Microfluidics is gaining in importance due to its wide ranging benefits and applicability in chemical and biological analysis. Although traditional microfluidic devices are created with glass or silicon based fabrication technologies, polymer based devices are gaining in popularity. Soft lithography and replica molding are techniques for the rapid prototyping of such devices, utilizing Polydimethylsiloxane (PDMS) as the dominant material. Other benefits include its low costs and ease of fabrication. Even though soft lithography is a well researched and developed fabrication process, new applications have been discovered in which the technology can be applied. Often, changes in the fabrication process are necessary for their application in other areas of research. This thesis will address several microfluidic applications using soft lithography. These areas of research include microfluidic thermometry, isoelectric focusing (IEF), and micromixers. In microfluidic thermometry, a novel thin film PDMS/Rhodamine B has been developed allowing whole-chip temperature measurements. In addition, compatibility problems between Rhodamine B and PDMS microfluidic devices were resolved. The thin film fabrication process, experimental results, and issues with its use are discussed. Future work and attempts at improving the thin film performance are also provided. IEF involves applications in which samples are separated according to its electrostatic charge. Two types of IEF applications are shown in which soft lithography has been shown to be beneficial to its development and performance. In isoelectric focusing with the use of thermally generated pH gradients, soft lithography allows for the rapid design, production and testing of different channel layouts. In general, due to PDMS insulation and overall low heat transfer rates, the temperatures detected are more gradual than those previously reported in literature. IEF using carrier ampholytes are also discussed, with preliminary results in which devices fabricated using soft lithography are compared to commercially available IEF cartridges. Its fabrication issues are discussed in detail. In micromixers, soft lithography fabrication issues and overall integration with flow mechanisms is discussed. In general it is difficult to perform mixing in the microscale due to the predominantly laminar flow and flow rate restrictions. Channel geometry is insignificant, as can be seen through numerical simulations.

The aim of this diploma work is to improve selectivity and sensitivity in DNA-chips by utilizing fluorescence resonance energy transfer (FRET) between conjugated polyelectrolytes (CPEs) and fluorophores. Leclerc and co-workers have presented successful results from studies of super FRET between fluorophore tagged DNA and a CPE during hybridisation of the double strand. Orwar and co-workers have constructed a DNA-chip using standard photo lithography creating a pattern of the hydrophobic photoresist SU-8 and cholesterol tagged DNA (chol-DNA). This diploma work will combine and modify these two ideas to fabricate a improved DNA-chip. Immobilizing of DNA onto surface has been done by using soft lithography. Hydrophobic pattern arises from the poly(dimethylsiloxane) (PDMS) stamp. The hydrophobic pattern will attract chol-DNA that is adsorbed to the chip. Different sets of fluorophores are covalently bound to the DNA and adding CPEs to the complex will make FRET occur between CPE and bound fluorophore. We will here show that the specificity in DNA hybridization by using PDMS patterning was high. FRET clearly occurred, especially with the CPEs as donor to the fluorophore Cy5. The intensity of FRET was higher when the fluorophore and the CPE were conjugated to the same DNA strand. The largest difference in FRET intensity between double stranded and single stranded complexes was observed with the CPE tPOMT. Super FRET has been observed but not yet fully proved. The FRET efficiency was lower with the fluorophore Alexa350 as donor compared to the Cy5/CPE complex. Most of the energy transferred from Alexa350 was extinguished by quenching.

