Th. doct.-ing.--Nancy, I.N.P.L., 1979.

Thesis (M.S.)--University of Delaware, 2006. / Principal faculty advisor: Robert W. Birkmire, Dept. of Materials Science & Engineering. Includes bibliographical references.

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abstract: Nanowires are 1D rod-like structures which are regarded as the basis for future technologies. III-V nanowires have attracted immense attention because of their stability, crystal quality and wide use. In this work, I focus on the growth and characterization of III-V semiconductor nanowires, in particular GaP, InP and InGaP alloys. These nanowires were grown using a hot wall CVD(Chemical Vapor Deposition) setup and are characterized using SEM (Scanning Electron Microscope), EDX (Energy Dispersive X-ray Spectroscopy) and PL (Photoluminescence) techniques. In the first chapter, Indium Phosphide nanowires were grown using elemental sources (In and P powders). I consider the various kinds of InP morphologies grown using this method. The effect of source temperature on the stoichiometry and optical properties of nanowires is studied. Lasing behavior has been seen in InP nanostructures, showing superior material quality of InP. InGaP alloy nanowires were grown using compound and elemental sources. Nanowires grown using compound sources have significant oxide incorporation and showed kinky morphology. Nanowires grown using elemental sources had no oxide and showed better optical quality. Also, these samples showed a tunable alloy composition across the entire substrate covering more than 50% of the InGaP alloy system. Integrated intensity showed that the bandgap of the nanowires changed from indirect to direct bandgap with increasing Indium composition. InGaP alloy nanowires were compared with Gallium Phosphide nanowires in terms of PL emission, using InGaP nanowires it is possible to grow nanowires free of defects and oxygen impurities, which are commonly encountered in GaP nanowires. / Dissertation/Thesis / Masters Thesis Electrical Engineering 2016

In der vorliegenden Arbeit werden verschiedene Aspekte des Einflusses von Lokalisation, Unordnung und Polarisationsfeldern auf Elektron-Loch Zustände in Quantengräben (QWs von engl. quantum wells) aus Halbleitern mit großer Bandlücke theoretisch untersucht. Unter Verwendung eines Schwerpunktseparationsansatzes wird das Verhalten von QW Exzitonen und Biexzitonen im Grenzfall schwacher Lokalisation beschrieben. Es zeigt sich, daß die Lokalisationsenergie des Biexzitons mehr als doppelt so groß ist wie die des Exzitons. Dies wird verursacht durch ein universelles Gesetz der Lokalisation in schwachen zwei-dimensionalen Potentialen, welches lediglich durch das "Potentialvolumen" und die Masse des lokalisierten Teilchens bestimmt wird. Ein einfaches Modell des QW Biexzitons wird entwickelt, dessen Ergebnisse gut mit jenen übereinstimmen, die man mit Hilfe eines aufwendigeren numerischen Modells erhält. Der Grenzfall starker Lokalisation von QW Exzitonen und höheren Exzitonenkomplexen wird mittels einer Dichtefunktionalrechnung untersucht. Es wird gezeigt, daß Zustände bis mindestens zum X4 in den nm-großen Potentialminima lokalisieren können, die durch Phasenseparation in (In,Ga)N/GaN QWs enstehen. Es wird das Übergangsspektrum des sukzessiven Zerfalls eines lokalisierten X4 berechnet. Auf Grundlage der selbstkonsistenten Lösung von Poisson- und Schrödinger-Gleichung wird der Einfluß des Probendesigns von (In,Ga)N/GaN QW-Strukturen auf den makroskopischen Verlauf des Polarisationsfeldes in Wachstumsrichtung und somit auf optische Übergangsenergie und Oszillatorstärke systematisch untersucht. Besondere Bedeutung kommt dabei der Abschirmung der Felder durch Raumladungszonen zu. Es wird gezeigt, daß die Position des QW bezüglich einer ausgedehnten Oberflächen-Verarmungszone - die in n-dotierten, Ga-polarisierten Proben auftritt - erheblichen Einfluß auf Übergangsenergie und Oszillatorstärke hat. Durch die räumliche Variation der Polarisationsfeldstärke in dieser Verarmungszone kann das optische Übergangsspektrum eines Mehrfach-QW Schultern oder mehrere Maxima aufweisen. Indium Oberflächen-Segregation ruft eine Blauverschiebung der Übergangsenergie hervor, die bis zu einem Drittel der vom Polarisationsfeld verursachten quantum confined Stark-Verschiebung kompensiert. Diese Blauverschiebung wird von einer Verringerung des Elektron-Loch Überlapps