In this study, optical behavior of metal nanoparticles having dimensions smaller than the wavelength of visible light is studied experimentally and numerically. Gold (Au) and silver (Ag) nanoparticles are studied due to their superior optical properties when compared to other metals. A compact code based on Discrete Dipole Approximation (DDA) is developed to compute extinction efficiencies of nanoparticles with various different properties such as material, dimension and geometry. To obtain self consistent nanoparticle arrays with well defined geometries and dimensions, Electron Beam Lithography (EBL) technique is mainly used as the manufacturing method. Dose parameters required to produce nanoparticles with dimensions down to 50 nm over substrates with different electrical conductivities are determined. Beam current is found to affect the doseV size relation. The use of thin Au films as antistatic layer for e-beam patterning over insulating substrates is considered and production steps, involving instabilities due to contaminants introduced to the system during additional removal steps, are clarified. 4 nm thick Au layer is found to provide sufficient conductivity for e-beam patterning over insulating substrates. An optical setup capable of performing transmittance and reflectance measurements of samples having small areas patterned with EBL is designed. Sizes of the metal nanoparticles are determined by scanning electron microscope (SEM) and spectral data obtained using the optical setup is analyzed to find out the parameters affecting the localized surface plasmon resonances (LSPR). Arrays of particles with diameters between 50 &ndash / 200 nm are produced and optically analyzed. Size and shape of the nanoparticles are found to affect the resonance behavior. Furthermore, lattice constants of the particle arrays and surrounding medium are also shown to influence the reflectance spectra. Axes with different lengths in ellipsoidal nanoparticles are observed to cause distinguishable resonance peaks when illuminated with polarized light. Peak intensities obtained from both polarizations are observed to decrease under unpolarized illumination. Binary systems consisting of nanosized particles and holes provided better contrast for transmitted light.

Electrochemical biosensors are cost effective, fast and portable devices, which can determine the existence and amounts of chemicals in a specific medium. These devices have many potential applications in many fields such as determination of diseases, process and product control, environmental monitoring, and drug research. To realize these potentials of the devices, many studies are being carried out to increase their sensitivity, selectivity and long term stabilities. Surface modification studies with various types of particles (metal nano particles, carbon nano tubes etc.) can be count among these studies. Although zeolites and zeo-type materials are investigated for many years, they still hold interest on them due to their capabilities. By means of their chemical resistances, large surface areas, tailorable surface properties, and porous structures they can be applied in many applicational fields. In some recent studies, these properties are intended to be used in the field of biosensors. The purpose of the current study was to investigate the effect of zeolite nanoparticles on electrochemical biosensor performances. Firstly, several different procedures were investigated in order to find the best and optimum methodology to attach previously synthesized zeolites on Si wafer substrates for the first time. For this purpose, the ultrasonication, spin coating and direct attachment methods were used and their efficiencies were compared. Perfectly oriented, fully covering, zeolite monolayers are produced by direct attachment method. Successively produced zeolite thin films were then patterned with the help of Electron Beam Lithography technique to show the compatibility of coating methods to the CMOS technology. Combination of Direct Attachment and EBL techniques resulted well controlled zeolite monolayer patterns. Then zeolite modified electrochemical biosensors were tested for their performances. With these experiments it was intended to improve the selectivity, sensitivity and storage stabilities of standard electrochemical biosensors. Experiments, conducted with different types of zeolites, showed that zeolites have various effects on the performances of electrochemical biosensors. Amperometric biosensor response magnitudes have been doubled with the addition of Silicalites. Faster conductometric electrode responses were achieved with enzyme immobilization on zeolite film technique. Also it is seen that Beta type zeolites modified through different ion exchange procedures, resulted different responses in IS-FET measurements.