Microfluidics is gaining in importance due to its wide ranging benefits and applicability in chemical and biological analysis. Although traditional microfluidic devices are created with glass or silicon based fabrication technologies, polymer based devices are gaining in popularity. Soft lithography and replica molding are techniques for the rapid prototyping of such devices, utilizing Polydimethylsiloxane (PDMS) as the dominant material. Other benefits include its low costs and ease of fabrication. Even though soft lithography is a well researched and developed fabrication process, new applications have been discovered in which the technology can be applied. Often, changes in the fabrication process are necessary for their application in other areas of research. This thesis will address several microfluidic applications using soft lithography. These areas of research include microfluidic thermometry, isoelectric focusing (IEF), and micromixers. In microfluidic thermometry, a novel thin film PDMS/Rhodamine B has been developed allowing whole-chip temperature measurements. In addition, compatibility problems between Rhodamine B and PDMS microfluidic devices were resolved. The thin film fabrication process, experimental results, and issues with its use are discussed. Future work and attempts at improving the thin film performance are also provided. IEF involves applications in which samples are separated according to its electrostatic charge. Two types of IEF applications are shown in which soft lithography has been shown to be beneficial to its development and performance. In isoelectric focusing with the use of thermally generated pH gradients, soft lithography allows for the rapid design, production and testing of different channel layouts. In general, due to PDMS insulation and overall low heat transfer rates, the temperatures detected are more gradual than those previously reported in literature. IEF using carrier ampholytes are also discussed, with preliminary results in which devices fabricated using soft lithography are compared to commercially available IEF cartridges. Its fabrication issues are discussed in detail. In micromixers, soft lithography fabrication issues and overall integration with flow mechanisms is discussed. In general it is difficult to perform mixing in the microscale due to the predominantly laminar flow and flow rate restrictions. Channel geometry is insignificant, as can be seen through numerical simulations.

This research delineates the design of a nanolithographic process for nanometer scale surface patterning. The process involves the combination of serial atomic force microscope (AFM) based nanolithography with the parallel patterning capabilities of soft lithography. The union of these two techniques provides for a unique approach to nanoscale patterning that establishes a research knowledge base and tools for future research and prototyping.To successfully design this process a number of separate research investigations were undertaken. A custom 3-axis AFM with feedback control on three positioning axes of nanometer precision was designed in order to execute nanolithographic research. This AFM system integrates a computer aided design/computer aided manufacturing (CAD/CAM) environment to allow for the direct synthesis of nanostructures and patterns using a virtual design interface. This AFM instrument was leveraged primarily to study anodization nanolithography (ANL), a nanoscale patterning technique used to generate local surface oxide layers on metals and semiconductors. Defining research focused on the automated generation of complex oxide nanoscale patterns as directed by CAD/CAM design as well as the implementation of tip-sample current feedback control during ANL to increase oxide uniformity. Concurrently, research was conducted concerning soft lithography, primarily in microcontact printing (µCP), and pertinent experimental and analytic techniques and procedures were investigated.Due to the masking abilities of the resulting oxide patterns from ANL, the results of AFM based patterning experiments are coupled with micromachining techniques to create higher aspect ratio structures at the nanoscale. These relief structures are used as master pattern molds for polymeric stamp formation to reproduce the original in a parallel fashion using µCP stamp formation and patterning. This new method of master fabrication provides for a useful alternative to conventional techniques for soft lithographic stamp formation and patterning. / Dissertation

This thesis reports the characterization and development of nanolithography using Electron Beam Lithography system and nanoscale plasma etching. The standard Bosch process and a modified three-pulse Bosch process were developed in STS ICP and Plasma ICP system separately. The limit of the Bosch process at the nanoscale regime was investigated and documented. Furthermore, the effect of different control parameters on the process were studied and summarized in this report. 28nm-wide trench with aspect-ratio of 25 (smallest trench), and 50nm-wide trench with aspect ratio of 37 (highest aspect-ratio) have been demonstrated using the modified three-pulse process. Capacitive resonators, SiBAR and IBAR devices have been fabricated using the process developed in this work. IBARs (15MHz) with ultra-high Q (210,000) have been reported.

