Here I report work done to develop an integrated amplitude and phase shaped optical frequency comb as a source for RF photonic signal processing. The first published section of work pushed towards integrated comb generation; in this work, InP devices were provided by Infinera corp., and SiN devices fabricated by professor Minghao Qi’s group. In this work a monolithic InP-based photonic integrated circuit (PIC) consisting of a widely tunable laser master oscillator feeding an array of integrated semiconductor optical amplifiers that are interferometrically combined on-chip in a single-mode waveguide is shown. We demonstrate a stable and efficient on-chip coherent beam combination and obtain up to 240 mW average power from the monolithic PIC, with 30–50 kHz Schawlow-Townes linewidths and >180 mW average power across the extended C-band. We also explored hybrid integration of the InP-based laser and amplifier array PIC with a high quality factor silicon nitride microring resonator. We observe lasing based on gain from the interferometrically combined amplifier array in an external cavity formed via feedback from the silicon nitride microresonator chip; this configuration results in narrowing of the Schawlow-Townes linewidth to 􀀀3 kHz with 37.9 mW average power at the SiN output facet. The pulse shaping was achieved using an InP ultrafast optical pulse shaper fabricated by Infinera corporation. In this work we report characterization of a 48 channel InP shaper at 50 GHz channel spacing, provisioned with both channel-by-channel phase adjusters and SOA gain elements. To our knowledge this constitutes the first demonstration of an operable integrated InP pulse shaper with independent intensity and phase control.

We explore a new laboratory technique in the field of urinalysis promising a combination of speed and selectivity in support of urinary tract infection diagnosis. Laboratory experimentation demonstrates long range surface plasmon polaritons (LRSPP) waveguides as a useful biosensor to selectively detect gram negative bacteria or gram positive bacteria in human urine. The biosensor can detect bacteria at concentration of 105 CFU/ml, the internationally recommended threshold for diagnostic of urinary tract infection (UTI). Using a negative control solution at bacterial concentration 1000x higher than the targeted bacteria in urine with a weak concentration of constituents, the power ratio between the negative control signals to the target bacteria signal is measured to be 5.4. Thus we report a conclusive demonstration of the LRSPP waveguide biosensor selectivity to the gram of bacteria in human urine. In addition, the biosensor may prove useful as an alternative urinalysis test method to determine the urine specific gravity, to estimate proteinuria, and to detect biofilm formation on surfaces.

Integration of complex optical functionalities with high performance will lead to a huge development in the field of nanophotonics for a broad range of applications. Silicon photonics is currently the leading technology for the implementation of low-cost photonic integrated devices. The great potential of this technology relies on its compatibility with the mature silicon integrated circuits manufacturing based on complementary metal-oxide semiconductor (CMOS) processes widely used in microelectronic industry and the availability of high quality silicon-on-insulator wafers, an ideal platform for creating planar waveguide circuits that offers strong optical confinement due to the high index contrast between silicon (n=3.45) and silicon dioxide (n=1.45). In order to keep improving the performance of photonic devices on silicon, the integration of CMOS compatible materials with unique properties shows up as an excellent opportunity to overcome the current limitations in silicon while offering unprecedented and novel capabilities to the silicon platform. In this way, barium titantate (BaTiO3) stands out as one of the most disruptive candidates. The work developed in this thesis is essentially focused on the design, fabrication and characterization of an electro-optic modulator based on a hybrid BaTiO3 on silicon structure for the implementation of high performance electro-optic functionalities with beyond state-of-the art performance that currently cannot be afforded in silicon photonics technology. / La integración de funcionalidades ópticas con alto rendimiento llevará a un gran desarrollo en el campo de la nanofotónica para un amplio abanico de aplicaciones. Actualmente, la fotónica de silicio es la tecnología líder para la implementación de dispositivos fotónicos integrados a bajo coste. El gran potencial de esta tecnología reside en su compatibilidad con las