Zeolites are crystalline aluminosilicates which have highly ordered pore structures and high surface area. Also the tailorable surface properties, high ion-exchange capability, high chemical, thermal, and mechanical strength make these particles an important candidate for various application such as sensors, catalysis, dielectric materials, separation, and membrane technologies. Although zeolites have these unique properties, applications where zeolites are integrated into devices according to their application areas, are limited due to the powder form of the material. The purpose of the current study was to investigate the effect of zeolite nanoparticles on conductometric biosensor performance and cell viability measurements. Firstly, zeolite attachment on silicon surfaces was investigated by attaching silicalite and zeolite A nanoparticles onto the silicon substrates by direct attachment methodology in a closely packed monolayer form with perfect orientation and full coverage without using any chemical linker. Furthermore, the ability to pattern these zeolite crystals on silicon substrates with electron beam lithography and photolithography techniques was investigated. With the combination of electron beam lithography and direct attachment methodology, zeolite patterns were produced with feature sizes as small as a single silicalite nanoparticle thick line, that is approximately 500 nm. This approach has the ability of patterning very small features on silicon substrate, but the drawback is the long patterning time and lack of electron beam stability during long pattern formation process. Accordingly, it is almost impossible to form large patterns with electron beam lithography systems. Afterwards, to have full control on surfaces with differentiated areas on solid substrates, patterns of one type of zeolite crystals was formed on the monolayer of another type of zeolite layer with electron beam lithography for the first time. The same closed packed and highly oriented silicalite patterns were successfully formed on zeolite A monolayers and vice versa. Then photolithography technique was combined with direct attachment methodology to overcome the problem of the lack of total patterned area. With this technique, it was possible to pattern the whole silicon wafer in a couple of seconds, however the feature size of the zeolite patterns was limited with the infrastructures of the mask fabricated for photolithography studies. In this particular study, zeolite lines patterns with a minimum of 5 &micro / m thickness were prepared and the total patterned area was kept constant at 1 cm2. Similar to what was obtained by electron beam lithography study, zeolite A patterns were formed on silicalite monolayers with the minimum feature size of 5 &micro / m and vice versa. In the second part of the study, zeolite films were prepared on the transducers of conductometric biosensors using dip coating technique and named as Zeolite Coated Transducers (ZCT). Electrodes prepared using a mixture of zeolite and enzyme solution and then subjected to casting using glutaraldehyde were called Zeolite Membrane Transducers (ZMT). The operational and storage stabilities were determined to be in an acceptable range using ZCTs for conductometric urea biosensors. It was observed that using electrodes fabricated by the ZCT technique enhanced the biosensor signals up to two times and showed a rapid response after the addition of urea to the medium when it was compared with Standard Membrane Transducers (SMT). This enhancement can be explained by the lack of GA layer on top of the film, which acts as a diffusion barrier and inhibits the activity of the enzyme. On the second part of this conductometric biosensor study, effect of zeolite modification with methyl viologen (MV) and silver nanoparticles (Ag+ and Ag0), as well as the effect of changing Si/Al ratio was investigated with three different zeolite Beta particles which have Si/Al ratios of 40, 50, and 60. There were no significant effect of MV modification on ZMTs and there was no response observed with Ag+ and Ag0 modified zeolites. However, it was observed that conductometric responses increased with increasing Si/Al ratio for ZMTs. This behavior can be due to an increased hydrophobicity and/or the increasing acidic strength with the increasing Si/Al ratio within the zeolite crystals. Also ZCTs showed higher responses with respect to both SMTs and ZMTs. When compared with SMTs and ZMTs, ZCTs had higher reproducibility due to the controlled thickness of zeolite thin film by dip coating, and the controlled amount of enzyme adsorbed on this film. In the third part of the study, effect of zeolites on cell proliferation with MG63 osteoblast cells and NIH3T3 fibroblast cells were investigated. For that purpose, zeolite A, silicalite, and calcined forms of these zeolites were patterned with photolithography technique onto silicon wafers. Three different patterns prepared for this particular study, which has 0.125cm2, 0.08825cm2, and 0.04167cm2 zeolite patterned areas on 1 cm2 samples. In that way, not only the zeolite type and effect of calcination of zeolites, but also the effect of zeolite amount on MG63 osteoblast cells and NIH3T3 fibroblast cells were investigated. Silicalite coated samples were observed to have higher amount of cells than zeolite A coated samples after 24, 48, and 72 hours of incubation. This may be referred to the hydrophilic/hydrophobic properties, surface charge, and/or particle size of zeolites. Also it is observed that higher zeolite amount on samples resulted in an increase in the number of cells attached to the samples. There was also a significant increase in the number of cells upon using calcined silicalite samples. Accordingly, it can be hypothesized that zeolite pores result in an enhancement of protein adsorption and proliferation, even if this only occurs at the pore openings. On the other hand, there was no positive effect of calcining zeolite A. This result was expected since there is no structure directing agent used in synthesis procedure of zeolite A, which again supports the fact that pores might have some role in cell attachment.

