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A method using a Fourier series is demonstrated to optimize an LED array for local dimming applications in liquid crystal display backlighting. The same optimization method is also suitable for LED displays in which the Moiré effect must be suppressed during photography with a minimum loss of spatial resolution. Initially, the angular intensity profile of a Lambertian LED is modelled when backlighting a Lambertian rear projection screen and compared to experimental data. An array of optimized LEDs and the resulting screen intensity pattern is then derived such that an intensity distribution with an intensity deviation of less than 2% is achieved. The angular intensity profile of the LED is modified using adjustable Fourier coefficients optimized according to an algorithm. The algorithm is designed to achieve an illuminated screen area of maximum size for a bounded LED backlight array to appear uniform in intensity to an observer. This Fourier series approach provides an elegant method to optimize the intensity profile of LED backlight arrays without the use of ray tracing. A lens was designed in order to provide this optimized intensity profile as well as created and tested. / Thesis / Master of Science (MSc)

Precisely positioned optical lenses are currently required for many highly repetitive mechanics and applications. Thus the need for micron-scale repetition between opto-mechanical units is evident, especially in industrial manufacturing and medical breakthroughs. In this thesis, a novel optical metrology system is proposed, designed, and built whose purpose is to precisely locate the center of a mechanical fixture and then to assemble a plano-convex optical lens into the located position of the fixture. Center location specifications up to ±3 µm decenter and ±0.001° tilting accuracy are required. Nine precisely positioned lenses and fixtures were built with eight units passing the requirements with a repetitive standard deviation of ±0.15 µm or less. The assembled units show satisfactory results.

Yes / To determine if a gradual adaptation period is necessary for neophytes when fitted with modern hydrogel or silicone hydrogel reusable disposable contact lenses. Across four sites, 74 neophytes (18-28 years) were randomly assigned to a reusable lens cleaned nightly with Opti-Free® Puremoist® multi-purpose contact lens solution: Proclear® (hydrogel) or Biofinity® (silicone hydrogel) and an adaptation schedule: fast (10 h wear from the first day) or gradual (4 h on the first day, increasing their wear time by 2 h on each subsequent day until they had reached 10 h). Masked investigators graded ocular surface physiology and non-invasive tear breakup time (NIBUT) and a range of comfort, vision and lens handling subjective ratings (0-100 visual analogue scales) were recorded at the baseline visit and after 10 h of lens wear, 4-6 days and 12-14 days after lens fitting. Subjective scores were also repeated after 7 days. There was no difference (p > 0.05) in ocular surface physiology or NIBUT between fast and gradual adaptation groups at any time point in either lens type with the exception of increased corneal staining (p = 0.019) in the silicone hydrogel fast adaptation group after 4-6 days, but was similar by 12-14 days. Subjective scores were also similar across the visits and lens types with the exception of 'lens awareness' (p = 0.019) which was less in the gradual versus the fast adaptation silicone hydrogel lens group at 12-14 days. There seems to be no clinical benefit for recommending a gradual adaptation period in new wearers fitted with modern soft reusable disposable contact lenses. The findings of this work add to a growing body of evidence suggesting that such advice is unnecessary in regular soft contact lens wear, which has important ramifications for the initial clinical management of these patients. / BUCCLE

Yes / All neophyte contact lens wearers require training on how to handle contact lenses. Currently, almost no published information exists describing the most common approaches used by those involved in such training in soft contact lens wearers. This study aimed to gather information on the approaches taken by those conducting this training worldwide. An online survey was created in English and translated to Spanish and distributed internationally via social media, conference attendees, and professional contacts. The anonymous survey included information on workplace setting of respondents, information about the typical approaches used for application and removal of soft contact lenses, length of the appointment, and success rate with their approach. Survey responses were received between May 2021 and April 2022. A total of 511 individuals completed the survey and responses were received from 31 countries with 48.7% from the UK. The most common approach taught for application was to have the patient hold the upper eyelashes (84.7%) and to hold the lower eyelid with the same hand as the lens (89.4%). Lenses were applied directly to the cornea by 57.7% of the respondents. The most common approach taught for lens removal was to drag the lens inferiorly from the cornea prior to removal (49.3%). Most respondents did not use videos to aid the teaching appointment (62.0%); however, they felt that their approach was successful in most cases (90). Application and removal training sessions lasted a median of 30 min and contact lenses were typically dispensed after the instructor witnessing successful application and removal three times. Various methods are adopted globally for training of application and removal of soft contact lenses, with many advising a patient-specific approach is required for success. The results of this survey provide novel insights into soft contact lens handling training in clinical practice. / British & Irish University and College Contact Lens Educators (BUCCLE) receives sponsorship from CooperVision, Alcon, Bausch + Lomb and Johnson and Johnson. No specific grant was received for this study, and no sponsors had any input or involvement within this project. Nery Garcia-Porta is supported financially by a Maria Zambrano contract at USC under the grants call for the requalification of the Spanish university system 2021–2023, funded by the European Union—Next Generation EU.

