact and non-destructive method, suitable to characterize lower concentrations of point defects, such as substitutional impurities (donors, acceptors) and native defects in CZT crystals. A PL spectrum provides information regarding the defect nature of the crystal by determining the presence and the type of vacancies, interstitials, and impurities in the lattice. The main objective of this thesis is to address the presence of the defects in CZT crystals, identify their types, and study their roles in the performance of x-ray radiation detectors using PL spectroscopy. Additionally, using PL method and different excitation sources including UV excitation, this thesis studies the surface of CZT samples and investigates the PL signature of the surface oxide of the samples, in an effort to optimize the surface processing and thereby improve CZT detector performance. / Graduate

Ce manuscrit porte sur la conception d’un transistor à effet de champ destiné à l’observation de la photoluminescence de l’exciton et des complexes excitoniques chargés du ZnO sous l’influence d’un champ électrique. Pour cela, des simulations ont permis de définir un cahier des charges de la structure du transistor afin de bloquer la conductivité dans le canal de ZnO et d’appliquer un champ électrique intense. La seconde partie concerne le choix du matériau de grille et de l’électrode transparente de surface pour l’observation de la photoluminescence dans le canal. L’oxyde de gallium (-Ga2O3) a été choisi car il présente un grand gap, des propriétés d’isolant et de semi-conducteur avec dopage. Cependant les films de Ga2O3 dopés avec Ti, Sn, Zn et Mg élaborés par MOCVD n’ont pas révélé de conductivité. Les films d’alliages (Ga,Sn)2O3 n’ont pas non plus montré de conductivité et leur structure est étudiée intensivement. Des traitements plasma radiofréquence sous flux d’argon, d’oxygène ou d’hydrogène ont permis de montrer que l’implantation de l’hydrogène donne lieu à un niveau donneur avec une énergie d’activation de 7 meV. La conductivité est toutefois modulée par le dopage en Sn et les traitements s’accompagnent d’un changement de la sous-stœchiométrie en oxygène qui diminue la transparence à cause de la formation de niveau profond de lacune d’oxygène. La structure finale de la grille transparente dans l’ultraviolet pour l’observation de la photoluminescence du ZnO peut donc être élaborée par une grille diélectrique de -Ga2O3 puis une électrode conductrice transparente de (Ga,Sn)2O3 traitée superficiellement par un plasma d’hydrogène. / This manuscript covers the design of a field transistor for the observation of photoluminescence of the exciton and the charged excitonic complex of ZnO under the influence of an electric field. For this, simulations have helped to define the specifications of the transistor structure to block the conductivity in the ZnO channel and applying a strong electric field. The second part concerns the choice of gate material and the surface transparent electrode for the observation of photoluminescence in the channel. The gallium oxide (-Ga2O3) was chosen because it has a large gap, insulating properties and semiconductor properties with doping. However, Ga2O3 films doped with Ti, Sn, Zn and Mg MOCVD did not show conductivity. Films of alloys (Ga,Sn)2O3 have not shown either conductivity and their structure is studied intensively. Radio frequency plasma treatment under a flux of argon, oxygen or hydrogen have shown that implantation of hydrogen gives rise to a donor level with 7 meV activation energy. However, the conductivity is modulated by doping Sn and treatments are accompanied by a change of sub-stoichiometry in oxygen, which reduces the transparency due to the formation of deep level of oxygen vacancy. The final structure of the transparent gate in the ultraviolet for the observation of photoluminescence of ZnO can be prepared by a dielectric gate -Ga2O3 and a transparent conductive electrode of (Ga,Sn)2O3 surface treated by a plasma of hydrogen.

Issues of major relevance to the n-type conductivity of Al0.77Ga0.23N associated with Si and O incorporation, their shallow donor or deep donor level behavior, and carrier compensation are elucidated by allying (i) study of Si and O incorporation kinetics at high process temperature and low growth rate, and (ii) electron paramagnetic resonance measurements. The Al0.77Ga0.23N composition correlates to that Al content for which a drastic reduction of the conductivity of AlxGa1−xN is commonly reported. We note the incorporation of carbon, the role of which for the transport properties of AlxGa1−xN has not been widely discussed.