Recent advances in nanotechnology and the biotechnology revolution have created an immense opportunity for the use of noble metal nanoparticles as Surface Enhanced Raman Spectroscopy (SERS) substrates for biological sensing and diagnostics. This is because SERS enhances the intensity of the Raman scattered signal from an analyte by orders of 106 or more. This dissertation deals with the different aspects involved in the application of SERS for biosensing. It discusses initial studies performed using traditional chemically reduced silver colloidal nanoparticles for the SERS detection of a myriad of proteins and nucleic acids. It examines ways to circumvent the inherent aggregation problems associated with colloidal nanoparticles that frequently lead to poor data reproducibility. The different methods examined to create robust SERS substrates include the creation of thermally evaporated silver island films on microscope glass slides, using the technique of Nanosphere Lithography (NSL) to create hexagonally close packed periodic particle arrays of silver nanoparticles on glass substrates as well as the use of optically tunable gold nanoshell films on glass substrates. The three different types of SERS surfaces are characterized using UV-Vis absorption spectroscopy, Electron Microscopy (EM), Atomic Force Microscopy (AFM) as well as SERS using the model Raman active molecule trans-1,2-bis(4-pyridyl)ethylene (BPE). Also discussed is ongoing work in the initial stages of the development of a SERS based biosensor using gold nanoshell films for the direct detection of b-amyloid, the causative agent for Alzheimer's disease. Lastly, the use of gold nanoshells as SERS substrates for the intracellular detection of various biomolecules within mouse fibroblast cells in cell culture is discussed. The dissertation puts into perspective how this study can represent the first steps in the development of a robust gold nanoshell based SERS biosensor that can improve the ability to monitor biological processes in real time, thus providing new avenues for designing systems for the early diagnosis of diseases.

Optics has the inherent advantages of parallelism and wide bandwidths in processing information. However, the need to interface with electronics creates a bottleneck that eliminates many of these advantages. The proposed research explores novel optical devices and techniques to overcome some of these bottlenecks. To address parallelism issues we take a specific example of a content-addressable memory that can recognize images. Image recognition is an important task that in principle can be done rapidly using the natural parallelism of optics. However in practice, when presented with incomplete or erroneous information, image recognition often fails to give the correct answer. To address this problem we examine a scheme based on free-space interconnects implemented with diffractive optics. For bandwidth issues, we study possible ways to eliminate the electronic conversion bottleneck by exploring all-optical buffer memories and all-optical processing elements. For buffer memories we examine the specific example of slow light delay lines. Although this is currently a popular research topic, there are fundamental issues of the delay-time-bandwidth product that must be solved before slow light delay lines can find practical applications. For all-optical processing we examine the feasibility of constructing circuit elements that operate directly at optical frequencies to perform simple processing tasks. Here we concentrate on the simplest element, a sub-wavelength optical wire, along with a grating coupler to interface with conventional optical elements such as lenses and fibers. Even such a simple element as a wire has numerous potential applications. In conclusion, information processing by all-optical devices are demonstrated with an associative memory using diffractive optics, an all-optical delay line using room temperature slow light in photorefractive crystals, and a subwavelength optical circuit by surface plasmon effects.

