No description available.

abstract: In this project, current-voltage (I-V) and Deep Level Transient Spectroscopy (DLTS) measurements are used to (a) characterize the electrical properties of Nb/p-type Si Schottky barriers, (b) identify the concentration and physical character of the electrically active defects present in the depletion region, and (c) use thermal processing to reduce the concentration or eliminate the defects. Barrier height determinations using temperature-dependent I-V measurements indicate that the barrier height decreases from 0.50 eV to 0.48 eV for anneals above 200 C. The electrically-active defect concentration measured using DLTS (deep level transient spectroscopy) drops markedly after anneals at 250 C. A significant increase in leakage currents is almost always observed in near-ideal devices upon annealing. In contrast, non-ideal devices dominated by leakage currents annealed at 150 C to 250 C exhibit a significant decrease in such currents. / Dissertation/Thesis / Masters Thesis Materials Science and Engineering 2018

The thesis includes two aspects. The first part includes designs and optical study of electro-absorption modulator structures. Three structures are designed near 1.5

Silicon Carbide is a wide bandgap semiconductor with excellent physical and opto-electrical properties. Among these excellent properties are its radiation hardness, high temperature operation and high electric field breakdown. SiC can therefore be used in the fabrication of electronic devices capable of operating in harsh environments, e.g. radiation detectors. Like any other semiconductor, the success of SiC in device fabrication depends on elimination of defects that are detrimental to desired devices or controlled introduction of desired energy levels. The first step in so doing is understanding the defects that are either found in as grown material, introduced during device fabrication or introduced during device operation. In this study nickel ohmic and Schottky contacts were resistively fabricated on n-type 4H-SiC with a net doping density of 4 × 1014 cm-3. Current-Voltage (I-V), Capacitance-Voltage (C-V), Deep Level Transient Spectroscopy (DLTS) and Laplace-DLTS measurement techniques were used to electrically characterize the fabricated Schottky diodes. The diodes were then irradiated with low energy electrons, alpha particles and protons. The characterization measurements were repeated after irradiation to evaluate the effect of irradiation on the electrical properties of SiC. It was observed from I-V measurements that electron, alpha particle and proton irradiations do not significantly affect the rectification of Ni/SiC Schottky contacts. C-V measurements indicated that the free carrier removal rate is higher for alpha particle irradiation as compared to electron irradiation. The irradiated diodes were annealed in argon ambient and significant recovery in the free carrier concentration was observed below 600 °C. The free carrier concentration of proton irradiated Schottky contacts, which was decreased to below detection levels was also partly recovered after heat treatment of up to 400 °C. DLTS and Laplace-DLTS measurements revealed the presence of four defect levels in as-grown 4H-SiC. These defects have been labelled E0.10, E0.12, E0.17 and E0.69 where the subscripts indicate the activation energies of the respective defects. Electron, alpha particle and proton irradiations were observed to induce three more defect levels with activation energies of 0.42 eV, 0.62 eV and 0.76 eV. Additionally, these irradiations were also observed to enhance the concentration of level E0.69. All the radiation induced defects were annealed out at temperatures below 600 °C. In proton irradiated diodes, another defect with activation energy of 0.31 eV was observed after annealing the irradiated diodes at 625 °C. / Dissertation (MSc)--University of Pretoria, 2014. / lk2014 / Physics / MSc / Unrestricted

Since the development of deep level transient spectroscopy (DLTS) in the 1970’s by Lang and others, the technique has become a powerful analytical tool to characterise the electrical properties of defects in semiconductors. With the development of more powerful computers and improved data acquisition systems, it has become possible to replace the original analogue boxcar analysers and lock-in amplifiers that were commonly used in early DLTS systems with digitisers and digital signal processing equipment. The use of a computer for signal processing allows for much more flexibility in the DLTS system. For instance, a digital DLTS system is capable of measuring a much wider range of emission rates than an analogue system. Furthermore, since the digital DLTS system does not rely on a repetitive signal, such a system can observe phenomena such as defect metastability that cannot be observed in an analogue system. In this thesis, the design and characterisation of a digital DLTS system is described. The results of a number of experiments that illustrated the capabilities of the system are reported. The extended range of emission rates that could be measured by the system were illustrated by the measuring of the EL2 defect in GaAs over the temperature range 270 – 380 K (corresponding to emission rates ranging from less than 10–3 s–1 to more than 103 s–1). The results compared well with previous results obtained by means of an analogue DLTS system. Further low temperature measurements on the E2 defect in GaAs showed that in the low temperature region, thermal radiation from the cryostat shroud influenced carrier emission. The field dependence of the emission rate of a number of defects, including defects in as-grown n-GaN, He-ion irradiated n-GaN and Si, was investigated as well. The ability of the digital DLTS system to measure single transients was used to investigate configurationally bistable defects in He-ion irradiated p-Si and a sputter-induced defect with negative-U properties in n-GaN. In both of these cases, the results proved far superior to those obtained by means of an analogue system. / Thesis (PhD (Physics))--University of Pretoria, 2007. / Physics / unrestricted

No description available.