begleitet. Die Polarisationsfelder in (In,Ga)N/GaN Mehrfach-QWs verschmieren das stufenförmige Einteilchen-Absorptionsspektrum. Durch die Aufhebung der näherungsweisen Diagonalität von Inter-Subband Übergängen und durch die Miniband-Dispersion in höheren, gekoppelten Zuständen haben diese Felder, neben dem Beitrag von Potentialfluktuationen, einen entscheidenden Einfluß auf die Form des Absorptionsspektrums. Ein in der Literatur diskutierter Mechanismus, der allein durch Polarisationsfelder eine Verbreiterung optischer Spektren hervorruft, kann nicht bestätigt werden. Unter Annahme einer unkorrelierten Zusammensetzung von (In,Ga)N und einer lateral korrelierten Grenzflächenrauhigkeit von einer Monolage in jeder Grenzfläche zeigt die spektrale Breite des Exzitonen-Schwerpunktpotentials eine Verschmälerung mit zunehmendem Feld. Diese wird verursacht durch das Eindringen der Teilchen in die binären Barrieren und durch ein vergrößertes Exzitonenvolumen. Im Fall einer langreichweitigen Grenzfächenrauhigkeit findet man eine Aufspaltung des Spektrums in einzelne Linien. / In this thesis, various aspects of the influence of localization, disorder, and polarization fields on electron-hole states in wide-gap semiconductor quantum wells (QWs) are investigated theoretically. A theoretical treatment of quantum well exciton and biexciton states in the limit of weak localization is presented, using a center-of-mass separation ansatz. It shows that the localization energy of the biexciton is more than twice as large as that of the exciton due to the universal behaviour of localization in weak two-dimensional potentials which is ruled only by the potential "volume" and the mass of the localized particle. A useful simple model of the QW biexciton wavefunction is developed which provides good agreement with the results obtained with an extensive numerical solution. The limit of strong localization of QW excitons and higher exciton complexes is investigated with a density functional calculation. It is demonstrated that states at least up to X4 may localize in nm-scale potential boxes caused by indium phase separation in (In,Ga)N/GaN QWs. The transition spectrum of the successive recombination of a localized X4 is calculated. A systematic investigation of the influence of the sample design of (In,Ga)N/GaN QW structures on optical transition energy and oscillator strength reveals the importance of space charge layers with regard to screening of polarization fields along the QW-axis. Based on a self-consistent solution of the Schrödinger-Poisson equations, the overall situation of the macroscopic spontaneous and piezoelectric polarization fields is discussed in dependence on various substantial sample parameters. It is found that the position of a QW in the sample with respect to an extended surface depletion layer - which is shown to exist in n-type Ga-face grown material - severely affects transition energy and electron-hole overlap. Due to the spatial variation of the field strength in this surface depletion layer, the optical transition spectrum of a Ga-face grown multiple-QW can display shoulders or even a multiple-peak structure. Indium surface segregation results in a blueshift of the transition energy compensating up to one third of the quantum confined Stark shift produced by the polarization field. This blueshift is accompanied by a decrease of the electron-hole overlap. Polarization fields in (In,Ga)N/GaN multiple-QWs result in a smoothing of the step-like single-particle absorption spectrum. Apart from the contribution of compositional fluctuations, the fields have significant influence on the shape of the spectrum via the abrogation of the nearly diagonality of inter-subband transitions and via the mini-band dispersion of higher coupled states in case of a periodic structure. A line broadening-mechanism due to polarization fields in (In,Ga)N/GaN QWs, as sometimes discussed in literature, could not be confirmed. Assuming uncorrelated (In,Ga)N alloy and in-plane-correlated interface roughness of one monolayer in each interface, the calculation of the spectral width of the QW exciton center-of-mass potential yields a narrowing with increasing average field. This is a result of the penetration of the carriers into the barriers and of an increasing exciton volume. In case of a long-range interface roughness, a splitting of the spectrum into individual lines can be predicted.