As devices and new technologies continue to shrink, nanocrystalline multi-metal compounds are becoming increasingly important for high efficiency and multifunctionality. However, synthetic methods to make desirable nanocrystalline multi-metallics are not yet matured. In response to this deficiency, we have developed several solution-based methods to synthesize nanocrystalline binary alloy and intermetallic compounds. This dissertation describes the processes we have developed, as well as our investigations into the use of lithographically patterned surfaces for template-directed self-assembly of solution dispersible colloids. We used a modified polyol process to synthesize nanocrystalline intermetallics of late transition and main-group metals in the M-Sn, Pt-M', and Co-Sb systems. These compounds are known to have interesting physical properties and as nanocrystalline materials they may be useful for magnetic, thermoelectric, and catalytic applications. While the polyol method is quite general, it is limited to metals that are somewhat easy to reduce. Accordingly, we focused our synthetic efforts on intermetallics comprised of highly electropositive metals. We find that we can react single-metal nanoparticles with zero-valent organometallic Zinc reagents in hot, coordinating amine solvents via a thermal decomposition process to form several intermetallics in the M''-Zn system. Characterization of the single-metal intermediates and final intermetallic products shows a general retention of morphology throughout the reaction, and changes in optical properties are also observed. Following this principle of conversion chemistry, we can employ the high reactivity of nanocrystals to reversibly convert between intermetallic phases within the Pt-Sn system, where PtSn2 ↔ PtSn ↔ Pt3Sn. Our conversion chemistry occurs in solution at temperatures below 300 °C and within 1 hour, highlighting the high reactivity of our nanocrystalline materials compared to the bulk. Some evidence of the generality for this process is also presented. Our nanocrystalline powders are dispersible in solution, and as such are amenable to solution-based processing techniques developed for colloidal dispersions. Accordingly, we have investigated the use of lithographically patterned surfaces to control the self-assembly of colloidal particles. We find that we can rapidly crystallize 2-dimensional building blocks, as well as use epitaxial templates to direct the formation of interesting superlattice structures comprised of a bidisperse population of particles.

With the raise of nanotechnology researching, many special physical and chemical properties were found gradually in nanoscale. Among them, the one-dimension nanostructure owns high specific surface area and excellent electron emission properties. Moreover, the two-dimension arrayed nanostructure has the characteristics of photonic crystal and moth-eye effect. Currently, advanced lithographic methods such as electron beam (E-beam) or deep ultraviolet (DUV) lithography and X-ray lithography are adopted to define periodic nanoscale patterns. But these lithographic equipment are too expensive. Moreover, costly etching methods such as inductively coupled plasma reactive ion etching (ICP-RIE) or electron cyclotron resonance reactive ion etching (ECR-RIE) must be used to form arrayed silicon nanostructure with high aspect ratios. The nanoscale array patterns can be defined on the surface of the silicon wafer by the self-assembly of a polystyrene nanosphere. The photo-assisted electrochemical etching (PAECE) has the advantage of forming nanopore, and the aspect ratio of etched nanopores can be as high as 50:1 which is better than ICP-RIE. Therefore, PAECE is very suitable to fabricate nanostructure. This high-cost drawback makes most of academias and small/medium enterprises hard to invest in nanotechnology. This study combines the self-assembly nanosphere lithography (SANSL) process and photo-assisted electrochemical etching to fabricate a nanostructure array with a high aspect ratio on the surface of a silicon wafer. Experimental results show that the nanosphere array with a nearly perfect arrangement can be obtained in the sample of 1.8 ∗1.8 cm2 by spin coating and vibration coating. Using reactive ion etching (RIE) can transfer the nanosphere array pattern to the silicon nitride layer, and form the etching window of PAECE. The concentration of the HF electrolyte used in PAECE was 2.5 wt%. When PAECE was performed with etching mask can produce deeper and periodic