Main objective of the present work is to develop wide-band gap InGaN solar cells in the 2.4 - 2.9 eV range that can be an integral component of photovoltaic devices to achieve efficiencies greater than 50%. In the present work, various challenges in the novel III-nitride technology are identified and overcome individually to build basic design blocks, and later, optimized comprehensively to develop high-performance InGaN solar cells. Due to the unavailability of a suitable modeling program for InGaN solar cells, PC1D is modified up to a source-code level to incorporate spontaneous and piezoelectric polarization in order to accurately model III-nitride solar cells. On the technological front, InGaN with indium compositions up to 30% (2.5 eV band gap) are developed for photovoltaic applications by controlling defects and phase separation using metal-organic chemical vapor deposition. InGaN with band gap of 2.5 eV is also successfully doped to achieve acceptor carrier concentration of 1e18 cm-3. A robust fabrication scheme for III-nitride solar cells is established to increase reliability and yield; various schemes including interdigitated grid contact and current spreading contacts are developed to yield low-resistance Ohmic contacts for InGaN solar cells. Preliminary solar cells are developed using a standard design to optimize the InGaN material, where the band gap of InGaN is progressively lowered. Subsequent generations of solar cell designs involve an evolutionary approach to enhance the open-circuit voltage and internal quantum efficiency of the solar cell. The suitability of p-type InGaN with band gaps as low as 2.5 eV is established by incorporating in a solar cell and measuring an open-circuit voltage of 2.1 V. Second generation InGaN solar cell design involving a 2.9 eV InGaN p-n junction sandwiched between p- and n-GaN layers yields internal quantum efficiencies as high as 50%; while sixth generation devices utilizing the novel n-GaN strained window-layer enhance the open circuit voltage of a 2.9 eV InGaN solar cell to 2 V. Finally, key aspects to further InGaN solar cell research, including integration of various designs, are recommended to improve the efficiency of InGaN solar cells. These results establish the potential of III-nitrides in ultra-high efficiency photovoltaics.

Ce manuscrit porte sur la conception d’un transistor à effet de champ destiné à l’observation de la photoluminescence de l’exciton et des complexes excitoniques chargés du ZnO sous l’influence d’un champ électrique. Pour cela, des simulations ont permis de définir un cahier des charges de la structure du transistor afin de bloquer la conductivité dans le canal de ZnO et d’appliquer un champ électrique intense. La seconde partie concerne le choix du matériau de grille et de l’électrode transparente de surface pour l’observation de la photoluminescence dans le canal. L’oxyde de gallium (-Ga2O3) a été choisi car il présente un grand gap, des propriétés d’isolant et de semi-conducteur avec dopage. Cependant les films de Ga2O3 dopés avec Ti, Sn, Zn et Mg élaborés par MOCVD n’ont pas révélé de conductivité. Les films d’alliages (Ga,Sn)2O3 n’ont pas non plus montré de conductivité et leur structure est étudiée intensivement. Des traitements plasma radiofréquence sous flux d’argon, d’oxygène ou d’hydrogène ont permis de montrer que l’implantation de l’hydrogène donne lieu à un niveau donneur avec une énergie d’activation de 7 meV. La conductivité est toutefois modulée par le dopage en Sn et les traitements s’accompagnent d’un changement de la sous-stœchiométrie en oxygène qui diminue la transparence à cause de la formation de niveau profond de lacune d’oxygène. La structure finale de la grille transparente dans l’ultraviolet pour l’observation de la photoluminescence du ZnO peut donc être élaborée par une grille diélectrique de -Ga2O3 puis une électrode conductrice transparente de (Ga,Sn)2O3 traitée superficiellement par un plasma d’hydrogène. / This manuscript covers the design of a field transistor for the observation of photoluminescence of the exciton and the charged excitonic complex of ZnO under the influence of an electric field. For this, simulations have helped to define the specifications of the transistor structure to block the conductivity in the ZnO channel and applying a strong electric field. The second part concerns the choice of gate material and the surface transparent electrode for the observation of photoluminescence in the channel. The gallium oxide (-Ga2O3) was chosen because it has a large gap, insulating properties and semiconductor properties with doping. However, Ga2O3 films doped with Ti, Sn, Zn and Mg MOCVD did not show conductivity. Films of alloys (Ga,Sn)2O3 have not shown either conductivity and their structure is studied intensively. Radio frequency plasma treatment under a flux of argon, oxygen or hydrogen have shown that implantation of hydrogen gives rise to a donor level with 7 meV activation energy. However, the conductivity is modulated by doping Sn and treatments are accompanied by a change of sub-stoichiometry in oxygen, which reduces the transparency due to the formation of deep level of oxygen vacancy. The final structure of the transparent gate in the ultraviolet for the observation of photoluminescence of ZnO can be prepared by a dielectric gate -Ga2O3 and a transparent conductive electrode of (Ga,Sn)2O3 surface treated by a plasma of hydrogen.

No description available.