The road map of the semiconductor industry has followed Moores Law over the past few decades. According to Moores Law the number of transistors in an integrated circuit (IC) will double for a minimum component cost every two years. The features made in an IC are produced by photolithography. Industry is now producing devices at the 65 nm node, however, for every deceasing node size, both the materials and processes used are not only difficult but also expensive to develop. Ultimately, the feature size obtainable via photolithography is dependent on the wavelength used in the process. The limitations of photolithography will eventually make Moores Law unsustainable. Therefore, new methodologies of creating features in the semiconductor substrate are desired. Here we present a new way to make patterns in silicon (Si) and silicon dioxide (SiO2), molecular lithography. Individual molecules and polymers, in a monolayer, serves directly as the etch mask; eliminating the photolighographic size limitation of light at a specific wavelength. The Ohnishi- and Ring parameter suggests that cyclic carbon rich molecules have a high resistance towards the plasma process, used to create the features in the substrate. Therefore highly aromatic molecules were investigated as candidates for molecular lithography. A monolayer of poly cyclic hydrocarbons, fullerene containing polymer, and fullerene molecules were created using the versatile photochemistry of benzophenone as the linker between the substrate and the material. First, a chlorosilane benzophenone derivative was attached to the Si/SiO2 surface. A thin film of the desired material is then created on top of the silane benzophenone layer. Irradiation at ~350 nm excites the benzophenone and reacts with neighboring alkyl chains. After covalent attachment the non-bonded molecules are extracted from the surface using a Soxhlet apparatus. Self-assembly, molecular weight, and wetting properties of the material dictates the features shape and size. These features are then serving as an etchmask in a fluorine plasma. The organic etch resist is then removed either in an oxygen plasma or in a piranha solution. AFM analysis revealed that 3 to 4 nm wide defined structures were obtained using C96 as the etch mask. This is about ten times smaller then industry standards. Also a depth profile of 50 nm, which is the minimum feature depth used in industry, was created using a fullerene containing polymer as the etch mask. Directionality and control over the shape and sizes of the features are naturally critical for implementing this technology in device fabrication. Therefore, alignment of the materials used has also been examined. Monolayers of highly stable molecules has successfully been used as etch masks. Further research and development could implement molecular lithography in device fabrication. Self-assembly among other forces would dictate which materials could be used successfully as a molecular resist.

The objective of this research is the development of an electrically active microneedle array that can deliver biomolecules such as DNA and drugs to epidermal cells by means of electroporation. Properly metallized microneedles could serve as microelectrodes essential for electroporation. Furthermore, the close needle-to-needle spacing of microneedle electrodes provides the advantage of utilizing reduced voltage, which is essential for safety as well as portable applications, while maintaining the large electric fields required for electroporation. Therefore, microneedle arrays can potentially be used as part of a minimally invasive, highly-localized electroporation system for cells in the epidermis layer of the skin. This research consists of three parts: development of the 3-D microfabrication technology to create the microneedle array, fabrication and characterization of the microneedle array, and the electroporation studies performed with the microneedle array. A 3-D fabrication process was developed to produce a microneedle array using an inclined UV exposure technique combined with micromolding technology, potentially enabling low cost mass-manufacture. The developed technology is also capable of fabricating 3-D microstructures of various heights using a single mask. The fabricated microneedle array was then tested to demonstrate its feasibility for through-skin electrical and mechanical functionality using a skin insertion test. It was found that the microneedles were able to penetrate skin without breakage. To study the electrical properties of the array, a finite element simulation was performed to examine the electric field distribution. From these simulation results, a predictive model was constructed to estimate the effective volume for electroporation. Finally, studies to determine hemoglobin release from bovine red blood cells (RBC) and the delivery of molecules such as calcein and bovine serum albumin (BSA) into human prostate cancer cells were used to verify the electrical functionality of this device. This work established that this device can be used to lyse RBC and to deliver molecules, e.g. calcein, into cells, thus supporting our contention that this metallized microneedle array can be used to perform electroporation at reduced voltage. Further studies to show efficacy in skin should now be performed.