nanopores. The surfactant of SDSS added in the HF electrolyte of PAECE can reduce the contact angle of electrolyte and avoid the phenomenon of hole-reaming. When the voltage of 1 V is used to etch for 12.5 min, the etching depth of the nanopore array structure is about 5.69 £gm and its diameter is about 90 nm, such that the aspect ratio of the pore can reach about 63:1. If the etching voltage was increased, the width of pore will be increased and the depth of pore will be reduced gradually at the same time. When the etching voltage of 2 V is applied to etch for 5 min, the etching height of the nanopillar is about 2 £gm and its diameter is about 100 nm, such that the aspect ratio of the pillar can reach about 20:1. The nanopillar was arranged periodically according to the definition of nanosphere, therefore the arrayed nanopillar can be realized successfully. Dropping the solution which has biological samples into the gap of nanopillar, it will affect the light which goes through the nanostructure and produce specific parameters of polarization. The results showed that when the DI water was dropped into the nanopillar structure, the degree of polarization (DOP) is 0.981, azimuth is 4.86¢X and ellipticity is 2.83¢X. When the solution which has alkaline lysis plasmid of 5 £gg/ml was dropped into the nanopillar structure, the DOP is 0.957, azimuth is 7.7¢X and ellipticity is 3.99¢X. The result shows that the change of polarization parameter has the relations with the concentration of biological samples in solution. Therefore, the measure system can be combined with nanopillar array to develop the photonic crystal biosensor. This study also applies the developed nanopore nanostructure array to fabricate sub-wavelength antireflection structure of solar cell. Experimental results show that the deeper in structure and then the better in antireflective effect. After performing 1 V PAECE for 5 min, the weighted mean reflectance can be reduced to 1.73% under the wavelength range of 280¡V890 nm. Further coating of a silicon nitride layer on the surface of a nanostructure array reduces the weighted mean reflectance even to 0.878 %. Finally, this study also uses various voltage of PAECE to produce nanostructure array with different surface area for the electrode fabrication of fuel cell. Experimental results show that the larger in surface area of sample and then the better in catalysis effect. Two-staged PAECE of 1.5 V and 1.75 V can yield nanopillar with surface area of 14.2 cm2 , which is about 50.2 times higher than a planar electrode. When the surface of such a nanopillar array is coated with platinum of 1000 Å, the reaction current of nanopillar array is 10.2 mA, which is 72.9 times higher than that obtained by only a planar electrode.

Organic light-emitting diodes (OLEDs) are regarded as next-generation light sources. The enhancement of external quantum efficiency of OLEDs has been investigated widely. It is an effective method of improving the external quantum efficiency, which destroys the phenomenon of total internal reflection inside the OLEDs by attaching microlens array to the surface of the glass substrate of the OLEDs. In this thesis, a multi-level aspherical gapless microlens array was designed and manufactured, and it was applied to OLEDs. In contrast with a spherical microlens array, the multi-level aspherical gapless microlens array can achieve a form of high aspect ratio and high fill factor, and they can enhance the external quantum efficiency of OLEDs. At first, aspherical microlens arrays with different parameters, including shapes of curved surface, layouts and feature dimensions, were simulated by optical simulation software, FRED. The aspherical microlens arrays which were attached to an OLED were simulated with a ray tracing method. Then, an optimal geometry and layout were found out. After simulation, a film with multi-level aspherical microlens array was fabricated by a LIGA-like process, including lithography, electroforming, PDMS (Polydimethylsiloxane) micro-molding and UV (Ultraviolet) -cured techniques. The characteristic in this process was to use multi-lithography to fabricate a microlens array with multi-level and high aspect ratio. The shape of multi-level was similar to the design, and the process can achieve the advantage of batch manufacture. Finally, the films with different multi-level aspherical microlens array were attached to an OLED to measure the optical-electric properties. The measured results were compared with simulation and confirmed them.