maduras técnicas de fabricación de circuitos integrados de silicio basadas en los procesos "complementary metal-oxide semiconductor" (CMOS) ampliamente utilizados en la industria microelectrónica y la disponibilidad de disponer de obleas de silicio sobre aislante de alta calidad, una plataforma ideal para crear circuitos de guía de ondas planas que ofrecen un fuerte confinamiento óptico debido al alto contraste índices entre el silicio (n=3,45) y el dióxido de silicio (n=1,45). Para poder mejorar el rendimiento de dispositivos fotónicos en silicio, la integración de materiales con propiedades excepcionales y compatibles con los procesos de fabricación CMOS surge como una excelente oportunidad para superar las actuales limitaciones de la tecnología de silicio al mismo tiempo que ofrece oportunidades novedosas y sin precedentes en la plataforma de silicio. En este sentido, el material titanato de bario (BaTiO3) se postula como uno de los candidatos más prometedores. El trabajo desarrollado en esta tesis está esencialmente enfocado en el diseño, fabricación y caracterización de un modulador electro-óptico basado en una estructura híbrida de BaTiO3 en silicio para la implementación de funcionalidades electro-ópticas de alto rendimiento más allá del estado del arte de las que no se puede disponer actualmente en la tecnología de fotónica de silicio. / La integració de funcionalitats òptiques amb alt rendiment portarà a un gran desenvolupament en el camp de la nanofotònica per a un ampli ventall d'aplicacions. Actualment, la fotònica de silici és la tecnologia capdavantera per a la implementació de dispositius fotònics integrats a baix cost. El gran potencial d'aquesta tecnologia resideix en la seva compatibilitat amb les madures tècniques de fabricació de circuits integrats de silici basades en els processos "complementary metal-oxide semiconductor" (CMOS) amplament utilitzats en la indústria microelectrònica i la disponibilitat de disposar d'hòsties de silici sobre aïllant d'alta qualitat, una plataforma ideal per crear circuits de guia d'ones planes que ofereixen un fort confinament òptic a causa de l'alt contrast d'índexs entre el silici (n=3,45) i el diòxid de silici (n=1,45). Per poder millorar el rendiment de dispositius fotònics en silici, la integració de materials amb propietats excepcionals i compatibles amb els processos de fabricació CMOS sorgeix com una excel·lent oportunitat per superar les actuals limitacions de la tecnologia de silici al mateix temps que ofereix oportunitats noves i sense precedents en la plataforma de silici. En aquest sentit, el material titanat de bari (BaTiO3) es postula com un dels candidats més prometedors. El treball desenvolupat en aquesta tesi està essencialment enfocat en el disseny, fabricació i caracterització d'un modulador electro-òptic basat en una estructura híbrida de BaTiO3 en silici per a la implementació de funcionalitats electro-òptiques d'alt rendiment més enllà de l'estat de l'art de les quals no es pot disposar actualment a la tecnologia de fotònica de silici. / Castera Molada, P. (2017). Development of new photonic devices based on barium titanate in silicon [Tesis doctoral no publicada]. Universitat Politècnica de València. https://doi.org/10.4995/Thesis/10251/86197 / TESIS

<p>Infertility is the disease of the reproductive system and is estimated to affect more than 10% of the people of reproductive age. Assisted reproductive technologies (ART) are methods designed to alleviate infertility problems. <i>In vitro </i>embryo production is part of most infertility treatments and the efficiency of ART is low due to the lack of reliable methods to measure embryo viability. In order to improve the success rate of ART procedures, the current study was designed to investigate the use of an optical analyzer technology known as the Biodynamic Imaging (BDI) system for viability assessment. BDI is a novel approach that is able to measure intracellular dynamic processes that are directly related to functional events. During a series of experiments, 13 different biomarkers of oocytes and embryos were monitored by the BDI microscope and used for machine learning and evaluation of BDI sensitivity. We monitored cellular mechanisms essential for proper embryo development such as (1) extrusion of first and second polar body (2) energy status and mitochondrial activity, and (3) viability of embryos with different cellular composition. We were able to identify several biomarkers that have the potential to indicate viability: (1) slope, (2) NSD, (3) Knee (4) Floor, and (5) R² could consistently differentiate between oocytes and embryos of different viability. In addition, the BDI microscope could successfully predict the energy status of embryos by identifying 4 biomarkers (Slope, Knee, Floor, and Dy). Finally, a lipidomic analysis was done to evaluate the lipid composition of oocytes with different cytoplasm integrities. This analysis demonstrated that there is a difference in lipid subclasses among oocytes with dark vs. light cytoplasm. The results indicate that the BDI is useful for viability assessment of oocytes and embryos and may be helpful for the improvement of the efficiency of assisted reproductive technologies.</p>