Ce travail de thèse a pour sujet l'étude de transistors en couches minces (TFTs) à base d'Indium Gallium Zinc Oxide (IGZO). Nous nous sommes intéressés au procédé de réalisation des TFTs, et à la caractérisation des couches d'IGZO afin d'obtenir les caractéristiques au plus près de l'état de l'art. Nous avons également étudié le processus de passivation, paramètre identifié comme critique pour stabiliser les TFT et atteindre de bonnes performances.Dans un premier temps, nous avons mis au point les conditions du dépôt de la couche active, et de la réalisation des TFTs. Les analyses morphologiques et structurales ont montré l'absence de cristallites de couche, ainsi qu'une surface peu rugueuse. La densité des porteurs de charge de la couche IGZO diminue lorsque le débit d'oxygène, variable durant son dépôt, augmente. La couche active déposée à 200°C et à 4 sccm d'oxygène présente une densité de porteurs de charge de l'ordre de 1E17 cm-3, valeur adaptée au fonctionnement des TFTs.Dans un second temps, nous avons évalué l'influence d'un recuit sur les caractéristiques des TFTs. Nous avons mis en évidence que le recuit sous oxygène conduit à des TFTs opérationnels, tandis que celui sous azote ou en absence de recuit induisent une suppression de l'effet de champ. Nos études ont également montré qu'une température de recuit de 300°C est favorable aux performances des transistors. Les premiers TFTs présentent des mobilités entre 5 et 15 cm2/Vs, des rapports ION/IOFF de l'ordre de 1E7, et des pentes sous le seuil d'environ 0.3 V/décade. Les tensions de seuil (VT), quant à elles, demeurent faibles donc restent à améliorer.Pour finir, nous avons étudié l'impact d'une couche de passivation sur les TFTs, en raison de la dégradation des caractéristiques de ces derniers dans l'atmosphère ambiante. Les couches de SiO2 (déposée par PECVD) et d'Al2O3 (déposée par ALD) ont été étudiées. Nous avons mis en évidence que ces passivations peuvent dégrader les TFTs au lieu de les protéger. VT tend à se décaler dans le sens négatif lorsque l'on augmente l'épaisseur de la couche d'Al2O3 ou le débit de Silane durant le dépôt du SiO2. Une des raisons principales de ce phénomène est la présence de l'hydrogène généré lors de la passivation. Nous avons évalué les solutions pour éviter la dégradation lors du dépôt et assurer une bonne protection du TFT. / This thesis aims to study thin-film transistors (TFTs) based on Indium Gallium Zinc Oxide (IGZO) in the framework of applications in active matrix flat panel LCD and OLED display. The TFT fabrication process and the characterization of IGZO deposited film are two key studies in this thesis in order to obtain TFT electrical characteristics close to the state-of-the-art. We have also studied the passivation which is identified as crucial for stabilizing the TFT and achieving good performance.The deposition of the active layer and the fabrication process of TFT are firstly studied. Smooth surface of deposited films is demonstrated by AFM and the absence of the crystalline peak of the material is shown by X-ray diffraction. The density of charge carriers decreases with the increase of oxygen flow rate. The active layer deposited at 200°C and at 4 sccm of oxygen flow has a carrier density in the order of 1E17 cm-3 which is suitable for TFT operation. This condition is chosen to fabricate IGZO-based TFT in this thesis.In a second step, we have evaluated the influence of annealing condition on TFTs' electrical characteristics. Annealing in oxygen leads to operational TFTs while doing the same under nitrogen or the absence of annealing suppresses field-effect behavior. Our studies have also shown that annealing temperature of 300°C is suitable to obtain good performance of the transistors. From this study, we have obtained TFTs with high mobility (between 5 and 15 cm2/Vs), high ION/IOFF ratios (about 1E7), and reasonable sub threshold slope (about 0.3 V/decade). The threshold voltage (VT) however remains low (between -4 and -2 V) and needs to be improved.Finally, we have investigated the impact of a passivation layer on the performance of IGZO TFTs. SiO2 film (deposited by PECVD) and Al2O3 film (formed by ALD) were studied. We have observed that such passivation can degrade the TFTs rather than protecting them. Concretely, VT shifts in negative direction when increasing the Al2O3 layer thickness or the silane flow during SiO2 deposition. Principal reason for this shift is the presence of hydrogen which is generated during passivation. We have evaluated some solutions to reduce the degradation during deposition and ensure a good protection of the TFTs.