No description available.

The understanding of the electrical properties of defects introducing deep levels in silicon is of prime technological importance in modern microelectronics. In this thesis, a comprehensive study of the transition metals titanium, cobalt, and nickel in silicon, and of their interaction with hydrogen is presented. The formed defects are detected and characterized by deep level transient spectroscopy (DLTS), Laplace DLTS, and minority carrier transient spectroscopy. A natural starting point for a study of metal-hydrogen reactions in silicon is the analysis of the effect of hydrogen on metal-free silicon. Complexes of hydrogen with carbon, which create deep levels in the band gap of silicon, are observed. Titanium introduces three levels into the band gap. The charge states determined in this thesis are in contradiction to the literature, questioning the assignment of these levels. Upon hydrogenation, TiH complexes with one, two, and three hydrogen atoms are identified. A proposition by theory that two different configurations of TiH with one hydrogen atom exist, can be supported. Cobalt is shown to have only one level in the band gap of silicon, whereas a second level previously attributed to cobalt is assigned to the cobalt-boron pair. Two CoH complexes are determined. Nickel has three levels in the band gap. Upon hydrogenation, complexes with up to three hydrogen atoms are identified. One of the defects can be observed in both n - and p -type silicon. For all three metals investigated, passive hydrogen complexes exist. They are created by further hydrogenation after the appearance of the above mentioned electrically active complexes. The thesis concludes with a comparison of the obtained results with those of neighboring elements to look for similarities and patterns. / Das Verständnis der elektrischen Eigenschaften von Defekten, welche tiefe Niveaus in der Bandlücke von Silizium erzeugen, ist von außerordentlichem Interesse für die moderne Mikroelektronik. In der vorliegenden Dissertation wird eine umfassende Untersuchung der Übergangsmetalle Titan, Kobalt und Nickel in Silizium und ihrer Wechselwirkung mit Wasserstoff vorgestellt. Die entstandenen Defekte werden mit Hilfe von Kapazitätstransientenspektroskopie (DLTS - deep level transient spectroscopy), Laplace DLTS und Minoritätsladungsträgertransientenspektroskopie (MCTS - minority carrier transient spectroscopy) beobachtet und charakterisiert. Für eine fehlerfreie Analyse der Metall-Wasserstoff-Reaktionen ist es sinnvoll, zuerst den Einfluss des Wasserstoffs auf metallfreies Silizium zu prüfen. Dabei wird die Bildung von Kohlenstoff-Wasserstoff-Komplexen, welche Niveaus in der Bandlücke von Silizium erzeugen, beobachtet. Titan besitzt drei Niveaus in der Bandlücke von Silizium. Die in dieser Arbeit bestimmten Ladungszustände stehen im Widerspruch zu den Literaturangaben, daher wird die Zuordnung dieser Niveaus in Frage gestellt. Die Reaktion von Titan mit Wasserstoff führt zu elektrisch aktiven Komplexen mit bis zu drei Wasserstoffatomen. Die Ergebnisse unterstützen einen Vorschlag aus der Theorie, nach dem der Komplex mit einem Wasserstoff zwei verschiedene Konfigurationen besitzen soll. Kobalt erzeugt ein Niveau in der Bandlücke. Ein weiteres Niveau, welches früher ebenfalls dem Kobalt zugewiesen wurde, kann dem Kobalt-Bor-Paar zugeordnet werden. Nach der Reaktion mit Wasserstoff können zwei CoH-Komplexe nachgewiesen werden. Nickel besitzt drei Niveaus in der Bandlücke und erzeugt elektrisch aktive NiH-Komplexe mit bis zu drei Wasserstoffatomen. Einer dieser Defekte kann sowohl im n - als auch im p -Typ Silizium beobachtet werden. Alle drei untersuchten Metalle besitzen elektrisch passive Komplexe, welche nach der weiteren Reaktion von Wasserstoff mit den aktiven Komplexen entstehen. Die Arbeit endet mit einem Vergleich der Ergebnisse mit denen benachbarter Elemente, um mögliche Ähnlichkeiten oder Muster zu erkennen.