Nanoscale lithography is the key component of the semiconductor device fabrication process. For the sub-10 nm node device, the conventional deep ultraviolet (DUV) photolithography approach is limited by the diffraction nature of light even with the help of double or multiple patterning. The upcoming extreme ultraviolet (EUV) photolithography can overcome this resolution limit by using very short wavelength (13.5nm) light. Because of the prohibitive cost of the tool and the photomask, the EUV lithography is only suitable for high volume manufacturing of high value. Several alternative lithography technologies are proposed to address the cost issue of EUV such as directed self-assembly (DSA), nanoimprint lithography (NIL), scanning probe lithography, maskless plasmonic photolithography, optical maskless lithography, multiple electron-beam lithography, etc.<div><br></div><div>Electron-beam lithography (EBL) utilizes a focused electron beam to write patterns dot by dot on the silicon wafer. The beam size can be sub-nanometers and the resolution is limited by the resist not the beam size. However, the major drawback of EBL is its low throughput. The throughput can be increased by using large current but at the cost of large beam size. This is because the interaction between electrons in the pathway of the electron beam. To address the trade-off between resolution and throughput of EBL, the multiple electron-beam lithography was proposed to use an array of electron-beams. Each beam has a not very large beam current to maintain good resolution but the total current can be very high to improve the throughput. One of the major challenges is how to create a uniform array of electron beamlets with large brightness.<br></div><div><br></div><div>This dissertation shows a novel low-cost high-throughput multiple electron-beam lithography approach that uses plasmonic enhanced photoemission beamlets as the electron beam source. This technology uses a novel device to excite and focus surface electromagnetic and electron waves to generate millions of parallel electron beamlets from photoemission. The device consists of an array of plasmonic lenses which generate electrons and electrostatic micro-lenses which guide the electrons and focus them into beams. Each of the electron beamlets can be independently controlled. During lithography, a fast spatial optical modulator will dynamically project light onto the plasmonic lenses individually to control the switching and brightness of electron beamlets without the need of a complicated beamlet-blanking array and addressable circuits. The incident photons are first converted into surface electromagnetic and electron waves by plasmonic lens and then concentrated into a diffraction-unlimited spot to excite the local electrons above their vacuum levels. Meanwhile, the electrostatic micro-lens will extract the excited electrons to form a finely focused beamlet, which can be rastered across a wafer to perform lithography. The scalable plasmonic enhanced photoemission electron-beam sources are designed and fabricated. An array of micro-scale electrostatic electron lenses are designed and fabricated using typical micro-electro-mechanical system (MEMS) fabrication method. The working distance (WD) defined as the gap from the electron lens to the underneath silicon wafer is regulated using a gap control system. A vacuum system is designed and constructed to host the multiple electron-beam system. Using this demo system, the resolution of the electron beams is confirmed to be better than 30 nm from the lithography results done on poly methyl methacrylate (PMMA) and hydrogen silsesquioxane (HSQ) resists. According to simulation results, the electron beam spot size can be further optimized to be better than 10 nm.<br></div><div><br></div><div>This scheme of high-throughput electron-beam lithography with multiple plasmonic enhanced photoemission beamlets has the potential to be an alternative approach for the sub-10 nm node lithography. Because of its maskless nature, it is cost effective and especially suitable for low volume manufacturing and prototype demonstration.<br></div><div><br></div><div><br></div>

This thesis deals with optical design of f-theta lens for purposes of precision micromachining using a laser beam. Optical design consists of creating a nominal design according to specifications given by Meopta – optika s.r.o company and a tolerance analysis, which describes manufacturability of given design. Specifications given are most importantly diffraction limited image quality, correction of distortion throughout the field and telecentricity of systém in image space. F-theta lens in this thesis was created using an optical design software called Zemax.

With the rise of 5G and the increasing number ofdevices, novel antenna designs are needed to meet the demandof the future. In this report, the authors present a design andexperimental verification of a 3D-printed Geodesic ModulatedReflective Luneburg lens antenna working at the X-Band, 8-12GHz. The lens profile is calculated from the refractive index of aflat system using transformation optics. Furthermore, the lens ismodulated to minimize the height and chamfers are implementedto reduce reflections. A sliding waveguide connected to a coaxialcable is used to excite the lens while the transmitted signal isradiated from a sinusoidal flare. A copper-lined PLA substrateconstitutes the 3D-printed lens. The authors achieved a S11 below-10 dB across the spectrum and a realized gain exceeding 10 dBacross the sweeping angles at 12 GHz, showcasing the usabilityas a directed antenna. / Med det nya 5G nätverket och den ökandemängden enheter behövs nya antenner för att möta framtidensefterfrågan. I denna rapport presenterar författarna en designoch experimentell verifiering av en 3D-printad geodesisk moduleradreflekterande Luneburg linsantenn i X-bandet, 8-12 GHz.Linsprofilen beräknas från brytningsindexet för ett platt systemmed transformationsoptik. Dessutom är linsen modulerad föratt minimera höjden och kantavfasningar implementeras föratt minska reflektioner. En glidande vågledare ansluten till enkoaxialkabel används för att excitera linsen medan den sända signalenutstrålas från en vågledare med sinusformad avrundning.Ett kopparfodrat PLA-substrat utgör den 3D-printade linsen.Författarna uppnådde en S11 under -10 dB över spektrumet ochen realiserad förstärkning överstigande 10 dB över svepvinklarnavid 12 GHz, vilket visar linsens användbarhet som riktad antenn. / Kandidatexjobb i elektroteknik 2021, KTH, Stockholm