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In the past decade, GaN-based nitrides have had a considerable impact in solid state lighting and high speed high power devices. InGaN-based LEDs have been widely used for all types of displays in TVs, computers, cell phones, etc. More and more high power LEDs have also been introduced in general lighting market. Once widely used, such LEDs could lead to the decrease of worldwide electrical consumption for lighting by more than 50% and reduce total electricity consumption by > 10%. However, there are still challenges for current state-of-the art InGaN-based LEDs, including ‘efficiency droop’ issues that cause output power quenching at high current injection levels (> 100 A/cm2). In this dissertation, approaches were investigated to address the major issues related to state-of-the-art nitride LEDs, in particular related to (1) efficiency droop investigations on m-plane and c-plane LEDs: enhanced matrix elements in m-plane LEDs and smaller hole effective mass favors the hole transport across the active region so that m-plane LEDs exhibit 30% higher quantum efficiency and negligible efficiency droop at high injection levels compared to c-plane counterparts; (2) engineering of InGaN active layers for achieving high quantum efficiency and minimal efficiency droop: lower and thinner InGaN barrier enhance hole transport as well as improves the quantum efficiencies at injection levels; (3) double-heterostructure (DH) active regions: various thicknesses were also investigated in order to understand the electron and hole recombination mechanism. We also present that using multi-thin DH active regions is a superior approach to enhance the quantum efficiency compared with simply increasing the single DH thickness or the number of quantum wells (QWs, 2 nm-thick) in multi-QW (MQW) LED structures due to the better material quality and higher density of states. Additionally, increased thickness of stair-case electron injectors (SEIs) has been demonstrated to greatly mitigate electron overflow without sacrificing material quality of the active regions. Finally, approaches to enhance light extraction efficiency including using Ga doped ZnO as the p-GaN contact layer to improve light extraction as well as current spreading was introduced.

Indium-Gallium-Zinc-Oxide (a-IGZO) is an amorphous oxide semiconductor that has been attracting increasing attention for use in flat panel display and optoelectronic applications. This is largely due to IGZO’s high mobility at low processing temperatures. In this thesis, IGZO films were successfully grown on polyethylene naphthalate (PEN) substrates by RF magnetron sputtering at room temperature. These films were flexible, transparent and had a good Hall mobility (5-12 cm2/Vs). High quality metal oxide Schottky contacts were fabricated on these as-grown IGZO/PEN films with on-off rectification ratios of up to 108. These were then used as the gate contacts in transparent metal semiconductor field effect transistors (MESFETs). The performance and device stability of these IGZO/PEN MESFETs were investigated via a series of stress tests in both dark conditions and under illumination at different wavelengths in the visible spectrum. During constant voltage stress testing under illumination, the threshold voltage shifted by -0.54 V and 0.38 V for negative and positive gate biasing, respectively. These shifts proved reversible when devices were left in dark conditions for extended periods of time. The effect of persistent photoconductivity after exposure to different illumination sources was examined, with three potential passivation coatings to reduce this unwanted effect explored. Transparent IGZO/PEN MESFETs with an absolute transmission of up to 75% were achieved with the use of ITO ohmic contacts. These devices survived mechanical bending down to a radius of 7 mm with negligible variation in on-current and threshold voltage. This allows for the possibility of incorporating their use in future applications such as flexible transparent electronics.