El silicio es la plataforma más prometedora para la integración fotónica, asegurando la compatibilidad con los procesos de fabricación CMOS y la producción en masa de dispositivos a bajo coste. Durante las últimas décadas, la tecnología fotónica basada en la plataforma de silicio ha mostrado un gran crecimiento, desarrollando diferentes tipos de dispositivos ópticos de alto rendimiento. Una de las posibilidades para continuar mejorando las prestaciones de los dispositivos fotónicos es mediante la combinación con otras tecnologías como la plasmónica o con nuevos materiales con propiedades excepcionales y compatibilidad CMOS. Las tecnologías híbridas pueden superar las limitaciones de la tecnología de silicio, dando lugar a nuevos dispositivos capaces de superar las prestaciones de sus homólogos electrónicos. La tecnología híbrida dióxido de vanadio/ silicio permite el desarrollo de dispositivos de altas prestaciones, con gran ancho de banda, mayor velocidad de operación y mayor eficiencia energética con dimensiones de la escala de la longitud de onda. El objetivo principal de esta tesis ha sido la propuesta y desarrollo de dispositivos fotónicos de altas prestaciones para aplicaciones de conmutación. En este contexto, diferentes estructuras basadas en silicio, tecnología plasmónica y las propiedades sintonizables del dióxido de vanadio han sido investigadas para controlar la polarización de la luz y para desarrollar otras funcionalidades electro-ópticas como la modulación. / Silicon is the most promising platform for photonic integration, ensuring CMOS fabrication compatibility and mass production of cost-effective devices. During the last decades, photonic technology based on the Silicon on Insulator (SOI) platform has shown a great evolution, developing different sorts of high performance optical devices. One way to continue improving the performance of photonic optical devices is the combination of the silicon platform with another technologies like plasmonics or CMOS compatible materials with unique properties. Hybrid technologies can overcome the current limits of the silicon technology and develop new devices exceeding the performance metrics of its counterparts electronic devices. The vanadium dioxide/silicon hybrid technology allows the development of new high-performance devices with broadband performance, faster operating speed and energy efficient optical response with wavelength-scale device dimensions. The main goal of this thesis has been the proposal and development of high performance photonic devices for switching applications. In this context, different structures, based on silicon, plasmonics and the tunable properties of vanadium dioxide, have been investigated to control the polarization of light and for enabling other electro-optical functionalities, like optical modulation. / El silici és la plataforma més prometedora per a la integració fotònica, assegurant la compatibilitat amb els processos de fabricació CMOS i la producció en massa de dispositius a baix cost. Durant les últimes dècades, la tecnologia fotònica basada en la plataforma de silici ha mostrat un gran creixement, desenvolupant diferents tipus de dispositius òptics d'alt rendiment. Una de les possibilitats per a continuar millorant el rendiment dels dispositius fotònics és per mitjà de la combinació amb altres tecnologies com la plasmònica o amb nous materials amb propietats excepcionals i compatibilitat CMOS. Les tecnologies híbrides poden superar les limitacions de la tecnologia de silici, donant lloc a nous dispositius capaços de superar el rendiment dels seus homòlegs electrònics. La tecnologia híbrida diòxid de vanadi/silici permet el desenvolupament de dispositius d'alt rendiment, amb gran ample de banda, major velocitat d'operació i major eficiència energètica en l'escala de la longitud d'ona. L'objectiu principal d'esta tesi ha sigut la proposta i desenvolupament de dispositius fotònics d'alt rendiment per a aplicacions de commutació. En este context, diferents estructures basades en silici, tecnologia plasmònica i les propietats sintonitzables del diòxid de vanadi han sigut investigades per a controlar la polarització de la llum i per a desenvolupar altres funcionalitats electró-òptiques com la modulació. / Sánchez Diana, LD. (2016). High performance photonic devices for switching applications in silicon photonics [Tesis doctoral no publicada]. Universitat Politècnica de València. https://doi.org/10.4995/Thesis/10251/77150 / TESIS