In this project, a cylindrical Luneburg lens isdesigned operating at optical frequencies. A Luneburg lens isa gradient index lens that transforms a point source into aplane wave or vice versa. The lens is rotational symmetric whichallows wide-angle beam scan. In this work, the gradient indexis discretized in layers. The refractive index of each layer isrealized with a transparent liquid. Ray tracing is used to designand evaluate the lens performance. We have simulated Luneburglenses with 4 - 10 layers. Increasing the number of layersimproves the performance. However, difficulties are present inthe manufacturing part of the lens considering that liquids withdesired refractive index cannot be mixed. / I detta projekt designas en cylindrisk Luneburg-lins som fungerar vid optiska frekvenser. En Luneburg-lins är en gradientindexlins som omvandlar en punktkälla till en plan våg eller vice versa. Linsen är rotationssymmetrisk vilket möjliggör vidvinkelstrålescanning. I detta arbete diskretiseras gradienta indexet i lager, brytningsindex för varje lager realiseras med en transparent vätska. Raytracing används för att designa och utvärdera linsprestandan. Vi har simulerat Luneburg-linser med 4 - 10 lager. Genom att öka antalet lager förbättras prestandan. Svårigheter förekommer i linsens tillverkningsprocess med tanke på att vätskor med önskat brytningsindex inte kan blandas. / Kandidatexjobb i elektroteknik 2020, KTH, Stockholm

In 2000, a controversial paper by John Pendry surmised that a slab of negative index material could act as a perfect lens, projecting images with resolution detail beyond the limits of conventional lensing systems. A thin silver slab was his realistic suggestion for a practical near-field superlens - a 'poor-mans perfect lens'. The superlens relied on plasmonic resonances rather than negative refraction to provide imaging. This silver superlens concept was experimentally verified by the author using a novel near-field lithographic technique called Planar Lensing Lithography (PLL), an extension of a previously developed Evanescent Near-Field Optical Lithography (ENFOL) technique. This thesis covers the computational and experimental efforts to test the performance of a silver superlens using PLL, and to compare it with the results produced by ENFOL. The PLL process was developed by creating metal patterned conformable photomasks on glass coverslips and adapting them for use with an available optical exposure system. After sub-diffraction-limited ENFOL results were achieved with this system additional spacer and silver layers were deposited onto the masks to produce a near-field test platform for the silver superlens. Imaging through a silver superlens was achieved in a near-field lithography environment for sub-micron, sub-wavelength, and sub-diffraction-limited features. The performance of PLL masks with 120-, 85-, 60-, and 50-nm thick silver layers was investigated. Features on periods down to 145-nm have been imaged through a 50-nm thick silver layer into a thin photoresist using a broadband mercury arc lamp. The quality of the imaging has been improved by using 365 nm narrowband exposures, however, resolution enhancement was not achieved. Multiple layer silver superlensing has also been experimentally investigated for the first time; it was proposed that a multi-layered superlens could achieve better resolution than a single layer lens for the same total silver thickness. Using a PLL mask with two 30-nm thick silver layers gave 170-nm pitch sub-diffraction-limited resolution, while for a single layer mask with the same total thickness (60 nm) resolution was limited to a 350-nm pitch. The proposed resolution enhancement was verified, however pattern fidelity was reduced, the result of additional surface roughness. Simulation and analytical techniques have been used to investigate and understand vi ABSTRACT the enhancements and limitations of the PLL technique. A Finite-Difference Time- Domain (FDTD) tool was written to produce full-vector numerical simulations and this provided both broad- and narrowband results, allowing image quality as a function of grating period to be investigated. An analytical T-matrix method was also derived to facilitate computationally efficient performance analysis for grating transmission through PLL stacks. Both methods showed that there is a performance advantage for PLL over conventional near-field optical lithography, however, the performance of the system varies greatly with grating period. The advantages of PLL are most prominent for multi-layer lenses. The work of this thesis indicates that the utilisation of plasmonic resonances in PLL and related techniques can enhance the performance of near-field lithography.