In this research, two major experiments, including the self-assembly of silica spheres, were performed by using a physical confinement method with an attractive capillary force. The silica spheres were dragged and aggregated as results of the evaporation of the solvent. In the first experiment, silica spheres were assembled into the two-dimensional pattered substrate, constructed by the photo-resist film formed under a lithography process. Several patterned substrates could work as a physical trap during the flow of the silica spheres. The ordered arrangement of the silica spheres was controlled by the concentration and the size of the silica spheres, the thickness of the photo-resist film, and the titled angle of the substrate. In our conditions, the silica spheres could orderly arrange in larger area of the substrate. In the second experiment, a surface-enhanced Raman scattering (SERS) enhancement was observed from a chain of silica spheres with silver nanoparticles, which worked as a excitation source to provid a strong local electromagnetic fields exciting the crystal violet (CV) dye coated on the silica spheres. We found that the CV molecules has a strong SERS intensity due to the refraction and reflection of the incident light within the silica spheres. When the silica spheres were linearly arranged, longer length of the chained silica spheres would lead to a maximum value of the SERS intensity.

As devices and new technologies continue to shrink, nanocrystalline multi-metal compounds are becoming increasingly important for high efficiency and multifunctionality. However, synthetic methods to make desirable nanocrystalline multi-metallics are not yet matured. In response to this deficiency, we have developed several solution-based methods to synthesize nanocrystalline binary alloy and intermetallic compounds. This dissertation describes the processes we have developed, as well as our investigations into the use of lithographically patterned surfaces for template-directed self-assembly of solution dispersible colloids. We used a modified polyol process to synthesize nanocrystalline intermetallics of late transition and main-group metals in the M-Sn, Pt-M’, and Co-Sb systems. These compounds are known to have interesting physical properties and as nanocrystalline materials they may be useful for magnetic, thermoelectric, and catalytic applications. While the polyol method is quite general, it is limited to metals that are somewhat easy to reduce. Accordingly, we focused our synthetic efforts on intermetallics comprised of highly electropositive metals. We find that we can react single-metal nanoparticles with zero-valent organometallic Zinc reagents in hot, coordinating amine solvents via a thermal decomposition process to form several intermetallics in the M’’-Zn system. Characterization of the single-metal intermediates and final intermetallic products shows a general retention of morphology throughout the reaction, and changes in optical properties are also observed. Following this principle of conversion chemistry, we can employ the high reactivity of nanocrystals to reversibly convert between intermetallic phases within the Pt-Sn system, where PtSn2 ↔ PtSn ↔ Pt3Sn. Our conversion chemistry occurs in solution at temperatures below 300 °C and within 1 hour, highlighting the high reactivity of our nanocrystalline materials compared to the bulk. Some evidence of the generality for this process is also presented. Our nanocrystalline powders are dispersible in solution, and as such are amenable to solution-based processing techniques developed for colloidal dispersions. Accordingly, we have investigated the use of lithographically patterned surfaces to control the self-assembly of colloidal particles. We find that we can rapidly crystallize 2-dimensional building blocks, as well as use epitaxial templates to direct the formation of interesting superlattice structures comprised of a bidisperse population of particles.

Grazing incidence pumping (GRIP) is a scheme to produce x-ray lasers and extreme ultraviolet lithography is a means of lithographic production which requires soft x-rays with a bandwidth of 2% centred at 13,5 nm. In this work firstly a grazing incidence pumping of Ni-like Mo and Ne-like Ti x-ray laser media were simulated by using EHYBRID and a post-processor code coupled to it. The required atomic data were obtained from the Cowan code. Besides, the timing issue needed for amplification purpose in a Ti:Sapphire laser system has been described theoretically. Afterwards, in order to produce soft x-ray lasers for extreme ultraviolet lithographic applications, emission of soft x-rays in the 2% bandwidth centred at 13.5 nm emitted from Sn XII and Sn XIII ions were simulated by using the EHYBRID code for a laser operating at 1064 nm with 1 J of pulse energy and 6 ns of pulse duration. The intensity range that has been investigated is between 1-5 x 1012 W/cm2. Ion fractions of tin ions and line intensities corresponding to different electron temperatures were calculated by using the collisional radiative code NeF.