This dissertation presents the fabrication and analysis of in-fiber devices based on elliptical core D-shaped optical fiber. Devices created inside optical fibers are attractive for a variety of reasons including low loss, high efficiency, self-alignment, light weight, multiplexibility, and resistance to electromagnetic interference. This work details how D-fiber can be used as a platform for a variety of devices and describes the creation and performance of two of these devices: an in-fiber polymer waveguide and a surface relief fiber Bragg grating. In D-fiber the core is very close to the flat side of the ‘D’ shape. This proximity allows access to the fields in the fiber core by removal of the cladding above the core. The D-fiber we use also has an elliptical core, allowing for the creation of polarimetric devices. This work describes two different etch processes using hydrofluoric acid (HF) to remove the fiber cladding and core. For the creation of devices in the fiber core, the core is partially removed and replaced with another material possessing the required optical properties. For devices which interact with the evanescent field, cladding removal is terminated before acid breaches the core. Etching fibers prepares them for use in the creation of in-fiber devices. Materials are placed into the groove left when the core of a fiber is partially removed to form a hybrid waveguide in which light is guided by both the leftover core and the inserted material. These in-fiber polymer waveguides have insertion loss less than 2 dB and can potentially be the basis for a number of electro-optic devices or sensors. A polarimetric temperature sensor demonstrates the feasibility of the core replacement method. This work also describes the creation of a surface relief fiber Bragg gratings (SR-FBGs) in the cladding above the core of the fiber. Because it is etched into the surface topography of the fiber, a SR-FBG can operate at much higher temperatures than a standard FBG, up to at least 1100 degrees Celsius. The performance of a SR-FBG is demonstrated in temperature sensing at high temperatures, and as a strain sensor.

La montée exponentielle du trafic de données liée au développement de l’interconnexion entre objets et personnes sur la toile nécessite de nouvelles technologies. Au cours de la dernière décennie, les peignes de fréquences optiques ont révolutionné le secteur des télécommunications, ouvrant la voie à une transmission de données à un débit de données auparavant inaccessible. Mis à part le domaine des télécommunications, les peignes de fréquences optiques ont été avantageusement exploités dans d’autres domaines comme la détection optique, la détection chimique, les horloges optiques… L'efficacité du phénomène de mélange à quatre ondes, qui sous-tend la génération des peignes de fréquences, dépend de manière significative des pertes par propagation dans les guides d’ondes optiques et, par conséquent, de la rugosité de ces derniers. De plus, l'absorption intrinsèque du matériau réduit l'efficacité des phénomènes non linéaires tout en contribuant à l’atténuation du signal lumineux dans le milieu optique de propagation. Grâce à la maturité des procédés de fabrication dits CMOS, la rugosité peut être réduite en optimisant la gravure, tandis que l’absorption peut être réduite par des traitements thermiques. L'utilisation d'un matériau CMOS permet donc une fabrication à faible coût et la co-intégration avec d’autres dispositifs optoélectroniques sur la même puce. Le nitrure de silicium sur isolant est une plateforme prometteuse pour la génération de peignes de fréquences optiques grâce à la faible absorption à deux photons dans ce matériau par rapport au silicium cristallin. Cependant, le nitrure présente une absorption dans la bande des télécommunications relié à la présence des liens moléculaires N-H. Tandis que des recuits à haute température ont été utilisés pour réduire le contenu en hydrogène du film et démontrer avec succès la génération de peignes de fréquence, ces procédés rendent la co-intégration monolithique de ces dispositifs en nitrure de silicium avec une optoélectronique à base de silicium très difficile, réduisant ainsi considérablement sa compatibilité avec les autres matériaux CMOS. Dans cette thèse, nous décrivons la conception, la fabrication et les caractérisations de circuits photoniques non-linéaires en nitrure de silicium sans