A variety of techniques are available to enable the fabrication of photonic crystal structures. Multi-beam-interference lithography (MBIL) is a relatively new technique which offers many advantages over more traditional means of fabrication. Unlike the more common fabrication methods such as optical and electron-beam lithography, MBIL is a method that can produce both two- and three-dimensional large-area photonic crystal structures for use in the infrared and visible light regimes. While multi-beam-interference lithography represents a promising methodology for the fabrication of PC structures, there has been an incomplete understanding of MBIL itself. The research in this thesis focuses on providing a more complete, systematic description of MBIL in order to demonstrate its full capabilities. Analysis of both three- and four-beam interference is investigated and described in terms of contrast and crystallography. The concept of a condition for primitive-lattice-vector-direction equal contrasts} is introduced in this thesis. These conditions are developed as nonlinear constraints when optimizing absolute contrast for producing lithographically useful interference patterns (meaning high contrast and localized intensity extrema). By understanding the richness of possibilities within MBIL, a number of useful interference patterns are found that can be created in a straightforward manner. These patterns can be both lithographically useful and structurally useful (providing interference contours that can define wide-bandgap photonic crystals). Included within this investigation are theoretical calculations of band structures for photonic crystals that are fabricatable through MBIL. The resulting calculations show that not only do most MBIL-defined structures exhibit similar performance characteristics compared to conventionally designed photonic crystal structures, but in some cases MBIL-defined structures show a significant increase in bandgap size. Using the results from this analysis, a number of hexagonal photonic crystals are fabricated using a variety of process conditions. It is shown that both rod- and hole-type photonic crystal structures can be fabricated using processes based on both positive and negative photoresist. The "light-field" and "dark-field" interference patterns used to define the hexagonal photonic crystal structures are quickly interchanged by the proper adjustment of each beam's intensity and polarization. The resulting structures, including a large area (~1 cm², 1 x 10⁹ lattice points) photonic crystal are imaged using a scanning electron microscope. Multi-beam-interference lithography provides an enabling initial step for the wafer-scale, cost-effective integration of the impressive PC-based devices into manufacturable DIPCS. While multi-beam-interference lithography represents a promising methodology for the fabrication of PC structures, it lacks in the ability to produce PC-based integrated photonic circuits. Future research will target the lack of a large-scale, cost-effective fabrication methodology for photonic crystal devices. By utilizing diffractive elements, a photo-mask will be able to combine both MBIL and conventional lithography techniques into a single fabrication technology while taking advantage of the inherent positive attributes of both.

To enable fast and reliable processors, advances must be made in the interconnections on the printed circuit board and in the interconnections from the chip to the printed circuit board. Processing techniques have been demonstrated to fabricate a copper-clad encapsulated air dielectric layer to enable low loss off-chip electrical signal lines using sacrificial polymers and the three dimensional patterning capabilities of imprint lithography. The inclusion of an air gap can eliminate the dielectric loss allowing the signal to propagate over longer lengths. Additionally, the low dielectric constant of air lowers the loss contributions from the conductor and increases the signal propagation velocity reducing delay. The metal shielding could minimize the crosstalk noise and radiation losses that are significant at high frequencies. The three dimensional patterning capabilities of imprint lithography fabricated curved structures and rounded terminations which can reduce reflections at discontinuities. Furthermore, imprint lithography also created planarized surfaces which simplified the buildup process. Since imprint lithography, only uses temperature and pressure to make a pattern it is an inexpensive and simple process advancement. The metal-clad encapsulated air dielectric structures were fabricated in a comparable number of registration steps to traditional transmission lines. Implementation of all copper chip to substrate interconnects would provide high conductivity electrical connections, resistance to electromigration while avoiding formation of brittle intermetallics. High aspect ratio polymer molds for copper electroplating interconnects could enable improved integrated circuit electrical performance. The properties of a new aqueous base develop, negative-tone photosensitive polynorbornene polymer have been characterized to develop mechanically compliant all copper connections between the chip and printed circuit board. High aspect ratio features of 7:1 (height:width) were produced in 70 ìm thick films in a single coat with straight side-wall profiles and high fidelity. The polymer films studied had a contrast of 11.6 and a low absorption coefficient. To evaluate the polymer's suitability to microelectronics applications, epoxy cross-linking reactions were studied as a function of processing condition through Fourier transform infrared spectroscopy, nano-indentation, and dielectric measurements. The fully cross-linked films had an elastic modulus of 2.9 GPa and hardness of 0.18 GPa which can improve the mechanical compliance of the copper interconnections. A photo-imprint lithography process was developed to improve the photo-patterning of the polynorbornene polymer for high aspect ratio hollow structures. A shallow photo-imprint stamp was developed to physically displace material in the polymer core. Since the imprint stamp displaces material in the area of the feature, the effective film thickness is reduced compared to the bulk film. The reduction in film height reduced the effects of scattering in the core and also facilitated transport of developer within the core. The photo-imprint lithography process resulted in high aspect ratio hollow core pillars that exceeded optical resolution capabilities for comparable feature sizes.