Ce travail porte sur une étude des propriétés électroniques des boîtes quantiques InAs/InP, qui est un système très prometteur pour les télécommunications. Ces nanoparticules sont étudiées pour différentes tailles, densité et dopage. Dans le premier chapitre, nous décrivons l’intérêt du système InAs/InP pour les applications optoélectroniques. Nous présentons la technique de croissance et quelques exemples d’applications de ces boîtes quantiques. Nous donnons une description générale complète des processus d’émission susceptible d’exister dans ces structures. Dans le deuxième chapitre, nous présentons les méthodologies de caractérisation électrique mises en jeu, en insistant sur la complémentarité de deux techniques d’analyse : la spectroscopie transitoire des défauts profonds et la mesure C(V). Dans le troisième chapitre, nous étudions ces boîtes quantiques avec la technique C(V) pour aboutir à une analyse qualitative et quantitative des profils N(W) des échantillons. Une étude de ce profil en fonction de la température nous permet de déterminer les types d’émission qui dominent dans nos structures. L’effet du fort dopage de la couche matrice, ainsi que la densité de boîtes est discuté. Dans le quatrième chapitre, une étude DLTS menée sur l’ensemble des échantillons disponibles montre plusieurs défauts reliés au contrôle de la croissance et de la qualité des interfaces. En outre, une étude plus approfondie nous permet d’extraire la réponse électrique des boîtes quantiques ainsi que leurs états électroniques s et p existants. / This work deals with a study of the electronic properties of InAs / InP quantum dots, which is a very promising material system for telecommunications. These nanoparticles are studied for different sizes, density and doping. In the first chapter, we describe the interest of the InAs / InP system for optoelectronic applications. As a result we present the growth technique and some examples of applications of these quantum dots. In addition, we present a description of the emission process may exist in these structures. In the second chapter, we present the electrical characterization methodologies: the Deep Level Transient Spectroscopy (DLTS) and the C (V) measurement. In the third chapter, we study the quantum dots to achieve a qualitative and quantitative analysis of profiles N (W) samples. A study of the profile as a function of temperature gives an overview of the types of emission that dominate in our structures. The effect of heavy doping of the matrix layer and of density of dots is discussed. In the fourth chapter, a DLTS study of all samples shows several defects related to growth and interface quality. In addition, further study allows us to extract the s and p electronical state response of quantum dot.

Le travail de la thèse proposé consiste à étudier, caractériser et modéliser la performance et la fiabilité de composants semi-conducteurs sous conditions extrêmes c’est à dire pendant et après que ces composants ont subi un stress électrique, un stress thermique voire les deux stress en même temps. Les composants semi-conducteurs que nous avons étudiés sont des modules photovoltaïques en silicium monocristallin pour des applications dans les énergies renouvelables. Dans cette étude, ces composants ont été soumis à plusieurs types de dégradations générant des défauts localisés dans la structure des composants. Dans un premier temps, des études approfondies des caractéristiques I(V) et C(V) et des paramètres électriques des modules solaires photovoltaïques ont été réalisées en testant une série de modules sous différentes conditions environnementales afin de fournir des données pertinentes pouvant être utiles pour l'évaluation des performances, la modélisation du fonctionnement et pour la mise en œuvre correcte et complète des modules photovoltaïques. Ces caractérisations ont été complétées par l’étude des défauts créés à l’interface et dans les structures des modules photovoltaïques par les différents stress sur la base de mesures effectuées sur ces mêmes cellules par la technique Deep Level Transient Spectroscopy (DLTS). Grâce à cette technique, nous avons identifié et localisé ces défauts au sein du composant, en déterminant leur énergie d’activation et leur section efficace de capture. Les résultats de notre étude montrent ainsi l’importance des conditions de fonctionnement sur les performances instantanées et sur le long terme des systèmes photovoltaïques. Ils peuvent être exploitables directement dans la conception même des modules silicium voire transposable, en suivant la méthodologie de l’étude que nous proposons à de nouvelles technologies de modules / The objective of this work aim to study the performance, reliability of semiconductor structures after their operation under extreme conditions, during and after electrical stress, thermal stress, and combined electro thermal stresses. The studied semiconductor structures are photovoltaic cells for applications in the field of renewable energies. These devices have been exposed to several types of degradation generating localized defects in the structures. The I (V) and C (V) characteristics and electrical parameters have been studied before and after each stress case. The Deep Level Transient Spectroscopy (DLTS) was used as advanced technique for tracking the defects created at the interface and in the bulk structures. The DLTS technique allows identifying and locating these defects within the devices, by determining their activation energy and their capture cross-Section