recuit. En particulier, nous avons mis au point un procédé de fabrication de films de Si3N4 d'une épaisseur de 740 nm, sans utilisation de recuit et avec une maitrise de la gestion des contraintes typiquement associées à ce type de matériau pour l’optique non linéaire. Cette approche offre une compatibilité de fabrication technologique avec la photonique sur silicium. Des preuves expérimentales montrent que les micro-résonateurs utilisant de tels films de nitrure de silicium sans recuit sont capables de générer un peigne de fréquence s'étendant sur 1300-2100 nm via une oscillation paramétrique optique basée sur du mélange à quatre ondes. En allant encore plus loin, nous présentons également les travaux d’optimisation technologique portant sur des microrésonateurs en nitrure de silicium recuits avec des guides d’onde à fort confinement modal, qui nous ont permis d’atteindre des pertes de propagation record. Ces résultats ont été rendus possible grâce à une optimisation fine des étapes de gravure des guides d’onde ainsi qu’à l'utilisation de traitements thermiques-chimiques efficaces. Cette nouvelle approche nous a permis de démontrer par ailleurs des sources de peignes de fréquences intégrées sur puce utilisant des résonateurs en nitrure de silicium couplés par aboutement à un laser III-V DFB utilisé comme une pompe. Cette preuve de concept prouve la validité de notre plateforme de circuits photoniques non-linéaires en Si3N4 pour la réalisation de peignes de fréquences optiques ultra-compacts à faible consommation. / The data traffic need for ultra-high definition videos as well as for the mobile data continues to grow. Within the last decade, optical frequency combs have revolutionized the telecommunications field and paved the way for groundbreaking data transmission demonstrations at previously unattainable data rates. Beside the telecommunications field, optical frequency combs brought benefits also for many other applications such as precision spectroscopy, chemical and bio sensing, optical clocks, and quantum optics. The efficiency of the four-wave mixing phenomenon from which the optical frequency comb arises critically depends on the propagation losses and consequently on the device roughness induced by the lithography and the etching processes. In addition, the bulk material absorption reduces the efficiency of the nonlinear phenomena. By using state-of-the-art complementary metal oxide semiconductor processes, the roughness can be reduced thanks to the maturity of the manufacturing, while the material bulk absorption can be reduced by thermal treatments. In addition, using a CMOS material enables a low-cost fabrication and the co-integration with electronic devices into the same chip. Silicon-nitride-on-insulator is an attractive CMOS-compatible platform for optical frequency comb generation in the telecommunication band because of the low two-photon absorption of silicon nitride when compared with crystalline silicon. However, the as deposited silicon nitride has a hydrogen related absorption in the telecommunication band. Although high-temperature annealing has been traditionally used to reduce the hydrogen content and successfully demonstrate silicon nitride-based frequency combs, this approach made the co-integration with silicon-based optoelectronics elusive, thus reducing dramatically its effective complementary metal oxide semiconductor compatibility. In this thesis, we report on the fabrication and test of annealing-free silicon nitride nonlinear photonic circuits. In particular, we have developed a process to fabricate low-loss, annealing-free and crack–free Si3N4 740-nm-thick films for Kerr-based nonlinear photonics, featuring a full process compatibility with front-end silicon photonics. Experimental evidence shows that micro-resonators using such annealing-free silicon nitride films are able to generate a frequency comb spanning 1300-2100 nm via optical parametrical oscillation based on four-wave mixing. In addition, we present the further optimized technological process related to annealed silicon nitride optical devices using high-confinement waveguides, allowing us to achieve record-low losses. This was enabled via a carefully tailored patterning etching process and an annealing treatment particularly efficient due to the already low hydrogen content in our as-deposited silicon nitride. Such improved Si3N4 platform allowed us to demonstrate on-chip integrated Kerr frequency comb sources using silicon nitride resonators that were butt-coupled to a III-V DFB laser used as a pump source. This proof of concept proves the validity of our approach for realizing fully packaged compact optical frequency combs.

No description available.